Abstract: Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## ?n=1 or 2, Y=a bridge member and X=a functional group! are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as photoresists.

Abstract: Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## [n=1 or 2, Y=a bridge member and X=a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as photoresists.

Abstract: Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## [n=1 or 2, Y=a bridge member and X=a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as photoresists.

Abstract: Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## [n=1 or 2, Y=a bridge member and X=a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as photoresists.

Abstract: Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## [n=1 or 2, Y=a bridge member and X=a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as photoresists.

Abstract: In a three stage process, a layer of a liquid composition containing a compound (A) having in the same molecule at least one (meth)acryloyl group and at least one 2,3-disubstituted maleimido group is exposed to actinic radiation so that the layer solidifies due to photopolymerization of (A) through the (meth)acryloyl group(s), remaining, however, further photocrosslinkable. When desired, the solidified layer is exposed, as through a negative, to a substantially greater amount of actinic radiation, the parts so further exposed becoming more highly photocrosslinked through the disubstituted maleimido group(s) and hence insoluble. An image is produced which can be developed by means of suitable solvents. Examples of (A) include N-(2-(acryloyloxy)ethyl)-2,3-dimethylmaleimide and N-(3-(methacryloyloxy)-2-hydroxypropyl)-2,3-dimethylmaleimide.

Abstract: Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## [n=1 or 2, Y=a bridge member and X=a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as pohtoresists.

Abstract: The invention relates to polymers which are crosslinkable under the action of light and contain side groups of the formula ##STR1## in which R.sup.3 is preferably chlorine and R, R.sup.1 and R.sup.2 are, for example, H or --CH.sub.3. The proportion of these groups in the polymers is preferably 20 to 100%. Because of their high sensitivity to light, these polymers are suitable for photographic applications.

Abstract: Novel thioxanthonecarboxylic acids and thioxanthonecarboxylic acid derivatives of the formula I ##STR1## in which Y is --COOH, --CO-halogen, --CN or a carboxylic acid ester, thioester or amide group and X, Z and W are as defined in the patent claim, are described. The compounds of the formula I in which Y is other than --CO--halogen are suitable as sensitizers for photo-crosslinkable polymers or as initiators for photo-polymerization of ethylenically unsaturated compounds or for photo-chemical crosslinking of polyolefins. The acid halides of the formula I are starting materials for the preparation of the corresponding nitriles and carboxylic acid esters, thioesters and amides.

Abstract: Photo-crosslinkable, novel polymers with side tricyclic imidyl groups, for example those of the formula ##STR1## are described. The novel photo-crosslinkable polymers are suitable for photo-mechanical applications, for example for the production of printing plates for the offset printing process and especially as photo-resists. They have high UV absorption and ensure a high rate of crosslinking even without the addition of photosensitizers.

Abstract: Photo-crosslinkable, novel polymers with side tricyclic imidyl groups, for example those of the formula ##STR1## are described. The novel photo-crosslinkable polymers are suitable for photo-mechanical applications, for example for the production of printing plates for the offset printing process and especially as photo-resists. They have high UV absorption and ensure a high rate of crosslinking even without the addition of photosensitizers.

Abstract: Photocrosslinkable polymers which have a mean molecular weight of not less than 5,000 and contain, in side chains, thioxanthone groupings of the formula ##STR1## and, in side chains, imidyl groupings of the formula ##STR2## in which X, Y, Z, n, G.sub.1 and G.sub.2 are as defined in the patent claim, are suitable for the production of highly light-sensitive image materials, for the production of printing plates for the offset printing process and in particular as so-called photoresists for the production of printed circuits. The thioxanthone groupings (I) act as sensitizers for the photocrosslinkable groups of the polymer, so that it is not necessary to add further sensitizers.

