Patents by Inventor Hideaki Sakurai

Hideaki Sakurai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11185895
    Abstract: According to one embodiment, a first liquid is supplied on a first face of a substrate. The first liquid has a pH with which a surface zeta potential of the substrate becomes negative and a surface zeta potential of a foreign substance attaching to the first face becomes positive. Then, a solidified layer in which at least part of the first liquid has been solidified is formed by cooling the substrate down to be equal to or lower than a solidification point of the first liquid. Thereafter, the solidified layer is melted.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: November 30, 2021
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Mana Tanabe, Hideaki Sakurai, Kosuke Takai, Kyo Otsubo, Minako Inukai
  • Publication number: 20210291408
    Abstract: A method of manufacturing a template, has: preparing a substrate containing quartz and having a surface, the surface including a protrusion and a depression; and processing the depression. The processing of the depression includes: a first step of forming a film on the surface, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region; a second step of removing the second region with the first region partly remaining to expose the bottom of the depression; and a third step of processing the exposed part of the depression using a mask made of the remainder of the first region.
    Type: Application
    Filed: December 9, 2020
    Publication date: September 23, 2021
    Applicant: Kioxia Corporation
    Inventors: Takeharu MOTOKAWA, Hideaki SAKURAI, Noriko SAKURAI, Ryu KOMATSU
  • Patent number: 11123774
    Abstract: According to one embodiment, a substrate processing method includes supplying a liquid on a first face of a substrate, forming a solidified layer in which at least part of the liquid has been solidified by cooling the substrate down to be equal to or lower than a solidification point of the liquid, and melting the solidified layer. Forming the solidified layer, includes controlling a cooling parameter by monitoring an optical characteristic or acoustic wave characteristic of the solidified layer.
    Type: Grant
    Filed: March 8, 2019
    Date of Patent: September 21, 2021
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Kosuke Takai, Mana Tanabe, Hideaki Sakurai
  • Publication number: 20210238739
    Abstract: According to one embodiment, a processing apparatus includes a chamber, a first gas introduction port that introduces a first gas into the chamber, a first gas discharge port that discharges the first gas from the chamber, and a stage that supports a processing object in the chamber. The processing apparatus has a plasma generating section with an electrode to generate a plasma in the chamber. The processing apparatus includes a shield at a first position that is between the plasma generating section and the stage. The shield is light transmissive, but blocks radicals and ions generated with plasma. In some examples, the shield may be moveable from the first position to another position that is not between the plasma generating section and the stage.
    Type: Application
    Filed: September 1, 2020
    Publication date: August 5, 2021
    Inventors: Ryu KOMATSU, Takeharu MOTOKAWA, Noriko SAKURAI, Hideaki SAKURAI
  • Publication number: 20210242042
    Abstract: According to one embodiment, a processing apparatus for processing substrates having different base shapes includes a stage comprising a first portion having a substrate facing surface and an opening extending therethough connected to a source of a cooling fluid, and a second portion located outwardly of the first portion, a substrate support, having a substrate support surface thereon, extending over the second portion, a process fluid outlet overlying the first portion, and a driving unit coupled to one of the stage and the first portion, wherein the driving unit is configured to move at least one of the substrate support surface and the substrate facing surface such that the relative locations of the substrate support surface and the substrate facing surface of the stage are changeable based on the shape of a substrate to be processed in the apparatus.
    Type: Application
    Filed: April 23, 2021
    Publication date: August 5, 2021
    Inventors: Kosuke TAKAI, Mana TANABE, Hideaki SAKURAI
  • Patent number: 10984922
    Abstract: There is provided an insulated electric wire comprising a conductor wire coated by an insulating film, in which the insulating film contains 5 to 20% by mass of a low boiling point component having a boiling point of less than 300° C. under normal pressure. The insulating film preferably has a thickness of 40 to 65 ?m. The conductor wire preferably has a cross-sectional shape in a rectangular shape or a square shape.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: April 20, 2021
    Assignee: MITSUBISHI MATERIALS CORPORATION
    Inventors: Makoto Urushihara, Hideaki Sakurai
  • Publication number: 20210088906
    Abstract: According to one embodiment, a pattern forming method includes forming a resist film including a first core material pattern and a second core material pattern, on a first film laminated on a substrate; forming a second film at least on sidewalls of the first and second core material patterns; removing the first core material pattern while not removing the second core material pattern and the second film; and processing the first film by using, as a mask, the second core material pattern and the second film.
