Patents by Inventor Hidekazu Okamoto
Hidekazu Okamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100185028Abstract: To provide a method for producing 1,1-dichloro-2,2,3,3,3-pentafluoropropane (HCFC-225ca) at a high content ratio, which is useful as e.g. a starting material to obtain 1,1-dichloro-2,3,3,3-tetrafluoropropene (R1214ya). The method comprises subjecting a starting material comprising one isomer or a mixture of at least two isomers of dichloropentafluoropropane (HCFC-225) and having a HCFC-225ca content of less than 60 mol%, to an isomerization reaction in the presence of a Lewis acid catalyst or a metal oxide catalyst so as to increase the HCFC-225ca content in the product to be higher than the content in the starting material.Type: ApplicationFiled: January 19, 2010Publication date: July 22, 2010Applicant: ASAHI GLASS COMPANY LIMITEDInventor: Hidekazu OKAMOTO
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Patent number: 7754665Abstract: A lubricant solution and a method for coating a lubricant using a solvent which does not adversely affect the global environment and provides an excellent solubility to a fluorinated or silicon lubricant and which is little influential over a synthetic resin such as an acrylic resin or a polycarbonate resin. A lubricant solution of the present invention comprises a lubricant and a solvent which contains a nonafluorohexane.Type: GrantFiled: December 17, 2004Date of Patent: July 13, 2010Assignee: Asahi Glass Company, LimitedInventors: Masaaki Tsuzaki, Hidekazu Okamoto
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Patent number: 7662192Abstract: The present invention provides a method for cleaning and rinsing an article, with excellent cleaning and rinsing performance. The present invention provides a method for cleaning and rinsing an article, characterized by comprising a cleaning step of contacting an article having a contaminant attached, with a hydrocarbon solvent containing an aromatic hydrocarbon or a glycol ether, and a rinsing step of contacting it with a fluorinated ether, wherein the fluorinated ether is a compound represented by the formula 1: R1—O—R2??Formula 1 wherein each of R1 and R2 which are independent of each other, is a fluorinated alkyl group, wherein the number of fluorine atoms contained in each of R1 and R2 is at least one, and the total number of carbon atoms contained in R1 and R2 is from 4 to 8.Type: GrantFiled: December 27, 2005Date of Patent: February 16, 2010Assignee: Asahi Glass Company, LimitedInventors: Tsuyoshi Hanada, Hidekazu Okamoto, Masaaki Tsuzaki, Maki Shigematsu
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Publication number: 20090029894Abstract: The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore portions of a pattern having a large aspect ratio. A method for washing a device substrate, which comprises a washing step of removing a resist attached to a device substrate by means of a solvent, wherein the solvent is a composition comprising at least one fluorinated compound selected from the group consisting of a hydrofluoroether, a hydrofluorocarbon and a perfluorocarbon, and a fluorinated alcohol.Type: ApplicationFiled: September 19, 2008Publication date: January 29, 2009Applicants: ASAHI GLASS COMPANY, LIMITED, NTT Advanced Technology CorporationInventors: Hidekazu Okamoto, Hideo Namatsu
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Patent number: 7442815Abstract: A pellicle which is excellent in transmittance and durability against short wavelength light, and which can be used for photolithography by using e.g. a KrF excimer laser, is provided. A pellicle for exposure to a light having a wavelength of at most 200 nm, which comprises a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane and/or the adhesive comprises a polymer containing repeating units represented by the following formula (1): wherein Q represents a C1-3 polyfluoroalkylene group having a linear structure, or a group having at least one atom selected from hydrogen atoms and fluorine atoms in such a polyfluoroalkylene group substituted by a substituent comprising a polyfluoroalkyl group which may contain an ethereal oxygen atom, or the like, and X represents a hydrogen atom, a fluorine atom or a C1-3 polyfluoroalkyl group which may contain an ethereal oxygen atom.Type: GrantFiled: February 22, 2005Date of Patent: October 28, 2008Assignee: Asahi Glass Company, LimitedInventors: Ikuo Matsukura, Hidekazu Okamoto, Eisuke Murotani, Kazuya Oharu