Abstract: Novel compounds of the formula I or II ##STR1## are described, in which M.sub.1 and M.sub.2 individually are --OH or together are --O--, R is hydrogen, C.sub.1-20 -alkyl, C.sub.2-5 -alkenyl, C.sub.3-5 -alkynyl, C.sub.5-12 -cycloalkyl, benzyl, phenyl or toluyl, X is --NO.sub.2, --OR', --SR' or --SO.sub.2 R' and the (R')s independently of one another are C.sub.1-20 -alkyl, C.sub.3-5 -alkenyl, C.sub.3-5 -alkynyl, C.sub.2-4 -monohydroxyalkyl, C.sub.1-12 -halogenoalkyl, benzyl, C.sub.5-12 -cycloalkyl, phenyl, carboxyphenyl, halogenophenyl, nitrophenyl, alkyl- or alkoxy-phenyl each having 1-4 C atoms in the alkyl or alkoxy moieties, or acetylaminophenyl. The compounds (I) and compounds (II) in which M.sub.1 and M.sub.2 together are --O-- are suitable as sensitizers for photocrosslinkable polymers or as initiators for the photopolymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.

Abstract: Thioxanthone carboxylic acid esters, thioesters and amides with reactive functional groups of the formula ##STR1## in which X, Y, Z, n and Q are as defined in the patent claim and Q is, for example, --OCH.dbd.CH.sub.2, --OCH.sub.2 CH.dbd.CH.sub.2, --SCH.sub.2 CH.dbd.CH.sub.2 or --NHCH.sub.2 CH.dbd.CH.sub.2 (n=1), --OH, --SH, --NH.sub.2, --COOH, --COCl or --OCO--C(R").dbd.CH.sub.2, in which R" is methyl or hydrogen (n=2), are suitable for the preparation of polymers with thioxanthone radicals in side chains. The compounds (I) and also the polymers which can be prepared therefrom can be employed as sensitisers for photocrosslinkable polymers or as initiators, if desired in a mixture with amines, for the photopolymerisation of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefines.

Abstract: Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## [n=1 or 2, Y=a bridge member and X=a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as photoresists.

Abstract: The invention relates to a process for the preparation of halogenoindenonecarboxylic acids of the formula ##STR1## in which R.sup.3 is preferably chlorine and R, R.sup.1 and R.sup.2 are, for example, H or -CH.sub.3. If these acids are novel, the corresponding substances are claimed. The invention also relates to corresponding esters of these acids, which contain reactive end groups. The compounds are suitable for the preparation of light-sensitive polymers.

Abstract: Photo-crosslinkable, novel polymers with side tricyclic imidyl groups, for example those of the formula ##STR1## are described. The novel photo-crosslinkable polymers are suitable for photo-mechanical applications, for example for the production of printing plates for the offset printing process and especially as photo-resists. They have high UV absorption and ensure a high rate of crosslinking even without the addition of photosensitizers.

Abstract: The compounds according to the invention have the formulae Ia or Ib ##STR1## in which Y is a divalent organic radical and Z is --NH.sub.2, --NH-alkyl having 1-4 C atoms, --OH, --COOH, --COCl, --O--CO--CH.dbd.CH.sub.2, ##STR2## --COO--CH.dbd.CH.sub.2 or --O--CH.dbd.CH.sub.2. These novel 3- or 4-azidophthalic acid derivatives may be used for the preparation of photo-crosslinkable polymers. Compared to corresponding photosensitive polymers of the prior art, these novel polymers have the advantages that they are even more photosensitive and that they also absorb in the long wavelength UV region (at wavelengths greater than 320 nm).

Abstract: The photo-crosslinkable polymers according to the invention have azidophthalimidyl side groups of the formula I ##STR1## in which Y is a divalent organic radical. These polymers are prepared either by introduction of the azidophthalimidyl group into an existing polymer chain or by synthesis of polymer chains from monomers which already contain the azidophthalimidyl group.Compared to corresponding photosensitive polymers of the prior art, these novel polymers have the advantages that they are even more photosensitive and that they also absorb in the long wavelength UV region (at wavelengths above 320 nm).

Abstract: Novel tricyclic imidyl derivatives, for example those of the formula ##STR1## [n=1 or 2, Y=a bridge member and X=a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable functional groups X by polymerization or polycondensation. The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printing process and especially as photoresists.