Patents by Inventor Hideo Kashima
Hideo Kashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9040905Abstract: Provided is a technique of analyzing particles in real time while collecting and condensing the particles continuously. Gas and/or particles as a detection target substance that are attached to an authentication target 2 are removed by air flow from a blowing region 5. The removed sample is sucked and is condensed and sampled at a sampling region 10, and ions of the sample are generated at an ion source 21 and are then subjected to mass analysis at a mass analysis region 23. Determination of the obtained mass spectrum is made as to the presence or not of a mass spectrum derived from the detection target substance, and a monitor 27 displays a result thereof. Thereby, the detection target substance attached to the authentication target 2 can be detected continuously in real time, promptly and with a less error rate.Type: GrantFiled: November 8, 2011Date of Patent: May 26, 2015Assignee: HITACHI, LTD.Inventors: Hisashi Nagano, Yasutaka Suzuki, Hideo Kashima, Yuichiro Hashimoto, Masuyuki Sugiyama, Masakazu Sugaya, Yasunori Doi, Koichi Terada
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Publication number: 20150136975Abstract: In a conventional fine particle detection device that vaporizes fine particles attached to the object of examination by heating, processing capability decreases as the processing time elapses due to the influence of deposition of fine particles other than the object of examination, dirt/dust, a residue of the fine particles as the object of examination, or residual matter.Type: ApplicationFiled: April 30, 2013Publication date: May 21, 2015Inventors: Masakazu Sugaya, Koichi Terada, Hideo Kashima, Yasuaki Takada, Hisashi Nagano
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Patent number: 8963102Abstract: An apparatus that can capture a rotation series of images of an observation area within a range of ?180° to +180° around the x axis thereof, and can capture a rotation series of images of the observation area within a range of ?180° to +180° around the y axis thereof.Type: GrantFiled: January 11, 2013Date of Patent: February 24, 2015Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Hideki Kikuchi, Hideo Kashima
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Publication number: 20140353500Abstract: There is provided an apparatus that can capture a rotation series of images of an observation area within a range of ?180° to +180° around the x axis thereof, and can capture a rotation series of images of the observation area within a range of ?180° to +180° around the y axis thereof.Type: ApplicationFiled: January 11, 2013Publication date: December 4, 2014Inventors: Ruriko Tsuneta, Hideki Kikuchi, Hideo Kashima
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Patent number: 8840496Abstract: Disclosed is a cooling air intake structure for a V-belt drive continuously variable transmission, which is disposed beside the rear wheel of a small vehicle and which does not permit muddy water and dust to enter therein. A cooling air inlet through which cooling air is taken in is formed at a position beside a transmission case and above a cooling fan side opening formed in the transmission case opposite to a drive pulley. A cooling air passage extending from the cooling air inlet to the side opening is formed so as to surround the side opening. Cooling air taken in through the cooling air inlet is guided so as to flow upward first and then flows downward along a U-shaped cooling air passage to the side opening of the transmission case beside the cooling fan.Type: GrantFiled: September 3, 2009Date of Patent: September 23, 2014Assignee: Honda Motor Co., Ltd.Inventors: Teruhide Yamanishi, Hirokazu Komuro, Ryuji Tsuchiya, Nobutaka Horii, Hideo Kashima
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Publication number: 20140260542Abstract: Provided is an analyzer for a substance, including: a first particle holding unit having a tubular shape; a first intake pipe for sucking a gas from an upper side of the first particle holding unit to cause a cyclonic phenomenon inside the first particle holding unit; a first supply pipe for supplying a sample containing particles, the first supply pipe being connected to a side surface of the first particle holding unit; a first flow control unit for controlling a flow rate of a gas flowing into the first particle holding unit to hold the rotationally moving particles inside the first particle holding unit for a predetermined time period and then cause the particles to settle, the first flow control unit being connected to a lower part of the first particle holding unit; a first collection heating unit for collecting and heating the settled particles; and an analysis unit for analyzing a substance vaporized from the particles through the heating by the first collection heating unit, the analysis unit being cType: ApplicationFiled: February 27, 2014Publication date: September 18, 2014Applicant: Hitachi, Ltd.Inventors: Hisashi NAGANO, Yasuaki TAKADA, Yuichiro HASHIMOTO, Masakazu SUGAYA, Hideo KASHIMA, Koichi TERADA, Yasutaka SUZUKI
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Publication number: 20140238106Abstract: Provided is a technique to identify a sample substance attached to an inspection target easily and precisely, while improving the rate of operation and reducing the number of persons required for inspection. A trace detecting system includes detection means to detect the size (vertical and horizontal dimensions) of an inspection target, and selects an air nozzle capable of spraying air jet at 15 m/s or more to the surface of the inspection target for air jet spraying.Type: ApplicationFiled: October 2, 2012Publication date: August 28, 2014Inventors: Hideo Kashima, Masakazu Sugaya, Koichi Terada, Yasunori Doi, Yasutaka Suzuki, Hisashi Nagano, Yuichiro Hashimoto, Yasuaki Takada
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Patent number: 8796651Abstract: A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.Type: GrantFiled: January 20, 2011Date of Patent: August 5, 2014Assignee: Hitachi, Ltd.Inventors: Hiroyasu Shichi, Tohru Ishitani, Hidemi Koike, Kaoru Umemura, Eiichi Seya, Mitsuo Tokuda, Satoshi Tomimatsu, Hideo Kashima, Muneyuki Fukuda
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Publication number: 20140151543Abstract: Provided is a technique of analyzing particles in real time while collecting and condensing the particles continuously. Gas and/or particles as a detection target substance that are attached to an authentication target 2 are removed by air flow from a blowing region 5. The removed sample is sucked and is condensed and sampled at a sampling region 10, and ions of the sample are generated at an ion source 21 and are then subjected to mass analysis at a mass analysis region 23. Determination of the obtained mass spectrum is made as to the presence or not of a mass spectrum derived from the detection target substance, and a monitor 27 displays a result thereof. Thereby, the detection target substance attached to the authentication target 2 can be detected continuously in real time, promptly and with a less error rate.Type: ApplicationFiled: November 8, 2011Publication date: June 5, 2014Applicant: HITACHI, LTD.Inventors: Hisashi Nagano, Yasutaka Suzuki, Hideo Kashima, Yuichiro Hashimoto, Masuyuki Sugiyama, Masakazu Sugaya, Yasunori Doi, Koichi Terada
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Patent number: 8618520Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.Type: GrantFiled: July 12, 2012Date of Patent: December 31, 2013Assignee: Hitachi, Ltd.Inventors: Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura
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Patent number: 8586916Abstract: A technology for collecting a granular substance adhering to a baggage with high rate without touching the substance and inspecting whether a dangerous or specific sample material is adhered to the baggage. A method for simplifying or automating such an inspection is also provided. An adhering matter inspection equipment (1) is characterized in that the equipment comprises a collecting section (5) for collecting a sample material peeled off from an inspection object (25) whereupon the sample material is adhered by blowing compression gas through a capturing filter (52), and an inspecting section (2) for analyzing the sample material captured by the capturing filter (52), and further characterized in that the inspection equipment comprises a section (3) for delivering a baggage to the inspecting section (2), and a carrying section (4) for carrying the capturing filter (52) from the capturing section (5) to the inspecting section (2).Type: GrantFiled: July 25, 2011Date of Patent: November 19, 2013Assignee: Hitachi, Ltd.Inventors: Hideo Kashima, Yasuaki Takada, Izumi Waki
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Publication number: 20120289370Abstract: Disclosed is a cooling air intake structure for a V-belt drive continuously variable transmission, which is disposed beside the rear wheel of a small vehicle and which does not permit muddy water and dust to enter therein. A cooling air inlet through which cooling air is taken in is formed at a position beside a transmission case and above a cooling fan side opening formed in the transmission case opposite to a drive pulley. A cooling air passage extending from the cooling air inlet to the side opening is formed so as to surround the side opening. Cooling air taken in through the cooling air inlet is guided so as to flow upward first and then flows downward along a U-shaped cooling air passage to the side opening of the transmission case beside the cooling fan.Type: ApplicationFiled: September 3, 2009Publication date: November 15, 2012Applicant: HONDA MOTOR CO., LTD.Inventors: Teruhide Yamanishi, Hirokazu Komuro, Ryuji Tsuchiya, Nobutaka Horii, Hideo Kashima
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Publication number: 20120273692Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.Type: ApplicationFiled: July 12, 2012Publication date: November 1, 2012Applicant: HITACHI, LTD.Inventors: Mitsuo TOKUDA, Muneyuki FUKUDA, Yasuhiro MITSUI, Hidemi KOIKE, Satoshi TOMIMATSU, Hiroyasu SHICHI, Hideo KASHIMA, Kaoru UMEMURA
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Patent number: 8222618Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.Type: GrantFiled: January 14, 2011Date of Patent: July 17, 2012Assignee: Hitachi, Ltd.Inventors: Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura
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Patent number: 8217339Abstract: A technology for collecting a granular substance adhering to a baggage with high rate without touching the substance and inspecting whether a dangerous or specific sample material is adhered to the baggage. A method for simplifying or automating such an inspection is also provided. An adhering matter inspection equipment (1) is characterized in that the equipment comprises a collecting section (5) for collecting a sample material peeled off from an inspection object (25) whereupon the sample material is adhered by blowing compression gas through a capturing filter (52), and an inspecting section (2) for analyzing the sample material captured by the capturing filter (52), and further characterized in that the inspection equipment comprises a section (3) for delivering a baggage to the inspecting section (2), and a carrying section (4) for carrying the capturing filter (52) from the capturing section (5) to the inspecting section (2).Type: GrantFiled: March 14, 2005Date of Patent: July 10, 2012Assignee: Hitachi, Ltd.Inventors: Hideo Kashima, Yasuaki Takada, Izumi Waki
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Publication number: 20110278469Abstract: A technology for collecting a granular substance adhering to a baggage with high rate without touching the substance and inspecting whether a dangerous or specific sample material is adhered to the baggage. A method for simplifying or automating such an inspection is also provided. An adhering matter inspection equipment (1) is characterized in that the equipment comprises a collecting section (5) for collecting a sample material peeled off from an inspection object (25) whereupon the sample material is adhered by blowing compression gas through a capturing filter (52), and an inspecting section (2) for analyzing the sample material captured by the capturing filter (52), and further characterized in that the inspection equipment comprises a section (3) for delivering a baggage to the inspecting section (2), and a carrying section (4) for carrying the capturing filter (52) from the capturing section (5) to the inspecting section (2).Type: ApplicationFiled: July 25, 2011Publication date: November 17, 2011Inventors: Hideo KASHIMA, Yasuaki Takada, Izumi Waki
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Publication number: 20110174974Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.Type: ApplicationFiled: January 14, 2011Publication date: July 21, 2011Applicant: HITACHI, LTD.Inventors: Mitsuo TOKUDA, Muneyuki FUKUDA, Yasuhiro MITSUI, Hidemi KOIKE, Satoshi TOMIMATSU, Hiroyasu SHICHI, Hideo KASHIMA, Kaoru UMEMURA
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Publication number: 20110114476Abstract: A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.Type: ApplicationFiled: January 20, 2011Publication date: May 19, 2011Inventors: Hiroyasu Shichi, Tohru Ishitani, Hidemi Koike, Kaoru Umemura, Eiichi Seya, Mitsuo Tokuda, Satoshi Tomimatsu, Hideo Kashima, Muneyuki Fukuda
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Patent number: 7897936Abstract: A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.Type: GrantFiled: July 5, 2007Date of Patent: March 1, 2011Assignee: Hitachi, Ltd.Inventors: Hiroyasu Shichi, Tohru Ishitani, Hidemi Koike, Kaoru Umemura, Eiichi Seya, Mitsuo Tokuda, Satoshi Tomimatsu, Hideo Kashima, Muneyuki Fukuda
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Patent number: 7888639Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.Type: GrantFiled: October 31, 2007Date of Patent: February 15, 2011Assignee: Hitachi, Ltd.Inventors: Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura