Patents by Inventor Hidenobu Tanimura
Hidenobu Tanimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11482435Abstract: In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.Type: GrantFiled: September 6, 2019Date of Patent: October 25, 2022Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Masatoshi Kawakami, Tsutomu Nakamura, Hideki Kihara, Hiroho Kitada, Hidenobu Tanimura, Hironori Kusumoto
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Publication number: 20190393058Abstract: In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.Type: ApplicationFiled: September 6, 2019Publication date: December 26, 2019Inventors: Masatoshi KAWAKAMI, Tsutomu NAKAMURA, Hideki KIHARA, Hiroho KITADA, Hidenobu TANIMURA, Hironori KUSUMOTO
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Patent number: 9620399Abstract: A load port is provided with a table and a plate. The table is arranged on a side of a front wall of an atmospheric transfer unit for transferring a piece of material under processing and is adapted to mount on it a container with the piece of material received in the same. The plate serves to isolate an interior of the atmospheric transfer unit from an exterior of the atmospheric transfer unit. The load port includes an exhaust duct arranged on a rear side of the plate and a fan arranged in a lower extremity of the exhaust duct. By the exhaust duct and the fan, an internal atmosphere of the atmospheric transfer unit can be exhausted into the atmosphere.Type: GrantFiled: February 16, 2015Date of Patent: April 11, 2017Assignee: HIRATA CORPORATIONInventors: Hidenobu Tanimura, Minoru Soraoka, Shinji Yokoyama, Noriyoshi Toyoda
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Publication number: 20150214083Abstract: In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.Type: ApplicationFiled: August 20, 2014Publication date: July 30, 2015Inventors: Masatoshi Kawakami, Tsutomu Nakamura, Hideki Kihara, Hiroho Kitada, Hidenobu Tanimura, Hironori Kusumoto
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Publication number: 20150162229Abstract: A load port is provided with a table and a plate. The table is arranged on a side of a front wall of an atmospheric transfer unit for transferring a piece of material under processing and is adapted to mount on it a container with the piece of material received in the same. The plate serves to isolate an interior of the atmospheric transfer unit from an exterior of the atmospheric transfer unit. The load port includes an exhaust duct arranged on a rear side of the plate and a fan arranged in a lower extremity of the exhaust duct. By the exhaust duct and the fan, an internal atmosphere of the atmospheric transfer unit can be exhausted into the atmosphere.Type: ApplicationFiled: February 16, 2015Publication date: June 11, 2015Applicant: Hirata CorporationInventors: Hidenobu TANIMURA, Minoru SORAOKA, Shinji YOKOYAMA, Noriyoshi TOYODA
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Patent number: 8532818Abstract: A vacuum chamber includes: a vacuum vessel arranged at the backward side, where a wafer of a processing subject is processed inside an internal processing chamber; a transfer chamber arranged at the forward side, where said wafer is transferred at the inside thereof under atmospheric pressure; a cassette stage arranged at the forward of this transfer chamber, where a cassette storing said wafer is mounted; a lock chamber connected with said transfer chamber at the backward of said transfer chamber; a robot arranged inside said transfer chamber, where said wafer is transferred between said cassette and said lock chamber; and an aligning machine for making position of said wafer fit with the predetermined position, wherein the wafer is transferred to said lock chamber, after performing alignment of said wafer on said aligning machine, in the case where displacement amount of position of this wafer is larger than the predetermined value.Type: GrantFiled: February 25, 2010Date of Patent: September 10, 2013Assignee: Hitachi High-Technologies CorporationInventors: Tomohiro Ohashi, Tsutomu Nakamura, Hidenobu Tanimura, Michiaki Kobayashi
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Patent number: 8366370Abstract: A vacuum processing apparatus includes a transfer container for transferring a wafer in the internal space thereof reduced in pressure, a vacuum vessel coupled to the side wall of the vacuum vessel and including a processing chamber having a sample stage therein on which a wafer to be processed is mounted, a lid member opened or closed by rotation above the vacuum vessel, an inner chamber member arranged in the vacuum vessel and making up the inner wall of the processing chamber, and a jig coupled to the side wall of the vacuum vessel to lift and hold the inner chamber member by being coupled thereto. The jig includes a first joint portion having vertical and horizontal shafts, an extensible arm portion rotatable around each shaft of the first joint portion, and a second joint portion with the inner chamber member adapted to rotate around the horizontal axis thereof.Type: GrantFiled: February 25, 2010Date of Patent: February 5, 2013Assignee: Hitachi High-Technologies CorporationInventors: Tsutomu Nakamura, Hidenobu Tanimura, Yuya Mizobe
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Publication number: 20120012252Abstract: A plasma processing apparatus capable of detecting sealing abnormality of each gate is disclosed. This apparatus includes an outer chamber constituting a vacuum vessel, an inner chamber disposed within the outer chamber for permitting a plasma to be formed in a vacuumed processing chamber as internally provided therein, a workpiece table below the processing chamber for holding thereon a wafer to be processed, a first gate valve disposed in a sidewall of the inner chamber for driving a gate to open and close while the wafer is transferred therethrough, and a second gate valve disposed in a sidewall of the outer chamber for opening and closing a gate while the wafer is transferred therethrough. After the wafer is put on the table, a pressure variation of an intermediate room formed between the inner and outer chambers sealed by the gate valves closed, thereby detecting a decrease in sealing performance.Type: ApplicationFiled: August 16, 2010Publication date: January 19, 2012Inventors: Hironori Kusumoto, Hideki Kihara, Tsutomu Nakamura, Hidenobu Tanimura, Yuuya Mizobe
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Publication number: 20110176893Abstract: A vacuum processing apparatus includes a transfer container for transferring a wafer in the internal space thereof reduced in pressure, a vacuum vessel coupled to the side wall of the vacuum vessel and including a processing chamber having a sample stage therein on which a wafer to be processed is mounted, a lid member opened or closed by rotation above the vacuum vessel, an inner chamber member arranged in the vacuum vessel and making up the inner wall of the processing chamber, and a jig coupled to the side wall of the vacuum vessel to lift and hold the inner chamber member by being coupled thereto. The jig includes a first joint portion having vertical and horizontal shafts, an extensible arm portion rotatable around each shaft of the first joint portion, and a second joint portion with the inner chamber member adapted to rotate around the horizontal axis thereof.Type: ApplicationFiled: February 25, 2010Publication date: July 21, 2011Inventors: Tsutomu NAKAMURA, Hidenobu Tanimura, Yuya Mizobe
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Publication number: 20110137454Abstract: A vacuum chamber includes: a vacuum vessel arranged at the backward side, where a wafer of a processing subject is processed inside an internal processing chamber; a transfer chamber arranged at the forward side, where said wafer is transferred at the inside thereof under atmospheric pressure; a cassette stage arranged at the forward of this transfer chamber, where a cassette storing said wafer is mounted; a lock chamber connected with said transfer chamber at the backward of said transfer chamber; a robot arranged inside said transfer chamber, where said wafer is transferred between said cassette and said lock chamber; and an aligning machine for making position of said wafer fit with the predetermined position, wherein the wafer is transferred to said lock chamber, after performing alignment of said wafer on said aligning machine, in the case where displacement amount of position of this wafer is larger than the predetermined value.Type: ApplicationFiled: February 25, 2010Publication date: June 9, 2011Inventors: Tomohiro OHASHI, Tsutomu Nakamura, Hidenobu Tanimura, Michiaki Kobayashi
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Publication number: 20100186672Abstract: A plasma processing apparatus composed of a processing chamber in a vacuum vessel to which a gas is fed to form a plasma, a sample stage in which a channel for a heat exchange medium is formed, beams for supporting the sample stage in the horizontal direction, a cylindrical space at atmospheric pressure formed below the channel in the sample stage, coupling paths for communicating the inner wall of the cylindrical space with the exterior of the vacuum vessel, a piping conduit for medium formed in the coupling path, a drive mechanism to drive pins for a wafer, and metal blocks covering junctions between the piping conduits for medium and the sample stage, whereby a gas at high temperature is supplied to between the metal blocks and is exhausted through the coupling path.Type: ApplicationFiled: February 26, 2009Publication date: July 29, 2010Inventors: Koji Okuda, Tsutomu Nakamura, Michiaki Kobayashi, Masakazu Isozaki, Hidenobu Tanimura
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Publication number: 20070066204Abstract: A load port is provided with a table and a plate. The table is arranged on a side of a front wall of an atmospheric transfer unit for transferring a piece of material under processing and is adapted to mount on it a container with the piece of material received in the same. The plate serves to isolate an interior of the atmospheric transfer unit from an exterior of the atmospheric transfer unit. The load port includes an exhaust duct arranged on a rear side of the plate and a fan arranged in a lower extremity of the exhaust duct. By the exhaust duct and the fan, an internal atmosphere of the atmospheric transfer unit can be exhausted into the atmosphere.Type: ApplicationFiled: April 18, 2006Publication date: March 22, 2007Applicant: Hirata CorporationInventors: Hidenobu Tanimura, Minoru Soraoka, Shinji Yokoyama, Noriyoshi Toyoda
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Patent number: D703160Type: GrantFiled: July 14, 2011Date of Patent: April 22, 2014Assignee: Hitachi High-Technologies CorporationInventor: Hidenobu Tanimura