Abstract: A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film is formed by a multilayer film in which films including at least two layers having an upper layer formed on the most surface side and a lower layer formed thereunder are provided, and a thickness of the upper layer is adjusted in such a manner that a refractive index of the film to be the upper layer is smaller than that of the film to be the lower layer and a surface reflectance for the inspecting light of the phase shifter film is maximized and approximates to a maximum.

Abstract: The invention provides an aqueous dispersion having excellent adherence and appearance of coated film and yet giving a coated film with good oil resistance for moldings or films of polyolefinic resin, as a resin for paint, ink or adhesive.

Abstract: The invention provides a package of solid material of carboxylic anhydride-modified chlorinated polyolefin to be used for a binder resin for paint or primer that aims at the protection or beautiful ornament of polyolefinic resins, capable of suppressing the changes in physical properties after storing for a long term, and a method of preserving said solid material.

Abstract: The invention provides a binder resin solution for paint, primer, printing ink or adhesive with good adherence to polyolefin and excellent solvent resistance, without injuring the low-temperature fluidity and the stability of viscosity over the time of carboxyl group-containing chlorinated polyolefin.

Abstract: A halftone phase-shift mask blank, in which the phase shifter film is composed of two layers, a low-transmission layer having a principal function of transmittance control, and a high-transmission layer having a principal function of phase shift control, the extinction coefficient K1 of the low-transmission layer and the extinction coefficient K2 of the high-transmission layer satisfy K2<K1≦3.0 at an exposure wavelength &lgr; falling between 140 nm and 200 nm, and the thickness d1 of the low-transmission layer satisfies 0.001≦K1d1/&lgr;≦0.500 at the exposure wavelength &lgr;.

Abstract: Disclosed is a polyamide-modified polyolefin composition obtainable by heating to react modified polyolefin with weight average molecular weight of not less than 5,000 to not more than 150,000, graft modified so as the content of unsaturated carboxylic acid anhydride to become 0.1 to 20 wt. % and polyamide with number average molecular weight of not less than 3,000 to not more than 30,000 at a particular weight ratio. The purpose is to provide a novel chlorine-free modified polyolefin with excellent adherence to polyolefin substrates, with no tack, and also with excellent cohesion.

Abstract: There is provided a manufacturing apparatus and method able to manufacture a phase shift mask blank in which a total number of particles and pinholes having a diameter larger than about a half of an exposure wavelength in a light semi-transmission film is 0.1 or less per square centimeter. In a DC magnetron sputtering apparatus for manufacturing a halftone phase shift mask blank, for example, a target plane is disposed downwards with respect to a gravity direction, a whole-surface erosion cathode is used, a corner portion 5a of an end of a target and a corner portion of an earth shield are chamfered (R processed), a target end 5b, an exposed backing plate surface 4b and the surface of an earth shield 12 are roughened, and the earth shield 12 is disposed above a target plane d (on a backing plate side).

Abstract: There is disclosed a manufacturing method of a phase shift mask blank in which dispersions of phase angle and transmittance among blanks can be reduced as much as possible and yield is satisfactory. In the manufacturing method of the phase shift mask blank, a process of using a sputtering method to continuously form a thin film on a transparent substrate comprises: successively subjecting a plurality of substrates to a series of process of supplying the transparent substrate into a sputtering chamber, forming the thin film for forming a pattern in the sputtering chamber, and discharging the transparent substrate with the film formed thereon from the sputtering chamber; supplying and discharging the transparent substrate substantially at a constant interval; and setting a film formation time to be constant among a plurality of blanks.

Abstract: There is disclosed a halftone phase shift mask blank, in which, for example, a semitransparent film (halftone phase shifter film) 2 contains silicon, palladium, and at least one selected from nitrogen, oxygen and hydrogen, and silicon and palladium contained in the semitransparent film are in a relation represented by the following equation: [atom % of palladium in the film]/[(atom % of palladium in the film)+(atom % of silicon in the film)]×100=10 to 40(%).

Abstract: An object of the present invention is to provide a half-tone phase shift mask blank and a half-tone phase shift mask of which a translucent film has improved acid resistance, alkali resistance and resistance to excimer laser irradiation while maintaining the internal stress of the film within an acceptable range for the intended use.

Abstract: To provide a method for manufacturing a phase shift mask blank having a light translucent film or a light translucent portion having the designated phase angle and transmittance and being superior in film characteristics of chemical resistance, light resistance, and internal stress. The invention is characterized by having a translucent film on a transparent substrate, wherein thermal treatment of the translucent film is implemented at more than 150° C. after forming the translucent film comprising nitrogen, metal, and silicon as a main component on said transparent substrate.

Abstract: Disclosed is a polyamide-modified polyolefin composition obtainable by heating to react modified polyolefin with weight average molecular weight of not less than 5,000 to not more than 150,000, graft modified so as the content of unsaturated carboxylic acid anhydride to become 0.1 to 20 wt. % and polyamide with number average molecular weight of not less than 3,000 to not more than 30,000 at a particular weight ratio. The purpose is to provide a novel chlorine-free modified polyolefin with excellent adherence to polyolefin substrates, with no tack, and also with excellent cohesion.

Abstract: The method of manufacturing a halftone phase shift mask blank enables the accurate and easy control over the composition of an MSi semitransparent film that makes it easy to obtain an MSi semitransparent film having a desired specific component, the formation of film with ease at a good reproducibility and the reduction of defects in the layer.

Abstract: In a half-tone type phase shift mask blank in which a semi-transparent film is formed on a transparent substrate, and the semi-transparent film serves to shift phase of a first optical light beam which transmits the semi-transparent film for a second optical light beam which directly transmits the transparent substrate and further, serves to reduce strength of the first optical light beam, the semi-transparent film includes silicon and nickel, and at least one selected from the group consisting of nitrogen, oxygen and hydrogen, and the relationship between the silicon and the nickel is specified by a formula in which a rate of [atom % of the nickel in the film] for [atom % of the nickel in the film+atom % of the silicon in the film] falls within the range between 0.15 and 0.5.

Abstract: PURPOSE: To provide the phase shift mask which can be produced while the generation of microdefects is suppressed with relatively simple stages and with which pattern transfer with a high resolution is possible and the phase shift mask blank which is the blank material thereof.CONSTITUTION: The mask patterns to be formed on a transparent substrate 1 of this phase shift mask are composed of light transparent parts 4 which allow the transmission of light of the intensity substantially contributing to exposing and light translucent parts 2 which allow the transmission of the light of the intensity substantially contributing to exposing.