Patents by Inventor Hideaki Nagai

Hideaki Nagai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220106146
    Abstract: The present invention provides a sheet stacking device, a counter-ejector, and a carton former and is provided with: a hopper unit that stacks cardboard boxes; feed rollers that feed a cardboard box to the hopper unit; a first blower device that blows air from above the hopper unit toward the cardboard box fed by the feed rollers; and a second blower device that blows air between the cardboard box stacked in the hopper unit and the cardboard box fed by the feed roller.
    Type: Application
    Filed: December 11, 2019
    Publication date: April 7, 2022
    Inventors: Hiroyuki KANAZAWA, Yoshitomo NODA, Tomohiro AKAKI, Koshi TANIMOTO, Hideaki NAGAI, Makoto SHIMOHATSUBO
  • Publication number: 20210300710
    Abstract: A sheet stacking device is provided with a hopper unit configured to stack a sheet, a feeding unit configured to feed out the sheet to the hopper unit, a distance detection unit configured to detect an inter-sheet distance, in the vertical direction, between a rear end portion of the sheet that is preceding and a tip end portion of the sheet that is subsequent, and an output unit configured to output a behavior stabilization command for the sheet based on the inter-sheet distance.
    Type: Application
    Filed: January 26, 2021
    Publication date: September 30, 2021
    Inventors: Hideaki NAGAI, Hiroyuki KANAZAWA, Koshi TANIMOTO, Kenta NAKAO
  • Patent number: 11056362
    Abstract: Provided are a wafer heating and holding mechanism for a rotary table, a wafer heating method for a rotary table, and a wafer rotating and holding device with which a wafer put on a rotary table can be heated while being rotated stably under a state in which an in-plane temperature distribution of the wafer is maintained. The wafer heating and holding mechanism for a rotary table of a wafer rotating and holding device comprises: a rotary shaft; a rotary table placed on an end of the rotary shaft and configured to hold a wafer on an upper surface of the rotary table; a drive motor configured to supply motive power to the rotary shaft; and a heater provided above the rotary table and below the wafer while avoiding contact with the wafer to heat the wafer.
    Type: Grant
    Filed: May 18, 2017
    Date of Patent: July 6, 2021
    Assignee: Mimasu Semiconductor Industry Co., LTD.
    Inventors: Osamu Yoshida, Masaki Tamura, Hideaki Nagai
  • Patent number: 10914386
    Abstract: An object of the invention is to provide a method of controlling a gate valve that operates the gate valve in a short time while suppressing vibration of the valve body. A method of controlling a gate valve provided on an opening of a chamber, wherein the gate valve includes a valve body that opens and closes so as to close the opening of a chamber, a valve seat provided on the edge of the opening to which the valve body is pressed, and a sealing material for sealing between the valve body and the valve seat. The invented method is characterized in that, in moving the valve body to the open position from the closed position where the valve body is pressed against the valve seat with the sealing material compressed, the valve body is made to stop temporarily for a predetermined time at the position immediately before the compressed sealing material is pulled apart or immediately after pulled apart in the opening movement of the valve body.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: February 9, 2021
    Assignee: V-Tex Corporation
    Inventors: Tomohiro Sawahata, Katsuyuki Saitoh, Hideaki Nagai, Mitsuhiro Ikeda
  • Patent number: 10818538
    Abstract: Provided are a wafer holding mechanism for a rotary table and a method and a wafer rotating and holding device, which enable change of a holding position of the wafer during spin processing while maintaining the posture of the wafer, enable reduction of marks of outer peripheral pins due to etching, and enable reduction of insufficient cleaning or uneven cleaning. The wafer holding mechanism for a rotary table comprises a rotary table configured to hold a wafer on an upper surface thereof, and a plurality of movable outer peripheral pins provided in the rotary table and configured to hold an outer periphery of the wafer. The plurality of movable outer peripheral pins comprise a plurality of first movable outer peripheral pins and a plurality of second movable outer peripheral pins configured to hold the wafer at positions different from positions at which the wafer is held by the first movable outer peripheral pins.
    Type: Grant
    Filed: May 18, 2017
    Date of Patent: October 27, 2020
    Assignee: MIMASU SEMICONDUCTOR INDUSTRY CO., LTD.
    Inventors: Ikuo Mashimo, Masaki Tamura, Hideaki Nagai
  • Patent number: 10808865
    Abstract: A method of controlling a vacuum valve includes instructing an actuator to reduce an operating speed so that an amplitude falls within the first threshold value when the amplitude obtained from a vibration sensor exceeds a first threshold value and a second threshold value. The method also includes instructing the actuator to return to the operating speed when the amplitude obtained from the vibration sensor is below the second threshold value.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: October 20, 2020
    Assignee: V-Tex Corporation
    Inventors: Hideaki Nagai, Tomohiro Sawahata
  • Publication number: 20200272136
    Abstract: A production schedule change system includes: a production schedule acquisition part configured to acquire a production schedule of a product in a case where the product is produced at an initial condition of production speed; a time information acquisition part configured to acquire time information indicating a scheduled collection time; and a schedule candidate calculation part configured to: change the production speed from the initial condition within a range defined by a quality standard of the product, based on the time information; and calculates at least one production schedule candidate satisfying a first condition that a time difference between a deliverable time of the product and the scheduled collection time is in an acceptable range and at least one of a second condition that the deliverable time is earlier than the scheduled collection time or a third condition that the scheduled collection time is earlier than the deliverable time.
    Type: Application
    Filed: November 20, 2019
    Publication date: August 27, 2020
    Inventors: Takumi FUJITA, Shoichi AOKI, Hideaki NAGAI
  • Patent number: 10746307
    Abstract: Particle scattering is suppressed only by controlling the gate valve in opening the gate valve with the internal pressure of the chamber being matched to the atmospheric pressure.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: August 18, 2020
    Assignee: V-Tex Corporation
    Inventors: Hideaki Nagai, Tomohiro Sawahata, Katsuyuki Saitoh, Shuichi Araki, Yoshinori Tobita, Mitsuhiro Ikeda
  • Patent number: 10558190
    Abstract: {Problem} In combining the master valve and the groups of slave valves, the configuration of the combination is made not for performing simply a uniform control, but is made to be such a form as capable of corresponding to the size and the inside configuration of the processing apparatus, or customer's requirements, which thereby allows a prompt adaptation to variety of demands. {Solution to Problem} In combining the master controller and the slave controller, the operation mode is set, and it is made possible to transmit the generated valve opening degree common signal and the generated valve opening degree individual signal from the master controller, corresponding to the operation mode, to the slave controllers that are connected in the sequential daisy-chain style, thereby the slave valves are opening-degree-controlled by any of such generated valve opening degree signals.
    Type: Grant
    Filed: April 20, 2017
    Date of Patent: February 11, 2020
    Assignee: V-TEX CORPORATION
    Inventors: Hideaki Nagai, Takayuki Tadokoro, Akira Iwamoto
  • Publication number: 20190346047
    Abstract: Particle scattering is suppressed only by controlling the gate valve in opening the gate valve with the internal pressure of the chamber being matched to the atmospheric pressure.
    Type: Application
    Filed: January 10, 2019
    Publication date: November 14, 2019
    Inventors: Hideaki NAGAI, Tomohiro SAWAHATA, Katsuyuki SAITOH, Shuichi ARAKI, Yoshinori TOBITA, Mitsuhiro IKEDA
  • Publication number: 20190331257
    Abstract: The object of the invention is to control the vibration of a vacuum valve within the allowable range by regulating the operation speed of the vacuum valve. A controlling method for driving a vacuum valve of a valve system is as described below. The vacuum valve to be controlled is comprised of a valve body that opens and closes the opening of a vacuum valve, an actuator that moves the valve body between closed position and open position of the valve body, a vibration sensor for detecting vibration of the valve body, and a control unit that instructs the actuator about speed of the valve body.
    Type: Application
    Filed: February 21, 2019
    Publication date: October 31, 2019
    Inventors: Hideaki NAGAI, Tomohiro SAWAHATA
  • Publication number: 20190316688
    Abstract: An object of the invention is to provide a method of controlling a gate valve that operates the gate valve in a short time while suppressing vibration of the valve body. A method of controlling a gate valve provided on an opening of a chamber, wherein the gate valve includes a valve body that opens and closes so as to close the opening of a chamber, a valve seat provided on the edge of the opening to which the valve body is pressed, and a sealing material for sealing between the valve body and the valve seat. The invented method is characterized in that, in moving the valve body to the open position from the closed position where the valve body is pressed against the valve seat with the sealing material compressed, the valve body is made to stop temporarily for a predetermined time at the position immediately before the compressed sealing material is pulled apart or immediately after pulled apart in the opening movement of the valve body.
    Type: Application
    Filed: February 26, 2019
    Publication date: October 17, 2019
    Inventors: Tomohiro SAWAHATA, Katsuyuki SAITOH, Hideaki NAGAI, Mitsuhiro IKEDA
  • Publication number: 20190295879
    Abstract: Provided are a wafer holding mechanism for a rotary table and a method and a wafer rotating and holding device, which enable change of a holding position of the wafer during spin processing while maintaining the posture of the wafer, enable reduction of marks of outer peripheral pins due to etching, and enable reduction of insufficient cleaning or uneven cleaning. The wafer holding mechanism for a rotary table comprises a rotary table configured to hold a wafer on an upper surface thereof, and a plurality of movable outer peripheral pins provided in the rotary table and configured to hold an outer periphery of the wafer. The plurality of movable outer peripheral pins comprise a plurality of first movable outer peripheral pins and a plurality of second movable outer peripheral pins configured to hold the wafer at positions different from positions at which the wafer is held by the first movable outer peripheral pins.
    Type: Application
    Filed: May 18, 2017
    Publication date: September 26, 2019
    Inventors: Ikuo MASHIMO, Masaki TAMURA, Hideaki NAGAI
  • Publication number: 20190295866
    Abstract: Provided are a wafer heating and holding mechanism for a rotary table, a wafer heating method for a rotary table, and a wafer rotating and holding device with which a wafer put on a rotary table can be heated while being rotated stably under a state in which an in-plane temperature distribution of the wafer is maintained. The wafer heating and holding mechanism for a rotary table of a wafer rotating and holding device comprises: a rotary shaft; a rotary table placed on an end of the rotary shaft and configured to hold a wafer on an upper surface of the rotary table; a drive motor configured to supply motive power to the rotary shaft; and heating means provided above the rotary table and below the wafer while avoiding contact with the wafer to heat the wafer.
    Type: Application
    Filed: May 18, 2017
    Publication date: September 26, 2019
    Inventors: Osamu YOSHIDA, Masaki TAMURA, Hideaki NAGAI
  • Publication number: 20190072989
    Abstract: {Problem} In combining the master valve and the groups of slave valves, the configuration of the combination is made not for performing simply a uniform control, but is made to be such a form as capable of corresponding to the size and the inside configuration of the processing apparatus, or customer's requirements, which thereby allows a prompt adaptation to variety of demands. {Solution to Problem} In combining the master controller and the slave controller, the operation mode is set, and it is made possible to transmit the generated valve opening degree common signal and the generated valve opening degree individual signal from the master controller, corresponding to the operation mode, to the slave controllers that are connected in the sequential daisy-chain style, thereby the slave valves are opening-degree-controlled by any of such generated valve opening degree signals.
    Type: Application
    Filed: April 20, 2017
    Publication date: March 7, 2019
    Inventors: Hideaki NAGAI, Takayuki TADOKORO, Akira IWAMOTO
  • Patent number: 9856148
    Abstract: Provided are: an alkali metal titanium oxide having a uniform composition and that is such that there are no residual by-products having a different composition or unreacted starting materials; and a method for producing a titanium oxide and proton exchange body obtained by processing the alkali metal titanium oxide. The method produces an alkali metal titanium oxide by firing the result of impregnating the surface and inside of pores of porous titanium compound particles with an aqueous solution of an alkali metal-containing component. The alkali metal titanium oxide is subjected to proton exchange, and with the proton exchange body of the alkali metal titanium oxide as the starting material, the titanium oxide is produced through a heat processing step.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: January 2, 2018
    Assignees: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, ISHIHARA SANGYO KAISHA, LTD.
    Inventors: Hideaki Nagai, Junji Akimoto, Kunimitsu Kataoka, Yoshimasa Kumashiro, Tomoyuki Sotokawa, Nobuharu Koshiba
  • Publication number: 20160344025
    Abstract: Provided is a titanate compound capable of further increasing the capacity of a power storage device when used as an electrode active material thereof. The titanate compound according to the present invention includes at least 60%, based on the number thereof, of particles having an anisotropic shape and a specific surface area of 10-30 m2/g as measured by a nitrogen adsorption BET one-point method, and having a long-axis diameter (L) in the range of 0.1<L?0.9 ?m as measured by electron microscopy.
    Type: Application
    Filed: January 23, 2015
    Publication date: November 24, 2016
    Inventors: Hideaki NAGAI, Kunimitsu KATAOKA, Junji AKIMOTO, Yoshimasa KUMASHIRO, Tomoyuki SOTOKAWA
  • Publication number: 20160194214
    Abstract: Provided are: an alkali metal titanium oxide having a uniform composition and that is such that there are no residual by-products having a different composition or unreacted starting materials; and a method for producing a titanium oxide and proton exchange body obtained by processing the alkali metal titanium oxide. The method produces an alkali metal titanium oxide by firing the result of impregnating the surface and inside of pores of porous titanium compound particles with an aqueous solution of an alkali metal-containing component. The alkali metal titanium oxide is subjected to proton exchange, and with the proton exchange body of the alkali metal titanium oxide as the starting material, the titanium oxide is produced through a heat processing step.
    Type: Application
    Filed: August 14, 2014
    Publication date: July 7, 2016
    Inventors: Hideaki NAGAI, Junji AKIMOTO, Kunimitsu KATAOKA, Yoshimasa KUMASHIRO, Tomoyuki SOTOKAWA, Nobuharu KOSHIBA
  • Publication number: 20160190574
    Abstract: Provided are an alkali metal titanium oxide and titanium oxide that have a novel form and are industrially advantageous. The alkali metal titanium oxide is obtained by firing the result of impregnating the surface and interior of pores of porous titanium compound particles with an aqueous solution of an alkali metal-containing component, and has the form of secondary particles resulting from the aggregation of primary particles having an anisotropic structure. The titanium oxide is obtained using the alkali metal titanium oxide as a starting material. The secondary particles can further assume a clumped structure, have a suitable size, and are easily handled, and so are industrially advantageous. In particular, the H2Ti12O25 of the present invention is an electrode material that is for a lithium secondary battery, has a high capacity and a superior initial charging/discharging rate and cycling characteristics, and has an extremely high practical value.
    Type: Application
    Filed: August 14, 2014
    Publication date: June 30, 2016
    Inventors: Hideaki NAGAI, Junji AKIMOTO, Kunimitsu KATAOKA, Yoshimasa KUMASHIRO, Tomoyuki SOTOKAWA, Nobuharu KOSHIBA
  • Patent number: 9086165
    Abstract: {Technical Problem} To provide a gate valve that can control the amount of squeeze of sealing material according to each of situations, that is, under the in-manufacturing or during vacuum-maintaining state; thereby, the invented gate valve is capable of suppressing deterioration of its sealing material and lengthening the service life of the sealing material used therein. {Solution to Problem} The gate valve 100 of the embodiment has the control device 11, which is comprised of the equipment control unit 12 that transmits an instruction either an in-manufacturing CLOSE instruction or a FULL CLOSE instruction and the storage means 13 that stores position date that corresponds to each of such instructions. The control device 11 receives either of such instructions and generates the position signal referring to the corresponding position data.
    Type: Grant
    Filed: April 25, 2013
    Date of Patent: July 21, 2015
    Assignee: V-Tex Corporation
    Inventors: Hideaki Nagai, Shuichi Araki, Takayuki Tadokoro, Naomichi Yamaguchi