Patents by Inventor Harald F. Hess

Harald F. Hess has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7816655
    Abstract: One embodiment disclosed relates to a reflective electron patterning device. The device includes a pattern on a surface. There is an electron reflective portion of the pattern and an electron non-reflective portion of the pattern. Another embodiment disclosed relates to a method of reflecting a pattern of electrons. An electron beam is generated to be incident upon a surface. The pattern is formed on the surface. The incident electrons are reflected from a reflective portion of the pattern are prevented from being reflected from a non-reflective portion of the pattern.
    Type: Grant
    Filed: May 21, 2004
    Date of Patent: October 19, 2010
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Harald F. Hess, Marian Mankos, David L. Adler
  • Publication number: 20100231922
    Abstract: A statistically sparse subset of switchable optical sources in a sample is activated, and the activated switchable optical sources are excited such that optical beams are emitted from the activated switchable optical sources along at least two optical paths. A first wavefront modification in a first optical beam emitted from the activated switchable optical sources along a first optical path is introduced and a second wavefront modification in a second optical beam emitted from the activated switchable optical sources along a second optical path is introduced, the second wavefront modification being distinct from the first wavefront modification. The first and second optical beams are interfered with each other to produce a plurality of output beams, and three-dimensional position information of the optical sources is determined based on an intensity of each output beam from the plurality of output beams.
    Type: Application
    Filed: September 10, 2009
    Publication date: September 16, 2010
    Applicant: HOWARD HUGHES MEDICAL INSTITUTE
    Inventors: Harald F. Hess, Gleb Shtengel
  • Patent number: 7782457
    Abstract: First activation radiation is provided to a sample that includes phototransformable optical labels (“PTOLs”) to activate a first subset of the PTOLs in the sample. First excitation radiation is provided to the first subset of PTOLs in the sample to excite at least some of the activated PTOLs, and radiation emitted from activated and excited PTOLs within the first subset of PTOLs is detecting with imaging optics. The first activation radiation is controlled such that the mean volume per activated PTOL in the first subset is greater than or approximately equal to a diffraction-limited resolution volume (“DLRV”) of the imaging optics.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: August 24, 2010
    Assignee: Hestzig LLC
    Inventors: Robert Eric Betzig, Harald F. Hess
  • Publication number: 20100181497
    Abstract: An apparatus includes a position-sensitive detector to detect intensities of radiation as a function of position on the detector, and an optical system, characterized by a diffraction-limited resolution volume, adapted for imaging light emitted from activated and excited phototransformable optical labels (“PTOLs”) in a sample onto the position sensitive-detector. A first light source provides activation radiation to the sample to activate a subset of the PTOLs that are distributed in the sample with a density greater than an inverse of the diffraction-limited resolution volume of the optical system. A second light source provides excitation radiation to the sample to excite a portion of the PTOLs in the subset of the PTOLs. A controller controls one both of the activation radiation and the excitation radiation provided to the sample such that a density of PTOLs in the portion of the PTOLs is less than the inverse of the diffraction-limited resolution volume.
    Type: Application
    Filed: December 22, 2009
    Publication date: July 22, 2010
    Applicant: HESTZIG LLC
    Inventors: Harald F. Hess, Robert Eric Betzig
  • Patent number: 7710563
    Abstract: A method of imaging with an optical system characterized by a diffraction-limited resolution volume is disclosed. In a sample that includes a plurality of phototransformable optical labels (“PTOLs”) distributed in the sample with a density greater than an inverse of the diffraction-limited resolution volume of the optical system, a first subset of the PTOLs in the sample are activated, and the density of the activated PTOLs in the first subset is less than the inverse of the diffraction-limited resolution volume. A first portion of the PTOLs in the first subset of PTOLs is excited. Radiation emitted from the activated and excited PTOLs in the first portion of PTOLs is detected with the imaging optics, and locations of activated and excited PTOLs in the first portion of PTOLs is determined with a sub-diffraction-limited accuracy based on the detected radiation emitted from the activated and excited PTOLs.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: May 4, 2010
    Assignee: Hestzig LLC
    Inventors: Robert Eric Betzig, Harald F. Hess
  • Patent number: 7704653
    Abstract: A method and tool for conducting charged-particle beam direct write lithography is disclosed. A disclosed method involves condensing an initial design file down to a set of profiles and a pattern of relative locations to form a formatted pattern file. The formatted pattern file is adjusted to accommodate desired pattern corrections. Portions of the formatted pattern records are extracted to form data strips that have a plurality of channels with a pattern of profiles and spatial indicators. Data strips are sequentially read to construct a printable pattern of profiles and spatial indicators that specify the locations of the profiles. Additionally, the pattern of profiles are sequentially printed from each data strip onto a substrate to form the desired pattern on the substrate.
    Type: Grant
    Filed: January 18, 2007
    Date of Patent: April 27, 2010
    Assignee: KLA-Tencor Corporation
    Inventors: Vincenzo Lordi, Shem-Tov Levi, Harald F. Hess
  • Patent number: 7626703
    Abstract: Spatially-structured activation radiation having relatively high- and low-intensity regions is provided to a sample that includes phototransformable optical labels (“PTOLs”). A subset of the PTOLs located predominately at relatively high intensity regions of the spatially-structured activation radiation is activated. Spatially-structured excitation radiation is provided to the activated PTOLs, and the excitation radiation is structured so that one or more relatively high intensity regions of the excitation radiation at least partially overlap one or more relatively high intensity regions of the activating radiation to excite PTOLs located at the relatively high intensity excitation radiation regions. Radiation emitted from the activated and excited PTOLs is detected with imaging optics.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: December 1, 2009
    Inventors: Robert Eric Betzig, Harald F. Hess
  • Patent number: 7626695
    Abstract: An apparatus includes a position-sensitive detector to detect intensities of radiation as a function of position on the detector, and an optical system, characterized by a diffraction-limited resolution volume, adapted for imaging light emitted from activated and excited phototransformable optical labels (“PTOLs”) in a sample onto the position sensitive-detector. A first light source provides activation radiation to the sample to activate a subset of the PTOLs that are distributed in the sample with a density greater than an inverse of the diffraction-limited resolution volume of the optical system. A second light source provides excitation radiation to the sample to excite a portion of the PTOLs in the subset of the PTOLs. A controller controls one both of the activation radiation and the excitation radiation provided to the sample such that a density of PTOLs in the portion of the PTOLs is less than the inverse of the diffraction-limited resolution volume.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: December 1, 2009
    Inventors: Robert Eric Betzig, Harald F. Hess
  • Patent number: 7626694
    Abstract: First activation radiation is provided to a sample that includes fluorescent proteins (“FPs”) to activate a first subset of the FPs in the sample. First excitation radiation is provided to the first subset of FPs in the sample to excite at least some of the activated FPs, and radiation emitted from activated and excited FPs within the first subset of FPs is detecting with imaging optics. The first activation radiation is controlled such that the mean volume per activated FPs in the first subset is greater than or approximately equal to a diffraction-limited resolution volume (“DLRV”) of the imaging optics.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: December 1, 2009
    Inventors: Robert Eric Betzig, Harald F. Hess
  • Publication number: 20090206251
    Abstract: First activation radiation is provided to a sample that includes phototransformable optical labels (“PTOLs”) to activate a first subset of the PTOLs in the sample. First excitation radiation is provided to the first subset of PTOLs in the sample to excite at least some of the activated PTOLs, and radiation emitted from activated and excited PTOLs within the first subset of PTOLs is detecting with imaging optics. The first activation radiation is controlled such that the mean volume per activated PTOL in the first subset is greater than or approximately equal to a diffraction-limited resolution volume (“DLRV”) of the imaging optics.
    Type: Application
    Filed: November 21, 2007
    Publication date: August 20, 2009
    Inventors: Harald F. Hess, Robert Eric Betzig
  • Patent number: 7566882
    Abstract: One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern of pixels and to reflect the illumination electron beam from said pattern so as to form a patterned electron beam. The patterned electron beam is projected onto a platter configured to hold and rotate a plurality of target substrates. Said generated pattern of pixels is shifted in correspondence with the rotation of the platter so that the patterned electron beam writes a swath path of pixels over the target substrates. Other features, aspects and embodiments are also disclosed.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: July 28, 2009
    Assignee: KLA-Tencor Technologies Corporation
    Inventor: Harald F. Hess
  • Patent number: 7535012
    Abstract: First activation radiation is provided to a sample that includes phototransformable optical labels (“PTOLs”) to activate a first subset of the PTOLs. Deactivation radiation is provided to the sample to transform activated PTOLs to an unactivated state. The deactivation radiation has a spatially-structured radiation field including intensity minima, such that a second subset of PTOLs located substantially at the intensity minima remain activated, while activated PTOLs exposed to the deactivation radiation outside the minima are transformed into an unactivated form. Excitation radiation is provided to the sample to excite activated PTOLs in the sample located substantially at the intensity minima of the deactivation radiation. Radiation emitted from the activated and excited PTOLs is detected with imaging optics.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: May 19, 2009
    Inventors: Robert Eric Betzig, Harald F. Hess
  • Patent number: 7505143
    Abstract: In one embodiment, a method of dynamic reference plane compensation, comprises impinging radiation from a first radiation source onto a surface of an object; generating an uncompensated measurement signal from radiation reflected from a first location on the surface and a second location; generating a compensation signal from radiation reflected from a third location and a fourth location on the surface; and generating a compensated measurement signal using the uncompensated measurement signal and the compensation signal.
    Type: Grant
    Filed: May 17, 2005
    Date of Patent: March 17, 2009
    Assignee: KLA-Tencor Corporation
    Inventors: Harald F. Hess, Thomas Daniel Carr, Romain Sappey
  • Publication number: 20080158551
    Abstract: In one embodiment, an apparatus comprises an optical system with multiple detectors and a processor. The optical system is configured to produce images of an optical source in a first dimension and a second dimension substantially orthogonal to the first dimension at each detector at a given time. Each image from the images is based on an interference of an emission from the optical source in a first direction and an emission from the optical source in a second direction different from the first direction. The processor is configured to calculate a position in a third dimension based on the images. The third dimension is substantially orthogonal to the first dimension and the second dimension.
    Type: Application
    Filed: December 20, 2007
    Publication date: July 3, 2008
    Inventor: Harald F. Hess
  • Patent number: 7391034
    Abstract: One embodiment pertains to an apparatus which impinges a focused electron beam onto a substrate. The apparatus includes an irradiation source and at least two non-axisymmetric lenses. The irradiation source is configured to originate electrons for an incident electron beam. The non-axisymmetric lenses are positioned after the irradiation source and are configured to focus the beam in a first linear dimension so as to produce a linear crossover of the beam. The non-axisymmetric lenses are further configured to subsequently focus the beam in a second linear dimension, which is substantially perpendicular to the first linear dimension. Finally, the non-axisymmetric lenses are also configured to produce a focused image at an image plane. Other embodiments are also disclosed.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: June 24, 2008
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Kirk J. Bertsche, Harald F. Hess
  • Publication number: 20080145767
    Abstract: A method and tool for conducting charged-particle beam direct write lithography is disclosed. A disclosed method involves condensing an initial design file down to a set of profiles and a pattern of relative locations to form a formatted pattern file. The formatted pattern file is adjusted to accommodate desired pattern corrections. Portions of the formatted pattern records are extracted to form data strips that have a plurality of channels with a pattern of profiles and spatial indicators. Data strips are sequentially read to construct a printable pattern of profiles and spatial indicators that specify the locations of the profiles. Additionally, the pattern of profiles are sequentially printed from each data strip onto a substrate to form the desired pattern on the substrate.
    Type: Application
    Filed: January 18, 2007
    Publication date: June 19, 2008
    Inventors: Vincenzo Lordi, Shem-Tov Levi, Harald F. Hess
  • Publication number: 20080111086
    Abstract: First activation radiation is provided to a sample that includes phototransformable optical labels (“PTOLs”) to activate a first subset of the PTOLs. Deactivation radiation is provided to the sample to transform activated PTOLs to an unactivated state. The deactivation radiation has a spatially-structured radiation field including intensity minima, such that a second subset of PTOLs located substantially at the intensity minima remain activated, while activated PTOLs exposed to the deactivation radiation outside the minima are transformed into an unactivated form. Excitation radiation is provided to the sample to excite activated PTOLs in the sample located substantially at the intensity minima of the deactivation radiation. Radiation emitted from the activated and excited PTOLs is detected with imaging optics.
    Type: Application
    Filed: November 21, 2007
    Publication date: May 15, 2008
    Inventors: Robert Eric Betzig, Harald F. Hess
  • Patent number: 6947852
    Abstract: A system and method for assessing and potentially correcting for non-translational motion in a resonance measurement apparatus is provided. The design measures the response of an article, such as an HGA assembly including a read/write head, as well as the excitation of a shaking device, such as a head resonance tester, and computes a correction factor using either two or three point measurement. The correction factor may be evaluated by subjecting the arrangement to further vibration at varying frequencies. Measurement of the shaking device may be accomplished using an accelerometer or by optical measurement using a light beam.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: September 20, 2005
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Harald F. Hess, Patrick Rodney Lee
  • Patent number: 6936816
    Abstract: One embodiment disclosed relates to a method for inspecting or reviewing a magnetized specimen using an automated inspection apparatus. The method includes generating a beam of incident electrons using an electron source, biasing the specimen with respect to the electron source such that the incident electrons decelerate as a surface of the specimen is approached, and illuminating a portion of the specimen at a tilt with the beam of incident electrons. The specimen is moved under the incident beam of electrons using a movable stage of the inspection apparatus. Scattered electrons are detected to form image data of the specimen showing distinct contrast between regions of different magnetization. The movement of the specimen under the beam of incident electrons may be continuous, and data for multiple image pixels may be acquired in parallel using a time delay integrating detector.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: August 30, 2005
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Marian Mankos, David A. Soltz, Harald F. Hess
  • Patent number: 6870172
    Abstract: One embodiment disclosed relates to an apparatus for reflection electron beam lithography. An electron source is configured to emit electrons. The electrons are reflected to a target substrate by portions of an electron-opaque patterned structure having a lower voltage level and are absorbed by portions of the structure having a higher voltage level. Another embodiment relates to a novel method of electron beam lithography. An incident electron beam is formed and directed to an opaque patterned structure. Electrons are reflected from portions of the structure having a lower voltage level applied thereto and are absorbed by portions of the structure having a higher voltage level applied thereto. The reflected electrons are directed towards a target substrate to form an image and expose a lithographic pattern.
    Type: Grant
    Filed: May 21, 2004
    Date of Patent: March 22, 2005
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Marian Mankos, Harald F. Hess, David L. Adler, Kirk J. Bertsche