Patents by Inventor Hidehito Saigusa

Hidehito Saigusa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM
    Publication number: 20040060516
    Abstract: The present invention presents an improved optical window deposition shield an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
    Type: Application
    Filed: September 30, 2002
    Publication date: April 1, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shinya Nishimoto, Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama
  • Method and apparatus for an improved baffle plate in a plasma processing system
    Publication number: 20040063333
    Abstract: The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
    Type: Application
    Filed: September 30, 2002
    Publication date: April 1, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama