Patents by Inventor Hidekazu Yoshida
Hidekazu Yoshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11960242Abstract: The present invention provides a toner that can maintain excellent transferability even when a transfer bias is low. The toner includes a toner particle that includes a toner base particle and a plurality of convex portions X existing on a surface of the toner base particle, wherein the convex portion X contains an organic silicon polymer; when a cross-section of the toner is observed with a scanning transmission electron microscope (STEM), and the convex portions X comprise a plurality of convex portions Y each having a convex height H of 40 nm or higher, a number ratio P (H/w) of the a number of the convex portions Y2 in which a ratio (H/w) of the convex height H to the convex width w is 0.33 or larger and 0.80 or smaller is 70% by number or more with respect to a total number of the convex portions Y.Type: GrantFiled: October 12, 2021Date of Patent: April 16, 2024Assignee: CANON KABUSHIKI KAISHAInventors: Kentaro Yamawaki, Sara Yoshida, Yusuke Kosaki, Taiji Katsura, Hidekazu Fumita, Toshiya Kaino
-
Patent number: 11136473Abstract: It is an object of the present invention to provide a coating film capable of realizing satisfactory sliding properties in addition to water- and oil-repellent properties and wear resistance evaluated by a static contact angle, and a coating composition for obtaining the coating film. The present invention is directed to a fluorine-containing coating film which has a root mean square roughness of less than 3.5 nm and has a perfluoropolyether structure. It is preferred that the coating film has a polysiloxane backbone and further has a structure in which a fluoroalkyl group is directly bonded to a silicon atom of the polysiloxane backbone, and that a sliding angle of 6 ?L of a water droplet is 24.3° or less, or a speed of 20 ?L of a water droplet sliding on a coating film inclined at 32° is 0.1 cm/second or more.Type: GrantFiled: January 10, 2017Date of Patent: October 5, 2021Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Sayaka Sakurai, Yasuharu Shimazaki, Hidekazu Yoshida
-
Publication number: 20210171410Abstract: A structural material includes a base material for forming a structure and an ion supplying source provided inside or on a surface of the base material, and the ion supplying source supplies at least one of a cation or an anion that constitutes a sparingly soluble salt having a water-solubility of no greater than a first value at a temperature of an environment where the base material is installed.Type: ApplicationFiled: August 22, 2019Publication date: June 10, 2021Inventors: Hidekazu YOSHIDA, Ippei MARUYAMA
-
Publication number: 20190048229Abstract: It is an object of the present invention to provide a coating film capable of realizing satisfactory sliding properties in addition to water- and oil-repellent properties and wear resistance evaluated by a static contact angle, and a coating composition for obtaining the coating film. The present invention is directed to a fluorine-containing coating film which has a root mean square roughness of less than 3.5 nm and has a perfluoropolyether structure. It is preferred that the coating film has a polysiloxane backbone and further has a structure in which a fluoroalkyl group is directly bonded to a silicon atom of the polysiloxane backbone, and that a sliding angle of 6 ?L of a water droplet is 24.3° or less, or a speed of 20 ?L of a water droplet sliding on a coating film inclined at 32° is 0.1 cm/second or more.Type: ApplicationFiled: January 10, 2017Publication date: February 14, 2019Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Sayaka SAKURAI, Yasuharu SHIMAZAKI, Hidekazu YOSHIDA
-
Publication number: 20190036028Abstract: A composition comprising a polymer compound containing a structural unit represented by formula (1) and at least one compound selected from a compound containing Pd, a compound containing P and a compound containing Pd and P, wherein the content rate of the polymer compound is 95% by mass or more, the content rate of Pd is 50 ppm by mass or less and the content rate of P is 60 ppm by mass or less: wherein ring A and ring B each independently represent a hetero ring having a number of carbon atoms of 2 to 30 optionally having a substituent; ring C represents an aromatic hydrocarbon ring having a number of carbon atoms of 6 to 30 optionally having a substituent or a hetero ring having a number of carbon atoms of 2 to 30 optionally having a substituent; and Z1 represents a specified group.Type: ApplicationFiled: January 26, 2017Publication date: January 31, 2019Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Sho KANESAKA, Hidekazu YOSHIDA, Tomoya KASHIKI
-
