Patents by Inventor Hareesh

Hareesh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7858195
    Abstract: A substrate having an anti-adhesive coating thereon. The coating is made from a coating composition comprising solid particles of a release agent different from boron nitride and a binder comprising surface-modified nanoscale solid particles.
    Type: Grant
    Filed: December 5, 2005
    Date of Patent: December 28, 2010
    Assignee: Leibniz-Institut Fuer Neue Materialien Gemeinnuetzige GmbH
    Inventors: Mesut Aslan, Robert Drumm, Klaus Endres, Hareesh Nair, Bernd Reinhard, Helmut Schmidt
  • Patent number: 7711807
    Abstract: A network device to selectively filter the exception data units based on the type of the exception data units. The network device generates a first threshold value for a first type of exception data units and a second threshold value for a second type of exception data units. The first threshold value and the second threshold value are determined based on the weight factors associated with each the first type and the second type of exception data units and a scratch pad threshold value. The network data unit determines the type of exception data units and a scratch pad fullness value and filters the first type and the second type of exception data units based on the first and the second threshold values.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: May 4, 2010
    Assignee: Intel Corporation
    Inventors: Hareesh M. Padmanabha Rao, Udaya Shankara
  • Publication number: 20100094171
    Abstract: The blood collection set includes an IV needle assembly, a length of flexible plastic tubing extending from the IV needle assembly and a non-patient needle assembly. The set is formed with a venting mechanism that permits an outflow of air, while blocking an outflow of blood or other fluids. Thus, the venting mechanism enables air that had existed in interior portions of the blood collection set to be vented allowing for greater flash visualization on venous entry, and avoids the need to employ a discard tube.
    Type: Application
    Filed: May 22, 2009
    Publication date: April 15, 2010
    Applicant: Becton, Dickinson and Company
    Inventors: Hugh Conway, Hareesh Nair, Kirk Swenson, C. Mark Newby, Curtis Bloch, Richard Levy, Bradley Wilkinson, James Schneider, Bryan Towns, Michael Iskra, Stewart Marsden, Robert G. Ellis
  • Patent number: 7688775
    Abstract: Embodiments of guaranteed timeslot usage management in wireless networks are described.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: March 30, 2010
    Assignee: Intel Corporation
    Inventors: Peramachanahalli Ramkumar, Vimal Venkatesh Narayanan, Hareesh Padmanabha Rao
  • Patent number: 7678422
    Abstract: A process to deposit metal silicon nitride on a substrate comprising: sorbing a metal amide on a heated substrate, purging away the unsorbed metal amide, contacting a silicon-containing source having one or more Si—H3 fragments with the heated substrate to react with the sorbed metal amide, wherein the silicon-containing source has one or more H3Si—NR02 (R0?SiH3, R, R1 or R2, defined below) groups selected from the group consisting of one or more of: wherein R and R1 in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., branched alkyl, cycloalkyl with R and R1 in formula A also being combinable into a cyclic group, and R2 representing a single bond, (CH2)n, a ring, or SiH2, and purging away the unreacted silicon-containing source.
    Type: Grant
    Filed: December 4, 2007
    Date of Patent: March 16, 2010
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Xinjian Lei, Hareesh Thridandam, Manchao Xiao, Heather Regina Bowen, Thomas Richard Gaffney
  • Publication number: 20090254774
    Abstract: Embodiments of the present invention provide a run-time scheduler that schedules tasks for database queries on one or more execution resources in a dataflow fashion. In some embodiments, the run-time scheduler may comprise a task manager, a memory manager, and hardware resource manager. When a query is received by a host database management system, a query plan is created for that query. The query plan splits a query into various fragments. These fragments are further compiled into a directed acyclic graph of tasks. Unlike conventional scheduling, the dependency arc in the directed acyclic graph is based on page resources. Tasks may comprise machine code that may be executed by hardware to perform portions of the query. These tasks may also be performed in software or relate to I/O.
    Type: Application
    Filed: April 7, 2008
    Publication date: October 8, 2009
    Applicant: Kickfire, Inc.
    Inventors: Joseph I. Chamdani, Alan Beck, Hareesh Boinepelli, Jim Crowley, Ravi Krishnamurthy, Jeremy Branscome
  • Patent number: 7593960
    Abstract: Systems and corresponding methods are provided for determining when a content page contains out of date content items as a result of changes made to the content items, which systems comprises a template engine operative to generate a content page comprising content items that are associated with time stamp information to indicate the last time the content item was modified. One or more dependency records are generated to store information regarding the relationship between content items that comprise the content page and the content items stored in the data source, which is compared with time stamp information contained in the data source for each content item, to determine through the comparison those content pages that contain content items that have been modified in the data source, and to instruct the template engine to re-generate the content page.
    Type: Grant
    Filed: June 20, 2001
    Date of Patent: September 22, 2009
    Assignee: Fatwire Corporation
    Inventors: Roger Kahn, Hareesh Kadlabalu
  • Patent number: 7582574
    Abstract: A method for forming a metal silicate as a high k dielectric in an electronic device, comprising the steps of: providing diethylsilane to a reaction zone; concurrently providing a source of oxygen to the reaction zone; concurrently providing a metal precursor to the reaction zone; reacting the diethylsilane, source of oxygen and metal precursor by chemical vapor deposition to form a metal silicate on a substrate comprising the electronic device. The metal is preferably hafnium, zirconium or mixtures thereof. The dielectric constant of the metal silicate film can be tuned based upon the relative atomic concentration of metal, silicon, and oxygen in the film.
    Type: Grant
    Filed: May 10, 2007
    Date of Patent: September 1, 2009
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Robert Daniel Clark, Hareesh Thridandam, Kirk Scott Cuthill, Arthur Kenneth Hochberg
  • Publication number: 20090191520
    Abstract: A method of displaying alphasyllabaries by way of appropriately shaped building blocks that represent individual character components of the scripts, and an apparatus for Total word forming and word building in alphasyllabaries using a minimum number of such building blocks, such that orthographic accuracy of the words formed/built in relation to the script and conformity with the alphabetic-syllabic nature of the scripts are maintained. The method and apparatus include a structured means to house the building blocks in a sequence or grid of spaces, with each space comprising of a closed shape within a closed shape and capable of housing a simple syllable or a complex syllable. The inner closed shape typically houses an independent vowel or consonant, and the area between the inner closed shape and the outer closed shape typically houses the dependent characters (diacritics).
    Type: Application
    Filed: April 10, 2009
    Publication date: July 30, 2009
    Inventor: Hareesh Viriyala
  • Publication number: 20090043225
    Abstract: The invention is a self-venting blood collection needle assembly for the extraction of at least one fluid sample into an evacuated container for laboratory testing, this blood collection needle assembly providing a clear or translucent flashback chamber for blood to flow into, for visualization by the user to confirm successful vein entry. The self-venting mechanism permits escape of air during use, and which, typically, also prevents an outflow of fluid, such as blood. Thus, air under venous pressure will be allowed to escape from the blood collection needle assembly until blood reaches the venting mechanism.
    Type: Application
    Filed: June 4, 2008
    Publication date: February 12, 2009
    Applicant: BECTON, DICKINSON AND COMPANY
    Inventors: Hugh T. Conway, Hareesh Nair, Kirk Swenson, C. Mark Newby, Curtis Bloch, Richard Levy, Bradley Wilkinson, James Schneider, Bryan Towns, Michael Iskra, Stewart Marsden
  • Publication number: 20090017200
    Abstract: A method for producing a ceramic coating of metallic and/or ceramic surfaces and products in reactors, process plants and combustion plants includes applying a mixture of fine-particle boron nitride, at least one inorganic binding agent of medium particle size in the nanometer range, containing substantially Al2O3, AlO(OH), ZrO2, Y—ZrO2, TiO2, Fe2O3 and/or SnO2 or an associated precursor compound and at least one solvent and/or water onto a metallic and/or ceramic surfaces or product, and burning the applied mixture into a coating through heating.
    Type: Application
    Filed: September 23, 2008
    Publication date: January 15, 2009
    Inventors: Olaf BINKLE, Stefan Faber, Ralph Nonninger, Romeo Volz, Karl Schwetz, Martin Engler, Helmut Schmidt, Mesut Aslan, Robert Drumm, Hareesh Nair, Klaus Endres, Bernd Reinhard
  • Publication number: 20080275364
    Abstract: The invention is a self-venting blood collection needle assembly for the extraction of at least one fluid sample into an evacuated container for laboratory testing, this blood collection needle assembly providing a clear or translucent flashback chamber for blood to flow into, for visualization by the user to confirm successful vein entry. The self-venting mechanism permits escape of air during use, and which, typically, also prevents an outflow of fluid, such as blood. Thus, air under venous pressure will be allowed to escape from the blood collection needle assembly until blood reaches the venting mechanism.
    Type: Application
    Filed: December 21, 2007
    Publication date: November 6, 2008
    Applicant: BECTON, DICKINSON AND COMPANY
    Inventors: Hugh T. Conway, Hareesh Nair, Kirk Swenson, C. Mark Newby, Curtis Bloch, Richard Levy, Bradley Wilkinson, James C. Schneider, Bryan Towns, Michael Iskra, Stewart Marsden
  • Publication number: 20080207007
    Abstract: The present invention is a process of plasma enhanced cyclic chemical vapor deposition of silicon nitride, silicon carbonitride, silicon oxynitride, silicon carboxynitride, and carbon doped silicon oxide from alkylaminosilanes having Si—H3, preferably of the formula (R1R2N)SiH3 wherein R1 and R2 are selected independently from C2 to C10 and a nitrogen or oxygen source, preferably ammonia or oxygen has been developed to provide films with improved properties such as etching rate, hydrogen concentrations, and stess as compared to films from thermal chemical vapor deposition.
