Patents by Inventor Haruna Kawashima
Haruna Kawashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10216092Abstract: A light source apparatus including a light source configured to emit a light flux from an emission region having a predetermined size and a rotationally symmetrical emission intensity distribution; and a condenser configured to condense the light flux to allow the light flux to exit to the outside. The condenser is rotationally symmetrical about an optical axis and is disposed to surround the emission region, and has four or more reflection mirrors each having a reflecting surface for reflecting the light flux emitted from the emission region. The reflection mirrors include elliptical surface reflection mirrors where the reflecting surface is elliptical and spherical surface reflection mirrors where the reflecting surface is spherical, and are alternately arranged in the direction of the optical axis, and a light flux reflected by one spherical surface reflection mirror is further reflected by one elliptical surface reflection mirror oppositely disposed across the emission region.Type: GrantFiled: January 6, 2017Date of Patent: February 26, 2019Assignee: CANON KABUSHIKI KAISHAInventor: Haruna Kawashima
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Patent number: 9772560Abstract: A light source apparatus including a light source configured to emit a light flux from an emission region having a predetermined size and a rotationally symmetrical emission intensity distribution; and a condenser configured to condense the light flux to allow the light flux to exit to the outside. The condenser is rotationally symmetrical about an optical axis and is disposed to surround the emission region, and has four or more reflection mirrors each having a reflecting surface for reflecting the light flux emitted from the emission region. The reflection mirrors include elliptical surface reflection mirrors where the reflecting surface is elliptical and spherical surface reflection mirrors where the reflecting surface is spherical, and are alternately arranged in the direction of the optical axis, and a light flux reflected by one spherical surface reflection mirror is further reflected by one elliptical surface reflection mirror oppositely disposed across the emission region.Type: GrantFiled: July 31, 2015Date of Patent: September 26, 2017Assignee: CANON KABUSHIKI KAISHAInventor: Haruna Kawashima
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Publication number: 20170123321Abstract: A light source apparatus including a light source configured to emit a light flux from an emission region having a predetermined size and a rotationally symmetrical emission intensity distribution; and a condenser configured to condense the light flux to allow the light flux to exit to the outside. The condenser is rotationally symmetrical about an optical axis and is disposed to surround the emission region, and has four or more reflection mirrors each having a reflecting surface for reflecting the light flux emitted from the emission region. The reflection mirrors include elliptical surface reflection mirrors where the reflecting surface is elliptical and spherical surface reflection mirrors where the reflecting surface is spherical, and are alternately arranged in the direction of the optical axis, and a light flux reflected by one spherical surface reflection mirror is further reflected by one elliptical surface reflection mirror oppositely disposed across the emission region.Type: ApplicationFiled: January 6, 2017Publication date: May 4, 2017Inventor: Haruna Kawashima
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Publication number: 20160041472Abstract: A light source apparatus including a light source configured to emit a light flux from an emission region having a predetermined size and a rotationally symmetrical emission intensity distribution; and a condenser configured to condense the light flux to allow the light flux to exit to the outside. The condenser is rotationally symmetrical about an optical axis and is disposed to surround the emission region, and has four or more reflection mirrors each having a reflecting surface for reflecting the light flux emitted from the emission region. The reflection mirrors include elliptical surface reflection mirrors where the reflecting surface is elliptical and spherical surface reflection mirrors where the reflecting surface is spherical, and are alternately arranged in the direction of the optical axis, and a light flux reflected by one spherical surface reflection mirror is further reflected by one elliptical surface reflection mirror oppositely disposed across the emission region.Type: ApplicationFiled: July 31, 2015Publication date: February 11, 2016Inventor: Haruna Kawashima
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Patent number: 8164754Abstract: An immersion exposure apparatus including an optical element 11, a reflective surface 42, a water repellent coating layer 43 in which peeled areas 45 and 46 are formed, a light intensity sensor 4 which detects light intensity of first light and second light, and an arithmetic processing unit which calculates a reflectance of the optical element 11, wherein the first light enters the projection optical system 1, passes through the peeled area 46 to be reflected by the reflective surface 42, is reflected on a surface of the optical element 11, and passes through the peeled area 45 to be received by the light intensity sensor 4, and the second light enters the projection optical system 1 and passes through the peeled area 45 to be received by the light intensity sensor 4 without being reflected on the reflective surface 42 and the surface of the optical element 11.Type: GrantFiled: April 28, 2009Date of Patent: April 24, 2012Assignee: Canon Kabushiki KaishaInventors: Haruna Kawashima, Nobuyuki Saito