Patent number: 9899665Abstract: Disclosed is a sodium secondary battery. The sodium secondary battery comprises a first electrode and a second electrode comprising a carbonaceous material. The carbonaceous material satisfies one or more requirements selected from the group consisting of requirements 1, 2, 3 and 4. Requirement 1: R value (=ID/IG) obtained by Raman spectroscopic measurement is 1.07 to 3. Requirement 2: A value and ?A value obtained by small angle X-ray scattering measurement are ?0.5 to 0 and 0 to 0.010, respectively. Requirement 3: for an electrode comprising an electrode mixture obtained by mixing 85 parts by weight of the carbonaceous material with 15 parts by weight of poly(vinylidene fluoride), the carbonaceous material in the electrode after being doped and dedoped with sodium ions is substantially free from pores having a size of not less than 10 nm. Requirement 4: Q1 value obtained by a calorimetric differential thermal analysis is not more than 800 joules/g.Type: GrantFiled: July 29, 2009Date of Patent: February 20, 2018Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Taketsugu Yamamoto, Hideaki Nakajima, Hiroshi Inukai, Shigekazu Ohmori, Chikara Murakami, Daisuke Nakaji, Hidekazu Yoshida, Maiko Saka
-
Patent number: 9818946Abstract: A film comprising a polymer compound and a low molecular weight compound having carrier transportability, wherein the content of the low molecular weight compound is 5 to 40 parts by mass with respect to 100 parts by mass of the sum of the polymer compound and the low molecular weight compound, the diffraction intensity A specified by the following measuring method A is 3 to 50, and the intensity ratio (A/B) of the diffraction intensity A specified by the following measuring method A to the diffraction intensity B specified by the following measuring method B is 30 or less: (Measuring method A) the diffraction intensity A is the maximum diffraction intensity in a range of scattering vector of 1 nm?1 to 5 nm?1 in a profile obtained by an Out-of plane measuring method using a film X-ray diffraction method; (Measuring method B) the diffraction intensity B is the maximum diffraction intensity in a range of scattering vector of 10 nm?1 to 21 nm?1 in a profile obtained by an In-plane measuring method using a film XType: GrantFiled: April 15, 2015Date of Patent: November 14, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Sho Kanesaka, Hidekazu Yoshida, Tomoya Kashiki, Takayuki Okachi
-
Publication number: 20170110665Abstract: A film comprising a polymer compound and a low molecular weight compound having carrier transportability, wherein the content of the low molecular weight compound is 5 to 40 parts by mass with respect to 100 parts by mass of the sum of the polymer compound and the low molecular weight compound, the diffraction intensity A specified by the following measuring method A is 3 to 50, and the intensity ratio (A/B) of the diffraction intensity A specified by the following measuring method A to the diffraction intensity B specified by the following measuring method B is 30 or less: (Measuring method A) the diffraction intensity A is the maximum diffraction intensity in a range of scattering vector of 1 nm?1 to 5 nm?1 in a profile obtained by an Out-of plane measuring method using a film X-ray diffraction method; (Measuring method B) the diffraction intensity B is the maximum diffraction intensity in a range of scattering vector of 10 nm?1 to 21 nm?1 in a profile obtained by an In-plane measuring method using a film XType: ApplicationFiled: April 15, 2015Publication date: April 20, 2017Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Sho KANESAKA, Hidekazu YOSHIDA, Tomoya KASHIKI, Takayuki OKACHI
-
Publication number: 20170025613Abstract: A composition comprising a polymer compound containing a structural unit represented by the formula (1) and a compound represented by the formula (2): [wherein Ring A and Ring B each independently represent a heterocyclic ring, and this heterocyclic ring may have a substituent. Ring C represents an aromatic hydrocarbon ring or a heterocyclic ring, and these rings may have a substituent. Z1 represents a group represented by the formula (Z-1), a group represented by the formula (Z-2), a group represented by the formula (Z-3), a group represented by the formula (Z-4) or a group represented by the formula (Z-5). A plurality of Z1 may be mutually the same or different.] [wherein R1 represents an alkyl group, a cycloalkyl group, an alkoxy group, a cycloalkoxy group, an alkylthio group, a cycloalkylthio group, an aryl group or a monovalent heterocyclic ring group, and these groups may have a substituent. When there are a plurality of R1, they may be the same or different.Type: ApplicationFiled: April 15, 2015Publication date: January 26, 2017Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Sho KANESAKA, Hidekazu YOSHIDA, Tomoya KASHIKI, Takayuki OKACHI
-
