Patents by Inventor Hidemi Nawafune

Hidemi Nawafune has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040001957
    Abstract: This invention offers a method for forming a resin composite material, containing the steps of: (1) treating the surface of a carrier resin to treatment introduce ion exchange groups, (2) introducing metal ions to treat the carrier resin surface by treating the surface of said carrier resin with a solution containing metal ions, (3) converting said metal ions to a component containing a metal element, (4) forming a metal foil on top of said component containing a metal element, and (5) transferring said metal foil to a resin substrate by heating said metal foil. This method provides a carrier resin substrate having a metal foil of any desired thickness laminated or cast onto it. In this way a carrier resin containing a metal foil, particularly a copper foil, having a thickness, such as 8 &mgr;m or less, can be prepared that is otherwise difficult to prepare using conventional methods.
    Type: Application
    Filed: November 1, 2002
    Publication date: January 1, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Masaru Seita, Hideki Tsuchida, Masaaki Imanari, Koichi Yomogida, Hidemi Nawafune
  • Patent number: 6607653
    Abstract: The present invention provides a tin-copper alloy plating bath, tin-copper-bismuth alloy plating bath or tin-copper-silver alloy plating bath containing a soluble metal compound and a specific sulfur-containing compound. The plating bath of the present invention is an alloy plating bath containing tin and copper, the bath being capable of preventing deposition of copper on a tin anode by substitution, having low dependence of plated coating composition on current density, high bath stability and resistance to turbidness.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: August 19, 2003
    Assignees: Daiwa Fine Chemicals Co., Ltd., Ishihara Chemical Co., Ltd.
    Inventors: Kiyotaka Tsuji, Keigo Obata, Takao Takeuchi, Hidemi Nawafune, Tetsuji Nishikawa
  • Publication number: 20030003307
    Abstract: The present invention offers a non-charging resin composite material and method for manufacturing said resin composite material. In particular, a non-charging resin composite material can be manufactured by using liquid containing metal ions to treat the surface of a resin base treated with ion-exchange group introduction agent, thereby introducing metal ions. By then converting said metal ions, a component containing metal element is introduced at the surface of the resin base in such a small amount that charging of the resin base can be prevented, without increasing the low conductivity intrinsic to the resin base to above a certain level, which has been difficult in the past. With said non-charging resin composite material, damage due to the adhesion of dirt or dust on the base is prevented, as is damage to the base caused by static electricity resulting from charging.
    Type: Application
    Filed: December 6, 2001
    Publication date: January 2, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Hideki Tsuchida, Masaaki Imanari, Koichi Yomogida, Hidemi Nawafune
  • Patent number: 6235093
    Abstract: An aqueous solution for obtaining a noble metal by chemical reduction containing at least one water-soluble compound or complex of a metal selected from the group consisting of gold, platinum, silver, and palladium as a source of the metal to be deposited, and at least one mercapto compound or sulfide compound or a salt thereof as a reducing agent. The reducing agent is typically mercaptoacetic acid, 2-mercaptopropionic acid, 2-aminoethanethiol, 2-mercaptoethanol, glucose cysteine, 1-thioglycerol, sodium mercaptopropanesulfonate, N-acetylmethionine, thiosalicylic acid, 2-thiazoline-2-thiol, 2,5-dimercapto-1,3,4-thiadiazole, 2-benzothiazolethiol, or 2-benzimidazolethiol. They may be used singly or in combination.
    Type: Grant
    Filed: June 28, 1999
    Date of Patent: May 22, 2001
    Assignee: Daiwa Fine Chemicals Co., Ltd.
    Inventors: Yoshiaki Okuhama, Takao Takeuchi, Keigo Obata, Yasuhito Kohashi, Hidemi Nawafune
  • Patent number: 6183545
    Abstract: An aqueous solution for the reductive deposition of metals comprising, besides water, (A) a phosphine of the general formula (1)  in which R1, R2, and R3 denote lower alkyl groups, at least one of which being hydroxy-or amino-substituted lower alkyl group, and (B) a soluble compound of a metal or a compound of a metal solubilized through the formation of a soluble complex by said phosphine.
    Type: Grant
    Filed: June 28, 1999
    Date of Patent: February 6, 2001
    Assignee: Daiwa Fine Chemicals Co., Ltd.
    Inventors: Yoshiaki Okuhama, Takao Takeuchi, Masakazu Yoshimoto, Shigeru Takatani, Emiko Tanaka, Masayuki Nishino, Yuji Kato, Yasuhito Kohashi, Kyoko Kuba, Tetsuya Kondo, Keiji Shiomi, Keigo Obata, Mitsuo Komatsu, Hidemi Nawafune
  • Patent number: 4804410
    Abstract: The present invention provides a palladium-base electroless plating solution which is excellent in stability and which is capable of forming a satisfactory palladium-base deposit, the solution being an aqueous solution containing (a) a palladium compound, (b) at least one compound of ammonia and amine compounds, (c) an organic compound containing bivalent sulfur, and (d) at least one compound of hypophosphorous acid compounds and boron hydride compounds, and a palladium-base electroless plating solution containing a nickel compound in addition to said electroless plating solution.
    Type: Grant
    Filed: October 21, 1987
    Date of Patent: February 14, 1989
    Assignee: Ishihara Chemical Co., Ltd.
    Inventors: Masaki Haga, Kiyotaka Tsuji, Hidemi Nawafune, Shozo Mizumoto, Ei Uchida
  • Patent number: 4650691
    Abstract: An electroless copper plating bath is prepared by adding both a metal-cyano-complex used as a stabilizer and an agent for complexing the metal of the metal-cyano-complex to an electroless copper plating bath containing cupric ion, an agent for complexing the cupric ion and a reducing agent, and an article to be plated is immersed in the bath.
    Type: Grant
    Filed: September 24, 1984
    Date of Patent: March 17, 1987
    Assignee: C. Uyemura & Co., Ltd.
    Inventors: Akemi Kinoshita, Ken Araki, Hidemi Nawafune, Shozo Mizumoto
  • Patent number: 4541902
    Abstract: An analytical method for determining by potentiometric titration formaldehyde in an electroless copper plating bath, which comprises using a hydroxylamine salt such as hydroxylamine hydrochloride as the titrant and using a silver electrode as the indicator electrode. This method can determine free formaldehyde in low concentration which takes part in the plating reaction.
    Type: Grant
    Filed: November 7, 1984
    Date of Patent: September 17, 1985
    Assignee: C. Uyemura & Co., Ltd.
    Inventors: Akemi Kinoshita, Ken Araki, Hidemi Nawafune, Shozo Mizumoto
  • Patent number: 4253916
    Abstract: A vibratory plating method carried out by placing only workpieces and a plating liquid in a plating container, and applying an electric current across the plating liquid while vibrating the plating container so as to cause the workpieces to be plated as the workpieces are rolled and moved independently of one another along the plating container. By this plating method, workpieces can be plated uniformly in a very short period of time at a high current density and with a small amount of plating liquid. Moreover, it eliminates troublesome steps of manually suspending and removing workpieces from hangers.
    Type: Grant
    Filed: September 19, 1979
    Date of Patent: March 3, 1981
    Assignee: Shikishima Tipton Mfg. Co., Ltd.
    Inventors: Hisamine Kobayashi, Motoo Kawasaki, Shozo Mizumoto, Hidemi Nawafune, Sadamasa Suzuki
  • Patent number: 4229276
    Abstract: A vibratory plating apparatus having a plating liquid in a plating container, a base on which the container is mounted for vibrating movement, and a lid for the top of the container. The bottom of the container has an arcuate bottom. A vibration motor vibrates the container and electrodes are disposed within the container. With this plating apparatus, workpieces can be plated uniformly in a very short period of time at a high current density and with a small amount of plating liquid. Moreover, it eliminates troublesome steps of manually suspending and removing workpieces from hangers.
    Type: Grant
    Filed: February 28, 1979
    Date of Patent: October 21, 1980
    Assignees: Shikishima Tipton Manufacturing Co. Ltd., Motoo Kawasaki
    Inventors: Hisamine Kobayashi, Motoo Kawasaki, Shozo Mizumoto, Hidemi Nawafune, Sadamasa Suzuki
  • Patent number: 4064022
    Abstract: A sludge containing a sparingly soluble metal compound such as nickel carbonate or the like is supplied to an anode compartment or an intermediate compartment of an electrolytic cell provided with an anode compartment and a cathode compartment or with an anode compartment, an intermediate compartment and a cathode compartment each sectioned by a filter membrane or an ion-exchange membrane, and thereafter an electrolytic treatment is conducted by using an insoluble electrode as anode and a usual electrode as cathode to precipitate a metal such as nickel on the cathode. Effective recovery of a metal is attained directly from a sludge by way of electrolysis.
    Type: Grant
    Filed: December 1, 1975
    Date of Patent: December 20, 1977
    Assignees: Motoo Kawasaki, Ebara-Udylite Co., Ltd.
    Inventors: Motoo Kawasaki, Shozo Mizumoto, Hidemi Nawafune