Patents by Inventor Hermanus Johannes Maria Kreuwel

Hermanus Johannes Maria Kreuwel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10289006
    Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.
    Type: Grant
    Filed: November 26, 2013
    Date of Patent: May 14, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Bernard Plechelmus Van Schoot, Markus Franciscus Antonius Eurlings, Hermanus Johannes Maria Kreuwel
  • Patent number: 10119114
    Abstract: A cartridge that can be positioned inside an air collection component and receive a component for recovering nucleic acids is described, the cartridge being substantially cylindrical and containing a microorganism retaining zone, the retaining zone containing a microorganism lysis mechanism. Also described is a device for collecting microorganisms contained in the air and a device for microorganism lysis.
    Type: Grant
    Filed: June 6, 2008
    Date of Patent: November 6, 2018
    Assignee: BIOMERIEUX
    Inventors: Hermanus Johannes Maria Kreuwel, Emiel Gerebern Maria Verwimp
  • Publication number: 20150334813
    Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.
    Type: Application
    Filed: November 26, 2013
    Publication date: November 19, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Jan Bernard Plechelmus VAN SCHOOT, Markus Franciscus Antoniu EURLINGS, Hermanus Johannes Maria KREUWEL
  • Patent number: 8958053
    Abstract: A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector arrangement comprising a reflector arrangement disposed in a fixed positional relationship with respect to the illuminator, the reflector arrangement being arranged to reflect radiation from the source collector module; and a sensor arrangement disposed in a fixed positional relationship with respect to the reflector arrangement, the sensor arrangement being configured to measure at least one property of radiation reflected by the reflector, the detector arrangement being configured to determine the location of a far field position of the radiation as a function of at least one property of the radiation reflected by the reflector and measured by the sensor arrangement.
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: February 17, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Michel François Hubert Klaassen, Hermanus Johannes Maria Kreuwel
  • Patent number: 8867021
    Abstract: An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.
    Type: Grant
    Filed: March 18, 2010
    Date of Patent: October 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Gosse Charles De Vries, Edwin Johan Buis, Marinus Johannes Maria Van Dam, Jan Bernard Plechelmus Van Schoot, Fidelus Adrianus Boon, Hermanus Johannes Maria Kreuwel
  • Publication number: 20140253894
    Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
    Type: Application
    Filed: August 23, 2012
    Publication date: September 11, 2014
    Applicant: ASML Netherland B.V.
    Inventors: Jan Bernard Plechelmus Van Schoot, Hermanus Johannes Maria Kreuwel, Vadim Yevgenyevich Banine, Andrei Mikhailovich Yakunin, Johannes Hubertus Josephina Moors, Olav Waldimir Frijns, Gerardus Hubertus Petrus Maria Swinkels, Ivo Vanderhallen, Uwe Bruno Heini Stamm
  • Patent number: 8680493
    Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
    Type: Grant
    Filed: June 5, 2012
    Date of Patent: March 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Maikel Adrianus Cornelis Schepers, Markus Franciscus Antonius Eurlings, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel, Jacob Cohen, Pepijn Wijnand Jozef Janssen, Maarten Kees Jan Boon
  • Patent number: 8647858
    Abstract: The present invention relates to, among other things, a device for collecting airborne microorganisms, said device having: an air collecting module, comprising: i. an upper element having an air admission duct permitting entry of an air stream into said module, said duct being provided, at its base, with means for disturbance of the air stream, ii. a lower element having air evacuating means permitting the air stream created to exit and said upper and lower elements can be made integral with one another so that the air stream can be created within said air collecting module; a cartridge, of roughly cylindrical shape, having a microorganism retention zone, said retention zone having means for lysis of the microorganisms, said cartridge being positioned within said air collecting module.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: February 11, 2014
    Assignee: Biomerieux
    Inventors: Patrick Broyer, Agnes Dupontfilliard, Massimo Galdiero, Michel Guy, Hermanus Johannes Maria Kreuwel, Emiliano Maione, Emiel Gerebern Maria Verwimp
  • Publication number: 20130077073
    Abstract: EUV exposure dose in a lithographic apparatus is controlled pulse to pulse by varying a conversion efficiency with which a pulse of EUV radiation is generated from an excitation of a fuel material by a corresponding pulse of excitation laser radiation. Conversion efficiency can be varied in several different ways, by varying the proportion of a fuel material that intersects a laser beam, and/or by varying a quality of the interaction. Mechanisms to vary the conversion efficiency can be based on variation of a laser pulse timing, variation of pre-pulse energy, and/or variable displacement of a main laser beam in one or more directions. Steps to maintain symmetry of the generated EUV radiation can be included.
