Patents by Inventor Hideaki Mitsui
Hideaki Mitsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11820956Abstract: The present disclosure relates to a lubricating fluid for an electric motor system and a method of lubricating gears and cooling a motor in an electric motor system. In particular, the disclosed technology relates to a lubricating fluid, for use in electric motor vehicle, comprising an oil of lubricating viscosity and at least one phosphorylated dispersant exhibiting increased resistivity after aging.Type: GrantFiled: April 14, 2022Date of Patent: November 21, 2023Assignee: Afton Chemical CorporationInventors: Tsuneo Adachi, Lesley Schmid, Hideaki Mitsui, Christopher Cleveland, Atanu Adhvaryu
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Publication number: 20220380698Abstract: The present disclosure relates to a lubricating fluid for an electric motor system and a method of lubricating gears and cooling a motor in an electric motor system. In particular, the disclosed technology relates to a lubricating fluid, for use in electric motor vehicle, comprising an oil of lubricating viscosity and at least one phosphorylated dispersant exhibiting increased resistivity after aging.Type: ApplicationFiled: April 14, 2022Publication date: December 1, 2022Inventors: Tsuneo Adachi, Lesley Schmid, Hideaki Mitsui, Christopher Cleveland, Atanu Adhvaryu
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Patent number: 11332689Abstract: The present disclosure relates to a lubricating fluid for an electric motor system and a method of lubricating gears and cooling a motor in an electric motor system. In particular, the disclosed technology relates to a lubricating fluid, for use in electric motor vehicle, comprising an oil of lubricating viscosity and at least one phosphorylated dispersant exhibiting increased resistivity after aging.Type: GrantFiled: August 7, 2020Date of Patent: May 17, 2022Assignee: Afton Chemical CorporationInventors: Tsuneo Adachi, Lesley Schmid, Hideaki Mitsui, Christopher Cleveland, Atanu Adhvaryu
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Publication number: 20220041951Abstract: The present disclosure relates to a lubricating fluid for an electric motor system and a method of lubricating gears and cooling a motor in an electric motor system. In particular, the disclosed technology relates to a lubricating fluid, for use in electric motor vehicle, comprising an oil of lubricating viscosity and at least one phosphorylated dispersant exhibiting increased resistivity after aging.Type: ApplicationFiled: August 7, 2020Publication date: February 10, 2022Inventors: Tsuneo Adachi, Lesley Schmid, Hideaki Mitsui, Christopher Cleveland, Atanu Adhvaryu
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Patent number: 8609304Abstract: An internal defect or the like of a transfer mask is detected using transmitted light quantity distribution data of an inspection apparatus. Using a die-to-die comparison inspection method, inspection light is irradiated to a first region of a thin film to obtain a first transmitted light quantity distribution, the inspection light is also irradiated to a second region of the thin film to obtain a second transmitted light quantity distribution, a predetermined-range difference distribution is produced by plotting coordinates at which difference light quantity values calculated from a comparison between the first transmitted light quantity distribution and the second transmitted light quantity distribution are each not less than a first threshold value and less than a second threshold value, and a selection is made of a transfer mask in which a region with high density of plotting is not detected in the predetermined-range difference distribution.Type: GrantFiled: March 30, 2012Date of Patent: December 17, 2013Assignee: Hoya CorporationInventors: Masaru Tanabe, Hideaki Mitsui, Naoki Nishida, Satoshi Iwashita
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Publication number: 20120251928Abstract: An internal defect or the like of a transfer mask is detected using transmitted light quantity distribution data of an inspection apparatus. Using a die-to-die comparison inspection method, inspection light is irradiated to a first region of a thin film to obtain a first transmitted light quantity distribution, the inspection light is also irradiated to a second region of the thin film to obtain a second transmitted light quantity distribution, a predetermined-range difference distribution is produced by plotting coordinates at which difference light quantity values calculated from a comparison between the first transmitted light quantity distribution and the second transmitted light quantity distribution are each not less than a first threshold value and less than a second threshold value, and a selection is made of a transfer mask in which a region with high density of plotting is not detected in the predetermined-range difference distribution.Type: ApplicationFiled: March 30, 2012Publication date: October 4, 2012Applicant: HOYA CORPORATIONInventors: Masaru TANABE, Hideaki MITSUI, Naoki NISHIDA, Satoshi IWASHITA
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Publication number: 20120034553Abstract: A low reflective photomask blank suitable for shortened exposure wavelengths is disclosed. A photomask blank (1) having a single-layer or multilayer light-shielding film (3) arranged on a translucent substrate (2) and mainly containing a metal is characterized by comprising an antireflective film (6), which at least contains silicon and oxygen and/or nitrogen, on the light-shielding film (3).Type: ApplicationFiled: October 13, 2011Publication date: February 9, 2012Inventors: Mitsuhiro Kureishi, Hideaki Mitsui
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Patent number: 8048594Abstract: A photomask blank is for fabricating a phase shift mask having a light-transmissive substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure light. The phase shift part is a dug-down part formed by digging down the light-transmissive substrate from a surface thereof to a digging depth adapted to produce the predetermined phase difference with respect to exposure light transmitted through the light-transmissive substrate at a portion where the phase shift part is not provided.Type: GrantFiled: September 18, 2009Date of Patent: November 1, 2011Assignee: Hoya CorporationInventors: Masahiro Hashimoto, Hideaki Mitsui
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Patent number: 8021806Abstract: A photomask blank for manufacturing a phase shift mask having a light-transmitting substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure light. An etching mask film serving as an etching mask when forming a phase shift part is provided on the front surface side, where the phase shift part is to be formed, of the substrate. A light-shielding film serving to shield exposure light is provided on the back surface side (opposite-side surface) of the substrate.Type: GrantFiled: June 29, 2009Date of Patent: September 20, 2011Assignee: Hoya CorporationInventors: Masahiro Hashimoto, Hideaki Mitsui
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Patent number: 8012314Abstract: There is disclosed a manufacturing method of a phase shift mask blank in which dispersions of phase angle and transmittance among blanks can be reduced as much as possible and yield is satisfactory. In the manufacturing method of the phase shift mask blank, a process of using a sputtering method to continuously form a thin film on a transparent substrate comprises: successively subjecting a plurality of substrates to a series of process of supplying the transparent substrate into a sputtering chamber, forming the thin film for forming a pattern in the sputtering chamber, and discharging the transparent substrate with the film formed thereon from the sputtering chamber; supplying and discharging the transparent substrate substantially at a constant interval; and setting a film formation time to be constant among a plurality of blanks.Type: GrantFiled: March 20, 2007Date of Patent: September 6, 2011Assignee: Hoya CorporationInventors: Osamu Nozawa, Hideaki Mitsui
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Patent number: 7862963Abstract: A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film is formed by a multilayer film in which films including at least two layers having an upper layer formed on the most surface side and a lower layer formed thereunder are provided, and a thickness of the upper layer is adjusted in such a manner that a refractive index of the film to be the upper layer is smaller than that of the film to be the lower layer and a surface reflectance for the inspecting light of the phase shifter film is maximized and approximates to a maximum.Type: GrantFiled: August 17, 2009Date of Patent: January 4, 2011Assignee: Hoya CorporationInventors: Yuuki Shiota, Osamu Nozawa, Hideaki Mitsui
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Publication number: 20100075236Abstract: A photomask blank is for fabricating a phase shift mask having a light-transmissive substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure light. The phase shift part is a dug-down part formed by digging down the light-transmissive substrate from a surface thereof to a digging depth adapted to produce the predetermined phase difference with respect to exposure light transmitted through the light-transmissive substrate at a portion where the phase shift part is not provided.Type: ApplicationFiled: September 18, 2009Publication date: March 25, 2010Applicant: HOYA CORPORATIONInventors: Masahiro Hashimoto, Hideaki Mitsui
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Publication number: 20100040961Abstract: A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film is formed by a multilayer film in which films including at least two layers having an upper layer formed on the most surface side and a lower layer formed thereunder are provided, and a thickness of the upper layer is adjusted in such a manner that a refractive index of the film to be the upper layer is smaller than that of the film to be the lower layer and a surface reflectance for the inspecting light of the phase shifter film is maximized and approximates to a maximum.Type: ApplicationFiled: August 17, 2009Publication date: February 18, 2010Applicant: HOYA CORPORATIONInventors: Yuuki Shiota, Osamu Nozawa, Hideaki Mitsui
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Publication number: 20090325084Abstract: A photomask blank for manufacturing a phase shift mask having a light-transmitting substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure light. An etching mask film serving as an etching mask when forming a phase shift part is provided on the front surface side, where the phase shift part is to be formed, of the substrate. A light-shielding film serving to shield exposure light is provided on the back surface side (opposite-side surface) of the substrate.Type: ApplicationFiled: June 29, 2009Publication date: December 31, 2009Applicant: HOYA CORPORATIONInventors: Masahiro HASHIMOTO, Hideaki Mitsui