Patent number: 9268897Abstract: A process for manufacturing integrated circuit devices includes providing a set of original color rules defining an original color rule space and defining a design space. The improvement involves applying a perturbed color rule space to the router processing engine to expose double pattern routing odd cycle decomposition errors, and reconfiguring the router processing engine in accordance with the exposed decomposition errors.Type: GrantFiled: May 7, 2012Date of Patent: February 23, 2016Assignee: GLOBALFOUNDRIES, INC.Inventors: Lei Yuan, Hidekazu Yoshida, Youngtag Woo, Jongwook Kye
-
Patent number: 8904335Abstract: Evaluation of electrical accessibility within a layer of a circuit to pin geometries residing within a cell boundary of the circuit is provided. The evaluating includes, for instance, checking along substantially parallel pin geometry access paths of the layer to determine possible points at which a respective pin geometry of the pin geometries within the cell boundary may be accessed. The evaluating also includes identifying which points of the possible points are accessible access points by any route of the possible routes for electrically connecting to a respective pin geometry of the pin geometries from a first side or a second side of the cell boundary, wherein at least one point of the possible points is identified as not being an accessible access point based on the at least one point being inaccessible by the possible routes.Type: GrantFiled: March 25, 2013Date of Patent: December 2, 2014Assignee: GLOBALFOUNDRIES, Inc.Inventors: Hidekazu Yoshida, Lei Yuan, Paul Mesa
-
Patent number: 8881083Abstract: A design methodology for routing for an integrated circuit is disclosed. The method includes placement of cells having double diffusion breaks, which create an extended intercell region. Metal layer prohibit zones are defined to prohibit any M1 structures in the prohibit zones. Metal layer allow zones are placed adjacent to outer metal lines, and jogs are formed in the metal layer allow zones. Vias and viabars may then be applied on the jogs.Type: GrantFiled: May 1, 2013Date of Patent: November 4, 2014Assignee: GLOBALFOUNDRIES Inc.Inventors: Yunfei Deng, Lei Yuan, Hidekazu Yoshida, Juhan Kim, Mahbub Rashed, Jongwook Kye
-
Publication number: 20140289695Abstract: Evaluation of electrical accessibility within a layer of a circuit to pin geometries residing within a cell boundary of the circuit is provided. The evaluating includes, for instance, checking along substantially parallel pin geometry access paths of the layer to determine possible points at which a respective pin geometry of the pin geometries within the cell boundary may be accessed. The evaluating also includes identifying which points of the possible points are accessible access points by any route of the possible routes for electrically connecting to a respective pin geometry of the pin geometries from a first side or a second side of the cell boundary, wherein at least one point of the possible points is identified as not being an accessible access point based on the at least one point being inaccessible by the possible routes.Type: ApplicationFiled: March 25, 2013Publication date: September 25, 2014Applicant: GLOBALFOUNDRIES Inc.Inventors: Hidekazu Yoshida, Lei Yuan, Paul Mesa
-
Patent number: 8741763Abstract: An approach for providing layout designs with via routing structures is disclosed. Embodiments include: providing a gate structure and a diffusion contact on a substrate; providing a gate contact on the gate structure; providing a metal routing structure that does not overlie a portion of the gate contact, the diffusion contact, or a combination thereof; and providing a via routing structure over the portion and under a part of the metal routing structure to couple the gate contact, the diffusion contact, or a combination thereof to the metal routing structure.Type: GrantFiled: May 7, 2012Date of Patent: June 3, 2014Assignee: GLOBALFOUNDRIES Inc.Inventors: Yuansheng Ma, Jongwook Kye, Harry Levinson, Hidekazu Yoshida, Mahbub Rashed
-
Patent number: 8735050Abstract: Integrated circuits and methods for fabricating integrated circuits are provided. One method includes creating a master pattern layout including first and second adjacent cells. The first adjacent cell has a first border pin with a first routing line. The second adjacent cell has a second border pin with a second routing line. The first and second routing lines overlap to define an edge-edge stitch to couple the first and second border pins. The master pattern layout is decomposed into sub-patterns.Type: GrantFiled: August 6, 2012Date of Patent: May 27, 2014Assignee: GLOBALFOUNDRIES, Inc.Inventors: Lei Yuan, Hidekazu Yoshida, Jongwook Kye, Qi Xiang, Mahbub Rashed
-
