Abstract: On memory die and other circuits, some parts may operate at a VDD logic level while other elements operate at a higher logic level, such as at or near the die's supply level VSUP. To reduce power consumption and increase operating speeds, VDD levels are moving to increasingly lower voltages. To raise the logic signal from the lower level to the higher, level shifters can be used. However, as the gap between the supply level VSUP and VDD widens, it can become difficult for a level shifter to reliably raise a logic signal operating at the VDD level to the VSUP level. The address this problem, the following introduces a small charge pump to boost the input logic signals for level shifter circuits to allow them to reliably generate an output logic signal at the VSUP level from an input logic signal at low VDD levels.

Abstract: A memory die includes an alternating stack of insulating layers and electrically conductive layers through which memory opening fill structures vertically extend. The memory die includes at least three memory array regions interlaced with at least two contact regions, or at least three contact regions interlaced with at least two memory array regions in the same memory plane. A logic die including at least two word line driver regions can be bonded to the memory die. The interlacing of the contact regions and the memory array regions can reduce lateral offset of boundaries of the word line driver regions from boundaries of the contact regions.

Abstract: A memory die includes an alternating stack of insulating layers and electrically conductive layers through which memory opening fill structures vertically extend. The memory die includes at least three memory array regions interlaced with at least two contact regions, or at least three contact regions interlaced with at least two memory array regions in the same memory plane. A logic die including at least two word line driver regions can be bonded to the memory die. The interlacing of the contact regions and the memory array regions can reduce lateral offset of boundaries of the word line driver regions from boundaries of the contact regions.

Abstract: A memory die includes an alternating stack of insulating layers and electrically conductive layers through which memory opening fill structures vertically extend. The memory die includes at least three memory array regions interlaced with at least two contact regions, or at least three contact regions interlaced with at least two memory array regions in the same memory plane. A logic die including at least two word line driver regions can be bonded to the memory die. The interlacing of the contact regions and the memory array regions can reduce lateral offset of boundaries of the word line driver regions from boundaries of the contact regions.

Abstract: A method for memory block management includes identifying a first group of bit lines corresponding to memory blocks of a 3-dimensional memory array. The method also includes biasing the first group of bit lines to a first voltage using respective bit line biasing transistors. The method also includes identifying, for each memory block, respective sub-memory blocks corresponding to word lines of each memory block that intersect the first group of bit lines. The method also includes logically grouping memory addresses of memory cells for each respective sub-memory block associated with the first group of bit lines.

Abstract: Systems and methods for reducing the size of sub-blocks within a physical memory block for a three-dimensional non-volatile memory using buried source lines are described. The physical memory block may be fabricated using dual buried source lines such that sub-blocks within the physical memory block may be individually selected in both a horizontal word line direction and a vertical NAND string direction. The physical memory block may include a plurality of sub-blocks that are individually selectable and that share bit lines and/or source-side select gate lines. The plurality of sub-blocks that are individually selectable may correspond with different portions of the same NAND string in which a first sub-block of the plurality of sub-blocks connects to a drain-side select gate for the NAND string and a second sub-block of the plurality of sub-blocks connects to a source-side select gate for the NAND string.

Abstract: Apparatuses and techniques are described for providing separate source regions in the substrate below a block of memory cells. The source regions can be separately driven by respective voltage drivers to provide benefits such as more uniform program and erase speeds and narrower threshold voltage distributions. In one approach, a single source region is provided and divided into multiple source regions by etching trenches and filling the trenches with an insulating material. Contacts to the source regions can include post-shaped contacts which extend through the block for each source region. In another approach, one or more planar contacts extend through the block for each source region. In another aspect, a program operation applies different voltages to the respective source regions during a verify test of a program operation.

Abstract: Multiple bonded units are provided, each of which includes a respective front-side die and a backside die. The two dies in each bonded unit may be a memory die and a logic die configured to control operation of memory elements in the memory die. Alternatively, the two dies may be memory dies. The multiple bonded units can be attached such that front-side external bonding pads have physically exposed surfaces that face upward and backside external bonding pads of each bonded unit have physically exposed surfaces that face downward. A first set of bonding wires can connect a respective pair of front-side external bonding pads, and a second set of bonding wires can connect a respective pair of backside external bonding pads.

Abstract: Apparatuses and techniques are described for providing separate source regions in the substrate below a block of memory cells. The source regions can be separately driven by respective voltage drivers to provide benefits such as more uniform program and erase speeds and narrower threshold voltage distributions. In one approach, a single source region is provided and divided into multiple source regions by etching trenches and filling the trenches with an insulating material. Contacts to the source regions can include post-shaped contacts which extend through the block for each source region. In another approach, one or more planar contacts extend through the block for each source region.

Abstract: A three-dimensional memory device includes an alternating stack of word-line-isolation insulating layers and word-line-level electrically conductive layers located over a substrate, a plurality of drain-select-level electrodes that are laterally spaced apart from each other overlying the alternating stack, memory stack structures containing a respective vertical semiconductor channel laterally surrounded by a respective memory film and vertically extending through the alternating stack and the plurality of drain-select-level electrodes, inter-select-gate electrodes located between a respective neighboring pair of the drain-select-level electrodes, and inter-select-gate dielectrics located between each of the inter-select-gate electrodes and a neighboring one of the drain-select-level electrodes. The inter-select-gate electrodes are not electrically connected to the drain-select-level electrodes.

Abstract: Multiple bonded units are provided, each of which includes a respective front-side die and a backside die. The two dies in each bonded unit may be a memory die and a logic die configured to control operation of memory elements in the memory die. Alternatively, the two dies may be memory dies. The multiple bonded units can be attached such that front-side external bonding pads have physically exposed surfaces that face upward and backside external bonding pads of each bonded unit have physically exposed surfaces that face downward. A first set of bonding wires can connect a respective pair of front-side external bonding pads, and a second set of bonding wires can connect a respective pair of backside external bonding pads.

Abstract: A three-dimensional (3D) memory is provided, including a memory array chip and a complementary metal-oxide semiconductor (CMOS) chip disposed on the memory array chip. The memory chip provides double write/read throughput and includes a lower region with a lower array of memory cells, lower word lines, and a lower bit line, while an upper region includes an upper array of memory cells, upper word lines, and an upper bit line. A source line is disposed between the lower and upper regions and is connected to both the lower array of memory cells and the upper array of memory cells.

Abstract: A three-dimensional memory device includes an alternating stack of word-line-isolation insulating layers and word-line-level electrically conductive layers located over a substrate, a plurality of drain-select-level electrodes that are laterally spaced apart from each other overlying the alternating stack, memory stack structures containing a respective vertical semiconductor channel laterally surrounded by a respective memory film and vertically extending through the alternating stack and the plurality of drain-select-level electrodes, inter-select-gate electrodes located between a respective neighboring pair of the drain-select-level electrodes, and inter-select-gate dielectrics located between each of the inter-select-gate electrodes and a neighboring one of the drain-select-level electrodes. The inter-select-gate electrodes are not electrically connected to the drain-select-level electrodes.

Abstract: A memory device is disclosed configured to share word line switches (WLSW) between each word line of two adjacent erase blocks. The word lines are driven from both sides of the memory array to reduces resistive-capacitive (RC) loading during pre-charge/ramp-up periods and during discharge/ramp-down periods for various storage operations. The dual-sided driving of signals combines with synergistic erase block size management to lower read latency (tR) for non-volatile memory media.

Abstract: First alternating stacks of first insulating strips and first spacer material strips is formed in a first device region, second alternating stacks of second insulating strips and second spacer material strips are formed in a second device region. Each of the first line trenches is filled with a respective laterally alternating sequence of memory stack structures and first dielectric pillar structures to form a three-dimensional NAND memory. Each of the memory stack structures includes a vertical semiconductor channel and a vertical stack of memory elements. Each of the second line trenches with a respective laterally alternating sequence of active region assemblies of lateral field effect transistors and second dielectric pillar structures to form a three-dimensional NOR memory. Each of the active region assemblies includes a source pillar, a drain pillar, and a tubular channel region. The spacer material strips include, or are subsequently replaced with, electrically conductive strips.

Abstract: A method for memory block management includes identifying a first group of bit lines corresponding to memory blocks of a 3-dimensional memory array. The method also includes biasing the first group of bit lines to a first voltage using respective bit line biasing transistors. The method also includes identifying, for each memory block, respective sub-memory blocks corresponding to word lines of each memory block that intersect the first group of bit lines. The method also includes logically grouping memory addresses of memory cells for each respective sub-memory block associated with the first group of bit lines.

Abstract: A semiconductor device is disclosed including an integrated memory module. The integrated memory module includes a first semiconductor die comprising first non-volatile memory cells, a second semiconductor die comprising second non-volatile memory cells, and a third semiconductor die comprising control circuitry. The first, the second and the third semiconductor die are bonded together. The control circuitry is configured to control memory operations in the first memory cells in parallel with the second memory cells.

Abstract: A three-dimensional (3D) memory is provided, including a memory array chip and a complementary metal-oxide semiconductor (CMOS) chip disposed on the memory array chip. The memory chip provides double write/read throughput and includes a lower region with a lower array of memory cells, lower word lines, and a lower bit line, while an upper region includes an upper array of memory cells, upper word lines, and an upper bit line. A source line is disposed between the lower and upper regions and is connected to both the lower array of memory cells and the upper array of memory cells.

Abstract: Systems and methods for reducing program disturb when programming portions of a memory array are described. A memory array may include a first set of NAND strings and a second set of NAND strings that share a common bit line that is connected to the drain-side end of drain-side select gates of the NAND strings and/or share a common source-side select gate line that connects to the gates of source-side select gates of the NAND strings. During programming of the first set of NAND strings a first pass voltage (e.g., 7V) may be applied to unselected word lines of the memory array and subsequently during programming of the second set of NAND strings a second pass voltage (e.g., 9V) greater than the first pass voltage may be applied to the unselected word lines of the memory array.

Abstract: Systems and methods for reducing program disturb when programming portions of a memory array are described. A memory array may include a first set of NAND strings and a second set of NAND strings that share a common bit line that is connected to the drain-side end of drain-side select gates of the NAND strings and/or share a common source-side select gate line that connects to the gates of source-side select gates of the NAND strings. During programming of the first set of NAND strings a first pass voltage (e.g., 7V) may be applied to unselected word lines of the memory array and subsequently during programming of the second set of NAND strings a second pass voltage (e.g., 9V) greater than the first pass voltage may be applied to the unselected word lines of the memory array.