Patents by Inventor Hari Soundararajan
Hari Soundararajan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240109163Abstract: A chemical mechanical polishing system includes a platen to support a polishing pad having a polishing surface, a conduit having an inlet to be coupled to a gas source, and a dispenser coupled to the conduit and having a convergent-divergent nozzle suspended over the platen to direct gas from the gas source onto the polishing surface of the polishing pad.Type: ApplicationFiled: December 12, 2023Publication date: April 4, 2024Inventors: Haosheng Wu, Shou-Sung Chang, Chih Chung Chou, Jianshe Tang, Hui Chen, Hari Soundararajan, Brian J. Brown
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Patent number: 11919123Abstract: A chemical mechanical polishing apparatus includes a rotatable platen to hold a polishing pad, a carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, and a temperature control system including a source of heated or coolant fluid and a plenum having a plurality of openings positioned over the platen and separated from the polishing pad for delivering the fluid onto the polishing pad, wherein at least some of the openings are each configured to deliver a different amount of the fluid onto the polishing pad.Type: GrantFiled: June 29, 2021Date of Patent: March 5, 2024Assignee: Applied Materials, Inc.Inventors: Surajit Kumar, Hari Soundararajan, Hui Chen, Shou-Sung Chang
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Publication number: 20240066660Abstract: A chemical mechanical polishing system includes a platen to support a polishing pad having a polishing surface, a source of coolant, a dispenser having one or more apertures suspended over the platen to direct coolant from the source of coolant onto the polishing surface of the polishing pad; and a controller coupled to the source of coolant and configured to cause the source of coolant to deliver the coolant through the nozzles onto the polishing surface during a selected step of a polishing operation.Type: ApplicationFiled: November 9, 2023Publication date: February 29, 2024Inventors: Haosheng Wu, Hari Soundararajan, Jianshe Tang, Shou-Sung Chang, Brian J. Brown, Yen-Chu Yang, You Wang, Rajeev Bajaj
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Patent number: 11897079Abstract: A chemical mechanical polishing system includes a platen to support a polishing pad having a polishing surface, a source of coolant, a dispenser having one or more apertures suspended over the platen to direct coolant from the source of coolant onto the polishing surface of the polishing pad; and a controller coupled to the source of coolant and configured to cause the source of coolant to deliver the coolant through the nozzles onto the polishing surface during a selected step of a polishing operation.Type: GrantFiled: March 26, 2020Date of Patent: February 13, 2024Assignee: Applied Materials, Inc.Inventors: Haosheng Wu, Hari Soundararajan, Jianshe Tang, Shou-Sung Chang, Brian J. Brown, Yen-Chu Yang, You Wang, Rajeev Bajaj
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Publication number: 20240025006Abstract: A chemical mechanical polishing system includes a polishing a port to dispense polishing liquid onto a polishing pad and a liquid flow controller to control a flow rate of the polishing liquid to the port, a temperature control system to control a temperature of the polishing pad, and a control system. The control system is configured to obtain a baseline removal rate, a baseline temperature and a baseline polishing liquid flow rate. A function is stored relating removal rate to polishing liquid flow rate and temperature. The function is used to determine a reduced polishing liquid flow rate and an adjusted temperature such that a resulting removal rate is not below the baseline removal rate. The liquid flow controller is controlled to dispense the polishing liquid at the reduced polishing liquid flow rate and control the temperature control system so that the polishing process reaches the adjusted temperature.Type: ApplicationFiled: September 29, 2023Publication date: January 25, 2024Inventors: Haosheng Wu, Jianshe Tang, Brian J. Brown, Shih-Haur Shen, Shou-Sung Chang, Hari Soundararajan
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Patent number: 11865671Abstract: A chemical mechanical polishing apparatus includes a platen to hold a polishing pad, a carrier laterally movable by an actuator across the polishing pad to hold a substrate against a polishing surface of the polishing pad during a polishing process, a thermal control system including a plurality of independently controllable heaters and coolers to independently control temperatures of a plurality of zones on the polishing pad, and a controller configured to cause the thermal control system to generate a first zone having a first temperature and a second zone having a different second temperature on the polishing pad.Type: GrantFiled: April 15, 2020Date of Patent: January 9, 2024Assignee: Applied Materials, Inc.Inventors: Haosheng Wu, Shou-Sung Chang, Jianshe Tang, Chih Chung Chou, Hui Chen, Hari Soundararajan, Benjamin Cherian
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Publication number: 20230415296Abstract: A chemical mechanical polishing apparatus includes a platen to hold a polishing pad, a carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, and a temperature control system including a source of a fluid medium and one or more openings positioned over the platen and separated from the polishing pad and configured for the fluid medium to flow onto the polishing pad to heat or cool the polishing pad.Type: ApplicationFiled: August 18, 2023Publication date: December 28, 2023Inventors: Shou-Sung Chang, Hari Soundararajan, Haosheng Wu, Jianshe Tang
