Abstract: The plasma shield device (13) comprises a hollow structure (40) made of monocrystal body of silicon carbide and having an inside space (40a) and a first and second openings (40b,40c) which are opposed to each other across the inside space. During operation of the plasma generation apparatus, the internal space of the hollow structure forms a discharge zone in which the plasma is generated. Discharge gas is supplied to the internal space of the hollow structure through the first opening and the EUV radiation is mainly emitted through the second opening.

Abstract: Substrate inspection apparatus, in which the acquisition of the inspection data for a defect and the acquisition of the focus data of the objective lens are performed in parallel, includes an autofocus apparatus for controlling position of the objective lens along its optical axis. The autofocus apparatus includes a focus error detection unit and a focus control signal generation unit for generating a focus control signal for controlling the position of the objective lens for each scan line using a focus data signal composed of an objective position signal or the objective position signal to which a focus error signal is added. When “i” is assumed as a positive integer and “m” is as a natural number, the focus data signal which was acquired during the scanning period of i-th scan line is used to produce the focus control signal used to scan the (i+2m)-th scan line.

Abstract: The invention is directed to the provision of a wavelength conversion-type ultraviolet light source apparatus that can obtain a stable output. A light source apparatus according to one mode of the invention includes: a laser light source 1 which produces fundamental light L1; at least one nonlinear optical crystal 3 which takes the fundamental light L1 or a harmonic thereof as incident light and outputs wavelength-converted light L2; and polarization adjusting means 2 which is placed in an optical path of the incident light and causes an output of the wavelength-converted light L2 to change by changing its refractive index for a polarized component of the incident light. The polarization adjusting means 2 changes the amount of change of the refractive index in accordance with an electrical signal output from a photodetector 7.

Abstract: A via hole depth measurement apparatus generates a light beam of white light, divides the light beam into a measurement and reference beams, focuses the measurement beam and projects it onto a sample, reflects the reference beam and advances it along the original optical path, continuously changes a relative optical path length difference between optical path lengths of the measurement and reference beams, combining reflected light from the sample and from the reflected reference beam and generates an interference beam, changes a relative distance between an objective lens which focuses the measurement beam and the sample, detects a relative position between the objective lens and the sample, receives the interference beam and outputs an interference signal, and, and outputs recessed portion depth information based on displacement information based on the interference signal and the relative position between the objective lens and the sample.

Abstract: According to the invention, the surface of the Sic substrate or the epitaxial layer formed on the Sic substrate using the optical apparatus including the differential interference optical system. The reflected light from the surface of the Sic substrate or the epitaxial layer is received by the line sensor (23), and the output of the line sensor is supplied to the processor (11). The processor comprises means for forming the differential interference contrast image of the surface of the Sic substrate. The differential interference contrast image of the surface of the Sic substrate is supplied to the defect detection means in order to detect the defects formed in the substrate. The image of the detected defect is supplied to the defect classification means (36) to classify the type of the defect based on the shape and luminance distribution of the defect image.

Abstract: The invention is directed to the provision of a wavelength conversion-type ultraviolet light source apparatus that can obtain a stable output. A light source apparatus according to one mode of the invention includes: a laser light source 1 which produces fundamental light L1; at least one nonlinear optical crystal 3 which takes the fundamental light L1 or a harmonic thereof as incident light and outputs wavelength-converted light L2; and polarization adjusting means 2 which is placed in an optical path of the incident light and causes an output of the wavelength-converted light L2 to change by changing its refractive index for a polarized component of the incident light. The polarization adjusting means 2 changes the amount of change of the refractive index in accordance with an electrical signal output from a photodetector 7.

Abstract: According to a first aspect of the present invention, there is provided an inspection apparatus including an objective lens, a reflected illumination optical system that illuminates a first area which is part of a field of view of the objective lens, a transmitted illumination optical system that illuminates the first area and a second area; an adjusting unit that adjusts positions on the sample of transmitted illumination light from the transmitted illumination optical system and reflected illumination light from the reflected illumination optical system; a first detector that detects a transmitted light transmitted by the sample and a reflected light reflected by the sample in the first area; and a second detector that detects through the objective lens a transmitted light transmitted by the sample in the second area.

Abstract: According to one aspect of the present invention, there is provided a photomask inspection apparatus which observes a pattern provided on a mask substrate of a mask to inspect the mask including an object lens, and a liquid that is present between a last lens in the side closer to the mask of the object lens and the mask.

Abstract: According to one aspect of the present invention, there is provided an illumination apparatus 110 including a laser source 11, a two dimensional diffraction optics 13 on which laser beam from the laser source is made incident, a rectangular rod 14 on which diffraction beams from the two dimensional diffraction optics 13 are made incident and through which incident beams travel while repeating total reflection, and a galvano mirror 12 changing an incident position of the diffraction beams from the two dimensional diffraction optics 13 in an incident end surface of the rectangular rod 14.