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Patent number: 7632612Abstract: A halftone phase shift mask blank for use in manufacturing a halftone phase shift mask comprises a transparent substrate, a light transmitting portion formed on the substrate for transmitting an exposure light beam, a phase shifter portion formed on the substrate for transmitting a part of the exposure light beam as a transmitted light beam and for shifting a phase of the transmitted light beam by a predetermined amount, and a phase shifter film for forming the phase shifter portion. The halftone phase shift mask has an optical characteristic such that light beams passing through the light transmitting portion and through the phase shifter portion cancel each other in the vicinity of a boundary portion therebetween, thereby maintaining and improving an excellent contrast at a boundary portion of an exposure pattern to be transferred onto the surface of an object to be exposed.Type: GrantFiled: July 3, 2006Date of Patent: December 15, 2009Assignee: Hoya CorporationInventors: Yuuki Shiota, Osamu Nozawa, Ryo Ohkubo, Hideaki Mitsui
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Patent number: 7592106Abstract: A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film is formed by a multilayer film in which films including at least two layers having an upper layer formed on the most surface side and a lower layer formed thereunder are provided, and a thickness of the upper layer is adjusted in such a manner that a refractive index of the film to be the upper layer is smaller than that of the film to be the lower layer and a surface reflectance for the inspecting light of the phase shifter film is maximized and approximates to a maximum.Type: GrantFiled: November 21, 2006Date of Patent: September 22, 2009Assignee: Hoya CorporationInventors: Yuuki Shiota, Osamu Nozawa, Hideaki Mitsui
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Patent number: 7402228Abstract: There is disclosed a manufacturing method of a phase shift mask blank in which dispersions of phase angle and transmittance among blanks can be reduced as much as possible and yield is satisfactory. In the manufacturing method of the phase shift mask blank, a process of using a sputtering method to continuously form a thin film on a transparent substrate comprises: successively subjecting a plurality of substrates to a series of process of supplying the transparent substrate into a sputtering chamber, forming the thin film for forming a pattern in the sputtering chamber, and discharging the transparent substrate with the film formed thereon from the sputtering chamber; supplying and discharging the transparent substrate substantially at a constant interval; and setting a film formation time to be constant among a plurality of blanks.Type: GrantFiled: February 4, 2004Date of Patent: July 22, 2008Assignee: Hoya CorporationInventors: Osamu Nozawa, Hideaki Mitsui
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Publication number: 20070287644Abstract: The present invention provides a lubricating oil composition comprising a base oil made of synthetic oil and/or mineral oil, admixed with an antioxidant and a polymethacrylate having a phosphate ester added to a terminal position. In a further aspect the present invention provides the use of the lubricating oil composition as a transmission oil, in particular as an automatic transmission oil.Type: ApplicationFiled: May 22, 2007Publication date: December 13, 2007Inventors: Hideaki Mitsui, Yoshitomo Fujimaki
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Patent number: 7282121Abstract: There is disclosed a manufacturing method of a phase shift mask blank in which dispersions of phase angle and transmittance among blanks can be reduced as much as possible and yield is satisfactory. In the manufacturing method of the phase shift mask blank, a process of using a sputtering method to continuously form a thin film on a transparent substrate comprises: successively subjecting a plurality of substrates to a series of process of supplying the transparent substrate into a sputtering chamber, forming the thin film for forming a pattern in the sputtering chamber, and discharging the transparent substrate with the film formed thereon from the sputtering chamber; supplying and discharging the transparent substrate substantially at a constant interval; and setting a film formation time to be constant among a plurality of blanks.Type: GrantFiled: April 9, 2004Date of Patent: October 16, 2007Assignee: Hoya CorporationInventors: Osamu Nozawa, Hideaki Mitsui
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Publication number: 20070187228Abstract: There is disclosed a manufacturing method of a phase shift mask blank in which dispersions of phase angle and transmittance among blanks can be reduced as much as possible and yield is satisfactory. In the manufacturing method of the phase shift mask blank, a process of using a sputtering method to continuously form a thin film on a transparent substrate comprises: successively subjecting a plurality of substrates to a series of process of supplying the transparent substrate into a sputtering chamber, forming the thin film for forming a pattern in the sputtering chamber, and discharging the transparent substrate with the film formed thereon from the sputtering chamber; supplying and discharging the transparent substrate substantially at a constant interval; and setting a film formation time to be constant among a plurality of blanks.Type: ApplicationFiled: March 20, 2007Publication date: August 16, 2007Inventors: Osamu Nozawa, Hideaki Mitsui