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Patent number: 8077288Abstract: An exposure apparatus for exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate via a projection optical system includes an illumination optical system for illuminating the reticle via a slit that has a longitudinal direction corresponding to a direction orthogonal to a scanning direction. The illumination optical system includes a corrector for correcting a slit width at each position in the longitudinal direction of the slit. The corrector is arranged at a position conjugate with the reticle, and includes a first optical filter movable in a direction corresponding to the longitudinal direction of the slit.Type: GrantFiled: December 6, 2006Date of Patent: December 13, 2011Assignee: Canon Kabushiki KaishaInventor: Haruna Kawashima
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Patent number: 7880862Abstract: An exposure apparatus comprising a projection optical system configured to project a pattern image of an original onto a substrate, and a sensor configured to detect light emerging from the projection optical system, the sensor including a light receiving element having a light receiving surface, and an optical member having a reflection surface which reflects the light emerging from the projection optical system toward the light receiving surface, wherein the reflection surface forms an acute angle with respect to the light receiving surface.Type: GrantFiled: December 19, 2007Date of Patent: February 1, 2011Assignee: Canon Kabushiki KaishaInventors: Nobuyuki Saito, Haruna Kawashima
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Publication number: 20100002209Abstract: An exposure apparatus comprises an optical system configured to illuminate a reticle, including an imaging optical system having an optical element, a reflecting surface which reflects light toward the optical element, and a processor which extracts information from a first signal based on first light which is incident on the imaging optical system and reflected by the reflecting surface and a surface of the optical element, and information from a second signal based on second light which is incident on the imaging optical system, and which obtains information indicating a surface condition of the optical element using the information extracted from the first and second signals.Type: ApplicationFiled: July 6, 2009Publication date: January 7, 2010Applicant: CANON KABUSHIKI KAISHAInventors: Haruna Kawashima, Nobuyuki Saito
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Patent number: 7630058Abstract: This invention provides an exposure apparatus which exposes a substrate (51) with a pattern formed on a reticle (3), and includes a projection optical system (1) including an optical element (11-14) and a reflecting surface (42) which reflects light toward the projection optical system (1). The exposure apparatus further includes a processor (P) which obtains information indicating a surface condition of the optical element (11-14) based on first light which is incident on the projection optical system (1) and reflected by the reflecting surface (42) and a surface of the optical element (11-14) and second light which is incident on the projection optical system (1) and not reflected by the reflecting surface (42) and the surface of the optical element (11-14).Type: GrantFiled: July 25, 2008Date of Patent: December 8, 2009Assignee: Canon Kabushiki KaishaInventors: Haruna Kawashima, Nobuyuki Saito
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Patent number: 7619716Abstract: An exposure method includes the steps of exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate, and by illuminating an illumination area having a slit shape on the reticle using a light from a light source, the slit shape having a longitudinal direction corresponding to a direction orthogonal to a scanning direction, and correcting an accumulated illuminance in the scanning direction at each position of the illumination area in the longitudinal direction, wherein the correcting step includes the steps of calculating a first illuminance correction amount common to plural areas on the substrate, the pattern being to be transferred to each area, and calculating a second illuminance correction amount intrinsic to each area, the correcting step correcting the accumulated illuminance based on the first and second illuminance correction amounts.Type: GrantFiled: December 6, 2006Date of Patent: November 17, 2009Assignee: Canon Kabushiki KaishaInventors: Haruna Kawashima, Ayako Kadono
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Publication number: 20090268176Abstract: An immersion exposure apparatus including an optical element 11, a reflective surface 42, a water repellent coating layer 43 in which peeled areas 45 and 46 are formed, a light intensity sensor 4 which detects light intensity of first light and second light, and an arithmetic processing unit which calculates a reflectance of the optical element 11, wherein the first light enters the projection optical system 1, passes through the peeled area 46 to be reflected by the reflective surface 42, is reflected on a surface of the optical element 11, and passes through the peeled area 45 to be received by the light intensity sensor 4, and the second light enters the projection optical system 1 and passes through the peeled area 45 to be received by the light intensity sensor 4 without being reflected on the reflective surface 42 and the surface of the optical element 11.Type: ApplicationFiled: April 28, 2009Publication date: October 29, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Haruna Kawashima, Nobuyuki Saito
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Patent number: 7525656Abstract: An exposure apparatus includes a reticle stage for supporting a reticle, an illumination optical system for illuminating the reticle, a projection optical system for projecting an image of a pattern of the reticle onto a substrate, a polarization state measuring part for measuring a polarization state, and an optical unit, supported by the reticle stage exchangeable for the reticle, for introducing a light from the illumination optical system to the polarization state measuring part, wherein said polarization state measuring part includes a phase shifter, a polarization element, and a light detector for detecting the light from the illumination optical system via the phase shifter and the polarization element.Type: GrantFiled: August 10, 2006Date of Patent: April 28, 2009Assignee: Canon Kabushiki KaishaInventors: Ayako Kadono, Haruna Kawashima
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Publication number: 20090033904Abstract: This invention provides an exposure apparatus which exposes a substrate (51) with a pattern formed on a reticle (3), and includes a projection optical system (1) including an optical element (11-14) and a reflecting surface (42) which reflects light toward the projection optical system (1). The exposure apparatus further includes a processor (P) which obtains information indicating a surface condition of the optical element (11-14) based on first light which is incident on the projection optical system (1) and reflected by the reflecting surface (42) and a surface of the optical element (11-14) and second light which is incident on the projection optical system (1) and not reflected by the reflecting surface (42) and the surface of the optical element (11-14).Type: ApplicationFiled: July 25, 2008Publication date: February 5, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Haruna Kawashima, Nobuyuki Saito
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Publication number: 20080151251Abstract: An exposure apparatus comprising a projection optical system configured to project a pattern image of an original onto a substrate, and a sensor configured to detect light emerging from the projection optical system, the sensor including a light receiving element having a light receiving surface, and an optical member having a reflection surface which reflects the light emerging from the projection optical system toward the light receiving surface, wherein the reflection surface forms an acute angle with respect to the light receiving surface.Type: ApplicationFiled: December 19, 2007Publication date: June 26, 2008Applicant: CANON KABUSHIKI KAISHAInventors: Nobuyuki Saito, Haruna Kawashima
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Publication number: 20070132978Abstract: An exposure apparatus for exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate via a projection optical system includes an illumination optical system for illuminating the reticle via a slit that has a longitudinal direction corresponding to a direction orthogonal to a scanning direction. The illumination optical system includes a corrector for correcting a slit width at each position in the longitudinal direction of the slit. The corrector is arranged at a position conjugate with the reticle, and includes a first optical filter movable in a direction corresponding to the longitudinal direction of the slit.Type: ApplicationFiled: December 6, 2006Publication date: June 14, 2007Inventor: Haruna Kawashima
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Publication number: 20070132981Abstract: An exposure method includes the steps of exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate, and by illuminating an illumination area having a slit shape on the reticle using a light from a light source, the slit shape having a longitudinal direction corresponding to a direction orthogonal to a scanning direction, and correcting an accumulated illuminance in the scanning direction at each position of the illumination area in the longitudinal direction, wherein the correcting step includes the steps of calculating a first illuminance correction amount common to plural areas on the substrate, the pattern being to be transferred to each area, and calculating a second illuminance correction amount intrinsic to each area, the correcting step correcting the accumulated illuminance based on the first and second illuminance correction amounts.Type: ApplicationFiled: December 6, 2006Publication date: June 14, 2007Inventors: Haruna KAWASHIMA, Ayako Kadono
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Publication number: 20070046922Abstract: An exposure apparatus includes a reticle stage for supporting a reticle, an illumination optical system for illuminating the reticle, a projection optical system for projecting an image of a pattern of the reticle onto a substrate, a polarization state measuring part for measuring a polarization state, and an optical unit, supported by the reticle stage exchangeable for the reticle, for introducing a light from the illumination optical system to the polarization state measuring part, wherein said polarization state measuring part includes a phase shifter, a polarization element, and a light detector for detecting the light from the illumination optical system via the phase shifter and the polarization element.Type: ApplicationFiled: August 10, 2006Publication date: March 1, 2007Inventors: Ayako KADONO, Haruna Kawashima
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Patent number: 7145635Abstract: An exposure apparatus includes a projection optical system for projecting a pattern on a mask onto an object to be exposed, a final surface of the projection optical system and a surface of the object immersed in a fluid, and a plane-parallel plate arranged between the projection optical system and the object. The plane-parallel plate includes a first surface and a second surface that serves as a back surface of the first surface and opposes to the object. Both the first and second surfaces are immersed in the fluid and the plane-parallel plate has an antireflection coating that is designed according to an incident light at an angle corresponding to a numerical aperture of the projection optical system.Type: GrantFiled: December 22, 2004Date of Patent: December 5, 2006Assignee: Canon Kabushiki KaishaInventor: Haruna Kawashima
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Patent number: D526217Type: GrantFiled: June 27, 2005Date of Patent: August 8, 2006Assignee: Casio Keisanki Kabushiki KaishaInventor: Haruna Kawashima
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Patent number: D569293Type: GrantFiled: June 27, 2005Date of Patent: May 20, 2008Assignee: Casio Keisanki Kabushiki KaishaInventors: Shigeru Hanagata, Shinichiro Oshita, Haruna Kawashima