Abstract: A phase shift amount measurement apparatus able to further correctly measure a phase shift amount of a phase shifter, wherein a laterally offset interference image of a phase shift mask is formed by a shearing interferometer, the interference image is captured by a two-dimensional imaging device, an output signal output from each light receiving element of the two-dimensional imaging device is supplied to a signal processing device, the phase shift amount is calculated for each light receiving element, the light receiving area of the light receiving element is very small, therefore the phase shift amount of any light receiving element outputting a peculiar phase amount due to incidence of diffraction light or multi-reflection light is excluded and the phase shift amount is determined based on the phase shift amount found from output signals of the remaining light receiving elements.

Abstract: A depth measurement apparatus and a method capable of measuring a via hole having a high aspect ratio with a high resolution is provided.

Abstract: According to one aspect of the present invention, there is provided a photomask inspection apparatus which observes a pattern provided on a mask substrate of a mask to inspect the mask including an object lens, and a liquid that is present between a last lens in the side closer to the mask of the object lens and the mask.

Abstract: A defect inspection apparatus according to an aspect of the present invention includes a laser source generating light beam, an objective lens focusing the light beam emitted from the laser source to form a light spot on a surface of a sample W, a prism dividing the light beam reflected from the sample into two light beams, two light receiving elements receiving the light beams divided by the prism to output output signals based on the beam amount of the received beams, and a real defect determination part determining a candidate detect as a real defect when output signals from the two light receiving elements are detected substantially at the same time.

Abstract: A defect inspection apparatus according to an aspect of the present invention includes a laser source generating light beam, an objective lens focusing the light beam emitted from the laser source to form a light spot on a surface of a sample W, a prism dividing the light beam reflected from the sample into two light beams, two light receiving elements receiving the light beams divided by the prism to output output signals based on the beam amount of the received beams, and a real defect determination part determining a candidate detect as a real defect when output signals from the two light receiving elements are detected substantially at the same time.

Abstract: According to a first aspect of the present invention, there is provided an inspection apparatus including an objective lens, a reflected illumination optical system that illuminates a first area which is part of a field of view of the objective lens, a transmitted illumination optical system that illuminates the first area and a second area; an adjusting unit that adjusts positions on the sample of transmitted illumination light from the transmitted illumination optical system and reflected illumination light from the reflected illumination optical system; a first detector that detects a transmitted light transmitted by the sample and a reflected light reflected by the sample in the first area; and a second detector that detects through the objective lens a transmitted light transmitted by the sample in the second area.

Abstract: A phase shift amount measurement apparatus able to further correctly measure a phase shift amount of a phase shifter, wherein a laterally offset interference image of a phase shift mask is formed by a shearing interferometer, the interference image is captured by a two-dimensional imaging device, an output signal output from each light receiving element of the two-dimensional imaging device is supplied to a signal processing device, the phase shift amount is calculated for each light receiving element, the light receiving area of the light receiving element is very small, therefore the phase shift amount of any light receiving element outputting a peculiar phase amount due to incidence of diffraction light or multi-reflection light is excluded and the phase shift amount is determined based on the phase shift amount found from output signals of the remaining light receiving elements.

Abstract: According to one aspect of the present invention, there is provided an illumination apparatus 110 including a laser source 11, a two dimensional diffraction optics 13 on which laser beam from the laser source is made incident, a rectangular rod 14 on which diffraction beams from the two dimensional diffraction optics 13 are made incident and through which incident beams travel while repeating total reflection, and a galvano mirror 12 changing an incident position of the diffraction beams from the two dimensional diffraction optics 13 in an incident end surface of the rectangular rod 14.

Abstract: An optically scanning apparatus and defect inspection system able to detect a defect with a high resolution and able to greatly shorten the inspection time. An radiation beam generated from a light source is converted to a light beam array of an m×n matrix by a two-dimensional diffraction grating. The light beams of the light beam array are focused into micro spots by an objective lens and projected on a sample. Therefore, a two-dimensional light spot array of an m×n matrix is formed on a sample. The sample stage rotates and moves rectilinearly in an r direction, so the sample surface is scanned by the m×n matrix of light spots. As a result, the sample surface is spirally scanned by a light beam of a belt shape of the scan width, so can be scanned at a high speed. Further, the beams reflected by the sample surface are received by light receiving elements separated by light blocking members, so a confocal optical system is formed and as a result the resolution of detection of defects becomes much higher.

Abstract: Disclosed is a light source device capable of further enhancing an effective pulse rate. A light source device according to the present invention comprises: a plurality of light sources (1a to 1h) emitting radiation light; a rotating reflection body (2) having one or more reflection surfaces (2a) and emitting the radiation light emitted from the respective light sources (1a to 1h) along an optical path (L) common to the light sources; a position detecting device (5) detecting a position of the reflection surface (2a) of the rotating reflection body (2); a timing control circuit (6) generating a synchronization signal for driving the plurality of light sources in synchronization with the position of the rotating reflection body based on an output signal from the position detecting device; and a power supply circuit (7) sequentially pulse-driving the light sources based on an output signal from the timing control circuit.

Abstract: The present invention has a configuration in which a line confocal optical system is formed and plural times of illumination by lines of lights are carried out. Particularly, in the present invention, the diffraction grating 32 produces the m×n number of sub beams. Further, the m×n number of sub beams are deflected by the acoustic optical element 33 so that their irradiation areas are to be continuous. Therefore, since the beam carries out scanning using the m×n number of sub beams, scanning can be completed in a short time.