Abstract: A photoresist composition capable of forming a high resolution pattern without an additional heating process includes an alkali-soluble phenol polymer in an amount of 10 to 70 parts by weight, including at least one unit of Formula 1, a photo-acid generator in an amount of 0.5 to 10 parts by weight, a dissolution inhibitor in an amount of 5 to 50 parts by weight, including at least one unit of Formula 2, and a solvent in an amount of 10 to 90 parts by weight, wherein the amounts of the foregoing components is based on a total of 100 parts by weight of alkali-soluble phenol polymer, photo-acid generator, dissolution inhibitor, and solvent, and wherein Formulas 1 and 2 have the structures: wherein R is a methyl group, wherein R1, R2 and R3 are the same or different and are hydrogen or t-butyl vinyl ether protective groups.

Abstract: An exposure apparatus may include: a stage configured to move a substrate; an optical unit configured to generate and project a plurality of laser beams; and a control unit configured to measure straightness of the stage by controlling the projection of the laser beams to an exposed surface of the substrate while moving the stage. A method to measure straightness of a stage in an exposure apparatus may include: placing a substrate on the stage; moving the stage and substrate; generating a plurality of laser beams; projecting the laser beams to the substrate on the stage; and measuring the straightness of the stage by projecting the laser beams to an exposed surface of the substrate.

Abstract: An organic composition having liquid-crystal alignment characteristics includes a photosensitive compound and a binder resin represented by Formula 1 below: wherein each R1 is independently hydrogen or a methyl group; R2 is an alkyl group of 4-16 carbon atoms; R3 is an alkyl group of 1-7 carbon atoms, a cyclooxyalkyl group of 1-7 carbon atoms, a benzyl group, or a phenyl group; l, m, and n represent molar ratios of polymerization units and are respectively from about 0.01 to about 0.50, from about 0.10 to about 0.60, and from about 0.03 to about 0.50.

Abstract: The present invention relates to a photoresist composition that comprises a resin that is represented by Formula 1, a method for forming a thin film pattern, and a method for manufacturing a thin film transistor array panel by using the same. Herein, R is a methylene group, and n is an integer of 1 or more.

Abstract: A photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15 % by weight of a curing agent, and a remainder of an organic solvent. A method of forming a metal pattern includes coating a photoresist composition on a base substrate having a metal layer, and forming a first photoresist film. The photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15% by weight of a curing agent, and a remainder of an organic solvent. The first photoresist film is patterned, and forms a first photo pattern. The base substrate having the first photo pattern is heated, and forms a first baked pattern. The metal layer is patterned using the first baked pattern, and forms a metal pattern.

Abstract: In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat unit represented by the following Chemical Formula 2, about 0.5 to about 10 parts by weight of a photo-acid generator, about 1 to about 20 parts by weight of a cross-linker and about 10 to about 200 parts by weight of a solvent. The photoresist composition may improve the heat resistance and adhesion ability of a photoresist pattern. wherein R1 and R2 independently represent an alkyl group having 1 to 5 carbon atoms, and n and m independently represent a natural number.

Abstract: A method of measuring a position error of a beam of an exposure apparatus and an exposure apparatus using the same are provided. An exposure apparatus using a digital micromirror device (DMD) element instead of a mask measures a radiation amount of a beam that passes through each pinhole using a mask including a pinhole, and when the radiation amount is less than a reference value, it is determined that an exposure beam has a position error. By using the exposure apparatus and a method of measuring a position error of a beam, a measurement time period is reduced, and a position error of a beam is simply and accurately determined.

Abstract: Provided is a method of manufacturing a display substrate. In the method, a gate line, a data line crossing the gate line, and a switching device are formed on a base substrate. A passivation layer, a first resist layer and a second resist layer are formed on the base substrate. The first resist layer and the second resist layer are patterned to form a resist pattern and an etch-stop pattern, the etch-stop pattern having a sidewall protruding from a sidewall of the resist pattern. A portion of the passivation layer is removed to form a contact hole on a drain electrode of the switching device. A pixel electrode electrically connected to the switching device through the contact hole is formed. Thus, an undercut between an etch-stop pattern and a resist pattern may be more easily formed without over-etching a passivation layer.

Abstract: A thinner composition is provided which includes about 60-80% by weight of propylene glycol mono-alkyl ether having a boiling point of T1° C., about 10-30% by weight of alkyl acetate having a boiling point of T2° C., and about 1-10% by weight of a solvent. The solvent has a boiling point of T3° C. and satisfies the equation (1). T2<T3<T2+30??(1).