    Type: Application
    Filed: March 13, 2020
    Publication date: March 25, 2021
    Applicant: Kioxia Corporation
    Inventors: Takeharu MOTOKAWA, Noriko SAKURAI, Ryu KOMATSU, Hideaki SAKURAI
  • Publication number: 20210080831
    Abstract: A method for processing a substrate includes forming a pattern on a substrate, supplying water to cover the pattern, and after the supplying the water, irradiating the pattern with light having a wavelength longer that which causes dissociation of water. A substrate processing apparatus of an embodiment includes a transfer chamber to receive a patterned substrate, a water supplying chamber to cover the pattern with water, and an irradiating chamber to irradiate a portion of the pattern with near-field light.
    Type: Application
    Filed: February 28, 2020
    Publication date: March 18, 2021
    Inventors: Ryu KOMATSU, Takeharu MOTOKAWA, Noriko SAKURAI, Hideaki SAKURAI
  • Publication number: 20210012930
    Abstract: A method of manufacturing an insulated superconducting wire material comprising the steps of: removing a flux (S01) by heating a superconducting wire material at a temperature equals to or higher than a flux volatilization temperature and equals to or lower than a heatproof temperature of the superconducting wire material, the superconducting wire material comprising a channel with a channel groove and a superconducting core wire material accommodated in the channel groove of the channel, and the channel groove and the superconducting core wire material being bonded with a solder including the flux; and forming an insulated superconducting wire material (S02) of forming an insulating film on a surface of the superconducting wire material.
    Type: Application
    Filed: March 20, 2019
    Publication date: January 14, 2021
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Hideaki Sakurai, Eiji Komai
  • Publication number: 20210005804
    Abstract: A method of manufacturing an insulated conductor wire material having a flat surface (12) with a groove (11, 51) formed on the flat surface (13) and coated with an insulating film, comprising: an electrodeposition step of dipping the conductor wire material in an electrodeposition dispersion (62) and forming an insulating layer (13) on a surface of the conductor wire material; an electrodeposition dispersion removal step of removing the electrodeposition dispersion (62) on the insulating layer (13) by taking out the conductor wire material from the electrodeposition dispersion (62) and by blowing a gas on a side of the flat surface (62) with the groove (11, 51); a baking step of coating the conductor wire material with an insulating film by heating the conductor wire material with the insulating layer (13) formed thereon and by baking the insulating layer (13) onto the conductor wire material.
    Type: Application
    Filed: March 13, 2019
    Publication date: January 7, 2021
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Hideaki Sakurai, Eiji Komai
  • Patent number: 10882082
    Abstract: A freeze cleaning apparatus includes a table for supporting a processing target substrate having a first surface and a second surface opposite to the first surface, a liquid supply unit positioned to supply a cleaning liquid onto the second surface of the processing target substrate that is placed such that the first surface faces the table, and a cooling gas discharge unit in the table to supply a cooling gas to the first surface side of the processing target substrate. A gap between the table and the processing target substrate is set such that the cooling gas flows as a laminar flow between the table and the processing target substrate.
    Type: Grant
    Filed: January 27, 2020
    Date of Patent: January 5, 2021
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Hideaki Sakurai, Kyo Otsubo, Minako Inukai
  • Publication number: 20200399778
    Abstract: An insulated conductor of the present invention is an insulated conductor having a conductor and an insulating film provided on a surface of the conductor, in which the insulating film has a low-concentration fluorine layer disposed on a surface side of the conductor and a high-concentration fluorine layer disposed on at least a part of an outside surface of the low-concentration fluorine layer, the low-concentration fluorine layer includes a cured product of a thermosetting resin and a fluororesin and has a fluorine atom content relatively lower than that of the high-concentration fluorine layer, and the high-concentration fluorine layer includes a cured product of a thermosetting resin and a fluororesin and has a fluorine atom content relatively higher than that of the low-concentration fluorine layer.
    Type: Application
    Filed: November 20, 2018
    Publication date: December 24, 2020
    Inventors: Shintaro Iida, Hideaki Sakurai
  • Publication number: 20200398215
    Abstract: A water treatment tank includes: a tank body including a bottom surface extending in a horizontal direction; an overflow wall partitioning the inside of the tank body into an upstream tank into which treatment water having absorbed sulfur from an exhaust gas is introduced and a downstream tank into which the treatment water overflowing from the upstream tank is introduced to flow therein; and an inclined part that is provided between the bottom surface of the tank body and the overflow wall in the downstream tank and is inclined downward as it goes from the overflow wall toward a downstream side inside the downstream tank to be connected to the bottom surface of the tank body.
