Abstract: Techniques are presented to reduce the amount of read disturb on partially written blocks of NAND type non-volatile memory, both for when determining the last written word line in a block and also for data read. In both cases, non-selected word lines that are unwritten or, in the case of finding the last written word line, may be unwritten are biased with a lower read-pass voltage then is typically used. The result of such reads can also be applied to an algorithm for finding the last written word by skipping a varying number of word lines. Performance in a last written page determination can also be improved by use of shorter bit line settling times than for a standard read.

Abstract: A number of complimentary techniques for the read scrub process using adaptive counter management are presented. In one set of techniques, in addition to maintaining a cumulative read counter for a block, a boundary word line counter can also be maintained to track the number of reads to most recently written word line or word lines of a partially written block. Another set of techniques used read count threshold values that vary with the number of program/erase cycles that a block has undergone. Further techniques involve setting the read count threshold for a closed (fully written) block based upon the number reads it experienced prior to being closed. These techniques can also be applied at a sub-block, zone level.

Abstract: A memory system or flash card may be exposed to elapsed time or increased temperature conditions which may degrade the memory. For example, extended time periods or high temperature conditions may hinder data retention in a memory device. An estimate of elapsed time and temperature conditions may be useful for memory management. An algorithm that periodically identifies one or more sentinel blocks in the memory device and measures the data retention shift in those sentinel blocks can calculate a scalar value that approximates the combined effect of elapsed time and/or temperature conditions.

Abstract: A storage module and method are provided for using healing effects of a quarantine process. In one embodiment, a storage module is provided comprising a controller and a memory. The controller is configured to identify a set of memory cells in the memory that contains a bit error rate above a threshold, wherein the bit error rate is above the threshold due to trapped charge in dielectrics of the memory cells. The controller is also configured to quarantine the set of memory cells for a period of time, wherein while the set of memory cells is quarantined, heat generated by the storage module anneals the set of memory cells to at least partially remove the trapped charge.

Abstract: When programming a set of non-volatile storage elements using a multi-stage programming process, a series of programming pulses are used for each stage. The magnitude of the initial program pulse for the current stage being performed is dynamically set as a function of the number of program pulses used for the same stage of the multi-stage programming process when programming non-volatile storage elements connected to on one or more previously programmed word lines.

Abstract: Techniques are disclosed herein for erasing non-volatile storage. The erase has two or more phases. The first phase includes erasing a group of non-volatile storage elements at a first speed until the group of non-volatile storage elements pass a first verify level. The second phase is performed after the group of non-volatile storage elements pass the first verify level. The second phase includes erasing the group of non-volatile storage elements at a second speed that is less than the first speed until the group of non-volatile storage elements pass a second verify level that is lower than the first verify level. Erasing at the first speed results in a fast erase without significant risk of over-erasing the storage elements. Erasing at the second speed during the second phase prevents or reduces over-erasure which could damage the storage elements.

Abstract: A method of making a monolithic three dimensional NAND string, including providing a stack of alternating first material layers and second material layers different from the first material layer over a substrate, the stack comprising at least one opening containing a charge storage material comprising a silicide layer, a tunnel dielectric on the charge storage material in the at least one opening, and a semiconductor channel on the tunnel dielectric in the at least one opening, selectively removing the second material layers without removing the first material layers from the stack and forming control gates between the first material layers.

Abstract: Non-volatile storage systems, and methods for programming non-volatile storage elements of non-volatile storage systems, are described herein. A method for programming a non-volatile storage element includes performing a plurality of program-verify iterations for the non-volatile storage element. This includes inhibiting programming of the non-volatile storage element when a present program-verify iteration is less than a threshold corresponding to a target data state that the storage element is being programmed to. This also includes enabling programming of the non-volatile storage element when the present program-verify iteration is greater than or equal to the threshold corresponding to the target data state that the storage element is being programmed to.

Abstract: Techniques are disclosed herein for erasing non-volatile storage. The erase has two or more phases. The first phase includes erasing a group of non-volatile storage elements at a first speed until the group of non-volatile storage elements pass a first verify level. The second phase is performed after the group of non-volatile storage elements pass the first verify level. The second phase includes erasing the group of non-volatile storage elements at a second speed that is less than the first speed until the group of non-volatile storage elements pass a second verify level that is lower than the first verify level. Erasing at the first speed results in a fast erase without significant risk of over-erasing the storage elements. Erasing at the second speed during the second phase prevents or reduces over-erasure which could damage the storage elements.

Abstract: When programming a set of non-volatile storage elements using a multi-stage programming process, a series of programming pulses are used for each stage. The magnitude of the initial program pulse for the current stage being performed is dynamically set as a function of the number of program pulses used for the same stage of the multi-stage programming process when programming non-volatile storage elements connected to on one or more previously programmed word lines.

Abstract: A method of making a monolithic three dimensional NAND string, including providing a stack of alternating first material layers and second material layers different from the first material layer over a substrate, the stack comprising at least one opening containing a charge storage material comprising a silicide layer, a tunnel dielectric on the charge storage material in the at least one opening, and a semiconductor channel on the tunnel dielectric in the at least one opening, selectively removing the second material layers without removing the first material layers from the stack and forming control gates between the first material layers.