    Type: Application
    Filed: February 12, 2008
    Publication date: August 28, 2008
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Hareesh Thridandam, Manchao Xiao, Xinjian Lei, Thomas Richard Gaffney, Eugene Joseph Karwacki
  • Publication number: 20080194986
    Abstract: The blood collection set includes an IV needle assembly, a length of flexible plastic tubing extending from the IV needle assembly and a non-patient needle assembly. The set is formed with a venting mechanism that permits an outflow of air, while blocking an outflow of blood or other fluids. Thus, the venting mechanism enables air that had existed in interior portions of the blood collection set to be vented allowing for greater flash visualization on venous entry, and avoids the need to employ a discard tube.
    Type: Application
    Filed: January 9, 2008
    Publication date: August 14, 2008
    Applicant: BECTON, DICKINSON AND COMPANY
    Inventors: Hugh Conway, Hareesh Nair, Kirk Swenson, C. Mark Newby, Curtis Bloch, Richard Levy, Bradley Wilkinson, James Schneider, Bryan Towns, Michael Iskra, Stewart Marsden, Robert G. Ellis
  • Publication number: 20080145535
    Abstract: A process to deposit metal silicon nitride on a substrate comprising: sorbing a metal amide on a heated substrate, purging away the unsorbed metal amide, contacting a silicon-containing source having one or more Si—H3 fragments with the heated substrate to react with the sorbed metal amide, wherein the silicon-containing source has one or more H3Si—NR02(R0?SiH3, R, R1 or R2, defined below) groups selected from the group consisting of one or more of: wherein R and R1 in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., branched alkyl, cycloalkyl with R and R1 in formula A also being combinable into a cyclic group, and R2 representing a single bond, (CH2)n, a ring, or SiH2, and purging away the unreacted silicon-containing source.
    Type: Application
    Filed: December 4, 2007
    Publication date: June 19, 2008
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Xinjian Lei, Hareesh Thridandam, Manchao Xiao, Heather Regina Bowen, Thomas Richard Gaffney
  • Publication number: 20080124946
    Abstract: The present invention discloses a process for depositing a carbon containing silicon oxide film, or a carbon containing silicon nitride film having enhanced etch resistance. The process comprises using a silicon containing precursor, a carbon containing precursor and a chemical modifier. The present invention also discloses a process for depositing a silicon oxide film, or silicon nitride film having enhanced etch resistance comprising using an organosilane precursor and a chemical modifier.
    Type: Application
    Filed: November 16, 2007
    Publication date: May 29, 2008
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: MANCHAO XIAO, HAREESH THRIDANDAM, EUGENE JOSEPH KARWACKI, Xinjian Lei
  • Publication number: 20080080460
    Abstract: Embodiments of guaranteed timeslot usage management in wireless networks are described.
    Type: Application
    Filed: September 29, 2006
    Publication date: April 3, 2008
    Inventors: Peramachanahalli Ramkumar, Vimal Venkatesh Narayanan, Hareesh Padmanabha Rao
  • Publication number: 20080028099
    Abstract: A network device to selectively filter the exception data units based on the type of the exception data units. The network device generates a first threshold value for a first type of exception data units and a second threshold value for a second type of exception data units. The first threshold value and the second threshold value are determined based on the weight factors associated with each the first type and the second type of exception data units and a scratch pad threshold value. The network data unit determines the type of exception data units and a scratch pad fullness value and filters the first type and the second type of exception data units based on the first and the second threshold values.
    Type: Application
    Filed: March 23, 2007
    Publication date: January 31, 2008
    Inventors: Hareesh M.P., Udaya Shankara
  • Publication number: 20070281475
    Abstract: A method for forming a metal silicate as a high k dielectric in an electronic device, comprising the steps of: providing diethylsilane to a reaction zone; concurrently providing a source of oxygen to the reaction zone; concurrently providing a metal precursor to the reaction zone; reacting the diethylsilane, source of oxygen and metal precursor by chemical vapor deposition to form a metal silicate on a substrate comprising the electronic device. The metal is preferably hafnium, zirconium or mixtures thereof. The dielectric constant of the metal silicate film can be tuned based upon the relative atomic concentration of metal, silicon, and oxygen in the film.
    Type: Application
    Filed: May 10, 2007
    Publication date: December 6, 2007
    Inventors: Robert Daniel Clark, Hareesh Thridandam, Kirk Scott Cuthill, Arthur Kenneth Hochberg
  • Publication number: 20070275166
    Abstract: The present invention is directed to a method for depositing a silicon oxide layer on a substrate by CVD. The reaction of an organoaminosilane precursor where the alkyl group has at least two carbon atoms in the presence of an oxidizing agent allows for the formation of a silicon oxide film. The organoaminosilanes are represented by the formulas: The use of diisopropylaminosilane is the preferred precursor for the formation of the silicon oxide film.
    Type: Application
    Filed: May 23, 2006
    Publication date: November 29, 2007
    Inventors: Hareesh Thridandam, Manchao Xiao, Xinjian Lei, Thomas Richard Gaffney