Patents by Inventor Henricus Petrus Maria Pellemans
Henricus Petrus Maria Pellemans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190056216Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.Type: ApplicationFiled: October 23, 2018Publication date: February 21, 2019Applicant: ASML Netherland B.V.Inventors: Henricus Petrus Maria PELLEMANS, Arie Jeffrey Den Boef
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Patent number: 10209061Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.Type: GrantFiled: March 6, 2018Date of Patent: February 19, 2019Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Arie Jeffrey Den Boef
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Publication number: 20180195857Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.Type: ApplicationFiled: March 6, 2018Publication date: July 12, 2018Applicant: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Arie Jeffrey Den Boef
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Patent number: 9933250Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a scatterometer configured to measure a property of the substrate. The scatterometer includes a radiation source configured to produce a radiated spot on a target on the substrate, where the radiated spot includes positions on the target. The scatterometer further includes a detector configured to generate measurement signals that correspond to respective ones of the positions of the radiated spot and a processor configured to output, based on the measurement signals, a single value that is representative of the property of the substrate.Type: GrantFiled: November 10, 2014Date of Patent: April 3, 2018Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Arie Jeffrey Den Boef
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Patent number: 9921489Abstract: An inspection apparatus (300) includes a focus monitoring arrangement (500, 500?). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.Type: GrantFiled: September 28, 2015Date of Patent: March 20, 2018Assignee: ASML Netherlands B.V.Inventors: Amandev Singh, Henricus Petrus Maria Pellemans
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Patent number: 9753379Abstract: Inspection apparatus (100) is used for measuring parameters of targets on a substrate. Coherent radiation follows an illumination path (solid rays) for illuminating target (T). A collection path (dashed rays) collects diffracted radiation from the target and delivers it to a lock-in image detector (112). A reference beam following a reference path (dotted rays). An acousto-optical modulator (108) shifts the optical frequency of the reference beam so that the intensity of radiation at the lock-in detector includes a time-varying component having a characteristic frequency corresponding to a difference between the frequencies of the diffracted radiation and the reference radiation. The lock-in image detector records two-dimensional image information representing both amplitude and phase of the time-varying component. A second reference beam with a different shift (110) follows a second reference path (dot-dash rays). Interference between the two reference beams can be used for intensity normalization.Type: GrantFiled: July 8, 2015Date of Patent: September 5, 2017Assignee: ASML Netherlands B.V.Inventors: Amandev Singh, Henricus Petrus Maria Pellemans, Patrick Warnaar
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Patent number: 9357626Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.Type: GrantFiled: November 20, 2014Date of Patent: May 31, 2016Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Johannes Matheus Marie De Wit, Ralph Jozef Johannes Gerardus Anna Maria Smeets, Gerbrand Van Der Zouw
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Publication number: 20160097984Abstract: An inspection apparatus (300) includes a focus monitoring arrangement (500, 500?). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.Type: ApplicationFiled: September 28, 2015Publication date: April 7, 2016Applicant: ASML Netherlands B.V.Inventors: Amandev SINGH, Henricus Petrus Maria PELLEMANS
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Publication number: 20160011523Abstract: Inspection apparatus (100) is used for measuring parameters of targets on a substrate. Coherent radiation follows an illumination path (solid rays) for illuminating target (T). A collection path (dashed rays) collects diffracted radiation from the target and delivers it to a lock-in image detector (112). A reference beam following a reference path (dotted rays). An acousto-optical modulator (108) shifts the optical frequency of the reference beam so that the intensity of radiation at the lock-in detector includes a time-varying component having a characteristic frequency corresponding to a difference between the frequencies of the diffracted radiation and the reference radiation. The lock-in image detector records two-dimensional image information representing both amplitude and phase of the time-varying component. A second reference beam with a different shift (110) follows a second reference path (dot-dash rays). Interference between the two reference beams can be used for intensity normalization.Type: ApplicationFiled: July 8, 2015Publication date: January 14, 2016Applicant: ASML Netherlands B.V.Inventors: Amandev SINGH, Henricus Petrus Maria Pellemans, Patrick Warnaar
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Patent number: 9158194Abstract: An approach is used to estimate and correct the overlay variation as function of offset for each measurement. A target formed on a substrate includes periodic gratings. The substrate is illuminated with a circular spot on the substrate with a size larger than each grating. Radiation scattered by each grating is detected in a dark-field scatterometer to obtain measurement signals. The measurement signals are used to calculate overlay. The dependence (slope) of the overlay as a function of position in the illumination spot is determined. An estimated value of the overlay at a nominal position such as the illumination spot's center can be calculated, correcting for variation in the overlay as a function of the target's position in the illumination spot. This compensates for the effect of the position error in the wafer stage movement, and the resulting non-centered position of the target in the illumination spot.Type: GrantFiled: September 27, 2012Date of Patent: October 13, 2015Assignee: ASML Netherlands B.V.Inventors: Armand Eugene Albert Koolen, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Peter Clement Paul Vanoppen, Michael Kubis
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Patent number: 9128065Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.Type: GrantFiled: April 1, 2014Date of Patent: September 8, 2015Assignee: ASML Netherlands B.V.Inventors: Hugo Augustinus Joseph Cramer, Antoine Gaston Marie Kiers, Henricus Petrus Maria Pellemans
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Publication number: 20150131076Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a scatterometer configured to measure a property of the substrate. The scatterometer includes a radiation source configured to produce a radiated spot on a target on the substrate, where the radiated spot includes positions on the target. The scatterometer further includes a detector configured to generate measurement signals that correspond to respective ones of the positions of the radiated spot and a processor configured to output, based on the measurement signals, a single value that is representative of the property of the substrate.Type: ApplicationFiled: November 10, 2014Publication date: May 14, 2015Applicant: ASML Netherlands B.V.Inventors: Henricus Petrus Maria PELLEMANS, Arie Jeffrey DEN BOEF
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Publication number: 20150108373Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.Type: ApplicationFiled: November 20, 2014Publication date: April 23, 2015Applicant: ASML Netherlands B.V.Inventors: Henricus Petrus Maria PELLEMANS, Pavel Stanislavovich ANTSIFEROV, Vladimir Mihailovitch KRIVTSUN, Johannes Matheus Marie DE WIT, Ralph Jozef Johannes Gerardus Anna Maria SMEETS, Gerbrand VAN DER ZOUW
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Patent number: 8921814Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.Type: GrantFiled: May 24, 2013Date of Patent: December 30, 2014Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Johannes Matheus Marie De Wit, Ralph Josef Johannes Gerardus Anna M Smeets, Gerbrand Van Der Zouw
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Patent number: 8885150Abstract: A scatterometer, configured to measure a property of a substrate, includes a radiation source which produces a radiation spot on a target formed on the surface of the substrate, the size of the radiation spot being smaller than the target in one direction along the target, the position of the radiation spot being moved along the surface in a series of discrete steps. A detector detects a spectrum of the radiation beam reflected from the target and produces measurement signals representative of the spectrum corresponding to each position of the radiation spot. A processor processes the measurement signals produced by the detector corresponding to each position of the radiation spot and derives a single value for the property.Type: GrantFiled: February 18, 2009Date of Patent: November 11, 2014Assignee: ASML Netherlands B.V.Inventors: Henricus Petrus Maria Pellemans, Arie Jeffrey Den Boef
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Patent number: 8830472Abstract: A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate.Type: GrantFiled: March 30, 2009Date of Patent: September 9, 2014Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Marcus Adrianus Van De Kerkhof, Henricus Petrus Maria Pellemans, Martin Ebert
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Publication number: 20140233025Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: ApplicationFiled: April 29, 2014Publication date: August 21, 2014Applicant: ASML Netherlands B.V.Inventors: Arie Jeffrey Maria DEN BOEF, Arno Jan BLEEKER, Youri Johannes Laurentius Maria VAN DOMMELEN, Mircea DUSA, Antoine Gaston Marie KIERS, Paul Frank LUEHRMANN, Henricus Petrus Maria PELLEMANS, Maurits VAN DER SCHAAR, Cedric Desire GROUWSTRA, Markus Gerardus Martinus VAN KRAAIJ
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Publication number: 20140211185Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.Type: ApplicationFiled: April 1, 2014Publication date: July 31, 2014Applicant: ASML Netherlands B.V.Inventors: Hugo Augustinus Joseph Cramer, Antoine Gaston Marie Kiers, Henricus Petrus Maria Pellemans
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Patent number: 8760662Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: August 27, 2013Date of Patent: June 24, 2014Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cédric Désiré Grouwstra, Markus Gerardus Martinus Maria Van Kraaij
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Patent number: 8705007Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.Type: GrantFiled: January 20, 2010Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Hugo Augustinus Joseph Cramer, Antoine Gaston Marie Kiers, Henricus Petrus Maria Pellemans