Publication number: 20140035151Abstract: Integrated circuits and methods for fabricating integrated circuits are provided. One method includes creating a master pattern layout including first and second adjacent cells. The first adjacent cell has a first border pin with a first routing line. The second adjacent cell has a second border pin with a second routing line. The first and second routing lines overlap to define an edge-edge stitch to couple the first and second border pins. The master pattern layout is decomposed into sub-patterns.Type: ApplicationFiled: August 6, 2012Publication date: February 6, 2014Applicant: GLOBALFOUNDRIES INC.Inventors: Lei Yuan, Hidekazu Yoshida, Jongwook Kye, Qi Xiang, Mahbub Rashed
-
Publication number: 20130298089Abstract: A method for increasing the robustness of a double patterning router used in the manufacture of integrated circuit devices that includes providing a set of original color rules defining an original color rule space, providing a set of integrated circuit designs defining a design space, providing a router processing engine, perturbing the original color rules to define a perturbed color rule space, applying the perturbed color rule space and the design space to the router processing engine to expose double pattern routing odd cycle decomposition errors, and feeding back the exposed decomposition errors to enhance router processing engine development by reconfiguring the router processing engine in accordance with the exposed decomposition errors.Type: ApplicationFiled: May 7, 2012Publication date: November 7, 2013Applicant: GLOBALFOUNDRIES INC.Inventors: Lei Yuan, Hidekazu Yoshida, Youngtag Woo, Jongwook Kye
-
Publication number: 20130292772Abstract: An approach for providing layout designs with via routing structures is disclosed. Embodiments include: providing a gate structure and a diffusion contact on a substrate; providing a gate contact on the gate structure; providing a metal routing structure that does not overlie a portion of the gate contact, the diffusion contact, or a combination thereof; and providing a via routing structure over the portion and under a part of the metal routing structure to couple the gate contact, the diffusion contact, or a combination thereof to the metal routing structure.Type: ApplicationFiled: May 7, 2012Publication date: November 7, 2013Applicant: GLOBALFOUNDRIES Inc.Inventors: Yuansheng Ma, Jongwook KYE, Harry LEVINSON, Hidekazu YOSHIDA, Mahbub RASHED
-
Publication number: 20110135990Abstract: Disclosed is a sodium secondary battery. The sodium secondary battery comprises a first electrode and a second electrode comprising a carbonaceous material. The carbonaceous material satisfies one or more requirements selected from the group consisting of requirements 1, 2, 3 and 4. Requirement 1: R value (=ID/IG) obtained by Raman spectroscopic measurement is 1.07 to 3. Requirement 2: A value and ?A value obtained by small angle X-ray scattering measurement are ?0.5 to 0 and 0 to 0.010, respectively. Requirement 3: for an electrode comprising an electrode mixture obtained by mixing 85 parts by weight of the carbonaceous material with 15 parts by weight of poly(vinylidene fluoride), the carbonaceous material in the electrode after being doped and dedoped with sodium ions is substantially free from pores having a size of not less than 10 nm. Requirement 4: Q1 value obtained by a calorimetric differential thermal analysis is not more than 800 joules/g.Type: ApplicationFiled: July 29, 2009Publication date: June 9, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Taketsugu Yamamoto, Hideaki Nakajima, Hiroshi Inukai, Shigekazu Ohmori, Chikara Murakami, Daisuke Nakaji, Hidekazu Yoshida, Maiko Saka
-
Patent number: 7225774Abstract: A valve timing control apparatus for an internal combustion engine includes a housing having a housing body and shoes protruding from an inner circumferential surface of the housing body to define actuation spaces therebetween, a vane rotor disposed in the housing and having a rotor body and vanes protruding from an outer circumferential surface of the rotor body to divide the actuation spaces into circumferentially alternating first and second hydraulic chambers, a plurality of spring units arranged in at least either the first hydraulic chambers or the second hydraulic chambers to bias the vane rotor in a rotational direction with respect to the housing, and a rotation restriction mechanism capable of restricting a relative rotation of the housing and the vane rotor to prevent the shoes and the vanes from contact with each other within the hydraulic chambers in which the spring units are arranged.Type: GrantFiled: September 16, 2005Date of Patent: June 5, 2007Assignee: Hitachi, Ltd.Inventors: Kotaro Watanabe, Hidekazu Yoshida, Tomoya Tsukada, Jiro Miyasaka, legal representative, Ayako Miyasaka, legal representative, Hideyuki Miyasaka, deceased