Patents by Inventor Hartmut Enkisch
Hartmut Enkisch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120229784Abstract: A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.Type: ApplicationFiled: March 12, 2012Publication date: September 13, 2012Applicant: Carl Zeiss SMT GmbHInventors: Martin ROCKTAESCHEL, Hartmut ENKISCH, Franz-Josef STICKEL, Oliver NATT, Hans-Juergen MANN, Sascha MIGURA
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Patent number: 8164077Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.Type: GrantFiled: November 24, 2009Date of Patent: April 24, 2012Assignee: Carl Zeiss SMT GmbHInventors: Marco Wedowski, Nadyeh Shariloo, legal representative, Markus Weiss, Stephan Muellender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, Hubert Adriaan van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa
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Publication number: 20110222144Abstract: A method for producing a multilayer coating (17) for reflecting radiation in the soft X-ray or EUV wavelength range on an optical element (8, 9) which is operated at an operating temperature (TOP) of 30° or more, preferably of 100° C. or more, particularly preferably of 150° C. or more, in particular of 250° C. or more, comprising: determining an optical design for the multilayer coating (17) which defines an optical desired layer thickness (nOP dOP) of the layers (17.1, 17.2) of the multilayer coating (17) at the operating temperature (TOP), and applying the layers (17.1, 17.2) of the multilayer coating (17) with an optical actual layer thickness (nB dB) chosen in such a way that a layer thickness change (nOP dOP?nB dB) caused by thermal expansion of the layers (17.1, 17.2) between the coating temperature (TB) and the operating temperature (TOP) is compensated for.Type: ApplicationFiled: December 10, 2010Publication date: September 15, 2011Applicant: CARL ZEISS SMT GmbhInventors: Hartmut ENKISCH, Stephan MUELLENDER, Martin ENDRES
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Publication number: 20110122392Abstract: An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.Type: ApplicationFiled: December 21, 2010Publication date: May 26, 2011Applicant: CARL ZEISS SMT GMBHInventors: Damian Fiolka, Michael Totzeck, Hartmut Enkisch, Stephan Muellender
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Publication number: 20100265481Abstract: An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.Type: ApplicationFiled: April 26, 2010Publication date: October 21, 2010Applicant: CARL ZEISS SMT AGInventors: Hans-Juergen Mann, Wilhelm Ulrich, Stephan Muellender, Hartmut Enkisch
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Publication number: 20100067653Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.Type: ApplicationFiled: November 24, 2009Publication date: March 18, 2010Applicant: Carl Zeiss SMT AGInventors: Marco Wedowski, Markus Weiss, Stephan Mûllender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H.A. van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa, Nadyeh Shariloo
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Patent number: 7672044Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.Type: GrantFiled: September 28, 2007Date of Patent: March 2, 2010Assignee: Carl Zeiss SMT AGInventors: Birgit Enkisch, Hartmut Enkisch, Toralf Gruner
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Publication number: 20100007866Abstract: The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.Type: ApplicationFiled: July 17, 2009Publication date: January 14, 2010Applicant: Carl Zeiss SMT AGInventors: Berndt Warm, Siegfried Rennon, Guenther Dengel, Juergen Baier, Udo Dinger, Stefan Burkart, Christos Kourouklis, Hin Yiu Anthony Chung, Stefan Wiesner, Hartmut Enkisch
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Patent number: 7646004Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.Type: GrantFiled: May 24, 2006Date of Patent: January 12, 2010Assignee: Carl Zeiss SMT AGInventors: Marco Wedowski, Nadyeh Shariloo, legal representative, Markus Weiss, Stephan Müllender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H. A. van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa
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Publication number: 20090015951Abstract: A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.Type: ApplicationFiled: August 22, 2008Publication date: January 15, 2009Applicant: Carl Zeiss SMT AGInventors: Hans-Juergen Mann, Stephan Muellender, Johann Trenkler, Hartmut Enkisch
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Patent number: 7429116Abstract: A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.Type: GrantFiled: December 16, 2004Date of Patent: September 30, 2008Assignee: Carl Zeiss SMT AGInventors: Hans-Juergen Mann, Stephan Muellender, Johann Trenkler, Hartmut Enkisch
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Publication number: 20080019013Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.Type: ApplicationFiled: September 28, 2007Publication date: January 24, 2008Applicant: CARL ZEISS SMT AGInventors: Birgit Enkisch, Hartmut Enkisch, Toralf Gruner
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Patent number: 7292388Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.Type: GrantFiled: November 8, 2004Date of Patent: November 6, 2007Assignee: Carl Zeiss SMT AGInventors: Birgit Enkisch, Hartmut Enkisch, Toralf Gruner
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Publication number: 20070114466Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.Type: ApplicationFiled: May 24, 2006Publication date: May 24, 2007Inventors: Marco Wedowski, Markus Weiss, Stephan Mullender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H.A. van Mierlo, Michiel Nijkerk, Fokko Wieringa, Nadyeh Shariloo
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Publication number: 20050170748Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.Type: ApplicationFiled: November 8, 2004Publication date: August 4, 2005Inventors: Birgit Enkisch, Hartmut Enkisch, Toralf Gruner
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Publication number: 20050134980Abstract: A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10) is described. The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.Type: ApplicationFiled: December 16, 2004Publication date: June 23, 2005Inventors: Hans-Juergen Mann, Stephan Muellender, Johann Trenkler, Hartmut Enkisch