Patents by Inventor Hidehito Saigusa

Hidehito Saigusa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for an improved deposition shield in a plasma processing system
    Patent number: 8117986
    Abstract: The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: February 21, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved baffle plate in a plasma processing system
    Patent number: 8118936
    Abstract: The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: February 21, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved optical window deposition shield in a plasma processing system
    Patent number: 7811428
    Abstract: The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: October 12, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Shinya Nishimoto, Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama
  • Method and apparatus for an improved bellows shield in a plasma processing system
    Patent number: 7678226
    Abstract: The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal erosion of the bellows shield.
    Type: Grant
    Filed: February 5, 2007
    Date of Patent: March 16, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved upper electrode plate in a plasma processing system
    Patent number: 7566368
    Abstract: The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode plate.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: July 28, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • METHOD AND APPARATUS FOR AN IMPROVED BELLOWS SHIELD IN A PLASMA PROCESSING SYSTEM
    Publication number: 20070125494
    Abstract: The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal erosion of the bellows shield.
    Type: Application
    Filed: February 5, 2007
    Publication date: June 7, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito SAIGUSA, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCESSING SYSTEM
    Publication number: 20070107846
    Abstract: The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
    Type: Application
    Filed: January 5, 2007
    Publication date: May 17, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM
    Publication number: 20070102287
    Abstract: The present invention presents an improved optical window deposition shield an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
    Type: Application
    Filed: January 5, 2007
    Publication date: May 10, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shinya Nishimoto, Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama
  • METHOD AND APPARATUS FOR AN IMPROVED UPPER ELECTRODE PLATE IN A PLASMA PROCESSING SYSTEM
    Publication number: 20070096658
    Abstract: The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode plate.
    Type: Application
    Filed: December 5, 2006
    Publication date: May 3, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito SAIGUSA, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved bellows shield in a plasma processing system
    Patent number: 7204912
    Abstract: The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal erosion of the bellows shield.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: April 17, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved deposition shield in a plasma processing system
    Publication number: 20070028839
    Abstract: The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
    Type: Application
    Filed: October 16, 2006
    Publication date: February 8, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved upper electrode plate in a plasma processing system
    Patent number: 7166200
    Abstract: The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode plate.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: January 23, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved baffle plate in a plasma processing system
    Patent number: 7166166
    Abstract: The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: January 23, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved optical window deposition shield in a plasma processing system
    Patent number: 7163585
    Abstract: The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
    Type: Grant
    Filed: March 19, 2004
    Date of Patent: January 16, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Shinya Nishimoto, Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama
  • Method and apparatus for an improved deposition shield in a plasma processing system
    Patent number: 7137353
    Abstract: The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: November 21, 2006
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved optical window deposition shield in a plasma processing system
    Patent number: 6798519
    Abstract: The present invention presents an improved optical window deposition shield an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: September 28, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Shinya Nishimoto, Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama
  • Method and apparatus for an improved optical window deposition shield in a plasma processing system
    Publication number: 20040173155
    Abstract: The present invention presents an improved optical window deposition shield an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
    Type: Application
    Filed: March 19, 2004
    Publication date: September 9, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shinya Nishimoto, Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama
  • Method and apparatus for an improved bellows shield in a plasma processing system
    Publication number: 20040060656
    Abstract: The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal erosion of the bellows shield.
    Type: Application
    Filed: September 30, 2002
    Publication date: April 1, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved upper electrode plate in a plasma processing system
    Publication number: 20040061447
    Abstract: The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode plate.
    Type: Application
    Filed: September 30, 2002
    Publication date: April 1, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Method and apparatus for an improved deposition shield in a plasma processing system
    Publication number: 20040060657
    Abstract: The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
    Type: Application
    Filed: September 30, 2002
    Publication date: April 1, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama