Patents by Inventor Hans Zweifel
Hans Zweifel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6966475Abstract: A draw roller for pulling web-shaped material with at least one pull ring arranged on at least one part of the circumference of the roller. The at least one pull ring can be displaced on the draw roller.Type: GrantFiled: June 30, 2003Date of Patent: November 22, 2005Assignee: Maschinenfabrik WIFAGInventors: Hans Zweifel, Thomas Treuthard
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Publication number: 20040050895Abstract: A draw roller for pulling web-shaped material with at least one pull ring arranged on at least one part of the circumference of the roller. The at least one pull ring can be displaced on the draw roller.Type: ApplicationFiled: June 30, 2003Publication date: March 18, 2004Inventors: Hans Zweifel, Thomas Treuthard
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Patent number: 6541547Abstract: Polyolefin mouldings which have excellent stability on permanent contact with extracting media comprise, as stabilizers, a selected mixture comprising an organic phosphite or phosphonite and a specially selected group of sterically hindered phenols or a certain group of sterically hindered amines. In addition, a selected three-component mixture comprising a phosphite or phosphonite, a phenolic antioxidant and a certain group of sterically hindered amines is particularly suitable as stabilizer for polyolefin moldings which are in permanent contact with extracting media.Type: GrantFiled: September 9, 1996Date of Patent: April 1, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Thomas Schmutz, Erich Kramer, Hans Zweifel, Bruno Rotzinger
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Patent number: 5494944Abstract: A hardenable composition containing:a) a material polymerizable by free radical or cationic polymerization,b) at least one iron compound of the formula I ##EQU1## wherein a is 1 or 2 and q is 1, 2 or 3,L is a divalent to heptavalent metal or non-metal,Q is a halogen atom,m is an integer corresponding to the sum of the values of L and q,R.sup.1 is an unsubstituted or substituted .eta..sup.6 -benzene andR.sup.2 is an unsubstituted or substituted cyclopentadienyl anion, andc) at least one sensitizer for the compound of the formula I,and, in the case of materials polymerizable by free radical polymerization, also d) an electron acceptor as an oxidizing agent, which is also advantageously used concomitantly for the material polymerizable by cationic polymerization. The composition is suitable for the production of protective layers and photographic images.Type: GrantFiled: August 18, 1994Date of Patent: February 27, 1996Assignee: Ciba-Geigy CorporationInventors: Kurt Meier, Hans Zweifel
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Patent number: 5371115Abstract: A hardenable composition containing:a) a material polymerizable by free radical or cationic polymerization,b) at least one iron compound of the formula I ##EQU1## wherein a is 1 or 2 and q is 1, 2 or 3,L is a divalent to heptavalent metal or non-metal,Q is a halogen atom,m is an integer corresponding to the sum of the values of L and q,R.sup.1 is an unsubstituted or substituted .eta..sup.6 -benzene andR.sup.2 is an unsubstituted or substituted cyclopentadienyl anion, andc) at least one sensitizer for the compound of the formula I,and, in the case of materials polymerizable by free radical polymerization, also d) an electron acceptor as an oxidizing agent, which is also advantageously used concomitantly for the material polymerizable by cationic polymerization. The composition is suitable for the production of protective layers and photographic images.Type: GrantFiled: April 15, 1992Date of Patent: December 6, 1994Assignee: Ciba-Geigy CorporationInventors: Kurt Meier, Hans Zweifel
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Patent number: 5073476Abstract: Iron (II)-aromatic compound complexes mixed with electron acceptors as an oxidizing agent are suitable initiators for the polymerization by irradiation of organic material which can be polymerized by cations and/or free radicals. The composition composed of the polymerizable material and of the initiator mixture is suitable for the production of protective coatings and can be used as a photographic recording material.Type: GrantFiled: May 10, 1984Date of Patent: December 17, 1991Assignee: Ciba-Geigy CorporationInventors: Kurt Meier, Giuliano Eugster, Franz Schwarzenbach, Hans Zweifel
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Patent number: 4855468Abstract: Titanocenes with .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are bonded to the metal, the aromatic rings being substituted in at least one of the two ortho-positions relative to the metal-carbon bonds by CF.sub.2 Z (Z=F or substituted or unsubstituted alkyl), are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds. They are distinguished by a high radiation sensitivity, stability to air and thermal effects, and high effectiveness in the range from UV light to visible light.Type: GrantFiled: September 11, 1987Date of Patent: August 8, 1989Assignee: Ciba-Geigy CorporationInventors: Martin Riediker, Kurt Meier, Hans Zweifel