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Patent number: 7408019Abstract: A novel fluorinated ether compound useful as an inert medium is provided. The compound is represented by the following formula (1) such as the compound represented by the following formula (1a) or the compound represented by the following formula (1b): RF1OCFRF2CFRF2ORF1 ??(1) F(CF2)4OCF(CF3)CF(CF3)O(CF2)4F ??(1a) F(CF2)6OCF(CF3)CF(CF3)O(CF2)6F ??(1b) wherein the symbols have the following meanings: RF1 is a C4-7 linear perfluoroalkyl group; and RF2 is a fluorine atom or a trifluoromethyl group.Type: GrantFiled: April 26, 2006Date of Patent: August 5, 2008Assignee: Asahi Glass Company, LimitedInventors: Masao Iwaya, Kazuya Oharu, Hirokazu Takagi, Hidekazu Okamoto
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Publication number: 20080161221Abstract: To provide a new uninflammable solvent composition which is capable of removing soils such as oils attached to electronic components such as ICs, precision machine components or glass substrates, or flux and dusts attached on e.g. printed boards. A mixed solvent composition comprising from 40 to 90 mass % of 1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorooctane and from 10 to 60 mass % of isopropanol, and an azeotropic solvent composition comprising 62 mass % of 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorooctane and 38 mass % of isopropanol.Type: ApplicationFiled: March 10, 2008Publication date: July 3, 2008Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Hidekazu OKAMOTO, Masaaki Tsuzaki
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Publication number: 20080097125Abstract: To provide a method for producing a fluorinated compound having a fluorosulfonyl group by coupling reaction. A method for producing a compound represented by the formula [(FSO2-)a(Z-)3-aC—]nR(—COY)b-n, which comprises subjecting a compound represented by the formula (FSO2-)a(Z-)3-aC(—COX) and a compound represented by the formula R(—COY)b to photocoupling reaction when X and Y are a fluorine atom or to electrolytic coupling reaction when X and Y are each independently a hydroxyl group or a group represented by the formula —OM, provided that X and Y are a fluorine atom, a hydroxyl group or a group represented by the formula —OM, Z is a hydrogen atom, a fluorine atom, a chlorine atom or a monovalent organic group, R is a b-valent organic group, M is an alkali metal atom, “a” is an integer of from 1 to 3, and “b” and “n” are each independently an integer of from 1 to 4, provided that b?n.Type: ApplicationFiled: October 18, 2007Publication date: April 24, 2008Applicant: ASAHI GLASS CO., LTD.Inventors: Masao Iwaya, Kazuya Oharu, Hidekazu Okamoto
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Publication number: 20080091009Abstract: To produce a disulfonyl fluoride compound easily and efficiently by utilizing coupling reaction. Further, to produce useful compounds by converting the above compound. A compound (2) is obtained by subjecting a compound (1) in which Y is a fluorine atom to photocoupling reaction or the compound wherein Y is a hydroxyl group, —OMa (wherein Ma is an alkali metal atom) or —O(Mb)1/2 wherein Mb is an alkaline earth metal atom) to electrolytic coupling reaction. Further, derivatives such as the following compound (7A) obtainable from the compound (2) are provided. FSO2-E-CX2—COY??(1) FSO2-E-CX2—CX2-E-SO2F??(2) wherein E is a single bond, —O—, a C1-20 alkylene group which may contain an etheric oxygen atom, or the like, X is a fluorine atom or the like, and Y is a fluorine atom, a hydroxyl group, or the like.Type: ApplicationFiled: October 1, 2007Publication date: April 17, 2008Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Masao IWAYA, Kazuya Oharu, Hidekazu Okamoto
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Publication number: 20080086019Abstract: To provide a method for producing a high purity fluorinated alkyl ether having a very low content of an impurity having an unsaturated bond at the industrial scale. A method for treating a fluorinated alkyl ether, which comprises bringing a reaction crude liquid containing a fluorinated alkyl ether obtained by reacting a fluorinated alkyl alcohol with a fluoroolefin in the presence of a basic catalyst, and an unsaturated impurity having an unsaturated bond formed as a by-product in the above reaction, into contact with a chlorine gas to convert the unsaturated impurity to a chlorine-added product, thereby to lower the content of the unsaturated impurity.Type: ApplicationFiled: November 14, 2007Publication date: April 10, 2008Applicant: Asahi Glass Company, LimitedInventors: Hidekazu OKAMOTO, Tamaki SHIMIZU
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Publication number: 20070116990Abstract: To present a lubricant solution for magnetic recording media, which comprises a lubricant excellent in chemical stability and capable of imparting excellent lubricity, and a solvent having a suitable dissolving power for the lubricant and being excellent in drying properties and not influential over the ozone layer. A lubricant solution comprising a lubricant and a fluorinated alkyl ether. For example, as the lubricant, a compound of the formula (HO—CH2—CF2(OCF2CF2)dO—)3Y wherein Y is a trivalent perfluorohydrocarbon group, is used, and as the fluorinated alkyl ether, 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether is used.Type: ApplicationFiled: January 24, 2007Publication date: May 24, 2007Applicant: ASAHI GLASS CO., LTD.Inventors: Daisuke SHIRAKAWA, Hidekazu OKAMOTO
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Patent number: 7193118Abstract: A method for producing a fluoroalkyl ether, which comprises reacting a fluoroalkyl alcohol with a fluorinated olefin in the presence of a solvent and a catalyst, wherein the fluoroalkyl alcohol and the fluorinated olefin are continuously supplied into a reactor, a reaction product containing the fluoroalkyl ether is continuously withdrawn from the reactor, and the reaction is carried out while the concentration of the fluoroalkyl alcohol present in the reactor is maintained to be at most 7 mass % based on the total organic component present in the reactor. According to the present invention, a fluoroalkyl ether having a high purity can be produced in an industrial scale and at a high reaction rate.Type: GrantFiled: December 5, 2005Date of Patent: March 20, 2007Assignee: Asahi Glass Company, LimitedInventors: Hidekazu Okamoto, Masazumi Nagai, Kazuya Oharu
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Patent number: 7193119Abstract: To provide a process for producing a fluorinated alkyl ether, whereby a sufficient reaction rate can be attained even under mild reaction conditions, and a post-process such as distillation after the reaction can be efficiently carried out. A process for producing a fluorinated alkyl ether, which comprises introducing an aprotic polar solvent, a fluorinated ether, a catalyst, a fluorinated alkyl alcohol and a fluorinated olefin into a reactor, and then, reacting the fluorinated alkyl alcohol with the fluorinated olefin, characterized in that the ratio of the two components of the aprotic polar solvent and the fluorinated ether introduced into the reactor is the aprotic polar solvent/the fluorinated ether=5/95 to 80/20 by mass ratio.Type: GrantFiled: February 7, 2006Date of Patent: March 20, 2007Assignee: Asahi Glass Company, LimitedInventors: Masazumi Nagai, Hidekazu Okamoto, Kazuya Oharu
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Publication number: 20060199979Abstract: A novel fluorinated ether compound useful as an inert medium is provided. The compound is represented by the following formula (1) such as the compound represented by the following formula (1a) or the compound represented by the following formula (1b): RF1OCFRF2CFRF2ORF1??(1) F(CF2)4OCF(CF3)CF(CF3)O(CF2)4F??(1a) F(CF2)6OCF(CF3)CF(CF3)O(CF2)6F??(1b) wherein the symbols have the following meanings: RF1 is a C4-7 linear perfluoroalkyl group; and RF2 is a fluorine atom or a trifluoromethyl group.Type: ApplicationFiled: April 26, 2006Publication date: September 7, 2006Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Masao Iwaya, Kazuya Oharu, Hirokazu Takagi, Hidekazu Okamoto
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Patent number: 7102031Abstract: It is an object to obtain from a mixture of a specific diene compound (1) and a compound (2) with the same molecular weight and molecular formula hard to separate by distillation, the diene compound (1) in high purity without using any special reagent or complicated technique. Namely, the present invention provides a method of inducing the Claisen rearrangement reaction of the compound (2) in a mixture containing CR1R2?CR3CFR4CR5R6OCR7?CR8R9 (1) and CFR1R2CR3?CR4CR5R6OCR7?CR8R9 (2), and separating the diene compound (1) from a Claisen rearrangement reaction product; or converting the Claisen rearrangement reaction product into a derivative and then separating the diene compound (1) from the derivative of the Claisen rearrangement reaction product. Wherein, R1 to R9 each represent a fluorine atom or the like.Type: GrantFiled: June 10, 2004Date of Patent: September 5, 2006Assignee: Asahi Glass Company, LimitedInventors: Masao Iwaya, Hidekazu Okamoto, Kazuya Oharu
