Abstract: Provided is a server management system which selects an active system and a standby system by using multiple server resources managed by being divided into multiple categories in a predetermined standard and in which a service providing server is redundantly disposed, the system including: a selection information input unit acquiring selection information that is information necessary for selecting the category; a selection information storage unit storing the selection information input from the selection information input unit; a failure information storage unit storing failure information indicating a failure occurring in the category; a selection unit selecting an additional category based on an failure occurrence according to the active system and/or the standby system; and a selection result output unit outputting the category selected, in which the selection unit refers to the failure information with respect to a category satisfying a condition indicated by selection information and selects an additio

Abstract: The high-frequency treatment device according to one embodiment of the present disclosure includes: a heating chamber that accommodates a heating target; an oscillator; at least one feeder; a detector; and a controller. The oscillator generates high-frequency power having an arbitrary frequency in a predetermined frequency band. At least one feeder supplies incident microwave power based on the high-frequency power to the heating chamber. The detector detects the incident microwave power and reflected microwave power returning from the heating chamber to at least one feeder. The controller causes the oscillator to execute a frequency sweep and measures a reflection characteristic based on the incident microwave power and the reflected microwave power for each heating condition including a frequency. The controller determines, based on a reflection variation range indicating a change in the reflection characteristic for each heating condition, a heating condition to be used next.

Abstract: This high-frequency treatment device includes: a heating chamber configured to accommodate a heating target; a high-frequency power generator; a feeder; a detector; a controller; and a storage. The high-frequency power generator generates high-frequency power having a frequency in a predetermined frequency band. The feeder supplies incident microwave power corresponding to the high-frequency power to the heating chamber. The detector detects at least one of the incident microwave power and reflected microwave power that is included in the incident microwave power and returns from the heating chamber to the feeder. The controller controls heating of the heating target by controlling the high-frequency power generator. The storage stores, together with time elapsed from the start of heating, information detected by the detector. The controller causes the high-frequency power generator to repeatedly generate, on a per frequency basis, the high-frequency power having a plurality of frequencies for the heating.

Abstract: A light source apparatus includes an excitation light emitter configured to irradiate excitation light, a phosphor that receives the excitation light and converts the excitation light into wavelength band light different from the excitation light, and a color wheel device. A first region of regions divided in a radial direction of the color wheel device includes a first transparent part that transmits the wavelength band light. A second region, which is different from the first region of the regions divided in the radial direction of the color wheel device, includes a reflector that reflects the excitation light and changes a light path and a second transparent part that transmits the excitation light. The phosphor is arranged on a light path of the excitation light reflected by the reflector or on a light path of the excitation light transmitted by the second transparent part.

Abstract: Provided is a server management system which selects an active system and a standby system by using multiple server resources managed by being divided into multiple categories in a predetermined standard and in which a service providing server is redundantly disposed, the system including: a selection information input unit acquiring selection information that is information necessary for selecting the category; a selection information storage unit storing the selection information input from the selection information input unit; a failure information storage unit storing failure information indicating a failure occurring in the category; a selection unit selecting an additional category based on an failure occurrence according to the active system and/or the standby system; and a selection result output unit outputing the category selected, in which the selection unit refers to the failure information with respect to a category satisfying a condition indicated by selection information and selects an addition

Abstract: In conventional fluid discharge devices, a discharge head used should be increased in size according to increase in size of a workpiece such as silicon wafer. However, if the discharge head increases in length, a deformation amount of a mask used for discharging the fluid on the workpiece increases, thereby the discharging amount varies. Discharging the fluid in a reciprocating manner is performed using a fluid discharging device including a head unit having a width shorter than a length of the workpiece. A suction port having opening portions each having a slit shape are disposed on the both sides of the discharge nozzle in a vicinity of the discharge nozzle.

Abstract: Example implementations described herein are directed to a meta-data processing system that supports the creation and deployment of the Analytical Solution Modules in development of industrial analytics. The example implementations described herein can involve a first system configured to be directed to a data scientist for receiving flow and operator definitions to generate an analytics library, which is provided to a second system configured to be directed to a domain expert for applying the analytics library to generate analytics modules to be executed on data input to the second system.

Abstract: Provided is a metabolism improving agent that contains, for example, an alkalizing agent such as an acidosis improving agent or a urinary alkalizing agent as an active ingredient, and has actions such as improvement of insulin resistance, improvement of pituitary and adrenal functions, and reduction of visceral fat accumulation.

Abstract: An electrophotographic photoconductor is provided that includes a conductive substrate, an undercoat layer overlying the conductive substrate, and a photosensitive layer overlying the undercoat layer. The undercoat layer contains zinc oxide particles and a binder resin and has a volume resistivity of 0.03×106 ?·cm or less in an electrical field of 5 V/?m at a temperature of 23 degrees C. and a relative humidity of 55%. The photosensitive layer contains a compound represented by the following general formula (1): where each of R1 to R3 independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms which may have a substituent, or a substituted or unsubstituted aryl group having 6 to 12 carbon atoms.

Abstract: In conventional fluid discharge devices, a discharge head used should be increased in size according to increase in size of a workpiece such as silicon wafer. However, if the discharge head increases in length, a deformation amount of a mask used for discharging the fluid on the workpiece increases, thereby the discharging amount varies. Discharging the fluid in a reciprocating manner is performed using a fluid discharging device including a head unit having a width shorter than a length of the workpiece. A suction port having opening portions each having a slit shape are disposed on the both sides of the discharge nozzle in a vicinity of the discharge nozzle.

Abstract: In conventional fluid discharge devices, a discharge head used should be increased in size according to increase in size of a workpiece such as silicon wafer. However, if the discharge head increases in length, a deformation amount of a mask used for discharging the fluid on the workpiece increases, thereby the discharging amount varies. Discharging the fluid in a reciprocating manner is performed using a fluid discharging device including a head unit having a width shorter than a length of the workpiece. A suction port having opening portions each having a slit shape are disposed on the both sides of the discharge nozzle in a vicinity of the discharge nozzle.

Abstract: Example implementations described herein are directed to a meta-data processing system that supports the creation and deployment of the Analytical Solution Modules in development of industrial analytics. The example implementations described herein can involve a first system configured to be directed to a data scientist for receiving flow and operator definitions to generate an analytics library, which is provided to a second system configured to be directed to a domain expert for applying the analytics library to generate analytics modules to be executed on data input to the second system.

Abstract: An electrophotographic photoconductor is provided that includes a conductive substrate, an undercoat layer overlying the conductive substrate, and a photosensitive layer overlying the undercoat layer. The undercoat layer contains zinc oxide particles and a binder resin and has a volume resistivity of 0.03×106 ?·cm or less in an electrical field of 5 V/?m at a temperature of 23 degrees C. and a relative humidity of 55%. The photosensitive layer contains a compound represented by the following general formula (1): where each of R1 to R3 independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms which may have a substituent, or a substituted or unsubstituted aryl group having 6 to 12 carbon atoms.

Abstract: A pattern formed on a silicon wafer is fine so that solder bumps formed on the silicon wafer are also fine and hence, when a failure occurs, the failure cannot be corrected so that an entire silicon wafer as a workpiece is discarded. Provided is a correction method where, on solder bumps formed on the silicon wafer, a mask in which holes are formed with the same pattern as the solder bumps is placed so as to cover the solder bumps and, thereafter, molten solder is caused to come into contact with the solder bumps through the mask thus filling hole portions of the mask with the molten solder.

Abstract: An analysis model execution unit executing a part of an analysis model, an analysis model partial execution unit partially executing the analysis model based on intermediate data generated during execution of the analysis model, external storage storing the intermediate data and mapping information which is corresponding relationship between the intermediate data and the analysis model, and an analysis model general processing unit generating the mapping information by associating the intermediate data with the analysis model and reading the intermediate data associated with the analysis model from the external storage based on the mapping information are provided.

Abstract: A defect may occur in which as the amount of fluid discharged by a fluid discharge device decreases, a mask is not filled with the fluid even when the fluid is discharged. In order to fill a workpiece with the fluid, it is necessary to replace air in the workpiece corresponding to a discharge part with the fluid. The air in the workpiece is removed in advance, thereby filling the workpiece with the discharged fluid. A fluid discharge device in which, at one end of a discharge head, a suction port for sucking air in the mask on the workpiece, and a fluid discharge device having a discharge nozzle formed thereon for discharging the fluid are formed is used.

Abstract: A flow preparation assisting apparatus calculates a difference between one or more flow data sets and a template flow data set having been a base of the one or more flow data sets, and calculates a dependency relation between node attributes for a template flow indicated by the template flow data set, from the calculated difference. The flow preparation assisting apparatus issues a notification according to the calculated dependency relation.

Abstract: A heating cooking device includes a heater, a heating chamber, an imaging unit, a lighting unit, an image processor, and a lighting controller. The heating chamber accommodates an object to be heated. The imaging unit take images of the inside of the heating chamber. The lighting unit illuminates the inside of the heating chamber. The image processor analyzes an image to detect the brightness of the object to be heated in the image. The lighting controller controls the lighting unit in response to the brightness of the object to be heated. This aspect allows the heating cooking device to accurately determine a cooking state of the object to be heated on the basis of the image of the inside of the heating chamber taken to control the heater in response to the cooking state.

Abstract: This geopolymer molding production method comprises: a mixing step (S1) for mixing a first material containing aluminum and silicon with a hydrate of an alkali stimulant containing a hydrate of an alkaline hydroxide and/or a hydrate of an alkaline silicate; a compaction step (S2) for compacting the mixture obtained in the mixing step (S1) into a compacted mixture; and a curing step (S3) for curing the compacted mixture.

Abstract: A flow preparation assisting apparatus calculates a difference between one or more flow data sets and a template flow data set having been a base of the one or more flow data sets, and calculates a dependency relation between node attributes for a template flow indicated by the template flow data set, from the calculated difference. The flow preparation assisting apparatus issues a notification according to the calculated dependency relation.