Patents by Inventor Hideaki Kondo

Hideaki Kondo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240360918
    Abstract: A fluid control valve improves position stability of a displacement expanding mechanism, and includes an actuator for driving the valve body, and the displacement expanding mechanism interposed between the valve body and the actuator to expand displacement of the actuator and transmit the displacement to the valve body. The displacement expanding mechanism includes an input member that is displaced upon receiving a driving force from the actuator, and a plurality of lever members that are disposed around a central axis of the valve body between the input member and the valve body, and expand displacement of the input member and transmit the displacement to the valve body. The plurality of lever members each have a contact surface with which the input member comes into contact to serve as a force point portion. The contact surface forms a downward gradient toward the central axis of the valve body.
    Type: Application
    Filed: March 20, 2024
    Publication date: October 31, 2024
    Inventors: Noriaki KONDO, Hideaki MIYAMOTO, Naoya TASAKA
  • Patent number: 12037467
    Abstract: Provided is an oil-in-water-type emulsion composition which can be produced by directly emulsifying an organopolysiloxane having a high polymerization degree, contains substantially no oversized particle, and has a small average particle size. A method for producing the oil-in-water-type emulsion composition using a vertical batch mixer is also provided. The oil-in-water-type emulsion composition is an emulsion comprising (A) an organopolysiloxane having an overall viscosity of 1,000,000 mPa·s or more or having plasticity or a mixture thereof, (B) a surfactant, and (C) water. Component (A) is emulsified in water by the action of component (B), the average particle size of emulsion particles falls within the range from 0.1 to 7.5 ?m, and the content of emulsion particles each having a particle size 10 times or more larger than the average particle size is less than 5.0 vol %.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: July 16, 2024
    Assignee: Dow Toray Co., Ltd.
    Inventors: Hideaki Komori, Kazuhiko Kojima, Takatoshi Toyama, Hidetoshi Kondo
  • Patent number: 10345728
    Abstract: A toner for electrophotography containing a resin binder containing a crystalline composite resin C and an amorphous polyester A and an ester wax, wherein the crystalline composite resin C is a resin containing a polycondensation resin component and a styrenic resin component, wherein the polycondensation resin component is obtained by polycondensing an alcohol component containing an aliphatic diol having 9 or more carbon atoms and 14 or less carbon atoms, and a carboxylic acid component containing an aliphatic dicarboxylic acid compound having 9 or more carbon atoms and 14 or less carbon atoms, wherein a mass ratio of the amorphous polyester A to the crystalline composite resin C (amorphous polyester A/crystalline composite resin C) is 60/40 or more and 95/5 or less, and wherein a mass ratio of the crystalline composite resin C to the ester wax (crystalline composite resin C/ester wax) is 0.5 or more and 9 or less.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: July 9, 2019
    Assignee: Kao Corporation
    Inventors: Hideaki Kondo, Kohei Katayama, Kouta Ijichi, Hiroki Kakiuchi
  • Publication number: 20180348656
    Abstract: A toner for electrophotography containing a resin binder containing a crystalline composite resin C and an amorphous polyester A and an ester wax, wherein the crystalline composite resin C is a resin containing a polycondensation resin component and a styrenic resin component, wherein the polycondensation resin component is obtained by polycondensing an alcohol component containing an aliphatic diol having 9 or more carbon atoms and 14 or less carbon atoms, and a carboxylic acid component containing an aliphatic dicarboxylic acid compound having 9 or more carbon atoms and 14 or less carbon atoms, wherein a mass ratio of the amorphous polyester A to the crystalline composite resin C (amorphous polyester A/crystalline composite resin C) is 60/40 or more and 95/5 or less, and wherein a mass ratio of the crystalline composite resin C to the ester wax (crystalline composite resin C/ester wax) is 0.5 or more and 9 or less.
    Type: Application
    Filed: December 4, 2015
    Publication date: December 6, 2018
    Applicant: Kao Corporation
    Inventors: Hideaki KONDO, Kohei KATAYAMA, Kouta IJICHI, Hiroki KAKIUCHI
  • Patent number: 9385016
    Abstract: In a processing system of a linear tool in which plural carrying robots are arranged in carrying mechanical units to which processing modules are coupled and a processing target is delivered and received between the plural carrying robots, in the case where there are plural carrying routes on which the processing target is carried, the present invention provides a technique for determining the carrying route on which the highest throughput can be obtained. In the processing system of a linear tool, in the case where there are plural carrying routes on which the processing target is carried, the throughputs of the respective carrying routes are compared to each other, and the carrying route is determined by a unit for selecting the carrying route with the highest throughput.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: July 5, 2016
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Teruo Nakata, Hideaki Kondo, Keita Nogi
  • Patent number: 9343340
    Abstract: A vacuum processing apparatus is disclosed for processing workpieces. The apparatus includes a load lock adapted to store the workpiece inside and to be switched between atmosphere and vacuum. Vacuum transport chambers are connected to the load lock and to the corresponding process chambers in a state where the load lock and each of the process chambers are isolated. The workpiece can be transferred between each of the process chambers and the load lock via the corresponding vacuum transport chamber. The apparatus also includes load lock valves for switching between interrupt and opening between the load lock and the corresponding vacuum transport chambers, and process chamber valves for switching between interrupt and opening between the process chambers and the corresponding vacuum transport chambers. Timing for opening and closing the valves is controlled in synchronization with the transfer of the workpieces.
    Type: Grant
    Filed: February 7, 2011
    Date of Patent: May 17, 2016
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Keita Nogi, Hideaki Kondo, Susumu Tauchi, Teruo Nakata
  • Patent number: 9188998
    Abstract: In a constant voltage circuit including: an error amplifier circuit amplifying a difference voltage between an output voltage and a reference voltage; and an output transistor controlling the output voltage based on an output of the error amplifier circuit, a voltage proportional to a leakage current detected by a monitoring transistor is generated by an oscillation circuit and a charge pump circuit and is supplied to a back gate of the output transistor.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: November 17, 2015
    Assignee: SOCIONEXT INC.
    Inventors: Yuma Yano, Akimitsu Tajima, Hideaki Kondo
  • Publication number: 20150194327
    Abstract: A vacuum processing system of a semiconductor processing substrate and a vacuum processing method using the same comprises an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer transferred from the atmospheric transfer chamber, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, a second vacuum transfer chamber connected to the transfer intermediate chamber, at least one vacuum processing chamber connected to the first vacuum transfer chamber, and two or more vacuum processing chambers connected to a rear side of the second vacuum transfer chamber, wherein the number of vacuum processing chambers connected to the first vacuum transfer chamber is smaller than the number of vacuum processing chambers connected to the second vacuum transfer chamber, or the number of use of vacuum processing chambers connected to the fir
    Type: Application
    Filed: March 20, 2015
    Publication date: July 9, 2015
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Susumu Tauchi, Hideaki Kondo, Teruo Nakata, Keita Nogi, Atsushi Shimoda, Takafumi Chida
  • Patent number: 9011065
    Abstract: A vacuum processing apparatus which includes an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, and a second vacuum transfer chamber connected to the transfer intermediate chamber. At least one vacuum processing chamber is connected to the first vacuum transfer chamber, and two or more vacuum processing chambers are connected to a rear side of the second vacuum transfer chamber. A plurality of gate valves are disposed between the first vacuum transfer chamber and each of the lock chamber, the transfer intermediate chamber, and the vacuum processing chamber coupled to the first vacuum transfer chamber. A control unit is also provided for controlling operation of the gate valves.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: April 21, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Susumu Tauchi, Hideaki Kondo, Teruo Nakata, Keita Nogi, Atsushi Shimoda, Takafumi Chida
  • Patent number: 8969480
    Abstract: To provide a polymer alloy formed of a non-polar rubber and a polar rubber, and a rubber product, which are improved in ozone resistance (weather resistance) while having oil resistance and can achieve high mechanical strength (in particular, tensile strength), and a production method thereof. A rubber product in which an organic peroxide or other cross-linking agent is used to cross-link a polymer alloy comprising: a modified rubber in which EPDM, NR, or another non-polar rubber having a non-conjugated double bond is modified with 2-methoxy-1-naphthonitrile oxide, 2,6-dimethoxybenzonitrile oxide, or another nitrile oxide of an aromatic nitrile oxide derivative; and nitrile rubber, acrylic rubber, or another polar rubber.