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Publication number: 20060135390Abstract: The present invention provides a method for cleaning and rinsing an article, with excellent cleaning and rinsing performance. The present invention provides a method for cleaning and rinsing an article, characterized by comprising a cleaning step of contacting an article having a contaminant attached, with a hydrocarbon solvent containing an aromatic hydrocarbon or a glycol ether, and a rinsing step of contacting it with a fluorinated ether, wherein the fluorinated ether is a compound represented by the formula 1: R1—O—R2 ??Formula 1 wherein each of R1 and R2 which are independent of each other, is a fluorinated alkyl group, wherein the number of fluorine atoms contained in each of R1 and R2 is at least one, and the total number of carbon atoms contained in R1 and R2 is from 4 to 8.Type: ApplicationFiled: December 27, 2005Publication date: June 22, 2006Applicant: Asahi Glass Company, LimitedInventors: Tsuyoshi Hanada, Hidekazu Okamoto, Masaaki Tsuzaki, Maki Shigematsu
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Publication number: 20060128915Abstract: To provide a process for producing a fluorinated alkyl ether, whereby a sufficient reaction rate can be attained even under mild reaction conditions, and a post-process such as distillation after the reaction can be efficiently carried out. A process for producing a fluorinated alkyl ether, which comprises introducing an aprotic polar solvent, a fluorinated ether, a catalyst, a fluorinated alkyl alcohol and a fluorinated olefin into a reactor, and then, reacting the fluorinated alkyl alcohol with the fluorinated olefin, characterized in that the ratio of the two components of the aprotic polar solvent and the fluorinated ether introduced into the reactor is the aprotic polar solvent/the fluorinated ether=5/95 to 80/20 by mass ratio.Type: ApplicationFiled: February 7, 2006Publication date: June 15, 2006Applicant: Asahi Glass Company, LimitedInventors: Masazumi Nagai, Hidekazu Okamoto, Kazuya Oharu
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Publication number: 20060094908Abstract: A method for producing a fluoroalkyl ether, which comprises reacting a fluoroalkyl alcohol with a fluorinated olefin in the presence of a solvent and a catalyst, wherein the fluoroalkyl alcohol and the fluorinated olefin are continuously supplied into a reactor, a reaction product containing the fluoroalkyl ether is continuously withdrawn from the reactor, and the reaction is carried out while the concentration of the fluoroalkyl alcohol present in the reactor is maintained to be at most 7 mass % based on the total organic component present in the reactor. According to the present invention, a fluoroalkyl ether having a high purity can be produced in an industrial scale and at a high reaction rate.Type: ApplicationFiled: December 5, 2005Publication date: May 4, 2006Applicant: Asahi Glass Company, LimitedInventors: Hidekazu Okamoto, Masazumi Nagai, Kazuya Oharu
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Patent number: 7037380Abstract: A compound such as Alq3 accumulated on the inner surface of a chamber at the time of organic EL device production and wasted is recovered and recycled, whereby the production cost is reduced. The inner surface of a chamber or the surface of components in the chamber to which a compound such as Alq3 has adhered is cleaned with a fluorinated alcohol such as 2,2,3,3,4,4,5,5-octafluoropentanol to recover Alq3.Type: GrantFiled: December 16, 2004Date of Patent: May 2, 2006Assignee: Asahi Glass Company, LimitedInventors: Nobuya Hayashi, Shinichiro Narui, Hidekazu Okamoto, Masaaki Tsuzaki
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Patent number: 7009018Abstract: Provided is a tetrafluoroethylene copolymer consisting of a unit based on tetrafluoroethylene and a unit based on a monomer represented by CF2?CFORf1Rf2 (where Rf1 is a polyfluoroalkylene group which may contain an etheric oxygen atom and Rf2 is a polyfluorocycloalkyl group which may contain an etheric oxygen atom), wherein a content of the latter is from 0.005 to 0.5% by mass. The tetrafluoroethylene copolymer is excellent both in paste extrudability and in heat resistance, has characteristics such as excellent transparency of a molded product, and is suitably applicable to paste extrusion and compression molding.Type: GrantFiled: March 16, 2005Date of Patent: March 7, 2006Assignee: Asahi Glass Company, LimitedInventors: Kazuya Oharu, Hidekazu Okamoto, Shin Tatematsu, Shigeki Kobayashi, Shinya Higuchi, Masataka Arai, Hiroki Nagai