    Type: Application
    Filed: September 24, 2012
    Publication date: March 28, 2013
    Applicant: ASML NETHERLANDS B. V.
    Inventors: Jan Bernard Plechelmus VAN SCHOOT, Hendrikus Robertus Marie VAN GREEVENBROEK, Vladimir Vitalevich IVANOV, Andrei Mikhailovich YAKUNIN, Hermanus Johannes Maria KREUWEL
  • Publication number: 20130001442
    Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
    Type: Application
    Filed: June 5, 2012
    Publication date: January 3, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Maikel Adrianus Cornelis Schepers, Markus Franciscus Antonius Eurlings, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel, Jacob Cohen, Pepijn Wijnand Jozef Janssen, Maarten Kees Jan Boon
  • Publication number: 20120154777
    Abstract: An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.
    Type: Application
    Filed: March 18, 2010
    Publication date: June 21, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Gosse Charles De Vries, Edwin Johan Buis, Marinus Johannes Maria Vandam, Jan Bernard Plechelmus Van Schoot, Fidelus Adrianus Boon, Hermanus Johannes Maria Kreuwel
  • Publication number: 20120038898
    Abstract: A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector arrangement comprising a reflector arrangement disposed in a fixed positional relationship with respect to the illuminator, the reflector arrangement being arranged to reflect radiation from the source collector module; and a sensor arrangement disposed in a fixed positional relationship with respect to the reflector arrangement, the sensor arrangement being configured to measure at least one property of radiation reflected by the reflector, the detector arrangement being configured to determine the location of a far field position of the radiation as a function of at least one property of the radiation reflected by the reflector and measured by the sensor arrangement.
    Type: Application
    Filed: July 19, 2011
    Publication date: February 16, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Michel François Hubert KLAASSEN, Hermanus Johannes Maria KREUWEL
  • Publication number: 20110273691
    Abstract: An EUV radiation source in the form of a plasma is focused at a virtual source point so as to pass through an exit aperture of a source collector module in an EUV lithographic apparatus. Plasma position is controlled in three directions, X, Y and Z using monitoring signals. By exploiting the photoacoustic effect, the monitoring is accomplished in a non-intrusive manner using acoustic sensors coupled to material of a cone which surrounds the exit aperture. Different angular positions of the radiation beam can be deduced by discriminating signals from the different sensors on the basis of relative arrival time or phase, and/or by comparing the amplitude/intensity of the signals. A sequencer function can be used to introduce a sequence of deliberate offsets in the beam position. This allows acoustic signals to be generated and detected for measurement purposes, when the beam would otherwise not impinge on the material.
    Type: Application
    Filed: May 5, 2011
    Publication date: November 10, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Petrus BUURMAN, Nicolaas Antonius Allegondu Johannes VAN ASTEN, Hermanus Johannes Maria KREUWEL
  • Publication number: 20110250680
    Abstract: The present invention relates to, among other things, a device for collecting airborne microorganisms, said device having: an air collecting module, comprising: i. an upper element having an air admission duct permitting entry of an air stream into said module, said duct being provided, at its base, with means for disturbance of the air stream, ii. a lower element having air evacuating means permitting the air stream created to exit and said upper and lower elements can be made integral with one another so that the air stream can be created within said air collecting module; a cartridge, of roughly cylindrical shape, having a microorganism retention zone, said retention zone having means for lysis of the microorganisms, said cartridge being positioned within said air collecting module.
    Type: Application
    Filed: December 9, 2009
    Publication date: October 13, 2011
    Applicant: BIOMERIEUX
    Inventors: Patrick Broyer, Agnes Dupontfilliard, Massimo Galdiero, Michel Guy, Hermanus Johannes Maria Kreuwel, Emiliano Maione, Emiel Gerebern Maria Verwimp
  • Publication number: 20100075313
    Abstract: The present invention relates to a cartridge which can be positioned inside an air collection means and receive a means for recovering nucleic acids, said cartridge being substantially cylindrical and comprising a microorganism retaining zone, said retaining zone comprising microorganism lysis means. The invention also relates to a device for collecting microorganisms contained in the air and a device for microorganism lysis.
    Type: Application
    Filed: June 6, 2008
    Publication date: March 25, 2010
    Applicant: BIOMERIEUX
    Inventors: Hermanus Johannes Maria Kreuwel, Emiel Gerebern Maria Verwimp
  • Patent number: 6864102
    Abstract: The present invention relates to a device for performing an assay, which device comprises a substrate having oriented through-going channels, said channels opening out on a surface for sample application, the channels in at least one area of the surface for sample application being provided with a first binding substance capable of binding to an analyte. The object of the present invention is to provide a substrate having both a high channel density and a high porosity, allowing high density arrays comprising different first binding substances to be applied to the surface for sample application. More in particular, the object of the present invention is to provide a device comprising a relatively cheap substrate that does not require the use of any typical microfabrication technology and, that offers an improved control over the liquid distribution over the surface of the substrate.
    Type: Grant
    Filed: May 1, 2001
    Date of Patent: March 8, 2005
    Assignee: PamGene International B.V.
    Inventors: Hendrik Sibolt van Damme, Hermanus Johannes Maria Kreuwel
  • Patent number: 6855539
    Abstract: Disclosed is a device useful for performing an assay comprising a substrate having interconnecting channels that open out onto a surface for sample application, the channels being provided in at least one cross-sectional area with a first binding substance capable of binding a particular analyte, the substrate being an electrochemically manufactured metal oxide membrane and containing the first binding substance within the through-going channels. Similar devices are also useful for chemical synthesis. Assay and chemical synthesis methods are also disclosed, as are kits for performing the assays or chemical syntheses.
    Type: Grant
    Filed: November 27, 2001
    Date of Patent: February 15, 2005
    Assignee: PamGene International B.V.
    Inventors: Hendrik Sibolt van Damme, Hermanus Johannes Maria Kreuwel, Tim Kievits, Marinus Gerardus Johannus van Beuningen, Pieter Jacob Boender
  • Patent number: 6764859
    Abstract: This invention relates to the use of magnetic or magnetizable particles, and, in particular, to methods of mixing magnetic or (super)paramagnetic particles efficiently with a fluid and the separation of the magnetic particles from a fluid, optionally followed by resuspension of the particles in another fluid. The present invention provides a method of mixing, in one or more container(s), magnetic or (super)paramagnetic particles with a fluid, using more than one magnets, whereby the containers are subjected to magnetic fields with different and changing directions by moving the magnets with respect to the position of the container(s) and/or by moving the containers with respect to the positions of the magnets. The invention further provided a device for doing the same.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: July 20, 2004
    Assignee: bioMerieux, B.V.
    Inventors: Hermanus Johannes Maria Kreuwel, Emiel Gerebern Maria Verwimp
  • Patent number: 6635493
    Abstract: The present invention relates to a device for performing an assay, which device comprises a substrate having oriented through-going channels, said channels opening out on a surface for sample application, the channels in at least one area of the surface for sample application being provided with a first binding substance capable of binding to an analyte. The object of the present invention is to provide a substrate having both a high channel density and a high porosity, allowing high density arrays comprising different first binding substances to be applied to the surface for sample application. More in particular, the object of the present invention is to provide a device comprising a relatively cheap substrate that does not require the use of any typical microfabrication technology and, that offers an improved control over the liquid distribution over the surface of the substrate.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: October 21, 2003
    Assignee: PamGene B.V.
    Inventors: Hendrik Sibolt van Damme, Hermanus Johannes Maria Kreuwel
  • Publication number: 20020164584
    Abstract: Disclosed is a device useful for performing an assay comprising a substrate having interconnecting channels that open out onto a surface for sample application, the channels being provided in at least one cross-sectional area with a first binding substance capable of binding a particular analyte, the substrate being an electrochemically manufactured metal oxide membrane and containing the first binding substance within the through-going channels. Similar devices are also useful for chemical synthesis. Assay and chemical synthesis methods are also disclosed, as are kits for performing the assays or chemical syntheses.
    Type: Application
    Filed: November 27, 2001
    Publication date: November 7, 2002
    Inventors: Tim Kievits, Marinus Gerardus Johannus Van Beuningen, Pieter Jacob Boender, Hendrik Sibolt van Damme, Hermanus Johannes Maria Kreuwel