Patents by Inventor Hideo Kashima

Hideo Kashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9040905
    Abstract: Provided is a technique of analyzing particles in real time while collecting and condensing the particles continuously. Gas and/or particles as a detection target substance that are attached to an authentication target 2 are removed by air flow from a blowing region 5. The removed sample is sucked and is condensed and sampled at a sampling region 10, and ions of the sample are generated at an ion source 21 and are then subjected to mass analysis at a mass analysis region 23. Determination of the obtained mass spectrum is made as to the presence or not of a mass spectrum derived from the detection target substance, and a monitor 27 displays a result thereof. Thereby, the detection target substance attached to the authentication target 2 can be detected continuously in real time, promptly and with a less error rate.
    Type: Grant
    Filed: November 8, 2011
    Date of Patent: May 26, 2015
    Assignee: HITACHI, LTD.
    Inventors: Hisashi Nagano, Yasutaka Suzuki, Hideo Kashima, Yuichiro Hashimoto, Masuyuki Sugiyama, Masakazu Sugaya, Yasunori Doi, Koichi Terada
  • Publication number: 20150136975
    Abstract: In a conventional fine particle detection device that vaporizes fine particles attached to the object of examination by heating, processing capability decreases as the processing time elapses due to the influence of deposition of fine particles other than the object of examination, dirt/dust, a residue of the fine particles as the object of examination, or residual matter.
    Type: Application
    Filed: April 30, 2013
    Publication date: May 21, 2015
    Inventors: Masakazu Sugaya, Koichi Terada, Hideo Kashima, Yasuaki Takada, Hisashi Nagano
  • Patent number: 8963102
    Abstract: An apparatus that can capture a rotation series of images of an observation area within a range of ?180° to +180° around the x axis thereof, and can capture a rotation series of images of the observation area within a range of ?180° to +180° around the y axis thereof.
    Type: Grant
    Filed: January 11, 2013
    Date of Patent: February 24, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Ruriko Tsuneta, Hideki Kikuchi, Hideo Kashima
  • Publication number: 20140353500
    Abstract: There is provided an apparatus that can capture a rotation series of images of an observation area within a range of ?180° to +180° around the x axis thereof, and can capture a rotation series of images of the observation area within a range of ?180° to +180° around the y axis thereof.
    Type: Application
    Filed: January 11, 2013
    Publication date: December 4, 2014
    Inventors: Ruriko Tsuneta, Hideki Kikuchi, Hideo Kashima
  • Patent number: 8840496
    Abstract: Disclosed is a cooling air intake structure for a V-belt drive continuously variable transmission, which is disposed beside the rear wheel of a small vehicle and which does not permit muddy water and dust to enter therein. A cooling air inlet through which cooling air is taken in is formed at a position beside a transmission case and above a cooling fan side opening formed in the transmission case opposite to a drive pulley. A cooling air passage extending from the cooling air inlet to the side opening is formed so as to surround the side opening. Cooling air taken in through the cooling air inlet is guided so as to flow upward first and then flows downward along a U-shaped cooling air passage to the side opening of the transmission case beside the cooling fan.
    Type: Grant
    Filed: September 3, 2009
    Date of Patent: September 23, 2014
    Assignee: Honda Motor Co., Ltd.
    Inventors: Teruhide Yamanishi, Hirokazu Komuro, Ryuji Tsuchiya, Nobutaka Horii, Hideo Kashima
  • Publication number: 20140260542
    Abstract: Provided is an analyzer for a substance, including: a first particle holding unit having a tubular shape; a first intake pipe for sucking a gas from an upper side of the first particle holding unit to cause a cyclonic phenomenon inside the first particle holding unit; a first supply pipe for supplying a sample containing particles, the first supply pipe being connected to a side surface of the first particle holding unit; a first flow control unit for controlling a flow rate of a gas flowing into the first particle holding unit to hold the rotationally moving particles inside the first particle holding unit for a predetermined time period and then cause the particles to settle, the first flow control unit being connected to a lower part of the first particle holding unit; a first collection heating unit for collecting and heating the settled particles; and an analysis unit for analyzing a substance vaporized from the particles through the heating by the first collection heating unit, the analysis unit being c
    Type: Application
    Filed: February 27, 2014
    Publication date: September 18, 2014
    Applicant: Hitachi, Ltd.