Abstract: When programming a set of non-volatile storage elements using a multi-stage programming process, a series of programming pulses are used for each stage. The magnitude of the initial program pulse for the current stage being performed is dynamically set as a function of the number of program pulses used for the same stage of the multi-stage programming process when programming non-volatile storage elements connected to on one or more previously programmed word lines.

Abstract: A set of reliability metrics is provided for use by an iterative probabilistic decoding process for non-volatile storage. A plurality of sense operations are performed on at least one set of non-volatile storage elements which are programmed to a plurality of programming states. A set of reliability metrics such as logarithmic likelihood ratios is provided based on the sense operations. The set of reliability metrics is can be used by an iterative probabilistic decoding process in determining a programming state of at least one non-volatile storage element based on at least one subsequent sense operation involving the at least one non-volatile storage element. The plurality of sense operations can be performed at different ages (e.g., number of program/erase cycles) of the at least one set of non-volatile storage elements and the set of reliability metrics can be based on an average over the different ages.

Abstract: A monolithic three dimensional NAND string includes a semiconductor channel located over a substrate, a plurality of control gates extending substantially parallel to the major surface of the substrate including a first control gate located in a first device level and a second control gate located in a second device level located over the substrate and below the first device level, a charge storage material including a silicide layer located in the first device level and in the second device level, a blocking dielectric located between the charge storage material and the plurality of control gates, and a tunnel dielectric located between the charge storage material and the semiconductor channel. The tunnel dielectric has a straight sidewall, portions of the blocking dielectric have a clam shape, and each of the plurality of control gates is located at least partially in an opening in the clam-shaped portion of the blocking dielectric.

Abstract: Non-voltage storage and techniques for fabricating non-volatile storage are disclosed. In some embodiments, at least a portion of the control gates of non-volatile storage elements are formed from p-type polysilicon. In one embodiment, a lower portion of the control gate is p-type polysilicon. The upper portion of the control gate could be p-type polysilicon, n-type polysilicon, metal, metal nitride, etc. P-type polysilicon in the control gate may not deplete even at high Vpgm. Therefore, a number of problems that could occur if the control gate depleted are mitigated. For example, a memory cell having a control gate that is at least partially p-type polysilicon might be programmed with a lower Vpgm than a memory cell formed from n-type polysilicon.

Abstract: When programming a set of non-volatile storage elements using a multi-stage programming process, a series of programming pulses are used for each stage. The magnitude of the initial program pulse for the current stage being performed is dynamically set as a function of the number of program pulses used for the same stage of the multi-stage programming process when programming non-volatile storage elements connected to on one or more previously programmed word lines.

Abstract: A method of making a monolithic three dimensional NAND string, including providing a stack of alternating first material layers and second material layers different from the first material layer over a substrate, the stack comprising at least one opening containing a charge storage material comprising a silicide layer, a tunnel dielectric on the charge storage material in the at least one opening, and a semiconductor channel on the tunnel dielectric in the at least one opening, selectively removing the second material layers without removing the first material layers from the stack and forming control gates between the first material layers.

Abstract: In a non-volatile storage system, first and second substrate channel regions for an unselected NAND string are boosted during programming to inhibit program disturb. The first and second substrate channel regions are created on either side of an isolation word line. During a program pulse time period in which a program pulse is applied to a selected word line, a voltage applied to an unselected word line which extends directly over the second channel region is stepped up to a respective pre-program pulse voltage, at a faster rate at which a voltage applied to an unselected word line which extends directly over the first channel region is stepped up to a respective pre-program pulse voltage. This helps improve the isolation between the channel regions.

Abstract: Non-voltage storage and techniques for fabricating non-volatile storage are disclosed. In some embodiments, at least a portion of the control gates of non-volatile storage elements are formed from p-type polysilicon. In one embodiment, a lower portion of the control gate is p-type polysilicon. The upper portion of the control gate could be p-type polysilicon, n-type polysilicon, metal, metal nitride, etc. P-type polysilicon in the control gate may not deplete even at high Vpgm. Therefore, a number of problems that could occur if the control gate depleted are mitigated. For example, a memory cell having a control gate that is at least partially p-type polysilicon might be programmed with a lower Vpgm than a memory cell formed from n-type polysilicon.

Abstract: Program disturb is reduced in a non-volatile storage system by programming storage elements on a selected word line WLn in separate groups, according to the state of their WLn?1 neighbor storage element, and applying an optimal pass voltage to WLn?1 for each group. Initially, the states of the storage elements on WLn?1 are read. A program iteration includes multiple program pulses. A first program pulse is applied to WLn while a first pass voltage is applied to WLn?1, a first group of WLn storage elements is selected for programming, and a second group of WLn storage elements is inhibited. Next, a second program pulse is applied to WLn while a second pass voltage is applied to WLn?1, the second first group of WLn storage elements is selected for programming, and the first group of WLn storage elements is inhibited. A group can include one or more data states.