Abstract: First activation radiation is provided to a sample that includes phototransformable optical labels (“PTOLs”) to activate a first subset of the PTOLs. Deactivation radiation is provided to the sample to transform activated PTOLs to an unactivated state. The deactivation radiation has a spatially-structured radiation field including intensity minima, such that a second subset of PTOLs located substantially at the intensity minima remain activated, while activated PTOLs exposed to the deactivation radiation outside the minima are transformed into an unactivated form. Excitation radiation is provided to the sample to excite activated PTOLs in the sample located substantially at the intensity minima of the deactivation radiation. Radiation emitted from the activated and excited PTOLs is detected with imaging optics.

Abstract: A system and method for assessing and potentially correcting for non-translational motion in a resonance measurement apparatus is provided. The design measures the response of an article, such as an HGA assembly including a read/write head, as well as the excitation of a shaking device, such as a head resonance tester, and computes a correction factor using either two or three point measurement. The correction factor may be evaluated by subjecting the arrangement to further vibration at varying frequencies. Measurement of the shaking device may be accomplished using an accelerometer or by optical measurement using a light beam.

Abstract: One embodiment disclosed relates to a method for inspecting or reviewing a magnetized specimen using an automated inspection apparatus. The method includes generating a beam of incident electrons using an electron source, biasing the specimen with respect to the electron source such that the incident electrons decelerate as a surface of the specimen is approached, and illuminating a portion of the specimen at a tilt with the beam of incident electrons. The specimen is moved under the incident beam of electrons using a movable stage of the inspection apparatus. Scattered electrons are detected to form image data of the specimen showing distinct contrast between regions of different magnetization. The movement of the specimen under the beam of incident electrons may be continuous, and data for multiple image pixels may be acquired in parallel using a time delay integrating detector.

Abstract: One embodiment disclosed relates to an apparatus for reflection electron beam lithography. An electron source is configured to emit electrons. The electrons are reflected to a target substrate by portions of an electron-opaque patterned structure having a lower voltage level and are absorbed by portions of the structure having a higher voltage level. Another embodiment relates to a novel method of electron beam lithography. An incident electron beam is formed and directed to an opaque patterned structure. Electrons are reflected from portions of the structure having a lower voltage level applied thereto and are absorbed by portions of the structure having a higher voltage level applied thereto. The reflected electrons are directed towards a target substrate to form an image and expose a lithographic pattern.

Abstract: One embodiment disclosed relates to a method for inspecting or reviewing a magnetized specimen using an automated inspection apparatus. The method includes generating a beam of incident electrons using an electron source, biasing the specimen with respect to the electron source such that the incident electrons decelerate as a surface of the specimen is approached, and illuminating a portion of the specimen at a tilt with the beam of incident electrons. The specimen is moved under the incident beam of electrons using a movable stage of the inspection apparatus. Scattered electrons are detected to form image data of the specimen showing distinct contrast between regions of different magnetization. The movement of the specimen under the beam of incident electrons may be continuous, and data for multiple image pixels may be acquired in parallel using a time delay integrating detector.

Abstract: One embodiment disclosed relates to a method for inspecting or reviewing a magnetized specimen using an automated inspection apparatus. The method includes generating a beam of incident electrons using an electron source, biasing the specimen with respect to the electron source such that the incident electrons decelerate as a surface of the specimen is approached, and illuminating a portion of the specimen at a tilt with the beam of incident electrons. The specimen is moved under the incident beam of electrons using a movable stage of the inspection apparatus. Scattered electrons are detected to form image data of the specimen showing distinct contrast between regions of different magnetization. The movement of the specimen under the beam of incident electrons may be continuous, and data for multiple image pixels may be acquired in parallel using a time delay integrating detector.

Abstract: One embodiment disclosed relates to a method for inspecting or reviewing a magnetized specimen using an automated inspection apparatus. The method includes generating a beam of incident electrons using an electron source, biasing the specimen with respect to the electron source such that the incident electrons decelerate as a surface of the specimen is approached, and illuminating a portion of the specimen at a tilt with the beam of incident electrons. The specimen is moved under the incident beam of electrons using a movable stage of the inspection apparatus. Scattered electrons are detected to form image data of the specimen showing distinct contrast between regions of different magnetization. The movement of the specimen under the beam of incident electrons may be continuous, and data for multiple image pixels may be acquired in parallel using a time delay integrating detector.

Abstract: A system and method for assessing and potentially correcting for non-translational motion in a resonance measurement apparatus is provided. The design measures the response of an article, such as an HGA assembly including a read/write head, as well as the excitation of a shaking device, such as a head resonance tester, and computes a correction factor using either two or three point measurement. The correction factor may be evaluated by subjecting the arrangement to further vibration at varying frequencies. Measurement of the shaking device may be accomplished using an accelerometer or by optical measurement using a light beam.

Abstract: A method and system for optically recognizing an object from a reference library of known products based on a spectrum of local radius of curvature of the object. A surface portion of an object is illuminated with a pattern of light that permits the extraction of three dimensional coordinates for a set of points on the surface portion of the object. An image data set of the surface portion of the object is then captured with a capture device that is positioned at an angular offset with respect to a source of the light. That is, the combination of the light pattern and the imaging device together generate a two dimensional captured image, from which it is possible to extract the three dimensional coordinates for the set of points on the surface portion of the object. A set of local radii of curvatures are then determined for selected data points in the image data set. A spectrum representing a distribution of the curvatures is then computed for the set of local radii of curvatures.

Abstract: A micro-photoreflectance technique has been developed for performing non-destructive analysis of III-V optoelectronic devices. By using a significantly reduced spot size (for example, 10 micrometers), various compositional features of the device may be analyzed and the Franz-Keldysh oscillations appearing in the micro-photoreflectance wavelength spectra (such as those beyond the barrier/SCL wavelength in an EML structure) may be analyzed to provide information regarding the physical characteristics of the device, such as the electric field and p-i junction placement within an exemplary EML device structure.

Abstract: A plurality of PR measurements are simultaneously made at N different spots on a wafer by forming N modulated pump beams and N tunable probe beams, and directing one pump beam and one probe beam so as to form overlapping images at each of the N spots. Each of a like plurality of N photodetectors receives a portion of the corresponding probe beam which is reflected from the surface of the wafer to provide information about the wafer characteristics at each spot. In one embodiment, automatic alignment of the probe and pump beams along a row of N spots is achieved by means of a semi-cylindrical scan head which has an axial cavity overlapping the row of N spots and a plurality of radial cavities organized into separate, but interleaved input and output groups. The cavities of two separate input groups receive optical fibers carrying the probe and pump beams to the row of N spots. The cavities of two separate output groups receive photodetectors for detecting the reflected beam and for monitoring the pump beam.