Patents by Inventor Henricus Petrus Maria Pellemans
Henricus Petrus Maria Pellemans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240094643Abstract: A method for measuring a parameter of interest from a target and associated apparatuses. The method includes obtaining measurement acquisition data relating to measurement of the target and finite-size effect correction data and/or a trained model operable to correct for at least finite-size effects in the measurement acquisition data. At least finite-size effects in the measurement acquisition data is corrected for using the finite-size effect correction data and/or the trained model to obtain corrected measurement data and/or obtain a parameter of interest; and where the correcting does not directly determine the parameter of interest, determining the parameter of interest from the corrected measurement data.Type: ApplicationFiled: December 20, 2021Publication date: March 21, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Filippo ALPEGGIANI, Harm Jan Willem BELT, Sebatianus Adrianus GOORDEN, Irwan Dani SETIJA, Simon Reinald HUISMAN, Henricus Petrus Maria PELLEMANS
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Publication number: 20240044639Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.Type: ApplicationFiled: October 13, 2023Publication date: February 8, 2024Applicant: ASML Netherlands B.V.Inventors: Henricus Petrus Maria PELLEMANS, Arie Jeffrey DEN BOEF
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Publication number: 20240027913Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).Type: ApplicationFiled: December 2, 2021Publication date: January 25, 2024Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Sergei SOKOLOV, Simon Reinald HUISMAN, Jin LIAN, Sebastianus Adrianus GOORDEN, Muhsin ERALP, Henricus Petrus Maria PELLEMANS, Justin Lloyd KREUZER
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Patent number: 11828585Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.Type: GrantFiled: March 11, 2022Date of Patent: November 28, 2023Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Arie Jeffrey Den Boef
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Publication number: 20220397832Abstract: Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.Type: ApplicationFiled: October 19, 2020Publication date: December 15, 2022Applicant: ASML Netherlands B.V.Inventors: Filippo ALPEGGIANI, Henricus Petrus Maria PELLEMANS, Sebastianus Adrianus GOORDEN, Simon Reinald HUISMAN
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Patent number: 11525786Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: March 4, 2021Date of Patent: December 13, 2022Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cédric Désiré Grouwstra, Markus Gerardus Martinus Maria Van Kraaij
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Patent number: 11428925Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.Type: GrantFiled: December 31, 2019Date of Patent: August 30, 2022Assignee: ASML Netherlands B.V.Inventors: Arjan Johannes Anton Beukman, Alessandro Polo, Henricus Petrus Maria Pellemans, Nitish Kumar
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Patent number: 11372343Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.Type: GrantFiled: February 14, 2020Date of Patent: June 28, 2022Assignee: ASML Netherlands B.V.Inventors: Henricus Martinus Johannes Van De Groes, Johannes Hubertus Antonius Van De Rijdt, Marcel Pieter Jacobus Peeters, Chien-Hung Tseng, Henricus Petrus Maria Pellemans
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Publication number: 20220196393Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.Type: ApplicationFiled: March 11, 2022Publication date: June 23, 2022Inventors: Henricus Petrus Maria PELLEMANS, Arie Jeffrey DEN BOEF
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Patent number: 11360399Abstract: Disclosed is a metrology device (1600) configured to produce measurement illumination comprising a plurality of illumination beams, each of said illumination beams being spatially incoherent or pseudo-spatially incoherent and comprising multiple pupil points in an illumination pupil of the metrology device. Each pupil point in each one of said plurality of illumination beams has a corresponding pupil point in at least one of the other illumination beams of said plurality of illumination beams thereby defining multiple sets of corresponding pupil points, and the pupil points of each set of corresponding pupil points are spatially coherent with respect to each other.Type: GrantFiled: August 27, 2019Date of Patent: June 14, 2022Assignee: ASML Netherlands B.V.Inventors: Sebastianus Adrianus Goorden, Simon Reinald Huisman, Simon Gijsbert Josephus Mathijssen, Henricus Petrus Maria Pellemans
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Patent number: 11307024Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.Type: GrantFiled: March 12, 2020Date of Patent: April 19, 2022Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Arie Jeffrey Den Boef
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Publication number: 20220100107Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.Type: ApplicationFiled: February 14, 2020Publication date: March 31, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Henricus Martinus Johannes VAN DE GROES, Johannes Hubertus Antonius VAN DE RIJDT, Marcel Pieter Jacobus PEETERS, Chien-Hung TSENG, Henricus Petrus Maria PELLEMANS
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Publication number: 20220035257Abstract: Disclosed is a metrology device (1600) configured to produce measurement illumination comprising a plurality of illumination beams, each of said illumination beams being spatially incoherent or pseudo-spatially incoherent and comprising multiple pupil points in an illumination pupil of the metrology device. Each pupil point in each one of said plurality of illumination beams has a corresponding pupil point in at least one of the other illumination beams of said plurality of illumination beams thereby defining multiple sets of corresponding pupil points, and the pupil points of each set of corresponding pupil points are spatially coherent with respect to each other.Type: ApplicationFiled: August 27, 2019Publication date: February 3, 2022Applicant: ASML Netherlands B.V.Inventors: Sebastianus Adrianus GOORDEN, Simon Reinald HUISMAN, Simon Gijsbert Josephus MATHIJSSEN, Henricus Petrus Maria PELLEMANS
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Publication number: 20210208083Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: ApplicationFiled: March 4, 2021Publication date: July 8, 2021Applicant: ASML Netherlands B.V.Inventors: Arie Jeffrey DEN BOEF, Amo Jan BLEEKER, Youri Johannes VAN DOMMELEN, Mircea DUSA, Antoine Gaston Marie KIERS, Paul Frank LUEHRMANN, Henricus Petrus Maria PELLEMANS, Maurits VAN DER SCHAAR, Cédric Désiré GROUWSTRA, Markus Geradus Maritinus VAN KRAAIJ
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Patent number: 10955353Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: February 7, 2019Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Maria Van Kraaij
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Publication number: 20200217648Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern, Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.Type: ApplicationFiled: March 12, 2020Publication date: July 9, 2020Applicant: ASML Netherlands B.V.Inventors: Henricus Petrus Maria PELLEMANS, Arie Jeffrey DEN BOEF
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Publication number: 20200209608Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.Type: ApplicationFiled: December 31, 2019Publication date: July 2, 2020Applicant: ASML Netherlands B.V.Inventors: Arjan Johannes Anton Beukman, Alessandro Polo, Henricus Petrus Maria Pellemans, Nitish Kumar
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Patent number: 10591283Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.Type: GrantFiled: October 23, 2018Date of Patent: March 17, 2020Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Arie Jeffrey Den Boef
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Publication number: 20190170657Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: ApplicationFiled: February 7, 2019Publication date: June 6, 2019Applicant: ASML Netherlands B.V.Inventors: Arie Jeffrey Maria DEN BOEF, Arno Jan BLEEKER, Youri Johannes Laurentiu VAN DOMMELEN, Mircea DUSA, Antoine Gaston Marie KIERS, Paul Frank LUEHRMANN, Henricus Petrus Maria PELLEMANS, Maurits VAN DER SCHAAR, Cedric Desire GROUWSTRA, Markus Gerardus Martinus VAN KRAAIJ
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Patent number: 10241055Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: April 29, 2014Date of Patent: March 26, 2019Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij