Patents by Inventor Hartmut Wiezer

Hartmut Wiezer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8563129
    Abstract: The invention relates polysilazane-containing coatings for increasing the light permeability of sun-facing covers of solar cells. The coating for surfaces contains at least one polysilazane of formula (1) —(SiRR?R?—NR??1)n- (1), wherein R?, R?, R?? are the same or different or represent an optionally substituted alkyl, aryl, vinyl or (trialkoxysilyl)alkyl group, n being an integer and n being chosen in such a manner that the perhydropolysilazane has a number average molecular weight of 150 to 150,000 g/mol, a solvent and a catalyst. The cured coating has a thickness of at least 0.50-10 micrometer, preferably 0.2 to 5 micrometer, especially preferred 0.5 to 1.5 micrometer. It is especially suitable as transmission-promoting coating for use in sun-facing covers of solar cells.
    Type: Grant
    Filed: April 17, 2009
    Date of Patent: October 22, 2013
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Klaus Rode, Hartmut Wiezer, Sandra Stojanovic, Hubert Liebe, Lars Blankenburg
  • Patent number: 8482106
    Abstract: The invention relates to a method for producing passivation layers on crystalline silicon by a) coating the silicon with a solution containing at least one polysilazane of the general formula (1): —(SiR?R?—NR??)-n, wherein R?, R?, R?? are the same or different and stand independently of each other for hydrogen or a possibly substituted alkyl, aryl, vinyl, or (trialkoxysilyl)alkyl group, wherein n is an integer and n is chosen such that the polysilazane has a number average molecular weight of 150 to 150,000 g/mol, b) subsequently removing the solvent by evaporation, whereby polysilazane layers of 50-500 nm thickness remain on the silicon wafer, and c) heating the polysilazane layer at normal pressure to 200-1000° C. in the presence of air or nitrogen, wherein upon tempering the ceramic layers release hydrogen for bulk passivation of the silicon.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: July 9, 2013
    Inventors: Klaus Rode, Hartmut Wiezer
  • Publication number: 20110156221
    Abstract: The invention relates to a method for producing passivation layers on crystalline silicon by a) coating the silicon with a solution containing at least one polysilazane of the general formula (1): —(SiR?R?—NR??)-n, wherein R?, R?, R?? are the same or different and stand independently of each other for hydrogen or a possibly substituted alkyl, aryl, vinyl, or (trialkoxysilyl)alkyl group, wherein n is an integer and n is chosen such that the polysilazane has a number average molecular weight of 150 to 150,000 g/mol, b) subsequently removing the solvent by evaporation, whereby polysilazane layers of 50-500 nm thickness remain on the silicon wafer, and c) heating the polysilazane layer at normal pressure to 200-1000° C. in the presence of air or nitrogen, wherein upon tempering the ceramic layers release hydrogen for bulk passivation of the silicon.
    Type: Application
    Filed: August 26, 2009
    Publication date: June 30, 2011
    Applicant: CLARIANT FINANCE (BVI) LIMITED
    Inventors: Klaus Rode, Hartmut Wiezer
  • Patent number: 5648535
    Abstract: A process for the production of N-acylaminophenols by the concurrent hydrogenation of a nitrophenol to an aminophenol and the acylation of the aminophenol with acyl anhydride takes place on a continuous basis in a stirred tank reactor in which liquid product is continuously withdrawn from the reactor. Of particular interest is the manufacture of acetaminophen, N-acetyl-p-aminophenol by continuous reaction of p-ntirophenol, hydrogen and acetic anhydride.
    Type: Grant
    Filed: May 26, 1995
    Date of Patent: July 15, 1997
    Assignee: Hoechst Celanese Corp.
    Inventors: James A. Foster, Werner H. Mueller, Debra A. Ryan, Hartmut Wiezer
  • Patent number: 5182187
    Abstract: Radiation-polymerizable composition which comprisesa) a constituent that can be polymerized by free radicals and has a boiling point above 100.degree. C.,b) a photoinitiator, andc) a copolymer comprising units ofc1) an .alpha., .beta.-unsaturated aliphatic carboxylic acid,c2) an alkyl, cycloalkyl or cycloalkenyl methacrylate, andc3) an alkyl, cycloalkyl or cycloalkenyl acrylateand has an acid number of 78 to 176 and a glass transition temperature of 290 to 340 K. The composition is characterized by its ready developability at a low acid number and its good resistance to alkaline etching solutions.
    Type: Grant
    Filed: November 26, 1990
    Date of Patent: January 26, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Ulrich Geissler, Hartmut Wiezer
  • Patent number: 5085669
    Abstract: The invention describes a process for stabilizing a leuco-dye solution in an organic solvent against oxidation in air. In the process, a compound containing at least one 2,2,6,6-tetraalkylpiperidine, 2,2-dialkylpiperidine-6-spiro-cycloalkane or piperidine-2,6-dispiro-cycloalkane grouping is added to the solution. The process is, in particular, used for stabilizing photoresist solutions which, apart from the leuco dye, contain polymerizable compounds and photoinitiators, especially radiation-sensitive trihalomethyl compounds.
    Type: Grant
    Filed: October 6, 1989
    Date of Patent: February 4, 1992
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Dieter Frommeld, Hartmut Wiezer
  • Patent number: 4940647
    Abstract: The invention comprises a photopolymerizable mixture comprising as the essential constituents a polymeric binder, a compound capable of forming a polymer by free-radical initiated polymerization, a photoinitiator, a leuco dye and a leuco dye stabilizer having at least one epoxy group. The mixture has a better shelf life in the dark than known compositions and is preferably used in the preparation of dry photoresists.
    Type: Grant
    Filed: October 6, 1988
    Date of Patent: July 10, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Dieter Frommeld, Hartmut Wiezer
  • Patent number: 4689416
    Abstract: The reaction for the preparation of 1-oxa-3,8-diaza-4-oxo-spiro[4.5]decane compounds of the formula ##STR1## proceeds more rapidly and more completely if it is performed in the presence of a phase transfer catalyst in an aromatic hydrocarbon which is liquid at room temperature.
    Type: Grant
    Filed: July 8, 1986
    Date of Patent: August 25, 1987
    Assignee: Hoechst Aktiengellschaft
    Inventors: Josef Ertl, Hartmut Wiezer
  • Patent number: 4562220
    Abstract: New polyalkyldiazaspirodecanylacetic acid derivatives are prepared by reacting diazaspirodecanes of the formula ##STR1## in which X is ##STR2## with halogenoacetic acid derivatives, and, if desired, reacting products thus obtained further with alcohols or amines. The compounds can be used as light stabilizers for plastics and lacquers.
    Type: Grant
    Filed: April 17, 1983
    Date of Patent: December 31, 1985
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Hartmut Wiezer
  • Patent number: 4526966
    Abstract: Polyalkyldiazaspirodecanes which are substituted in the 2-position by functional radicals and have the formula ##STR1## are prepared from polyalkylpiperidine cyanohydrins and ketones which are substituted by functional radicals.The products are suitable for stabilizing organic polymers against photo-oxidative degradation.
    Type: Grant
    Filed: May 4, 1983
    Date of Patent: July 2, 1985
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Hartmut Wiezer
  • Patent number: 4504661
    Abstract: Polytriazinylpiperidylamines of the general formula ##STR1## are obtained by reacting cyanuric halides with a monofunctional amino compound and a difunctional amine, it being necessary for at least the difunctional amine to be substituted by a polyalkylpiperidyl radical. The new resinous polymers have a very low volatility. They have an atactic structure and are used to stabilize synthetic polymers towards photoinduced oxidative degradation.
    Type: Grant
    Filed: June 12, 1981
    Date of Patent: March 12, 1985
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Wiezer, Gerhard Pfahler
  • Patent number: 4496726
    Abstract: Hitherto unknown polyalkylpiperidinylaminotriazines having a structure of the type ##STR1## are obtained from halogenotriazinyl compounds and aminoethylaminoethanols and can be converted into further derivatives with isocyanates, esters and acid chlorides to give new stabilizers for polymers, which stabilizers are distinguished by very good migration resistance.
    Type: Grant
    Filed: August 2, 1982
    Date of Patent: January 29, 1985
    Inventors: Hartmut Wiezer, Gerhard Pfahler
  • Patent number: 4476302
    Abstract: New esters and urethanes containing polyalkylpiperidylaminotriazine groups of the formula ##STR1## are prepared from carboxylic acid exters or isocyanates and triazinyl alcohols. The compounds are valuable stabilizers for polymeric materials.
    Type: Grant
    Filed: March 15, 1982
    Date of Patent: October 9, 1984
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Wiezer, Gerhard Pfahler
  • Patent number: 4471417
    Abstract: Poly-bis-triazinylimides of the formula ##STR1## are prepared from bis-(2,4-dichloro-1,3,5-triazin-6-yl)imides and polyalkylpiperidylamines.They are used as light stabilizers for polymers.
    Type: Grant
    Filed: March 29, 1982
    Date of Patent: September 11, 1984
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Wiezer, Gerhard Pfahler
  • Patent number: 4451400
    Abstract: Halogenophosphazenes of the formula ##STR1## in which n denotes 3 to 100, are reacted with alcohols or amines having polyalkylpiperidyl groups to give compounds which are suitable for stabilizing synthetic polymers and are distinguished by a very high migration resistance.
    Type: Grant
    Filed: May 7, 1982
    Date of Patent: May 29, 1984
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Hartmut Wiezer
  • Patent number: 4433145
    Abstract: The invention relates to new light stabilizers and heat stabilizers which have a low volatility and are migration-resistant, for use in organic polymers. They are obtained by reacting cyanuric halides with a monoamine containing piperidine groups and a polyamine component.
    Type: Grant
    Filed: November 3, 1980
    Date of Patent: February 21, 1984
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Wiezer, Gerhard Pfahler
  • Patent number: 4409348
    Abstract: Poly-bis-triazinylaminotriazinylamines are prepared from cyanuric chloride, triazinylamines and two different diamino compounds. They are light stabilizers, of low volatility and resistant to migration, for synthetic polymers.
    Type: Grant
    Filed: May 3, 1982
    Date of Patent: October 11, 1983
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Wiezer, Gerhard Pfahler
  • Patent number: 4405735
    Abstract: Diazaspirodecanes of the general formulae ##STR1## are reacted with epoxides or aldehydes to give alcohols and the latter are reacted with bifunctional compounds to form oligomers or polymers which can be used as light stabilizers for synthetic polymers. The alcohols can also be obtained if epoxy compounds which are substituted by the above diazaspirodecanes are converted into their formic acid esters and the latter are saponified.
    Type: Grant
    Filed: February 3, 1982
    Date of Patent: September 20, 1983
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Wiezer, Gerhard Pfahler, Helmut Korbanka
  • Patent number: 4376836
    Abstract: Triazinylaminotriazines of the general formula ##STR1## which are used as stabilizers for polymers, are prepared by reacting a cyanuric halide with amines containing triazinyl and polyalkylpiperidylamino groups.
    Type: Grant
    Filed: July 13, 1981
    Date of Patent: March 15, 1983
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Wiezer, Gerhard Pfahler
  • Patent number: 4356308
    Abstract: In the synthesis of 2,2,6,6-tetramethylpiperidone-4 (triacetone-amine) from acetone and ammonia, a partially halogenated or perhalogenated aliphatic or cyclic hydrocarbon is used as catalyst in an amount of from 0.01 to 5 mol %, relative to acetone.
    Type: Grant
    Filed: March 27, 1981
    Date of Patent: October 26, 1982
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hartmut Wiezer, Gunther Nowy, Harald Haberlein