Abstract: In a three-TR configuration pixel, the solid-state image capturing apparatus according to the present invention is capable of securing an electric potential difference sufficiently between a signal voltage and a reset voltage at the transferring of a signal charge and performing complete transferring of the signal charge from a photoelectric conversion element to an FD section easily and stably. Each pixel section, constituting a pixel array, has a 3TR configuration including reset transistors, transfer transistors and amplifying transistors. In each row of the pixel array, provided are a level shifter for driving reset drain wiring connected to a drain of the reset transistor, with an electric potential higher than a power supply voltage, and another level shifter for driving a reset signal line connected to a gate of the reset transistor, with an electric potential higher than the power supply voltage.

Abstract: A solid-state image capturing apparatus is provided, and, in a pixel of a 3TR structure, the solid-state image capturing apparatus increases the reset electric potential of the signal charge accumulation section upon a reset operation so that an electric potential difference between the signal voltage and the reset voltage upon transferring of a signal charge is sufficiently secured, a complete transferring of the signal charge is easily performed from the photoelectric conversion element to the signal charge accumulation section, and a stable condition is provided.

Abstract: In a three-TR configuration pixel, the solid-state image capturing apparatus according to the present invention is capable of securing an electric potential difference sufficiently between a signal voltage and a reset voltage at the transferring of a signal charge and performing complete transferring of the signal charge from a photoelectric conversion element to an FD section easily and stably. Each pixel section, constituting a pixel array, has a 3TR configuration including reset transistors, transfer transistors and amplifying transistors. In each row of the pixel array, provided are a level shifter for driving reset drain wiring connected to a drain of the reset transistor, with an electric potential higher than a power supply voltage, and another level shifter for driving a reset signal line connected to a gate of the reset transistor, with an electric potential higher than the power supply voltage.

Abstract: A nonvolatile semiconductor memory device can prevent memory characteristics from deteriorating due to IR drop on word or bit lines in a cross-point type memory cell array. The device comprises a word line selection circuit selecting a selected word line from word lines and applying selected and unselected word line voltages to the selected and unselected word lines, respectively, a bit line selection circuit selecting a selected bit line from bit lines and applying selected and unselected bit line voltages to the selected and unselected bit lines, respectively, and voltage control circuits preventing voltage fluctuation of at least either one of the word and bit lines, wherein at least either one of the word and bit lines are connected to the voltage control circuits at a voltage control point positioned at a farthest point from a drive point connected to the word line selection circuit or bit line selection circuit.

Abstract: The method of controlling a resistance of a variable resistive element comprises a forming step for shifting the variable resistive element from an initial state after the production to a variable resistance state capable of a stable mono-polar switching action where a variable resistive characteristic of the variable resistive element is turned to a program resistive characteristic by applying a program voltage pulse to the variable resistive element for first pulse application time and to an erase resistive characteristic by applying an erase voltage pulse equal in polarity to the program voltage pulse to the variable resistive element for second pulse application time longer than the first pulse application time, wherein one or more forming voltage pulses equal in polarity to the program voltage pulse is applied to the variable resistive element for third pulse application time longer than the second pulse application time.

Abstract: A nonvolatile semiconductor memory device according to the present invention comprises a memory cell selecting circuit for selecting the memory cell from the memory cell array in units of row, column or memory cell; a read voltage application circuit for applying a read voltage to the variable resistor element of the selected memory cells selected by the memory cell selecting circuit; and a read circuit for detecting the amount of the read current flowing in accordance with the resistance value of the variable resistor element with respect to the memory cell to be read of the selected memory cells and reading the information stored in the memory cell to be read; and the read voltage application circuit applies a dummy read voltage having reversed polarity from the read voltage to the variable resistor element of the selected memory cell.

Abstract: A nonvolatile semiconductor memory device can prevent memory characteristics from deteriorating due to IR drop on word or bit lines in a cross-point type memory cell array. The device comprises a word line selection circuit selecting a selected word line from word lines and applying selected and unselected word line voltages to the selected and unselected word lines, respectively, a bit line selection circuit selecting a selected bit line from bit lines and applying selected and unselected bit line voltages to the selected and unselected bit lines, respectively, and voltage control circuits preventing voltage fluctuation of at least either one of the word and bit lines, wherein at least either one of the word and bit lines are connected to the voltage control circuits at a voltage control point positioned at a farthest point from a drive point connected to the word line selection circuit or bit line selection circuit.

Abstract: A solid-state image capturing apparatus comprises a pixel array in which pixel sections for outputting a pixel signal in accordance with incident light are arranged in two dimensions, and a readout signal line arranged for each pixel section column on the pixel array, for reading out a pixel signal from each pixel section in each pixel section column, where each pixel section includes a light receiving section for performing photoelectric conversion on incident light; a signal charge storing section for storing a signal charge generated in the light receiving section and generating electric potential in accordance with the stored signal charge; and a reset transistor for resetting electric potential of the signal charge storing section to reset electric potential.

Abstract: A nonvolatile semiconductor memory device capable of suppressing parasitic currents in unselected memory cells, in cross-point array including memory cells comprising a two-terminal circuit having a variable resistor storing information according to electric resistance change due to electric stress. The memory cell comprises a series circuit of the variable resistive element holding a variable resistor between an upper and lower electrodes, and the two-terminal element having non-linear current-voltage characteristics making currents flow bi-directionally.

Abstract: A solid-state image capturing apparatus is provided, and, in a pixel of a 3TR structure, the solid-state image capturing apparatus increases the reset electric potential of the signal charge accumulation section upon a reset operation so that an electric potential difference between the signal voltage and the reset voltage upon transferring of a signal charge is sufficiently secured, a complete transferring of the signal charge is easily performed from the photoelectric conversion element to the signal charge accumulation section, and a stable condition is provided.

Abstract: The method of controlling a resistance of a variable resistive element comprises a forming step for shifting the variable resistive element from an initial state after the production to a variable resistance state capable of a stable mono-polar switching action where a variable resistive characteristic of the variable resistive element is turned to a program resistive characteristic by applying a program voltage pulse to the variable resistive element for first pulse application time and to an erase resistive characteristic by applying an erase voltage pulse equal in polarity to the program voltage pulse to the variable resistive element for second pulse application time longer than the first pulse application time, wherein one or more forming voltage pulses equal in polarity to the program voltage pulse is applied to the variable resistive element for third pulse application time longer than the second pulse application time.

Abstract: A semiconductor memory device including a plurality of memory cells is provided. One of the plurality of memory cells includes a variable resistor having a resistance value thereof reversibly changed in accordance with a voltage applied thereto, and a transistor connected to the variable resistor.

Abstract: The present invention is intended to realize executing high-speed program and erasure by using a NAND type memory cell unit that suits high degree of integration and to realize providing a highly reliable non-volatile semiconductor memory device. A memory cell is made up of a cell transistor (Tij) that is formed on the semiconductor substrate and a variable resistive element (Rij) that is connected between a source and drain terminals of the cell transistor (Tij) and the resistance value of that varies depending on applying a voltage and that is formed of the oxide having a perovskite structure that contains manganese. By connecting a plurality of the memory cells in series, there is formed a memory cell connected-in-series part. Then a memory cell block is prepared by providing a selection transistor (Si) to at least one end of the memory cell connected-in-series part. By disposing more than one such memory cell block, there is constructed a memory cell array.

Abstract: A nonvolatile semiconductor memory device includes a memory array in which a plurality of memory cells are arranged in a row direction and a column direction, each of the memory cells being formed by connecting one end of a variable resistive element for storing information according to a change in electric resistance caused by an electric stress and a drain of a selection transistor to each other on a semiconductor substrate, a voltage switch circuit for switching among a program voltage, an erase voltage and a read voltage to be applied to the source line and the bit line connected to the memory cell, and a pulse voltage applying circuit.

Abstract: A nonvolatile semiconductor memory device according to the present invention comprises a memory cell selecting circuit for selecting the memory cell from the memory cell array in units of row, column or memory cell; a read voltage application circuit for applying a read voltage to the variable resistor element of the selected memory cells selected by the memory cell selecting circuit; and a read circuit for detecting the amount of the read current flowing in accordance with the resistance value of the variable resistor element with respect to the memory cell to be read of the selected memory cells and reading the information stored in the memory cell to be read; and the read voltage application circuit applies a dummy read voltage having reversed polarity from the read voltage to the variable resistor element of the selected memory cell.

Abstract: An object of the invention is to provide a nonvolatile semiconductor memory device and an erase method for a memory cell array that have high degree of freedom and that are capable of quickly and securely implementing data erase and reprogramming. In a memory cell array, memory cells each configured of a variable resistor element for storing information through variations in electric resistance and a selected transistor are arranged in a matrix, and word lines (WL1, . . . , WLm) and bit lines (BL1, . . . , BLn) are arranged to select a predetermined memory cell. For the memory cell array, erase means is provided that sets the electric resistance of the variable resistor element to a predetermined erased state by applying voltage under a predetermined application condition to the word line (WL), bit line (BL), and source line (SL). The erase means switches between a batch-erase mode and an individual-erase mode.

Abstract: A semiconductor capacitor device has two pairs of first and second MIM capacitors on a semiconductor substrate. The paired first and second MIM capacitors include respective capacitor dielectric films having different compositions. Also, the paired first and second MIM capacitors are connected in inverse parallel fashion, with an upper electrode of the first MIM capacitor being connected with a lower electrode of the second MIM capacitor and with a lower electrode of the first MIM capacitor being connected with an upper electrode of the second MIM capacitor. Furthermore, the two first MIM capacitors are electrically connected in inverse parallel with each other, and the two second MIM capacitors are also electrically connected in inverse parallel with each other. This arrangement facilitates mutual counteraction of the voltage dependences of the two pairs of first and second MIM capacitors so as to make the voltage dependence of the capacitance of the capacitor device small.

Abstract: A nonvolatile semiconductor memory device includes a memory array in which a plurality of memory cells are arranged in a row direction and a column direction, each of the memory cells being formed by connecting one end of a variable resistive element for storing information according to a change in electric resistance caused by an electric stress and a drain of a selection transistor to each other on a semiconductor substrate, a voltage switch circuit for switching among a program voltage, an erase voltage and a read voltage to be applied to the source line and the bit line connected to the memory cell, and a pulse voltage applying circuit.

Abstract: The present invention is intended to realize executing high-speed program and erasure by using a NAND type memory cell unit that suits high degree of integration and to realize providing a highly reliable non-volatile semiconductor memory device. A memory cell is made up of a cell transistor (Tij) that is formed on the semiconductor substrate and a variable resistive element (Rij) that is connected between a source and drain terminals of the cell transistor (Tij) and the resistance value of that varies depending on applying a voltage and that is formed of the oxide having a perovskite structure that contains manganese. By connecting a plurality of the memory cells in series, there is formed a memory cell connected-in-series part. Then a memory cell block is prepared by providing a selection transistor (Si) to at least one end of the memory cell connected-in-series part. By disposing more than one such memory cell block, there is constructed a memory cell array.

Abstract: A semiconductor memory device including a plurality of memory cells is provided. One of the plurality of memory cells includes a variable resistor having a resistance value thereof reversibly changed in accordance with a voltage applied thereto, and a transistor connected to the variable resistor.