Sputtering target

Skip to: Description  ·  Claims  ·  References Cited  · Patent History  ·  Patent History
Description

FIG. 1 is a top plan view of the design.

FIG. 2 is a cross-sectional view of the upper portion of the design taken at line 2—2 of FIG. 1.

FIG. 3 is an enlarged detail of the cross-sectional view shown in FIG. 2.

FIG. 4 is a partial top plan view of the design shown in FIG. 1; and,

FIG. 5 is a cross-sectional view taken at line 5—5 of FIG. 4.

Claims

The ornamental design for a sputtering target, as shown and described.

Referenced Cited
U.S. Patent Documents
3821841 July 1974 Goodwin
D381030 July 15, 1997 Tepman
6471830 October 29, 2002 Moslehi et al.
6599399 July 29, 2003 Xu et al.
6623605 September 23, 2003 Diaz et al.
Patent History
Patent number: D529057
Type: Grant
Filed: Aug 16, 2004
Date of Patent: Sep 26, 2006
Assignee: Williams Advanced Materials, Inc. (Buffalo, NY)
Inventors: Matthew T. Willson (New Milford, CT), Henry L. Grohman (Wappingers Falls, NY)
Primary Examiner: Antoine D. Davis
Assistant Examiner: Patricia Palasik
Attorney: Hiscock & Barclay, LLP
Application Number: 29/211,416