    Inventors: Hisashi NAGANO, Yasuaki TAKADA, Yuichiro HASHIMOTO, Masakazu SUGAYA, Hideo KASHIMA, Koichi TERADA, Yasutaka SUZUKI
  • Publication number: 20140238106
    Abstract: Provided is a technique to identify a sample substance attached to an inspection target easily and precisely, while improving the rate of operation and reducing the number of persons required for inspection. A trace detecting system includes detection means to detect the size (vertical and horizontal dimensions) of an inspection target, and selects an air nozzle capable of spraying air jet at 15 m/s or more to the surface of the inspection target for air jet spraying.
    Type: Application
    Filed: October 2, 2012
    Publication date: August 28, 2014
    Inventors: Hideo Kashima, Masakazu Sugaya, Koichi Terada, Yasunori Doi, Yasutaka Suzuki, Hisashi Nagano, Yuichiro Hashimoto, Yasuaki Takada
  • Patent number: 8796651
    Abstract: A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
    Type: Grant
    Filed: January 20, 2011
    Date of Patent: August 5, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyasu Shichi, Tohru Ishitani, Hidemi Koike, Kaoru Umemura, Eiichi Seya, Mitsuo Tokuda, Satoshi Tomimatsu, Hideo Kashima, Muneyuki Fukuda
  • Publication number: 20140151543
    Abstract: Provided is a technique of analyzing particles in real time while collecting and condensing the particles continuously. Gas and/or particles as a detection target substance that are attached to an authentication target 2 are removed by air flow from a blowing region 5. The removed sample is sucked and is condensed and sampled at a sampling region 10, and ions of the sample are generated at an ion source 21 and are then subjected to mass analysis at a mass analysis region 23. Determination of the obtained mass spectrum is made as to the presence or not of a mass spectrum derived from the detection target substance, and a monitor 27 displays a result thereof. Thereby, the detection target substance attached to the authentication target 2 can be detected continuously in real time, promptly and with a less error rate.
    Type: Application
    Filed: November 8, 2011
    Publication date: June 5, 2014
    Applicant: HITACHI, LTD.
    Inventors: Hisashi Nagano, Yasutaka Suzuki, Hideo Kashima, Yuichiro Hashimoto, Masuyuki Sugiyama, Masakazu Sugaya, Yasunori Doi, Koichi Terada
  • Patent number: 8618520
    Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.
    Type: Grant
    Filed: July 12, 2012
    Date of Patent: December 31, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura
  • Patent number: 8586916
    Abstract: A technology for collecting a granular substance adhering to a baggage with high rate without touching the substance and inspecting whether a dangerous or specific sample material is adhered to the baggage. A method for simplifying or automating such an inspection is also provided. An adhering matter inspection equipment (1) is characterized in that the equipment comprises a collecting section (5) for collecting a sample material peeled off from an inspection object (25) whereupon the sample material is adhered by blowing compression gas through a capturing filter (52), and an inspecting section (2) for analyzing the sample material captured by the capturing filter (52), and further characterized in that the inspection equipment comprises a section (3) for delivering a baggage to the inspecting section (2), and a carrying section (4) for carrying the capturing filter (52) from the capturing section (5) to the inspecting section (2).
    Type: Grant
    Filed: July 25, 2011
    Date of Patent: November 19, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Hideo Kashima, Yasuaki Takada, Izumi Waki
  • Publication number: 20120289370
    Abstract: Disclosed is a cooling air intake structure for a V-belt drive continuously variable transmission, which is disposed beside the rear wheel of a small vehicle and which does not permit muddy water and dust to enter therein. A cooling air inlet through which cooling air is taken in is formed at a position beside a transmission case and above a cooling fan side opening formed in the transmission case opposite to a drive pulley. A cooling air passage extending from the cooling air inlet to the side opening is formed so as to surround the side opening. Cooling air taken in through the cooling air inlet is guided so as to flow upward first and then flows downward along a U-shaped cooling air passage to the side opening of the transmission case beside the cooling fan.
