Patents by Inventor Hans Zweifel

Hans Zweifel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6966475
    Abstract: A draw roller for pulling web-shaped material with at least one pull ring arranged on at least one part of the circumference of the roller. The at least one pull ring can be displaced on the draw roller.
    Type: Grant
    Filed: June 30, 2003
    Date of Patent: November 22, 2005
    Assignee: Maschinenfabrik WIFAG
    Inventors: Hans Zweifel, Thomas Treuthard
  • Publication number: 20040050895
    Abstract: A draw roller for pulling web-shaped material with at least one pull ring arranged on at least one part of the circumference of the roller. The at least one pull ring can be displaced on the draw roller.
    Type: Application
    Filed: June 30, 2003
    Publication date: March 18, 2004
    Inventors: Hans Zweifel, Thomas Treuthard
  • Patent number: 6541547
    Abstract: Polyolefin mouldings which have excellent stability on permanent contact with extracting media comprise, as stabilizers, a selected mixture comprising an organic phosphite or phosphonite and a specially selected group of sterically hindered phenols or a certain group of sterically hindered amines. In addition, a selected three-component mixture comprising a phosphite or phosphonite, a phenolic antioxidant and a certain group of sterically hindered amines is particularly suitable as stabilizer for polyolefin moldings which are in permanent contact with extracting media.
    Type: Grant
    Filed: September 9, 1996
    Date of Patent: April 1, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Thomas Schmutz, Erich Kramer, Hans Zweifel, Bruno Rotzinger
  • Patent number: 5494944
    Abstract: A hardenable composition containing:a) a material polymerizable by free radical or cationic polymerization,b) at least one iron compound of the formula I ##EQU1## wherein a is 1 or 2 and q is 1, 2 or 3,L is a divalent to heptavalent metal or non-metal,Q is a halogen atom,m is an integer corresponding to the sum of the values of L and q,R.sup.1 is an unsubstituted or substituted .eta..sup.6 -benzene andR.sup.2 is an unsubstituted or substituted cyclopentadienyl anion, andc) at least one sensitizer for the compound of the formula I,and, in the case of materials polymerizable by free radical polymerization, also d) an electron acceptor as an oxidizing agent, which is also advantageously used concomitantly for the material polymerizable by cationic polymerization. The composition is suitable for the production of protective layers and photographic images.
    Type: Grant
    Filed: August 18, 1994
    Date of Patent: February 27, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Kurt Meier, Hans Zweifel
  • Patent number: 5371115
    Abstract: A hardenable composition containing:a) a material polymerizable by free radical or cationic polymerization,b) at least one iron compound of the formula I ##EQU1## wherein a is 1 or 2 and q is 1, 2 or 3,L is a divalent to heptavalent metal or non-metal,Q is a halogen atom,m is an integer corresponding to the sum of the values of L and q,R.sup.1 is an unsubstituted or substituted .eta..sup.6 -benzene andR.sup.2 is an unsubstituted or substituted cyclopentadienyl anion, andc) at least one sensitizer for the compound of the formula I,and, in the case of materials polymerizable by free radical polymerization, also d) an electron acceptor as an oxidizing agent, which is also advantageously used concomitantly for the material polymerizable by cationic polymerization. The composition is suitable for the production of protective layers and photographic images.
    Type: Grant
    Filed: April 15, 1992
    Date of Patent: December 6, 1994
    Assignee: Ciba-Geigy Corporation
    Inventors: Kurt Meier, Hans Zweifel
  • Patent number: 5073476
    Abstract: Iron (II)-aromatic compound complexes mixed with electron acceptors as an oxidizing agent are suitable initiators for the polymerization by irradiation of organic material which can be polymerized by cations and/or free radicals. The composition composed of the polymerizable material and of the initiator mixture is suitable for the production of protective coatings and can be used as a photographic recording material.
    Type: Grant
    Filed: May 10, 1984
    Date of Patent: December 17, 1991
    Assignee: Ciba-Geigy Corporation
    Inventors: Kurt Meier, Giuliano Eugster, Franz Schwarzenbach, Hans Zweifel
  • Patent number: 4855468
    Abstract: Titanocenes with .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are bonded to the metal, the aromatic rings being substituted in at least one of the two ortho-positions relative to the metal-carbon bonds by CF.sub.2 Z (Z=F or substituted or unsubstituted alkyl), are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds. They are distinguished by a high radiation sensitivity, stability to air and thermal effects, and high effectiveness in the range from UV light to visible light.
    Type: Grant
    Filed: September 11, 1987
    Date of Patent: August 8, 1989
    Assignee: Ciba-Geigy Corporation
    Inventors: Martin Riediker, Kurt Meier, Hans Zweifel
  • Patent number: 4713401
    Abstract: Titanocenes with .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are bonded to the metal, the aromatic rings being substituted in at least one of the two ortho-positions relative to the metal-carbon bonds by CF.sub.2 Z (Z=F or substituted or unsubstituted alkyl), are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds. They are distinguished by a high radiation sensitivity, stability to air and thermal effects, and high effectiveness in the range from UV light to visible light.
    Type: Grant
    Filed: December 11, 1985
    Date of Patent: December 15, 1987
    Inventors: Martin Riediker, Kurt Meier, Hans Zweifel
  • Patent number: 4681950
    Abstract: Novel xanthones and thioxanthones of the formula I ##STR1## in which A, X, Y, Z, E and E' are as defined in patent claim 1, are described. A is preferably --S-- and E and E' are preferably bonded in the ortho-position relative to one another. The compounds (I) are suitable, for example, as sensitizers for photocrosslinkable polymers or photocurable compositions, or for use in mixtures with polymers with H donor groups for image formation, in particular electrically conductive coatings and patterns, by means of electroless deposition of metals.
    Type: Grant
    Filed: December 23, 1985
    Date of Patent: July 21, 1987
    Assignee: Ciba-Geigy Corporation
    Inventors: Walter Fischer, Jurgen Finter, Hans Zweifel
  • Patent number: 4624912
    Abstract: A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin containing a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appropriate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.
    Type: Grant
    Filed: February 6, 1985
    Date of Patent: November 25, 1986
    Assignee: Ciba-Geigy Corporation
    Inventors: Hans Zweifel, Sigrid Bauer, Kurt Meier
  • Patent number: 4594400
    Abstract: Thioxanthone carboxylic acid esters, thioesters and amides with reactive functional groups of the formula ##STR1## in which X, Y, Z, n and Q are as defined in the patent claim and Q is, for example, --OCH.dbd.CH.sub.2, --OCH.sub.2 CH.dbd.CH.sub.2, --SCH.sub.2 CH.dbd.CH.sub.2 or --NHCH.sub.2 CH.dbd.CH.sub.2 (n=1), --OH, --SH, --NH.sub.2, --COOH, --COCl or --OCO--C(R").dbd.CH.sub.2, in which R" is methyl or hydrogen (n=2), are suitable for the preparation of polymers with thioxanthone radicals in side chains. The compounds (I) and also the polymers which can be prepared therefrom can be employed as sensitizers for photocrosslinkable polymers or as initiators, if desired in a mixture with amines, for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefines.
    Type: Grant
    Filed: September 19, 1984
    Date of Patent: June 10, 1986
    Assignee: Ciba-Geigy Corporation
    Inventors: Vratislav Kvita, Hans Zweifel, Martin Roth, Louis Felder
  • Patent number: 4585876
    Abstract: Novel xanthones and thioxanthones of the formula I ##STR1## in which A, X, Y, Z, E and E' are as defined in patent claim 1, are described. A is preferably --S-- and E and E' are preferably bonded in the ortho-position relative to one another. The compounds (I) are suitable, for example, as sensitizers for photocrosslinkable polymers or photocurable compositions, or for use in mixtures with polymers with H donor groups for image formation, in particular electrically conductive coatings and patterns, by means of electroless deposition of metals.
    Type: Grant
    Filed: November 14, 1983
    Date of Patent: April 29, 1986
    Assignee: Ciba-Geigy Corporation
    Inventors: Walter Fischer, Jurgen Finter, Hans Zweifel
  • Patent number: 4537977
    Abstract: Novel tetrasubstituted phthalic acid derivatives of the formula ##STR1## are described, in which Y.sub.1 and Y.sub.2 are oxygen and Y is ##STR2## or --O--, or one of Y.sub.1 and Y.sub.2 is oxygen and the other is .dbd.N--R" and Y is --O--, and m, n, X, R, R' and R" are as defined in claim 1. The compounds (I) are suitable as sensitizers for photocrosslinkable polymers or as initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.
    Type: Grant
    Filed: April 4, 1984
    Date of Patent: August 27, 1985
    Assignee: Ciba-Geigy Corporation
    Inventors: Walter Fischer, Hans Zweifel
  • Patent number: 4505794
    Abstract: Thioxanthonecarboxylic acid esters, thioesters or amides of the formula I ##STR1## in which X and Z are hydrogen or one of the substituents defined in more detail in claim 1 and Y is --OR.sub.1, --SR.sub.1 or --N(R.sub.1)(R.sub.2), in which R.sub.1 is C.sub.1-24 alkyl and R.sub.2 is H or R.sub.1, are suitable, if desired together with amines, as initiators for the photopolymerization of ethylenically unsaturated compounds or for photochemical crosslinking of polyolefines. They are also used as sensitizers for photocrosslinkable polymers. They can be prepared by methods known per se, for example by cyclization of phenylthio-phthalic, -isophthalic or -terephthalic acids, which can be correspondingly substituted, and subsequent reaction with suitable alcohols, thiols or amines.
    Type: Grant
    Filed: September 23, 1982
    Date of Patent: March 19, 1985
    Assignee: Ciba-Geigy Corporation
    Inventors: Vratislav Kvita, Hans Zweifel, Martin Roth, Louis Felder
  • Patent number: 4506083
    Abstract: Thioxanthonecarboxylic acid esters, thioesters or amides of the formula I ##STR1## in which X and Z are hydrogen or one of the substituents defined in more detail in claim 1 and Y is --OR.sub.1, --SR.sub.1 or --N(R.sub.1)(R.sub.2), in which R.sub.1 is C.sub.1-24 alkyl and R.sub.2 is H or R.sub.1, are suitable, if desired together with amines, as initiators for the photopolymerization of ethylenically unsaturated compounds or for photochemical crosslinking of polyolefines. They are also used an sensitizers for photocrosslinkable polymers. They can be prepared by methods known per se, for example by cyclization of phenylthio-phthalic, -isophthalic or -terephthalic acids, which can be correspondingly substituted, and subsequent reaction with suitable alcohols, thiols or amines.
    Type: Grant
    Filed: June 28, 1982
    Date of Patent: March 19, 1985
    Assignee: Ciba-Geigy Corporation
    Inventors: Vratislav Kvita, Hans Zweifel, Martin Roth, Louis Felder
  • Patent number: 4487942
    Abstract: Anhydrides of formula V ##STR1## where A" is --CH.sub.2 CH.sub.2 --, and R and R.sub.1 independently of one another are hydrogen, halogen, alkyl having 1 to 4 carbon atoms or methoxy are valuable intermediates for the preparation of tricyclic imidyl derivatives. These imidyl derivatives form photocrosslinkable polymers useful for making printing plates and photoresists.
    Type: Grant
    Filed: July 20, 1983
    Date of Patent: December 11, 1984
    Assignee: Ciba-Geigy Corporation
    Inventors: Hans Zweifel, Walter Schilling, Angelo Storni, Daniel Bellus
  • Patent number: 4486596
    Abstract: Anhydrides of formula V ##STR1## where A" is --OCH.sub.2 -- with the oxygen atom bonded to the aromatic ring and R and R.sub.1 independently of one another are hydrogen, halogen, alkyl having 1 to 4 carbon atoms or methoxy are valuable intermediates for the preparation of tricyclic imidyl derivatives. These imidyl derivatives form photocrosslinkable polymers useful for making printing plates and photoresists.
    Type: Grant
    Filed: August 29, 1983
    Date of Patent: December 4, 1984
    Assignee: Ciba-Geigy Corporation
    Inventors: Hans Zweifel, Walter Schilling, Angelo Storni, Daniel Bellus
  • Patent number: 4480105
    Abstract: Novel compounds of the formula II ##STR1## are described, in which M.sub.1 and M.sub.2 individually are --OH or together are --O--, X is --NO.sub.2, --OR', --SR' or SO.sub.2 R' and the (R')s independently of one another are C.sub.1-20 -alkyl, C.sub.3-5 -alkenyl, C.sub.3-5 -alkynyl, C.sub.2-4 -monohydroxyalkyl, C.sub.1-12 -halogenoalkyl, benzyl, C.sub.5-12 -cycloalkyl, phenyl, carboxyphenyl, halogenophenyl, nitrophenyl, alkyl- or alkoxy-phenyl each having 1-4 C atoms in the alkyl or alkoxy moieties, or acetylaminophenyl, such as for example 3-n-butylthio-5-nitrophthalic anhydride. The compounds (II) in which M.sub.1 and M.sub.2 together are --O-- are suitable as sensitizers for photo-crosslinkable polymers or as initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins, and those where M.sub.1 and M.sub.2 are --OH are useful intermediates for those wherein M.sub.1 and M.sub.2 together are --O--.
    Type: Grant
    Filed: April 30, 1982
    Date of Patent: October 30, 1984
    Assignee: Ciba-Geigy Corporation
    Inventors: Walter Fischer, Vratislav Kvita, Hans Zweifel
  • Patent number: 4463142
    Abstract: The invention relates to polymers which are crosslinkable under the action of light and contain side groups of the formula ##STR1## in which R.sup.3 is preferably chlorine and R, R.sup.1 and R.sup.2 are, for example, H or --CH.sub.3. The proportion of these groups in the polymers is preferably 20 to 100%. Because of their high sensitivity to light, the polymers are suitable for photographic applications.
    Type: Grant
    Filed: September 17, 1982
    Date of Patent: July 31, 1984
    Assignee: Ciba-Geigy Corporation
    Inventors: Hans Zweifel, Joseph Berger, Hans Bosshard
  • Patent number: 4459414
    Abstract: Novel tetrasubstituted phthalic acid derivatives of the formula ##STR1## are described, in which Y.sub.1 and Y.sub.2 are oxygen and Y is ##STR2## or --O--, or one of Y.sub.1 and Y.sub.2 is oxygen and the other is .dbd.N--R" and Y is --O--, and m, n, X, R, R' and R" are as defined in claim 1. The compounds (I) are suitable as sensitizers for photocrosslinkable polymers or as initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.
    Type: Grant
    Filed: March 29, 1982
    Date of Patent: July 10, 1984
    Assignee: Ciba-Geigy Corporation
    Inventors: Walter Fischer, Hans Zweifel