    Type: Grant
    Filed: November 21, 2011
    Date of Patent: March 3, 2015
    Assignee: Toyoda Gosei Co., Ltd.
    Inventors: Naoki Iwase, Hideyuki Imai, Akishige Seo, Hideaki Kondo, Yusuke Katono
  • Patent number: 8890503
    Abstract: A power supply has first and second reference voltage sources; a step-down voltage generator, including a transistor supplied with a first voltage, a resistor string between the transistor and a second voltage, and an op-amp which controls the transistor, and outputting the voltage at a first node among nodes in the resistor string; switches, coupled to the nodes; a comparison circuit, which compares the voltage at a common node the switches coupling in common with the second reference voltage source; and a calibration control circuit, which selects any switch according to a comparison result to calibrate. During calibration, the calibration control circuit couples a second node among the nodes to a non-inverting terminal of the op-amp, and the first reference voltage source to an inverting terminal of the op-amp, and after calibration, couples the common node to the non-inverting terminal, and the second reference voltage source to the inverting terminal.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: November 18, 2014
    Assignee: Fujitsu Semiconductor Limited
    Inventors: Hiroto Kodama, Akimitsu Tajima, Hideaki Kondo, Osamu Moriwaki
  • Patent number: 8849446
    Abstract: The present invention provides an efficient transferring control method in a vacuum processing apparatus of a linear tool in which plural vacuum robots are arranged in transferring mechanical units to which process chambers are connected and processing-target members are passed and received among the plural vacuum robots. In addition, the present invention provides a vacuum processing apparatus in which there are provided plural controlling methods, and a unit which determines whether rates of the transferring robots are to be controlled or rates of the process chambers are to be controlled on the basis of processing time of each processing-target member and switches the controlling method in accordance with a site whose rate is controlled.
    Type: Grant
    Filed: February 7, 2011
    Date of Patent: September 30, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Teruo Nakata, Hideaki Kondo, Susumu Tauchi, Keita Nogi
  • Patent number: 8747046
    Abstract: The vacuum processing apparatus is comprised of two vacuum transfer vessels in which a wafer is transferred through; two vacuum process vessels connected to these vacuum transfer vessels respectively; an intermediate chamber vessel capable of storing thereinto the wafer connected between the vacuum transfer vessels; a lock chamber connected to one of the vacuum transfer vessels; and a plurality of valves disposed among the vacuum transfer vessels, the vacuum process vessels, the intermediate chamber vessel, and the lock chamber respectively, for airtightly opening/closing communications among these vessels and the chamber; in which any one of the valves disposed on both sides of the intermediate chamber vessel is closed before the valves disposed between processing chambers of the vacuum process vessels and vacuum transfer chambers of the vacuum transfer vessels is opened.
    Type: Grant
    Filed: February 7, 2011
    Date of Patent: June 10, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Ryoichi Isomura, Susumu Tauchi, Hideaki Kondo
  • Publication number: 20140044502
    Abstract: In a vacuum processing apparatus including a plurality of vacuum transfer vessels arranged back and forth at the back of a lock chamber, an intermediate chamber arranged between them and capable of accommodating wafers, and processing units connected to respective vacuum transfer vessels, a wafer processed in a pre-processing vessel out of the processing units connected to the respective vacuum transfer vessels is transferred to a post-processing vessel connected to the same vacuum transfer vessel and post-processing is performed.
    Type: Application
    Filed: September 7, 2012
    Publication date: February 13, 2014
    Inventors: Takashi UEMURA, Hideaki Kondo, Masakazu Isozaki, Takahiro Shimomura
  • Publication number: 20140018503
    Abstract: To provide a polymer alloy formed of a non-polar rubber and a polar rubber, and a rubber product, which are improved in ozone resistance (weather resistance) while having oil resistance and can achieve high mechanical strength (in particular, tensile strength), and a production method thereof. A rubber product in which an organic peroxide or other cross-linking agent is used to cross-link a polymer alloy comprising: a modified rubber in which EPDM, NR, or another non-polar rubber having a non-conjugated double bond is modified with 2-methoxy-1-naphthonitrile oxide, 2,6-dimethoxybenzonitrile oxide, or another nitrile oxide of an aromatic nitrile oxide derivative; and nitrile rubber, acrylic rubber, or another polar rubber.