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Patent number: 4713401Abstract: Titanocenes with .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are bonded to the metal, the aromatic rings being substituted in at least one of the two ortho-positions relative to the metal-carbon bonds by CF.sub.2 Z (Z=F or substituted or unsubstituted alkyl), are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds. They are distinguished by a high radiation sensitivity, stability to air and thermal effects, and high effectiveness in the range from UV light to visible light.Type: GrantFiled: December 11, 1985Date of Patent: December 15, 1987Inventors: Martin Riediker, Kurt Meier, Hans Zweifel
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Patent number: 4681950Abstract: Novel xanthones and thioxanthones of the formula I ##STR1## in which A, X, Y, Z, E and E' are as defined in patent claim 1, are described. A is preferably --S-- and E and E' are preferably bonded in the ortho-position relative to one another. The compounds (I) are suitable, for example, as sensitizers for photocrosslinkable polymers or photocurable compositions, or for use in mixtures with polymers with H donor groups for image formation, in particular electrically conductive coatings and patterns, by means of electroless deposition of metals.Type: GrantFiled: December 23, 1985Date of Patent: July 21, 1987Assignee: Ciba-Geigy CorporationInventors: Walter Fischer, Jurgen Finter, Hans Zweifel
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Patent number: 4624912Abstract: A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin containing a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appropriate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.Type: GrantFiled: February 6, 1985Date of Patent: November 25, 1986Assignee: Ciba-Geigy CorporationInventors: Hans Zweifel, Sigrid Bauer, Kurt Meier
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Patent number: 4594400Abstract: Thioxanthone carboxylic acid esters, thioesters and amides with reactive functional groups of the formula ##STR1## in which X, Y, Z, n and Q are as defined in the patent claim and Q is, for example, --OCH.dbd.CH.sub.2, --OCH.sub.2 CH.dbd.CH.sub.2, --SCH.sub.2 CH.dbd.CH.sub.2 or --NHCH.sub.2 CH.dbd.CH.sub.2 (n=1), --OH, --SH, --NH.sub.2, --COOH, --COCl or --OCO--C(R").dbd.CH.sub.2, in which R" is methyl or hydrogen (n=2), are suitable for the preparation of polymers with thioxanthone radicals in side chains. The compounds (I) and also the polymers which can be prepared therefrom can be employed as sensitizers for photocrosslinkable polymers or as initiators, if desired in a mixture with amines, for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefines.Type: GrantFiled: September 19, 1984Date of Patent: June 10, 1986Assignee: Ciba-Geigy CorporationInventors: Vratislav Kvita, Hans Zweifel, Martin Roth, Louis Felder
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Patent number: 4585876Abstract: Novel xanthones and thioxanthones of the formula I ##STR1## in which A, X, Y, Z, E and E' are as defined in patent claim 1, are described. A is preferably --S-- and E and E' are preferably bonded in the ortho-position relative to one another. The compounds (I) are suitable, for example, as sensitizers for photocrosslinkable polymers or photocurable compositions, or for use in mixtures with polymers with H donor groups for image formation, in particular electrically conductive coatings and patterns, by means of electroless deposition of metals.Type: GrantFiled: November 14, 1983Date of Patent: April 29, 1986Assignee: Ciba-Geigy CorporationInventors: Walter Fischer, Jurgen Finter, Hans Zweifel
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Patent number: 4537977Abstract: Novel tetrasubstituted phthalic acid derivatives of the formula ##STR1## are described, in which Y.sub.1 and Y.sub.2 are oxygen and Y is ##STR2## or --O--, or one of Y.sub.1 and Y.sub.2 is oxygen and the other is .dbd.N--R" and Y is --O--, and m, n, X, R, R' and R" are as defined in claim 1. The compounds (I) are suitable as sensitizers for photocrosslinkable polymers or as initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.Type: GrantFiled: April 4, 1984Date of Patent: August 27, 1985Assignee: Ciba-Geigy CorporationInventors: Walter Fischer, Hans Zweifel
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Patent number: 4505794Abstract: Thioxanthonecarboxylic acid esters, thioesters or amides of the formula I ##STR1## in which X and Z are hydrogen or one of the substituents defined in more detail in claim 1 and Y is --OR.sub.1, --SR.sub.1 or --N(R.sub.1)(R.sub.2), in which R.sub.1 is C.sub.1-24 alkyl and R.sub.2 is H or R.sub.1, are suitable, if desired together with amines, as initiators for the photopolymerization of ethylenically unsaturated compounds or for photochemical crosslinking of polyolefines. They are also used as sensitizers for photocrosslinkable polymers. They can be prepared by methods known per se, for example by cyclization of phenylthio-phthalic, -isophthalic or -terephthalic acids, which can be correspondingly substituted, and subsequent reaction with suitable alcohols, thiols or amines.Type: GrantFiled: September 23, 1982Date of Patent: March 19, 1985Assignee: Ciba-Geigy CorporationInventors: Vratislav Kvita, Hans Zweifel, Martin Roth, Louis Felder
