Patents by Inventor Henry L. Grohman

Henry L. Grohman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion beam deposition targets having an interlocking interface and a replaceable insert
    Patent number: 6755944
    Abstract: An ion beam deposition target source consisting of a removable, centrally located inner insert surrounded by an outer region. The insert can be removed and replaced when eroded, while the outer region of the target source not eroded by the ion beam remains in place attached to a backing plate. The inner insert and the outer region are joined to each other by an interface comprising an interlocking lip or grove structure located on opposing mating surfaces on the inner insert and outer region, thereby forming the deposition target source when these components are united. The deposition target source can be attached by a bonding layer to a backing plate which is installed into an ion beam deposition machine.
    Type: Grant
    Filed: November 2, 2001
    Date of Patent: June 29, 2004
    Assignee: Williams Advanced Materials, Inc.
    Inventors: Henry L. Grohman, Robert Acker, Matthew T. Wilson
  • Ion beam deposition targets having an interlocking interface and a replaceable insert
    Publication number: 20020053512
    Abstract: An ion beam deposition target source consisting of a removable, centrally located inner insert surrounded by an outer region. The insert can be removed and replaced when eroded, while the outer region of the target source not eroded by the ion beam remains in place attached to a backing plate. The inner insert and the outer region are joined to each other by an interface comprising an interlocking lip or grove structure located on opposing mating surfaces on the inner insert and outer region, thereby forming the deposition target source when these components are united. The deposition target source can be attached by a bonding layer to a backing plate which is installed into an ion beam deposition machine.
    Type: Application
    Filed: November 2, 2001
    Publication date: May 9, 2002
    Inventors: Henry L. Grohman, Robert Acker, Matthew T. Willson
  • Sputtering target
    Patent number: D529057
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: September 26, 2006
    Assignee: Williams Advanced Materials, Inc.
    Inventors: Matthew T. Willson, Henry L. Grohman