Patents by Inventor Henry S. Povolny

Henry S. Povolny has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hot-filament chemical vapor deposition chamber and process with multiple gas inlets
    Patent number: 6638839
    Abstract: A thin film deposition method uses a vacuum confinement cup that employs a dense hot filament and multiple gas inlets. At least one reactant gas is introduced into the confinement cup both near and spaced apart from the heated filament. An electrode inside the confinement cup is used to generate plasma for film deposition. The method is used to deposit advanced thin films (such as silicon based thin films) at a high quality and at a high deposition rate.
    Type: Grant
    Filed: July 25, 2002
    Date of Patent: October 28, 2003
    Assignee: The University of Toledo
    Inventors: Xunming Deng, Henry S. Povolny
  • Novel hot-filament chemical vapor deposition chamber and process with multiple gas inlets
    Publication number: 20030032265
    Abstract: A thin film deposition method uses a vacuum confinement cup that employs a dense hot filament and multiple gas inlets. At least one reactant gas is introduced into the confinement cup both near and spaced apart from the heated filament. An electrode inside the confinement cup is used to generate plasma for film deposition. The method is used to deposit advanced thin films (such as silicon based thin films) at a high quality and at a high deposition rate.
    Type: Application
    Filed: July 25, 2002
    Publication date: February 13, 2003
    Applicant: The University of Toledo
    Inventors: Xunming Deng, Henry S. Povolny