Abstract: The present disclosure includes systems, apparatuses and methods related to maintaining data in a sorted order in a memory array to improve access time to data in the memory array and directing access to a row of data in cache based upon an address associated with the data. In a number of embodiments, a number of keys that are stored in a first row of an index table can be split between the first row and a second row in response to the first row being full, where the number of keys are copied to the second row and a first portion of the number of keys remain in the first row and a second portion of the number of keys are moved to the second row.

Abstract: Methods, apparatuses, and systems related to mapping a virtual address using a content addressable memory (CAM) are described. In a memory system including a memory and a content addressable memory (CAM), a select line of the CAM can be coupled to a corresponding select line of the memory, which allows the memory system to map a virtual address of a memory device directly to the corresponding select line of the memory. An example method can include receiving, from a host at a memory device comprising a memory array and a content addressable memory (CAM), a first virtual address to be searched among virtual addresses stored within the CAM, identifying, in response to receipt of the first virtual address, a select line of a plurality of select lines of the CAM associated with a second virtual address matching the first virtual address, and activating, in response to identifying the select line of the CAM, a corresponding select line of the memory coupled to the identified select line of the CAM.

Abstract: Apparatuses, systems, and methods for mapping a virtual address using a CAM are described. A parallel structure of a CAM can enable functions of a MMU to be integrated into a single operation performed using the CAM such that a virtual address of a memory array can be mapped directly to a row of a memory. An example method includes receiving an access command and address information for a memory array; identifying a virtual address and a physical address of the memory array based on the received address information; comparing, during a time period associated with the access command, the virtual address and the physical address to virtual addresses and physical addresses, respectively, of the memory array stored in a CAM; and accessing, during the time period, a row of the memory array coupled to a row of the CAM storing the virtual address and the physical address.

Abstract: Methods for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area of the desired shape based on an original set of exposure information. A backscatter for a sub area is calculated, based on the original set of exposure information. Dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A pre-PEC maximum dose is determined for the local pattern density, based on a pre-determined target post-PEC maximum dose. The original set of exposure information is modified with the pre-PEC maximum dose and the increased dosage of the at least one pixel in the sub area to create a modified set of exposure information.

Abstract: Methods include inputting an array of pixels, where each pixel in the array of pixels has a pixel dose. The array of pixels represents dosage on a surface to be exposed with a plurality of patterns, each pattern of the plurality of patterns having an edge. A target bias is input. An edge of a pattern in the plurality of patterns is identified. For each pixel which is in a neighborhood of the identified edge, a calculated pixel dose is calculated such that the identified edge is relocated by the target bias. The array of pixels with the calculated pixel doses is output. Systems for performing the methods are also disclosed.

Abstract: A power generation system (100, 200, 300, 400) is presented. The power generation system includes a prime mover (102), a doubly-fed induction generator (DFIG) (104) having a rotor winding (126) and a stator winding (122), a rotor-side converter (106), a line-side converter (108), and a secondary power source (110, 401) electrically coupled to a DC-link (128). Additionally, the power generation system includes a control sub-system (112, 212, 312) having a controller, and a plurality of switching elements (130, and 132 or 201). The controller is configured to selectively control switching of one or more switching elements (130, and 132 or 201) based on a value of an operating parameter corresponding to at least one of the prime mover, the DFIG, or the secondary power source to connect the rotor-side converter in parallel to the line-side converter to increase an electrical power production by the power generation system.

Abstract: An electrical power system connectable to a power grid includes a cluster of electrical power subsystems, each of the electrical power subsystems including a power converter electrically coupled to a generator having a generator rotor and a generator stator. Each of the electrical power subsystems defines a stator power path and a converter power path for providing power to the power grid. Each of the electrical power subsystems further includes a transformer. The system further includes a subsystem breaker configured with each of the electrical power subsystems, and a cluster power path extending from each subsystem breaker for connecting the cluster of electrical power subsystems to the power grid. The system further includes a reactive power compensation inverter electrically coupled within the electrical power system, the reactive power compensation inverter operable to increase the reactive power level in the electrical current flowing to the power grid.

Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam system is disclosed and includes determining a local pattern density for the area of the pattern based on an original set of exposure information. A pre-PEC maximum dose is determined for the area. The original set of exposure information is modified with the pre-PLC maximum dose.

Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information. A dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A modified set of exposure information is output, including the increased dosage of the at least one pixel in the sub area.

Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. A backscatter is calculated for the area of the pattern based on the exposure information. An artificial background dose is determined for the area. The artificial background dose comprises additional exposure information and is combined with the original set of exposure information creating a modified set of exposure information. A system for exposing a pattern in an area on a surface using a charged particle beam lithography is also disclosed.

Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. A backscatter is calculated for the area of the pattern based on the exposure information. An artificial background dose is determined for the area. The artificial background dose comprises additional exposure information and is combined with the original set of exposure information creating a modified set of exposure information. A system for exposing a pattern in an area on a surface using a charged particle beam lithography is also disclosed.

Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam system is disclosed and includes determining a local pattern density for the area of the pattern based on an original set of exposure information. A pre-PEC maximum dose is determined for the area. The original set of exposure information is modified with the pre-PLC maximum dose.

Abstract: Methods include inputting an array of pixels, where each pixel in the array of pixels has a pixel dose. The array of pixels represents dosage on a surface to be exposed with a plurality of patterns, each pattern of the plurality of patterns having an edge. A target bias is input. An edge of a pattern in the plurality of patterns is identified. For each pixel which is in a neighborhood of the identified edge, a calculated pixel dose is calculated such that the identified edge is relocated by the target bias. The array of pixels with the calculated pixel doses is output. Systems for performing the methods are also disclosed.

Abstract: An electrical power system connected to a power grid can include a generator having a stator and a rotor and a power converter. The stator is connected to the power grid via a stator power path. The power converter can include a line-side converter coupled to the power grid via a converter power path and a rotor-side converter coupled to a rotor bus of the rotor and the line-side converter via a DC link. The rotor-side converter is configured to convert a DC power on the DC link to an AC signal for the rotor bus. The power system can also include an active filter having one or more active controlled components. The active filter is coupled in parallel with the rotor-side converter to reduce harmonics of the electrical power system.

Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam system is disclosed and includes inputting an original set of exposure information for the area and inputting a target post-proximity effect correction (PEC) maximum dose. A local pattern density is calculated for the area of the pattern based on the original set of exposure information. A pre-PEC maximum dose is determined for the area. The original set of exposure information is modified with the pre-PEC maximum dose.

Abstract: A control method for increasing reactive power generation of a wind turbine having a Doubly-Fed Induction Generator (DFIG) includes obtaining, by a control device having one or more processors and one or more memory devices, wind forecast data of the wind turbine. Further, the method includes generating, by the control device, a real-time thermal model of the DFIG of the wind turbine using the wind forecast data. More specifically, the thermal model defines a thermal capacity for the DFIG that does not exceed system limits. Thus, the method also includes dynamically adjusting, by the control device, a reactive power set point of the DFIG of the wind turbine based on the real-time thermal model.

Abstract: Methods include inputting an array of pixels, where each pixel in the array of pixels has a pixel dose. The array of pixels represents dosage on a surface to be exposed with a plurality of patterns, each pattern of the plurality of patterns having an edge. A target bias is input. An edge of a pattern in the plurality of patterns is identified. For each pixel which is in a neighborhood of the identified edge, a calculated pixel dose is calculated such that the identified edge is relocated by the target bias. The array of pixels with the calculated pixel doses is output. Systems for performing the methods are also disclosed.

Abstract: Systems, apparatuses, and methods related to memory systems and operation are described. A memory system may be communicative coupled to a processor via data buses. The memory system may include a memory array that stores first data at a first storage location and second data at a second storage location. The memory may include a memory controller, which receives a memory access request that requests return of the first data and the second data, determines a data access pattern resulting from the memory access request, determines an access pointer that identifies the first storage location of the first data and the second storage location of the second data, and instructs the memory system to use the access pointer to identify and output the first data and the second data via the data buses to enable the processor to perform an operation based on the first data and the second data.

Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. A backscatter is calculated for the area of the pattern based on the exposure information. An artificial background dose is determined for the area. The artificial background dose comprises additional exposure information and is combined with the original set of exposure information creating a modified set of exposure information. A system for exposing a pattern in an area on a surface using a charged particle beam lithography is also disclosed.

Abstract: A yaw system of a wind turbine having contingency autonomous control capabilities includes a plurality of yaw system components configured to change an angle of a nacelle of the wind turbine relative to an incoming wind direction. The plurality of yaw system components includes an auxiliary power supply comprising a brake power control device, a braking unit coupled to the brake power control device, at least two energy storage devices coupled to the braking unit, a plurality of yaw drive mechanisms communicatively coupled to the auxiliary power supply via a communication link, and a controller configured to implement a protective control strategy for the yaw system in response to one of the yaw system components experiencing a failure. Each of the yaw drive mechanisms includes a yaw power control device.