    Type: Application
    Filed: November 21, 2011
    Publication date: January 16, 2014
    Applicant: TOYODA GOSEI CO., LTD.
    Inventors: Naoki Iwase, Hideyuki Imai, Akishige Seo, Hideaki Kondo, Yusuke Katono
  • Patent number: 8538573
    Abstract: Provided is a method for controlling efficient transferring operations in a vacuum processing apparatus with a linear tool. In the apparatus, plural transferring robots are arranged in transferring mechanism units in which plural process chambers are connected with each other, and to-be-processed wafers are received and passed between plural transferring robots. As the transferring robots is far from the load lock, the number of transferring operations to the process chambers is set larger, the number of times of continuous transferring operations to the process chambers is set as small as possible, and an odd number of times of continuous transferring operations to buffer rooms is set, by a destination determination unit and operation control rules. Further, transferring operations are performed based on the destination determination unit and the operation control rules.
    Type: Grant
    Filed: February 7, 2011
    Date of Patent: September 17, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Teruo Nakata, Hideaki Kondo, Susumu Tauchi, Keita Nogi
  • Publication number: 20130183121
    Abstract: In a vacuum processing apparatus having a plurality of vacuum processing chambers at least one of which are coupled to each of a plurality of vacuum transfer chambers which are behind an atmospheric transfer chamber and have vacuum transfer robots in their interior to transfer a wafer, taking out a plurality of wafers in a cassette and transferring successively to the plurality of the vacuum processing chambers, and thereafter returning to the cassette, the wafers are controlled to be transferred to all of the vacuum processing chambers coupled to the backmost vacuum transfer chamber and thereafter a next wafer is transferred to a vacuum processing chamber which becomes possible for the next wafer to be transferred in before they are possible to be transferred out from the vacuum processing chambers coupled to the backmost vacuum transfer chamber and arranged backmost.
    Type: Application
    Filed: March 1, 2012
    Publication date: July 18, 2013
    Inventors: Ryoichi Isomura, Susumu Tauchi, Hideaki Kondo, Michiaki Kobayashi
  • Patent number: 8244188
    Abstract: A transmitting and receiving circuit includes a transmitting side amplifier circuit amplifying a transmission signal transmitted from an antenna, a receiving side amplifier circuit amplifying a reception signal received by the antenna and being electrically connected to the a transmitting side amplifier circuit, a first matching circuit matching the antenna and the transmitting side amplifier circuit, a second matching circuit matching the antenna and the receiving side amplifier circuit, a first current source circuit capable of controlling an operating state and setting a first connection point between the first matching circuit and an output terminal of the transmitting side amplifier circuit to a given voltage, and a second current source circuit capable of controlling an operating state and setting a second connection point between the second matching circuit and an input terminal of the receiving side amplifier circuit to a given voltage.
    Type: Grant
    Filed: January 22, 2010
    Date of Patent: August 14, 2012
    Assignee: Fujitsu Limited
    Inventors: Masaru Sawada, Hideaki Kondo, Norio Murakami
  • Publication number: 20120163943
    Abstract: The vacuum processing apparatus is comprised of two vacuum transfer vessels in which a wafer is transferred through; two vacuum process vessels connected to these vacuum transfer vessels respectively; an intermediate chamber vessel capable of storing thereinto the wafer connected between the vacuum transfer vessels; a lock chamber connected to one of the vacuum transfer vessels; and a plurality of valves disposed among the vacuum transfer vessels, the vacuum process vessels, the intermediate chamber vessel, and the lock chamber respectively, for airtightly opening/closing communications among these vessels and the chamber; in which any one of the valves disposed on both sides of the intermediate chamber vessel is closed before the valves disposed between processing chambers of the vacuum process vessels and vacuum transfer chambers of the vacuum transfer vessels is opened.
    Type: Application
    Filed: February 7, 2011
    Publication date: June 28, 2012
    Inventors: Ryoichi ISOMURA, Susumu Tauchi, Hideaki Kondo
  • Patent number: 8148268
    Abstract: The invention provides a plasma treatment apparatus or a plasma treatment method having a high productivity while maintaining a stable treatment performance.
    Type: Grant
    Filed: February 29, 2008
    Date of Patent: April 3, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kohei Sato, Hideaki Kondo, Susumu Tauchi, Akitaka Makino