Patents by Inventor Henricus Jozef Castelijns

Henricus Jozef Castelijns has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS, COVERPLATE AND DEVICE MANUFACTURING METHOD
    Publication number: 20110069289
    Abstract: An immersion lithographic apparatus, including: first and second objects which are spaced apart with a gap therebetween and on whose top surfaces immersion liquid is provided; and a gutter positioned under the gap and configured to collect any immersion liquid which passes through the gap, wherein an advancing contact angle of immersion liquid with surfaces of the first and second objects defining the gap is less than 30°.
    Type: Application
    Filed: September 20, 2010
    Publication date: March 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas Ten Kate, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns
  • IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100283981
    Abstract: In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.
    Type: Application
    Filed: May 6, 2010
    Publication date: November 11, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Laurentius Johannes Adrianus Van Bokhoven, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre, Henricus Jozef Castelijns, Petrus Martinus Gerardus Johannes Arts
  • LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING AN ARTICLE FOR A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100060870
    Abstract: A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn where A is an element from Group 2 of the Periodic Table; or TiO2 doped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.
    Type: Application
    Filed: September 8, 2009
    Publication date: March 11, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nina Vladimirovna DZIOMKINA, Nicolaas TEN KATE, Sandra VAN DER GRAAF, Henricus Jozef CASTELIJNS
  • SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090296068
    Abstract: A table is disclosed in which an opening is provided for the provision of immersion fluid onto a top surface of the table. In an embodiment, there are two such openings. The first of the openings surrounds a substrate support of the table and the second of the openings extends around an outer edge of the table.
    Type: Application
    Filed: June 1, 2009
    Publication date: December 3, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Henricus Jozef CASTELIJNS, Nicolaas Ten Kate, Sergei Shulepov, Petrus Martinus Gerardus Johannes Arts