Patents by Inventor Hermanus Johannes Maria Kreuwel
Hermanus Johannes Maria Kreuwel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10289006Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.Type: GrantFiled: November 26, 2013Date of Patent: May 14, 2019Assignee: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Markus Franciscus Antonius Eurlings, Hermanus Johannes Maria Kreuwel
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Patent number: 10119114Abstract: A cartridge that can be positioned inside an air collection component and receive a component for recovering nucleic acids is described, the cartridge being substantially cylindrical and containing a microorganism retaining zone, the retaining zone containing a microorganism lysis mechanism. Also described is a device for collecting microorganisms contained in the air and a device for microorganism lysis.Type: GrantFiled: June 6, 2008Date of Patent: November 6, 2018Assignee: BIOMERIEUXInventors: Hermanus Johannes Maria Kreuwel, Emiel Gerebern Maria Verwimp
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Publication number: 20150334813Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.Type: ApplicationFiled: November 26, 2013Publication date: November 19, 2015Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus VAN SCHOOT, Markus Franciscus Antoniu EURLINGS, Hermanus Johannes Maria KREUWEL
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Patent number: 8958053Abstract: A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector arrangement comprising a reflector arrangement disposed in a fixed positional relationship with respect to the illuminator, the reflector arrangement being arranged to reflect radiation from the source collector module; and a sensor arrangement disposed in a fixed positional relationship with respect to the reflector arrangement, the sensor arrangement being configured to measure at least one property of radiation reflected by the reflector, the detector arrangement being configured to determine the location of a far field position of the radiation as a function of at least one property of the radiation reflected by the reflector and measured by the sensor arrangement.Type: GrantFiled: July 19, 2011Date of Patent: February 17, 2015Assignee: ASML Netherlands B.V.Inventors: Michel François Hubert Klaassen, Hermanus Johannes Maria Kreuwel
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Patent number: 8867021Abstract: An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.Type: GrantFiled: March 18, 2010Date of Patent: October 21, 2014Assignee: ASML Netherlands B.V.Inventors: Gosse Charles De Vries, Edwin Johan Buis, Marinus Johannes Maria Van Dam, Jan Bernard Plechelmus Van Schoot, Fidelus Adrianus Boon, Hermanus Johannes Maria Kreuwel
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Publication number: 20140253894Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.Type: ApplicationFiled: August 23, 2012Publication date: September 11, 2014Applicant: ASML Netherland B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Hermanus Johannes Maria Kreuwel, Vadim Yevgenyevich Banine, Andrei Mikhailovich Yakunin, Johannes Hubertus Josephina Moors, Olav Waldimir Frijns, Gerardus Hubertus Petrus Maria Swinkels, Ivo Vanderhallen, Uwe Bruno Heini Stamm
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Patent number: 8680493Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.Type: GrantFiled: June 5, 2012Date of Patent: March 25, 2014Assignee: ASML Netherlands B.V.Inventors: Maikel Adrianus Cornelis Schepers, Markus Franciscus Antonius Eurlings, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel, Jacob Cohen, Pepijn Wijnand Jozef Janssen, Maarten Kees Jan Boon
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Patent number: 8647858Abstract: The present invention relates to, among other things, a device for collecting airborne microorganisms, said device having: an air collecting module, comprising: i. an upper element having an air admission duct permitting entry of an air stream into said module, said duct being provided, at its base, with means for disturbance of the air stream, ii. a lower element having air evacuating means permitting the air stream created to exit and said upper and lower elements can be made integral with one another so that the air stream can be created within said air collecting module; a cartridge, of roughly cylindrical shape, having a microorganism retention zone, said retention zone having means for lysis of the microorganisms, said cartridge being positioned within said air collecting module.Type: GrantFiled: December 9, 2009Date of Patent: February 11, 2014Assignee: BiomerieuxInventors: Patrick Broyer, Agnes Dupontfilliard, Massimo Galdiero, Michel Guy, Hermanus Johannes Maria Kreuwel, Emiliano Maione, Emiel Gerebern Maria Verwimp
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Publication number: 20130077073Abstract: EUV exposure dose in a lithographic apparatus is controlled pulse to pulse by varying a conversion efficiency with which a pulse of EUV radiation is generated from an excitation of a fuel material by a corresponding pulse of excitation laser radiation. Conversion efficiency can be varied in several different ways, by varying the proportion of a fuel material that intersects a laser beam, and/or by varying a quality of the interaction. Mechanisms to vary the conversion efficiency can be based on variation of a laser pulse timing, variation of pre-pulse energy, and/or variable displacement of a main laser beam in one or more directions. Steps to maintain symmetry of the generated EUV radiation can be included.Type: ApplicationFiled: September 24, 2012Publication date: March 28, 2013Applicant: ASML NETHERLANDS B. V.Inventors: Jan Bernard Plechelmus VAN SCHOOT, Hendrikus Robertus Marie VAN GREEVENBROEK, Vladimir Vitalevich IVANOV, Andrei Mikhailovich YAKUNIN, Hermanus Johannes Maria KREUWEL
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Publication number: 20130001442Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.Type: ApplicationFiled: June 5, 2012Publication date: January 3, 2013Applicant: ASML Netherlands B.V.Inventors: Maikel Adrianus Cornelis Schepers, Markus Franciscus Antonius Eurlings, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel, Jacob Cohen, Pepijn Wijnand Jozef Janssen, Maarten Kees Jan Boon
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Publication number: 20120154777Abstract: An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.Type: ApplicationFiled: March 18, 2010Publication date: June 21, 2012Applicant: ASML Netherlands B.V.Inventors: Gosse Charles De Vries, Edwin Johan Buis, Marinus Johannes Maria Vandam, Jan Bernard Plechelmus Van Schoot, Fidelus Adrianus Boon, Hermanus Johannes Maria Kreuwel
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Publication number: 20120038898Abstract: A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector arrangement comprising a reflector arrangement disposed in a fixed positional relationship with respect to the illuminator, the reflector arrangement being arranged to reflect radiation from the source collector module; and a sensor arrangement disposed in a fixed positional relationship with respect to the reflector arrangement, the sensor arrangement being configured to measure at least one property of radiation reflected by the reflector, the detector arrangement being configured to determine the location of a far field position of the radiation as a function of at least one property of the radiation reflected by the reflector and measured by the sensor arrangement.Type: ApplicationFiled: July 19, 2011Publication date: February 16, 2012Applicant: ASML Netherlands B.V.Inventors: Michel François Hubert KLAASSEN, Hermanus Johannes Maria KREUWEL
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Publication number: 20110273691Abstract: An EUV radiation source in the form of a plasma is focused at a virtual source point so as to pass through an exit aperture of a source collector module in an EUV lithographic apparatus. Plasma position is controlled in three directions, X, Y and Z using monitoring signals. By exploiting the photoacoustic effect, the monitoring is accomplished in a non-intrusive manner using acoustic sensors coupled to material of a cone which surrounds the exit aperture. Different angular positions of the radiation beam can be deduced by discriminating signals from the different sensors on the basis of relative arrival time or phase, and/or by comparing the amplitude/intensity of the signals. A sequencer function can be used to introduce a sequence of deliberate offsets in the beam position. This allows acoustic signals to be generated and detected for measurement purposes, when the beam would otherwise not impinge on the material.Type: ApplicationFiled: May 5, 2011Publication date: November 10, 2011Applicant: ASML Netherlands B.V.Inventors: Erik Petrus BUURMAN, Nicolaas Antonius Allegondu Johannes VAN ASTEN, Hermanus Johannes Maria KREUWEL
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Publication number: 20110250680Abstract: The present invention relates to, among other things, a device for collecting airborne microorganisms, said device having: an air collecting module, comprising: i. an upper element having an air admission duct permitting entry of an air stream into said module, said duct being provided, at its base, with means for disturbance of the air stream, ii. a lower element having air evacuating means permitting the air stream created to exit and said upper and lower elements can be made integral with one another so that the air stream can be created within said air collecting module; a cartridge, of roughly cylindrical shape, having a microorganism retention zone, said retention zone having means for lysis of the microorganisms, said cartridge being positioned within said air collecting module.Type: ApplicationFiled: December 9, 2009Publication date: October 13, 2011Applicant: BIOMERIEUXInventors: Patrick Broyer, Agnes Dupontfilliard, Massimo Galdiero, Michel Guy, Hermanus Johannes Maria Kreuwel, Emiliano Maione, Emiel Gerebern Maria Verwimp
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Publication number: 20100075313Abstract: The present invention relates to a cartridge which can be positioned inside an air collection means and receive a means for recovering nucleic acids, said cartridge being substantially cylindrical and comprising a microorganism retaining zone, said retaining zone comprising microorganism lysis means. The invention also relates to a device for collecting microorganisms contained in the air and a device for microorganism lysis.Type: ApplicationFiled: June 6, 2008Publication date: March 25, 2010Applicant: BIOMERIEUXInventors: Hermanus Johannes Maria Kreuwel, Emiel Gerebern Maria Verwimp
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Patent number: 6864102Abstract: The present invention relates to a device for performing an assay, which device comprises a substrate having oriented through-going channels, said channels opening out on a surface for sample application, the channels in at least one area of the surface for sample application being provided with a first binding substance capable of binding to an analyte. The object of the present invention is to provide a substrate having both a high channel density and a high porosity, allowing high density arrays comprising different first binding substances to be applied to the surface for sample application. More in particular, the object of the present invention is to provide a device comprising a relatively cheap substrate that does not require the use of any typical microfabrication technology and, that offers an improved control over the liquid distribution over the surface of the substrate.Type: GrantFiled: May 1, 2001Date of Patent: March 8, 2005Assignee: PamGene International B.V.Inventors: Hendrik Sibolt van Damme, Hermanus Johannes Maria Kreuwel
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Patent number: 6855539Abstract: Disclosed is a device useful for performing an assay comprising a substrate having interconnecting channels that open out onto a surface for sample application, the channels being provided in at least one cross-sectional area with a first binding substance capable of binding a particular analyte, the substrate being an electrochemically manufactured metal oxide membrane and containing the first binding substance within the through-going channels. Similar devices are also useful for chemical synthesis. Assay and chemical synthesis methods are also disclosed, as are kits for performing the assays or chemical syntheses.Type: GrantFiled: November 27, 2001Date of Patent: February 15, 2005Assignee: PamGene International B.V.Inventors: Hendrik Sibolt van Damme, Hermanus Johannes Maria Kreuwel, Tim Kievits, Marinus Gerardus Johannus van Beuningen, Pieter Jacob Boender
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Patent number: 6764859Abstract: This invention relates to the use of magnetic or magnetizable particles, and, in particular, to methods of mixing magnetic or (super)paramagnetic particles efficiently with a fluid and the separation of the magnetic particles from a fluid, optionally followed by resuspension of the particles in another fluid. The present invention provides a method of mixing, in one or more container(s), magnetic or (super)paramagnetic particles with a fluid, using more than one magnets, whereby the containers are subjected to magnetic fields with different and changing directions by moving the magnets with respect to the position of the container(s) and/or by moving the containers with respect to the positions of the magnets. The invention further provided a device for doing the same.Type: GrantFiled: June 4, 2002Date of Patent: July 20, 2004Assignee: bioMerieux, B.V.Inventors: Hermanus Johannes Maria Kreuwel, Emiel Gerebern Maria Verwimp
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Patent number: 6635493Abstract: The present invention relates to a device for performing an assay, which device comprises a substrate having oriented through-going channels, said channels opening out on a surface for sample application, the channels in at least one area of the surface for sample application being provided with a first binding substance capable of binding to an analyte. The object of the present invention is to provide a substrate having both a high channel density and a high porosity, allowing high density arrays comprising different first binding substances to be applied to the surface for sample application. More in particular, the object of the present invention is to provide a device comprising a relatively cheap substrate that does not require the use of any typical microfabrication technology and, that offers an improved control over the liquid distribution over the surface of the substrate.Type: GrantFiled: April 30, 2001Date of Patent: October 21, 2003Assignee: PamGene B.V.Inventors: Hendrik Sibolt van Damme, Hermanus Johannes Maria Kreuwel
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Publication number: 20020164584Abstract: Disclosed is a device useful for performing an assay comprising a substrate having interconnecting channels that open out onto a surface for sample application, the channels being provided in at least one cross-sectional area with a first binding substance capable of binding a particular analyte, the substrate being an electrochemically manufactured metal oxide membrane and containing the first binding substance within the through-going channels. Similar devices are also useful for chemical synthesis. Assay and chemical synthesis methods are also disclosed, as are kits for performing the assays or chemical syntheses.Type: ApplicationFiled: November 27, 2001Publication date: November 7, 2002Inventors: Tim Kievits, Marinus Gerardus Johannus Van Beuningen, Pieter Jacob Boender, Hendrik Sibolt van Damme, Hermanus Johannes Maria Kreuwel