Sputtering target
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Description
FIG. 1 is a top plan view of the design.
FIG. 2 is a cross-sectional view of the upper portion of the design taken at line 2—2 of FIG. 1.
FIG. 3 is an enlarged detail of the cross-sectional view shown in FIG. 2.
FIG. 4 is a partial top plan view of the design shown in FIG. 1; and,
FIG. 5 is a cross-sectional view taken at line 5—5 of FIG. 4.
Claims
The ornamental design for a sputtering target, as shown and described.
Referenced Cited
Patent History
Patent number: D529057
Type: Grant
Filed: Aug 16, 2004
Date of Patent: Sep 26, 2006
Assignee: Williams Advanced Materials, Inc. (Buffalo, NY)
Inventors: Matthew T. Willson (New Milford, CT), Henry L. Grohman (Wappingers Falls, NY)
Primary Examiner: Antoine D. Davis
Assistant Examiner: Patricia Palasik
Attorney: Hiscock & Barclay, LLP
Application Number: 29/211,416
Type: Grant
Filed: Aug 16, 2004
Date of Patent: Sep 26, 2006
Assignee: Williams Advanced Materials, Inc. (Buffalo, NY)
Inventors: Matthew T. Willson (New Milford, CT), Henry L. Grohman (Wappingers Falls, NY)
Primary Examiner: Antoine D. Davis
Assistant Examiner: Patricia Palasik
Attorney: Hiscock & Barclay, LLP
Application Number: 29/211,416
Classifications