    Type: Application
    Filed: February 22, 2019
    Publication date: December 24, 2020
    Inventors: Masamichi IINO, Takashi KAWANO, Hiroshi KAWANE, Hideaki SAKURAI, Naoyuki KAMIYAMA, Ryozo SASAKI, Tetsu USHIKU
  • Publication number: 20200391156
    Abstract: A water treatment tank includes: a tank body including a bottom surface extending in a horizontal direction; and an overflow wall installed in the tank body to partition an inside space of the tank body into a seawater intake upstream tank into which treatment water having absorbed sulfur from an exhaust gas is introduced and a seawater intake downstream tank into which treatment water overflowing the seawater intake upstream tank is introduced to flow therein. The treatment water flowing into the seawater intake downstream tank is divided by the overflow wall in the width direction of the overflow wall so as to form a waterfall region and a non-waterfall region.
    Type: Application
    Filed: January 28, 2019
    Publication date: December 17, 2020
    Applicant: Mitsubishi Hitachi Power Systems, Ltd.
    Inventors: Hideaki Sakurai, Naoyuki Kamiyama, Takashi Kawano, Ryozo Sasaki, Seiji Kagawa
  • Publication number: 20200395146
    Abstract: There is provided an insulated flat rectangular conductor including: a flat rectangular conductor; and an insulating film coating the flat rectangular conductor, in which the flat rectangular conductor has a first surface and a second surface opposite to the first surface, and the first surface is rougher than the second surface.
    Type: Application
    Filed: March 1, 2019
    Publication date: December 17, 2020
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Makoto Urushihara, Hideaki Sakurai
  • Publication number: 20200347185
    Abstract: A resin for forming an insulating film includes at least one of a modified polyamide-imide having a terminal OH group or a terminal SH group and a modified polyimide having a terminal OH group or a terminal SH group. A varnish includes the resin for forming an insulating film and a solvent. An electrodeposition dispersion includes the resin for forming an insulating film, a polar solvent, water, a poor solvent, and a base. A method for producing an insulated conductor includes: a step of applying the varnish or electrodepositing the electrodeposition dispersion to a surface of a conductor to form a coating layer or an electrodeposition layer on the surface of the conductor; and a step of heating the coating layer or the electrodeposition layer to produce an insulating film and bake the insulating film on the conductor.
    Type: Application
    Filed: November 20, 2018
    Publication date: November 5, 2020
    Inventors: Koji Hirano, Shintaro Iida, Hideaki Sakurai
  • Patent number: 10800942
    Abstract: A water-based electrodeposition dispersion for forming an insulating film contains polymer particles, an organic solvent, a basic compound, and water, the polymer particles are made of polyamide-imide, and the basic compound is a nitrogen-containing compound in which the HSP distance from water is 35 or greater.
    Type: Grant
    Filed: September 27, 2016
    Date of Patent: October 13, 2020
    Assignee: MITSUBISHI MATERIALS CORPORATION
    Inventors: Jyunko Isomura, Shintaro Iida, Hideaki Sakurai
  • Publication number: 20200321212
    Abstract: According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.
    Type: Application
    Filed: June 17, 2020
    Publication date: October 8, 2020
    Inventors: Minako Inukai, Hideaki Sakurai, Kyo Otsubo, Tetsuo Takemoto
  • Patent number: 10781320
    Abstract: A water-dispersed electrodeposition solution (11) for forming an insulating film includes: polymer particles; an organic solvent; a basic compound; and water. The polymer particles are made of: any one of; or both of polyamide-imide and polyester-imide, main chains thereof being free of an anionic group, a number-based median diameter D50 of the polymer particles is 0.05 ?m to 0.5 ?m, and polymer particles having a particle size within ?30% to +30% of the number-based median diameter D50 are 50% or more of all of the polymer particles on a number basis.
    Type: Grant
    Filed: May 17, 2016
    Date of Patent: September 22, 2020
    Assignee: MITSUBISHI MATERIALS CORPORATION
    Inventors: Shintaro Iida, Hideaki Sakurai
  • Publication number: 20200251255
    Abstract: An insulated conductor of the present invention is an insulated conductor having a conductor and an insulating film provided on a surface of the conductor, in which the insulating film has a fluorine-containing resin composition layer including a cured product of a thermosetting resin and a fluororesin and a fluorine concentration gradient layer which is disposed between the conductor and the fluorine-containing resin composition layer, includes a cured product of a thermosetting resin and a fluororesin, and is provided with a concentration gradient in which a fluorine atom content decreases from the fluorine-containing resin composition layer side toward the conductor.
    Type: Application
    Filed: November 20, 2018
    Publication date: August 6, 2020
    Inventors: Shintaro Iida, Hideaki Sakurai