Patents by Inventor Hidekazu Okamoto

Hidekazu Okamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120226011
    Abstract: The present invention relates to a method for producing a polycarbonate, containing melt-polycondensing a diol component containing a compound represented by the following formula (1) with a fluorine-containing carbonate: here, R1 and R2 are each independently hydrogen atom, C1-10 alkyl group, C6-10 cycloalkyl group, or C6-10 aryl group, and two of R1's and two of R2's may mutually be the same or different; X is C1-6 alkylene group, C6-10 cycloalkylene group, or C6-10 arylene group, and a plurality of X's may be the same or different; and m and n are each independently an integer of from 1 to 5.
    Type: Application
    Filed: May 16, 2012
    Publication date: September 6, 2012
    Inventors: Jumpei NOMURA, Hidekazu OKAMOTO, Takashi OKAZOE
  • Patent number: 8143203
    Abstract: The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore portions of a pattern having a large aspect ratio. A method for washing a device substrate, which comprises a washing step of removing a resist attached to a device substrate by means of a solvent, wherein the solvent is a composition comprising at least one fluorinated compound selected from the group consisting of a hydrofluoroether, a hydrofluorocarbon and a perfluorocarbon, and a fluorinated alcohol.
    Type: Grant
    Filed: September 19, 2008
    Date of Patent: March 27, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Hidekazu Okamoto, Hideo Namatsu
  • Publication number: 20120067379
    Abstract: The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore portions of a pattern having a large aspect ratio. A method for washing a device substrate, which comprises a washing step of removing a resist attached to a device substrate by means of a solvent, wherein the solvent is a composition comprising at least one fluorinated compound selected from the group consisting of a hydrofluoroether, a hydrofluorocarbon and a perfluorocarbon, and a fluorinated alcohol.
    Type: Application
    Filed: November 23, 2011
    Publication date: March 22, 2012
    Applicants: NTT Advanced Technology Corporation, ASAHI GLASS COMPANY, LIMITED
    Inventors: Hidekazu Okamoto, Hideo Namatsu
  • Publication number: 20120004474
    Abstract: To provide a process for producing, at a high content ratio, 1,1-dichloro-2,2,3,3,3-pentafluoropropane (HCFC-225ca) which is useful as e.g. a starting material to obtain 1,1-dichloro-2,3,3,3-tetrafluoropropene (CFO1214ya). The process for producing HCFC-225ca of the present invention comprises subjecting a raw material composed of dichloropentafluoropropane (HCFC-225) including 2,2-dichloro-1,1,1,3,3-pentafluoropropane (HCFC225aa) to an isomerization reaction at a temperature of at most 290° C. in a gas phase in the presence of a metal oxide catalyst thereby to isomerize HCFC-225aa to HCFC-225ca.
    Type: Application
    Filed: June 23, 2011
    Publication date: January 5, 2012
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventor: Hidekazu OKAMOTO
  • Publication number: 20110319680
    Abstract: In the production of 2,3,3,3-tetrafluoropropene (HFO-1234yf), formation of HFC-254eb as an excessively reduced product is suppressed. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound gas composed of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen gas, in the presence of a catalyst, wherein the catalyst is a catalyst having palladium supported on active carbon, and the ratio of the number of moles of the hydrogen gas to the number of moles of chlorine atoms in the raw material compound gas (H2/Cl) is at most 0.7.
    Type: Application
    Filed: June 23, 2011
    Publication date: December 29, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Satoshi KAWAGUCHI, Hidekazu OKAMOTO, Yu TAKEUCHI, Hirokazu TAKAGI, Kunio WATANABE, Koichi YANASE
  • Publication number: 20110319677
    Abstract: The object is to provide a process for producing highly pure 2,3,3,3-tetrafluoropropene, whereby formation of 3,3,3-trifluoropropene is suppressed. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound composed of 1,1-dichloro-2,3,3,3-tetrafluoropropene and/or 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen in a gas phase in a reactor having a catalyst layer packed with a catalyst-supporting carrier, while maintaining the maximum temperature of the catalyst layer to be at most 130° C., to obtain formed gas containing 2,3,3,3-tetrafluoropropene, and then, contacting the formed gas discharged from the reactor, with alkali at a temperature of at most 100° C.
    Type: Application
    Filed: June 23, 2011
    Publication date: December 29, 2011
    Applicant: Asahi Glass Company, Limited
    Inventors: Satoshi KAWAGUCHI, Hidekazu Okamoto, Yu Takeuchi, Hirokazu Takagi, Kunio Watanabe, Koichi Yanase
  • Publication number: 20110319679
    Abstract: The object is to provide a process whereby it is possible to produce 2,3,3,3-tetrafluoropropene at a high conversion ratio constantly for a long period of time. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen, in the presence of a catalyst, wherein the catalyst is a noble metal catalyst supported on a metal oxide having a Hammett acidity function value (H0) of at least ?5.6.
    Type: Application
    Filed: June 23, 2011
    Publication date: December 29, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hirokazu Takagi, Hidekazu Okamoto
  • Publication number: 20110319681
    Abstract: The object is to provide a process for producing highly pure 2,3,3,3-tetrafluoropropene, whereby formation of 3,3,3-trifluoropropene as a by-product is suppressed. A process for producing 2,3,3,3-tetrafluoropropene, which comprises introducing and reacting a raw material compound composed of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen, in a catalyst layer packed with a catalyst-supporting carrier, wherein the temperature of the catalyst layer is controlled to be higher than the dew point of the raw material mixed gas comprising the raw material compound and the hydrogen, and the maximum temperature of the catalyst layer is maintained to be at most 130° C. during the reaction.
    Type: Application
    Filed: June 23, 2011
    Publication date: December 29, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Satoshi KAWAGUCHI, Hidekazu Okamoto, Yu Takeuchi, Hirokazu Takagi, Kunio Watanabe, Koichi Yanase
  • Publication number: 20110319678
    Abstract: To provide a process to produce 1,1-dichloro-2,3,3,3-tetrafluoropropene (CFO-1214ya) simply and economically without requiring purification of 1,1-dichloro-2,2,3,3,3-pentafluoropropane (HCFC-225ca) from the raw material component obtained as a mixture of isomers, i.e. dichloropentafluoropropane (HCFC-225) including HCFC-225ca and at the same time to produce simply and economically 2,3,3,3-tetrafluoropropene (HFO-1234yf) from 1-chloro-2,3,3,3-tetrafluoropropane (HCFC-244eb). A raw material composition comprising HCFC-244eb and HCFC-225 including HCFC-225ca is contacted with an alkali aqueous solution in the presence of a phase-transfer catalyst to produce CFO-1214ya from HCFC-225ca and at the same time to produce HFO-1234yf from HCFC-244eb.
    Type: Application
    Filed: June 23, 2011
    Publication date: December 29, 2011
    Applicant: Asahi Glass Company, Limited
    Inventors: Ryuji SEKI, Hidekazu Okamoto, Hirokazu Takagi, Satoshi Kawaguchi
  • Publication number: 20110319676
    Abstract: The object is to provide a process whereby it is possible to produce 2,3,3,3-tetrafluoropropene at a high conversion ratio constantly for a long period of time. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen, in the presence of a noble metal catalyst supported on active carbon having an ash content of at most 3% as measured in accordance with ASTM D2866.
    Type: Application
    Filed: June 23, 2011
    Publication date: December 29, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hirokazu TAKAGI, Hidekazu Okamoto, Satoshi Kawaguchi, Yu Takeuchi, Kunio Watanabe, Koichi Yanase, Shingo Nomura
  • Patent number: 8067585
    Abstract: The present invention relates to producing a disulfonyl fluoride compound easily and efficiently by utilizing coupling reaction where a compound (2) is obtained by subjecting a compound (1) wherein Y is a fluorine atom to photocoupling reaction, or subjecting a compound (1) wherein Y is a hydroxyl group, —OMa wherein Ma is an alkali metal atom, or —O(Mb)1/2 wherein Mb is an alkaline earth metal atom to electrolytic coupling reaction, and derivatives such as the following compound (7A) are obtained from the compound (2): FSO2-E-CX2—COY??(1) FSO2-E-CX2—CX2-E-SO2F??(2) wherein E is a single bond, —O—, a C1-20 alkylene group which may contain an etheric oxygen atom, or the like, X is a fluorine atom or the like, and Y is a fluorine atom, a hydroxyl group, or the like.
    Type: Grant
    Filed: October 1, 2007
    Date of Patent: November 29, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Masao Iwaya, Kazuya Oharu, Hidekazu Okamoto
  • Publication number: 20110251442
    Abstract: To provide a simple and economical process for producing 1,1-dichloro-2,3,3,3-tetrafluoropropene, which does not require purification of the raw material component obtained in the form of a mixture of isomers, and a process for producing 2,3,3,3-tetrafluoropropene from the product thereby obtained. A process for producing 1,1-dichloro-2,3,3,3-tetrafluoropropene, characterized by bringing a mixture of dichloropentafluoropropane isomers which contains 1,1-dichloro-2,2,3,3,3-pentafluoropropane into contact with an aqueous alkali solution in the presence of a phase transfer catalyst, and thereby selectively dehydrofluorinating only the 1,1-dichloro-2,2,3,3,3-pentafluoropropane in the mixture, and a process for producing 2,3,3,3-tetrafluoropropene from the 1,1-dichloro-2,3,3,3-tetrafluoropropene thereby obtained.
    Type: Application
    Filed: June 20, 2011
    Publication date: October 13, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hidekazu OKAMOTO, Yasuyuki SASAO
  • Publication number: 20110237846
    Abstract: To provide processes for efficiently and economically producing 2-chloro-1,1,1,2-tetrafluoropropane (R244bb) and 2,3,3,3-tetrafluoropropene (R1234yf) in an industrially practical manner. A process for producing 2-chloro-1,1,1,2-tetrafluoropropane, which comprises a chlorination step of reacting 1,2-dichloro-2-fluoropropane and chlorine in the presence of a solvent under irradiation with light to obtain 1,1,1,2-tetrachloro-2-fluoropropane, and a fluorination step of reacting the 1,1,1,2-tetrachloro-2-fluoropropane obtained in the chlorination step and hydrogen fluoride in the presence of a catalyst to obtain 2-chloro-1,1,1,2-tetrafluoropropane, and a process for producing 2,3,3,3-tetrafluoropropene, which comprises dehydrochlorinating it in the presence of a catalyst.
    Type: Application
    Filed: June 10, 2011
    Publication date: September 29, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Satoshi KAWAGUCHI, Takashi OKAZOE, Hidekazu OKAMOTO
  • Publication number: 20110214694
    Abstract: Disclosed is a supercritical processing apparatus and a supercritical processing method for suppressing the pattern collapse or the injection of material constituting a processing liquid into a substrate. A processing chamber receives a substrate subjected to a processing with supercritical fluid, and a liquid supply unit supplies a processing liquid including a fluorine compound to the processing chamber. A liquid discharge unit discharges the supercritical fluid from the processing chamber, a pyrolysis ingredient removing unit removes an ingredient facilitating the pyrolysis of a liquid from the processing chamber or from the liquid supplied from the liquid supply unit, and a to heating unit heats the processing liquid including a fluorine compound of hydrofluoro ether or hydrofluoro carbon.
    Type: Application
    Filed: March 3, 2011
    Publication date: September 8, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takayuki TOSHIMA, Mitsuaki IWASHITA, Kazuyuki MITSUOKA, Hidekazu OKAMOTO, Hideo NAMATSU
  • Publication number: 20110172469
    Abstract: To provide a method for producing 1,1-dichloro-2,2,3,3,3-pentafluoropropane (HCFC-225ca) at a high content ratio, which is useful as e.g. a starting material to obtain 1,1-dichloro-2,3,3,3-tetrafluoropropene (R1214ya). The method comprises subjecting a starting material comprising one isomer or a mixture of at least two isomers of dichloropentafluoropropane (HCFC-225) and having a HCFC-225ca content of less than 60 mol %, to an isomerization reaction in the presence of a Lewis acid catalyst or a metal oxide catalyst so as to increase the HCFC-225ca content in the product to be higher than the content in the starting material.
    Type: Application
    Filed: March 21, 2011
    Publication date: July 14, 2011
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventor: Hidekazu OKAMOTO
  • Patent number: 7956023
    Abstract: Provided is a lubricant solution for a magnetic recording media, wherein the lubricant solution includes a lubricant that is excellent in chemical stability and capable of imparting excellent lubricity to the lubricant solution, and a solvent having a suitable dissolving power for the lubricant, being excellent in drying properties and not influential over the ozone layer. Also provided is a lubricant solution including a lubricant and a fluorinated alkyl ether. Further provided is a lubricant solution including a compound of the formula (HO—CH2—CF2(OCF2CF2)dO—)3Y, wherein Y is a trivalent perfluorohydrocarbon group, as the lubricant and 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether as the fluorinated alkyl ether.
    Type: Grant
    Filed: January 24, 2007
    Date of Patent: June 7, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Daisuke Shirakawa, Hidekazu Okamoto
  • Publication number: 20110067733
    Abstract: To provide a cleaning method capable of favorably removing an object to be cleaned having a plasma polymer formed in a plasma etching step employing a fluorinated gas. A cleaning method comprising an immersion step of immersing an object 1 to be cleaned in a cleaning liquid (fluorinated solvent) 3 containing at least a fluorine compound, wherein in the immersion step, the temperature t of the cleaning liquid 3 is at least the lower one of the normal boiling point of the fluorine compound contained in the cleaning liquid 3 at 1 atm and 100° C., and the atmospheric pressure is such a pressure that the fluorine compound is in a liquid state at the temperature t.
    Type: Application
    Filed: November 22, 2010
    Publication date: March 24, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hidekazu Okamoto, Hideo Namatsu
  • Publication number: 20100249436
    Abstract: The present invention is to provide a novel production process capable of selectively producing various kinds of carbonate compounds without any inhibition in high yields without using phosgene and without producing hydrogen chloride as a by-product. The present invention relates to a process for producing a compound having a carbonate bond by reacting a compound (1) with a compound having one OH group or a compound having two or more OH groups in the presence of a halogen salt. In the formula (1) shown below, X1 to X6 each represents a hydrogen atom or a halogen atom, at least one of X1 to X3 is a halogen atom, and at least one of X4 to X6 is a halogen atom.
    Type: Application
    Filed: June 2, 2010
    Publication date: September 30, 2010
    Inventors: Hidekazu OKAMOTO, Kouhei Tajima, Takashi Okazoe
  • Publication number: 20100240912
    Abstract: The present invention is to provide a production process capable of selectively producing various kinds of fluorine-containing carbonate compounds without any inhibition in high yields without using phosgene and without producing hydrogen chloride as a by-product. The present invention relates to a process for producing a fluorine-containing compound having a carbonate bond by reacting a compound (1) with a fluorine-containing compound having an OH group. In the formula (1) shown below, X1 to X6 each represents a hydrogen atom or a halogen atom, at least one of X1 to X3 is a halogen atom, and at least one of X4 to X6 is a halogen atom.
    Type: Application
    Filed: June 2, 2010
    Publication date: September 23, 2010
    Inventors: Hidekazu OKAMOTO, Kouhei Tajima, Takashi Okazoe
  • Publication number: 20100185028
    Abstract: To provide a method for producing 1,1-dichloro-2,2,3,3,3-pentafluoropropane (HCFC-225ca) at a high content ratio, which is useful as e.g. a starting material to obtain 1,1-dichloro-2,3,3,3-tetrafluoropropene (R1214ya). The method comprises subjecting a starting material comprising one isomer or a mixture of at least two isomers of dichloropentafluoropropane (HCFC-225) and having a HCFC-225ca content of less than 60 mol%, to an isomerization reaction in the presence of a Lewis acid catalyst or a metal oxide catalyst so as to increase the HCFC-225ca content in the product to be higher than the content in the starting material.
    Type: Application
    Filed: January 19, 2010
    Publication date: July 22, 2010
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventor: Hidekazu OKAMOTO