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Publication number: 20230415297Abstract: A chemical mechanical polishing system includes a steam generator with a heating element to apply heat to a vessel to generate steam, an opening to deliver steam onto a polishing pad, a first valve in a fluid line between the opening and the vessel, a sensor to monitor a steam parameter, and a control system. The control system causes the valve to open and close in accordance with a steam delivery schedule in a recipe, receive a measured value for the steam parameter from the sensor, receive a target value for the steam parameter, and perform a proportional integral derivative control algorithm with the target value and measured value as inputs so as to control the first valve and/or a second pressure release valve and/or the heating element such that the measured value reaches the target value substantially just before the valve is opened according to the steam delivery schedule.Type: ApplicationFiled: September 12, 2023Publication date: December 28, 2023Inventors: Hari Soundararajan, Shou-Sung Chang, Calvin Lee, Jonathan P. Domin, Shuchivrat Datar, Dmitry Sklyar, Paul D. Butterfield, Chad Pollard, Haosheng Wu
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Patent number: 11833637Abstract: A chemical mechanical polishing system includes a steam generator with a heating element to apply heat to a vessel to generate steam, an opening to deliver steam onto a polishing pad, a first valve in a fluid line between the opening and the vessel, a sensor to monitor a steam parameter, and a control system. The control system causes the valve to open and close in accordance with a steam delivery schedule in a recipe, receive a measured value for the steam parameter from the sensor, receive a target value for the steam parameter, and perform a proportional integral derivative control algorithm with the target value and measured value as inputs so as to control the first valve and/or a second pressure release valve and/or the heating element such that the measured value reaches the target value substantially just before the valve is opened according to the steam delivery schedule.Type: GrantFiled: June 28, 2021Date of Patent: December 5, 2023Assignee: Applied Materials, Inc.Inventors: Hari Soundararajan, Shou-Sung Chang, Calvin Lee, Jonathan P. Domin, Shuchivrat Datar, Dmitry Sklyar, Paul D. Butterfield, Chad Pollard, Haosheng Wu
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Patent number: 11826872Abstract: A chemical mechanical polishing system includes a polishing a port to dispense polishing liquid onto a polishing pad and a liquid flow controller to control a flow rate of the polishing liquid to the port, a temperature control system to control a temperature of the polishing pad, and a control system. The control system is configured to obtain a baseline removal rate, a baseline temperature and a baseline polishing liquid flow rate. A function is stored relating removal rate to polishing liquid flow rate and temperature. The function is used to determine a reduced polishing liquid flow rate and an adjusted temperature such that a resulting removal rate is not below the baseline removal rate. The liquid flow controller is controlled to dispense the polishing liquid at the reduced polishing liquid flow rate and control the temperature control system so that the polishing process reaches the adjusted temperature.Type: GrantFiled: June 24, 2021Date of Patent: November 28, 2023Assignee: Applied Materials, Inc.Inventors: Haosheng Wu, Jianshe Tang, Brian J. Brown, Shih-Haur Shen, Shou-Sung Chang, Hari Soundararajan
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Publication number: 20230356351Abstract: A chemical mechanical polishing apparatus includes a platen having a top surface to hold a polishing pad, a carrier head to hold a substrate against a polishing surface of the polishing pad during a polishing process, and a temperature monitoring system. The temperature monitoring system includes a non-contact thermal sensor positioned above the platen that has a field of view of a portion of the polishing pad on the platen. The sensor is rotatable by the motor around an axis of rotation so as to move the field of view across the polishing pad.Type: ApplicationFiled: July 21, 2023Publication date: November 9, 2023Inventors: Hari Soundararajan, Shou-Sung Chang, Haosheng Wu, Jianshe Tang
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Patent number: 11801582Abstract: A chemical mechanical polishing system includes a steam generator with a heating element to apply heat to a vessel to generate steam, an opening to deliver steam onto a polishing pad, a first valve in a fluid line between the opening and the vessel, a sensor to monitor a steam parameter, and a control system. The control system causes the valve to open and close in accordance with a steam delivery schedule in a recipe, receive a measured value for the steam parameter from the sensor, receive a target value for the steam parameter, and perform a proportional integral derivative control algorithm with the target value and measured value as inputs so as to control the first valve and/or a second pressure release valve and/or the heating element such that the measured value reaches the target value substantially just before the valve is opened according to the steam delivery schedule.Type: GrantFiled: June 28, 2021Date of Patent: October 31, 2023Assignee: Applied Materials, Inc.Inventors: Hari Soundararajan, Shou-Sung Chang, Calvin Lee, Jonathan P. Domin, Shuchivrat Datar, Dmitry Sklyar, Paul D. Butterfield, Chad Pollard, Haosheng Wu
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Patent number: 11752589Abstract: A chemical mechanical polishing apparatus includes a platen having a top surface to hold a polishing pad, a carrier head to hold a substrate against a polishing surface of the polishing pad during a polishing process, and a temperature monitoring system. The temperature monitoring system includes a non-contact thermal sensor positioned above the platen that has a field of view of a portion of the polishing pad on the platen. The sensor is rotatable by the motor around an axis of rotation so as to move the field of view across the polishing pad.Type: GrantFiled: April 15, 2020Date of Patent: September 12, 2023Assignee: Applied Materials, Inc.Inventors: Hari Soundararajan, Shou-Sung Chang, Haosheng Wu, Jianshe Tang
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Publication number: 20230256562Abstract: A method of temperature control for a chemical mechanical polishing system includes directing a gas that includes steam from an orifice onto the component in the polishing system while the component is spaced away from a polishing pad of the polishing system to raise a temperature of the component to an elevated temperature, and before the component returns to an ambient temperature, moving the component into contact with the polishing pad.Type: ApplicationFiled: April 24, 2023Publication date: August 17, 2023Inventors: Haosheng Wu, Jianshe Tang, Hari Soundararajan, Shou-Sung Chang, Paul D. Butterfield, Hui Chen, Chih Chung Chou, Alexander John Fisher
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Publication number: 20230249225Abstract: A chemical mechanical polishing system includes a platen to support a polishing pad, a boiler, a component that is movable between a first position spaced from the polishing pad and a second position in contact with the polishing pad, a plurality of nozzles to direct steam from the boiler onto the component of the polishing system when located at the first position, an actuator to move the component from the first position to the second position in contact with the polishing pad, and a controller configured to cause the treatment station to direct the steam onto the component to clean the component, and cause the actuator to move the cleaned component from the treatment station into contact with the polishing pad.Type: ApplicationFiled: April 17, 2023Publication date: August 10, 2023Inventors: Haosheng Wu, Jianshe Tang, Hari Soundararajan, Shou-Sung Chang, Hui Chen, Chih Chung Chou, Alexander John Fisher, Paul D. Butterfield
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Patent number: 11697187Abstract: A chemical mechanical polishing apparatus includes a rotatable platen to hold a polishing pad, a rotatable carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, a polishing liquid supply port to supply a polishing liquid to the polishing surface, a thermal control system including a movable nozzle to spray a medium onto the polishing surface to adjust a temperature of a zone on the polishing surface, an actuator to move the nozzle radially relative to an axis of rotation of the platen, and a controller configured to coordinate dispensing of the medium from the nozzle with motion of the nozzle across the polishing surface.Type: GrantFiled: April 15, 2020Date of Patent: July 11, 2023Assignee: Applied Materials, Inc.Inventors: Haosheng Wu, Shou-Sung Chang, Jianshe Tang, Chih Chung, Hui Chen, Hari Soundararajan, Benjamin Cherian
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Patent number: 11633833Abstract: A method of temperature control for a chemical mechanical polishing system includes directing a gas that includes steam from an orifice onto the component in the polishing system while the component is spaced away from a polishing pad of the polishing system to raise a temperature of the component to an elevated temperature, and before the component returns to an ambient temperature, moving the component into contact with the polishing pad.Type: GrantFiled: May 28, 2020Date of Patent: April 25, 2023Assignee: Applied Materials, Inc.Inventors: Haosheng Wu, Jianshe Tang, Hari Soundararajan, Shou-Sung Chang, Paul D. Butterfield, Hui Chen, Chih Chung Chou, Alexander John Fisher
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Patent number: 11628478Abstract: A method of cleaning for a chemical mechanical polishing system includes directing a gas that includes steam from an orifice onto a component in the polishing system while the component is spaced away from a polishing pad of the polishing system to clean the component, and moving the component into contact with the polishing pad.Type: GrantFiled: May 28, 2020Date of Patent: April 18, 2023Assignee: Applied Materials, Inc.Inventors: Haosheng Wu, Jianshe Tang, Hari Soundararajan, Shou-Sung Chang, Hui Chen, Chih Chung Chou, Alexander John Fisher, Paul D. Butterfield
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Patent number: 11597052Abstract: A chemical mechanical polishing apparatus includes a platen to hold a polishing pad, a carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, a dispenser to supply a polishing liquid to the polishing surface, and a temperature control system including a body configured to contact the polishing surface or the polishing liquid on the polishing surface. The body supports a thermal control module positioned over the polishing pad.Type: GrantFiled: June 21, 2019Date of Patent: March 7, 2023Assignee: Applied Materials, Inc.Inventors: Hari Soundararajan, Shou-Sung Chang, Haosheng Wu, Jianshe Tang, Jeonghoon Oh, Rajeev Bajaj, Andrew Siordia
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Publication number: 20230029290Abstract: A chemical mechanical polishing apparatus includes a platen to hold a polishing pad, a carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, a dispenser to supply a polishing liquid to the polishing surface, and a temperature control system including a body configured to contact the polishing surface or the polishing liquid on the polishing surface. The body supports a thermal control module positioned over the polishing pad.Type: ApplicationFiled: October 4, 2022Publication date: January 26, 2023Inventors: Hari Soundararajan, Shou-Sung Chang, Haosheng Wu, Jianshe Tang, Jeonghoon Oh, Rajeev Bajaj, Andrew Siordia