Abstract: A method of forming an interconnection line and a method of manufacturing a thin film transistor substrate are provided in accordance with one or more embodiments of the present invention. The method of forming an interconnection line in accordance with one or more embodiments of the present invention includes preparing a substrate, forming a lower organic layer and an upper organic layer on the substrate in lamination, forming trenches in parts of the upper organic layer and the lower organic layer, forming a lower interconnection layer in the trenches formed in parts of the lower organic layer, removing the upper organic layer, and filling the trenches formed in parts of the lower organic layer with an upper interconnection layer.

Abstract: A photoresist resin composition, a method for forming a pattern and a method for manufacturing a display panel using the photoresist resin composition are disclosed. The photoresist resin composition includes an alkali soluble resin, a photoresist compound, and a solvent, wherein the alkali soluble resin includes a first polymer resin represented by the following Chemical Formula 1, wherein, of R1, R2, R3, R4, R5 and R6, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen, and of R7, R8, R9, R10 and R11, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen.

Abstract: A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about 20% by weight of a cross-linker, about 0.1 to about 5% by weight of a dye and about 10 to about 80% by weight of a solvent. The photoresist composition may be applied to, for example, a method of manufacturing a TFT substrate.

Abstract: In accordance with one or more embodiments of the present disclosure, a liquid crystal display includes a first substrate, a plurality of first signal lines formed on the first substrate, a plurality of second signal lines intersecting the first signal lines, a plurality of thin film transistors connected to the first signal lines and the second signal lines, an organic insulator formed on the thin film transistors, a plurality of pixel electrodes formed on the organic insulator, a second substrate facing the first substrate, a common electrode formed on the second substrate, a sealant disposed between the first substrate and the second substrate and formed according to the circumference of the second substrate, and a liquid crystal layer interposed between the first substrate and the second substrate and disposed in a region defined by the sealant. The organic insulator includes an opening formed at a position overlapping the sealant.

Abstract: A photoresist composition includes; a novolac resin prepared from a phenol compound, wherein the m-cresol constitutes about 70% to about 85% by weight of the weight of the phenol compound, a diazide compound, and an organic solvent.

Abstract: A display substrate includes a gate wiring, a data wiring, a switching element, an organic layer, and a pixel electrode. The gate wiring contacts a first transparent conductive layer formed on the gate wiring. The data wiring crosses the gate wiring. The data wiring contacts a second transparent conductive layer formed on the data wiring. The switching element is connected to the gate and data wirings. The organic layer is formed on a base substrate having the switching element formed thereon. The organic layer has first and second trenches corresponding to the first and second transparent conductive layers, respectively. The pixel electrode is formed in a pixel area of the organic layer.

Abstract: A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.

Abstract: A method of planarizing a substrate. An organic layer is formed on a base substrate to cover a metal line formed on the base substrate. A portion of the organic layer is removed to form a pre-planarization layer exposing the metal layer, so that a surface of the base substrate having the metal line is planarized. The pre-planarization layer is cured to flow toward a side surface of the metal line to form a planarization layer making contact with the side surface of the metal line. Therefore, a stepped portion between the base substrate and the metal line can be minimized or substantially eliminated, thereby increasing the surface uniformity of a subsequent layer, thereby improving the reliability of the manufacturing process.

Abstract: A halftone mask includes a transparent substrate, a light-blocking layer, a first semi-transparent layer and a second semi-transparent layer. The transparent substrate includes a light-blocking area, a light-transmitting area, a first halftone area transmitting first light, and a second halftone area transmitting second light that is less than the first light. The light-blocking layer is formed in the light-blocking area to fully block light from being transmitted. The first and second semi-transparent layers are formed on the transparent substrate. At least one of the first and second semi-transparent layers is formed in the first halftone area, and the first and second semi-transparent layers are overlapped with each other on the second halftone area.

Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.

Abstract: A manufacturing method of a display device, wherein the manufacturing method for an embodiment includes: forming color filters in a plurality of pixel regions; forming a conductive layer on the color filters; and separating the conductive layer in each of the pixel regions through a photolithography process and forming a pixel electrode; wherein a groove is formed between the adjacent color filters having different colors at boundaries between the pixel regions; and wherein the photolithography process uses a negative photoresist material.