Patents by Inventor Hidehiro Yanai

Hidehiro Yanai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus and method of manufacturing semiconductor device
    Patent number: 7579276
    Abstract: To prevent particles from generating by reducing a contact-gas area and improve a purge efficiency by reducing a flow passage capacity.
    Type: Grant
    Filed: October 14, 2005
    Date of Patent: August 25, 2009
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Hideharu Itatani, Hidehiro Yanai, Sadayoshi Horii, Atsushi Sano
  • Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
    Publication number: 20070264840
    Abstract: To prevent particles from generating by reducing a contact-gas area and improve a purge efficiency by reducing a flow passage capacity.
    Type: Application
    Filed: October 14, 2005
    Publication date: November 15, 2007
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideharu Itatani, Hidehiro Yanai, Sadayoshi Horii, Atsushi Sano