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Patent number: 4506083Abstract: Thioxanthonecarboxylic acid esters, thioesters or amides of the formula I ##STR1## in which X and Z are hydrogen or one of the substituents defined in more detail in claim 1 and Y is --OR.sub.1, --SR.sub.1 or --N(R.sub.1)(R.sub.2), in which R.sub.1 is C.sub.1-24 alkyl and R.sub.2 is H or R.sub.1, are suitable, if desired together with amines, as initiators for the photopolymerization of ethylenically unsaturated compounds or for photochemical crosslinking of polyolefines. They are also used an sensitizers for photocrosslinkable polymers. They can be prepared by methods known per se, for example by cyclization of phenylthio-phthalic, -isophthalic or -terephthalic acids, which can be correspondingly substituted, and subsequent reaction with suitable alcohols, thiols or amines.Type: GrantFiled: June 28, 1982Date of Patent: March 19, 1985Assignee: Ciba-Geigy CorporationInventors: Vratislav Kvita, Hans Zweifel, Martin Roth, Louis Felder
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Patent number: 4487942Abstract: Anhydrides of formula V ##STR1## where A" is --CH.sub.2 CH.sub.2 --, and R and R.sub.1 independently of one another are hydrogen, halogen, alkyl having 1 to 4 carbon atoms or methoxy are valuable intermediates for the preparation of tricyclic imidyl derivatives. These imidyl derivatives form photocrosslinkable polymers useful for making printing plates and photoresists.Type: GrantFiled: July 20, 1983Date of Patent: December 11, 1984Assignee: Ciba-Geigy CorporationInventors: Hans Zweifel, Walter Schilling, Angelo Storni, Daniel Bellus
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Patent number: 4486596Abstract: Anhydrides of formula V ##STR1## where A" is --OCH.sub.2 -- with the oxygen atom bonded to the aromatic ring and R and R.sub.1 independently of one another are hydrogen, halogen, alkyl having 1 to 4 carbon atoms or methoxy are valuable intermediates for the preparation of tricyclic imidyl derivatives. These imidyl derivatives form photocrosslinkable polymers useful for making printing plates and photoresists.Type: GrantFiled: August 29, 1983Date of Patent: December 4, 1984Assignee: Ciba-Geigy CorporationInventors: Hans Zweifel, Walter Schilling, Angelo Storni, Daniel Bellus
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Patent number: 4480105Abstract: Novel compounds of the formula II ##STR1## are described, in which M.sub.1 and M.sub.2 individually are --OH or together are --O--, X is --NO.sub.2, --OR', --SR' or SO.sub.2 R' and the (R')s independently of one another are C.sub.1-20 -alkyl, C.sub.3-5 -alkenyl, C.sub.3-5 -alkynyl, C.sub.2-4 -monohydroxyalkyl, C.sub.1-12 -halogenoalkyl, benzyl, C.sub.5-12 -cycloalkyl, phenyl, carboxyphenyl, halogenophenyl, nitrophenyl, alkyl- or alkoxy-phenyl each having 1-4 C atoms in the alkyl or alkoxy moieties, or acetylaminophenyl, such as for example 3-n-butylthio-5-nitrophthalic anhydride. The compounds (II) in which M.sub.1 and M.sub.2 together are --O-- are suitable as sensitizers for photo-crosslinkable polymers or as initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins, and those where M.sub.1 and M.sub.2 are --OH are useful intermediates for those wherein M.sub.1 and M.sub.2 together are --O--.Type: GrantFiled: April 30, 1982Date of Patent: October 30, 1984Assignee: Ciba-Geigy CorporationInventors: Walter Fischer, Vratislav Kvita, Hans Zweifel
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Patent number: 4463142Abstract: The invention relates to polymers which are crosslinkable under the action of light and contain side groups of the formula ##STR1## in which R.sup.3 is preferably chlorine and R, R.sup.1 and R.sup.2 are, for example, H or --CH.sub.3. The proportion of these groups in the polymers is preferably 20 to 100%. Because of their high sensitivity to light, the polymers are suitable for photographic applications.Type: GrantFiled: September 17, 1982Date of Patent: July 31, 1984Assignee: Ciba-Geigy CorporationInventors: Hans Zweifel, Joseph Berger, Hans Bosshard
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Patent number: 4459414Abstract: Novel tetrasubstituted phthalic acid derivatives of the formula ##STR1## are described, in which Y.sub.1 and Y.sub.2 are oxygen and Y is ##STR2## or --O--, or one of Y.sub.1 and Y.sub.2 is oxygen and the other is .dbd.N--R" and Y is --O--, and m, n, X, R, R' and R" are as defined in claim 1. The compounds (I) are suitable as sensitizers for photocrosslinkable polymers or as initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.Type: GrantFiled: March 29, 1982Date of Patent: July 10, 1984Assignee: Ciba-Geigy CorporationInventors: Walter Fischer, Hans Zweifel