Abstract: The present invention has a configuration in which a line confocal optical system is formed and plural times of illumination by lines of lights are carried out. Particularly, in the present invention, the diffraction grating 32 produces the m×n number of sub beams. Further, the m×n number of sub beams are deflected by the acoustic optical element 33 so that their irradiation areas are to be continuous. Therefore, since the beam carries out scanning using the m×n number of sub beams, scanning can be completed in a short time.

Abstract: An optically scanning apparatus and defect inspection system able to detect a defect with a high resolution and able to greatly shorten the inspection time. An radiation beam generated from a light source is converted to a light beam array of an m×n matrix by a two-dimensional diffraction grating. The light beams of the light beam array are focused into micro spots by an objective lens and projected on a sample. Therefore, a two-dimensional light spot array of an m×n matrix is formed on a sample. The sample stage rotates and moves rectilinearly in an r direction, so the sample surface is scanned by the m×n matrix of light spots. As a result, the sample surface is spirally scanned by a light beam of a belt shape of the scan width, so can be scanned at a high speed.

Abstract: Disclosed is a light source device capable of further enhancing an effective pulse rate. A light source device according to the present invention comprises: a plurality of light sources (1a to 1h) emitting radiation light; a rotating reflection body (2) having one or more reflection surfaces (2a) and emitting the radiation light emitted from the respective light sources (1a to 1h) along an optical path (L) common to the light sources; a position detecting device (5) detecting a position of the reflection surface (2a) of the rotating reflection body (2); a timing control circuit (6) generating a synchronization signal for driving the plurality of light sources in synchronization with the position of the rotating reflection body based on an output signal from the position detecting device; and a power supply circuit (7) sequentially pulse-driving the light sources based on an output signal from the timing control circuit.

Abstract: A laser microscope for picking up an image of a specimen at a high speed and a pattern checking apparatus for checking a pattern at a high speed with a high sensitivity can be provided. A plurality of light beams aligned in a first direction are produced from a light source device (1, 10), and these light beams are projected onto a specimen (7, 30) by an objective lens (6, 29) to form a light spot array on the specimen. The specimen is moved in a direction perpendicular to the light spot array or the light beams are moved by a beam deflecting device in said direction to scan the specimen two-dimensionally. Light beams emanating from the light spots on the specimen are made incident upon corresponding light receiving elements of a linear image sensor (11, 33). In case of checking periodic patterns such as memory cell patterns, a pitch of the light spots is corresponded to a pitch of the patterns, and defects in the patterns can be detected by comparing output signals from respective light receiving elements.

Abstract: A laser microscope for picking up an image of a specimen at a high speed and a pattern checking apparatus for checking a pattern at a high speed with a high sensitivity can be provided. A plurality of light beams aligned in a first direction are produced from a light source device (1, 10), and these light beams are projected onto a specimen (7, 30) by an objective lens (6, 29) to form a light spot array on the specimen. The specimen is moved in a direction perpendicular to the light spot array or the light beams are moved by a beam deflecting device in said direction to scan the specimen two-dimensionally. Light beams emanating from the light spots on the specimen are made incident upon corresponding light receiving elements of a linear image sensor (11, 33). In case of checking periodic patterns such as memory cell patterns, a pitch of the light spots is corresponded to a pitch of the patterns, and defects in the patterns can be detected by comparing output signals from respective light receiving elements.

Abstract: A pellicle stripping apparatus includes a supporting section for supporting a photomask, the supporting section having gripping portions for gripping at least two edges of a pellicle frame of a pellicle adhered to the photomask; and a steam generating section for generating high temperature steam and contacting the pellicle adhered to the photomask with the steam, the steam generating section including a container having a steam vent directly opposite a portion of the pellicle adhered to the photomask and a heater for boiling water in the container.

Abstract: An interferometer of Mach-Zehnder type includes a first half mirror dividing an entrance light flux into first and second light fluxes, a first reflection mirror reflecting the first light flux toward a second half mirror, and a second reflection mirror reflecting the second light flux toward the second half mirror. At the second half mirror, the first and second light fluxes are mixed to derive an exit light flux including interference fringes. The first half mirror and first reflection mirror are secured to opposing side walls of a first hollow supporting block made of ceramics, and the second half mirror and second reflection mirror are secured to a second hollow supporting blocks made of ceramics. The first and second supporting blocks are coupled with each other at their side walls and an assembly of the supporting blocks is mounted on a surface of an optical bench by means of kinetic mounts.

Abstract: An electron beam exposing apparatus permitting the temperature of mask to be constant without affecting an electron beam. Keeping the temperature of a stencil mask 81 constant permits the position and form of an opening 69 to be constant. The temperature of a stencil mask 81 is measured by a thermal radiation to temperature transducer 72, and the magnitude of the output of a laser generator 89 is controlled by a control portion 70 based on the temperature data. A magnetic field affecting the flow of the electron beam 79 is not generated by emitting a laser beam 93.

Abstract: A method and apparatus are provided for obtaining accurately an amount of phase shift and light transmittance in a phase shift mask by a phase shifting portion. A shearing type Mach-Zehnder interferometer is constructed using an optical member for ultraviolet light. Using light having a wavelength identical to that of light used in photolithography, light transmitted through a phase shifting portion interferes with light transmitted through a light transmitting portion, resulting in an interference light intensity signal. From the interference light intensity signal, an amount of phase shifting and light transmittance of the phase shifting portion can be obtained directly and non-destructively.

Abstract: A light-shielding pattern including light-shielding regions and an aperture therebetween is formed on a substrate. The substrate and the light-shielding pattern are then coated with conductive film. The conductive film is thereafter patterned, defining a conductive pattern. Next, a phase-shifting film and a resist film are deposited in this order on the substrate, the light-shielding pattern and the conductive pattern. Following this, a light beam is illuminated toward the bottom surface of the substrate and developed, thereby defining a resist pattern. The phase-shifting film is thereafter selectively etched with the resist pattern as an etching mask. As a result, a phase-shifter is obtained. Thus, the conductive pattern not only acts as an etching stopper but also prevents the substrate from getting charged. Hence, a phase-shifting mask is manufactured accurately.