    Type: Application
    Filed: September 3, 2009
    Publication date: November 15, 2012
    Applicant: HONDA MOTOR CO., LTD.
    Inventors: Teruhide Yamanishi, Hirokazu Komuro, Ryuji Tsuchiya, Nobutaka Horii, Hideo Kashima
  • Publication number: 20120273692
    Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.
    Type: Application
    Filed: July 12, 2012
    Publication date: November 1, 2012
    Applicant: HITACHI, LTD.
    Inventors: Mitsuo TOKUDA, Muneyuki FUKUDA, Yasuhiro MITSUI, Hidemi KOIKE, Satoshi TOMIMATSU, Hiroyasu SHICHI, Hideo KASHIMA, Kaoru UMEMURA
  • Patent number: 8222618
    Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: July 17, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura
  • Patent number: 8217339
    Abstract: A technology for collecting a granular substance adhering to a baggage with high rate without touching the substance and inspecting whether a dangerous or specific sample material is adhered to the baggage. A method for simplifying or automating such an inspection is also provided. An adhering matter inspection equipment (1) is characterized in that the equipment comprises a collecting section (5) for collecting a sample material peeled off from an inspection object (25) whereupon the sample material is adhered by blowing compression gas through a capturing filter (52), and an inspecting section (2) for analyzing the sample material captured by the capturing filter (52), and further characterized in that the inspection equipment comprises a section (3) for delivering a baggage to the inspecting section (2), and a carrying section (4) for carrying the capturing filter (52) from the capturing section (5) to the inspecting section (2).
    Type: Grant
    Filed: March 14, 2005
    Date of Patent: July 10, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Hideo Kashima, Yasuaki Takada, Izumi Waki
  • Publication number: 20110278469
    Abstract: A technology for collecting a granular substance adhering to a baggage with high rate without touching the substance and inspecting whether a dangerous or specific sample material is adhered to the baggage. A method for simplifying or automating such an inspection is also provided. An adhering matter inspection equipment (1) is characterized in that the equipment comprises a collecting section (5) for collecting a sample material peeled off from an inspection object (25) whereupon the sample material is adhered by blowing compression gas through a capturing filter (52), and an inspecting section (2) for analyzing the sample material captured by the capturing filter (52), and further characterized in that the inspection equipment comprises a section (3) for delivering a baggage to the inspecting section (2), and a carrying section (4) for carrying the capturing filter (52) from the capturing section (5) to the inspecting section (2).
    Type: Application
    Filed: July 25, 2011
    Publication date: November 17, 2011
    Inventors: Hideo KASHIMA, Yasuaki Takada, Izumi Waki
  • Publication number: 20110174974
    Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.
    Type: Application
    Filed: January 14, 2011
    Publication date: July 21, 2011
    Applicant: HITACHI, LTD.
    Inventors: Mitsuo TOKUDA, Muneyuki FUKUDA, Yasuhiro MITSUI, Hidemi KOIKE, Satoshi TOMIMATSU, Hiroyasu SHICHI, Hideo KASHIMA, Kaoru UMEMURA
  • Publication number: 20110114476
    Abstract: A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
    Type: Application
    Filed: January 20, 2011
    Publication date: May 19, 2011
    Inventors: Hiroyasu Shichi, Tohru Ishitani, Hidemi Koike, Kaoru Umemura, Eiichi Seya, Mitsuo Tokuda, Satoshi Tomimatsu, Hideo Kashima, Muneyuki Fukuda
  • Patent number: 7897936
    Abstract: A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
    Type: Grant
    Filed: July 5, 2007
    Date of Patent: March 1, 2011
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyasu Shichi, Tohru Ishitani, Hidemi Koike, Kaoru Umemura, Eiichi Seya, Mitsuo Tokuda, Satoshi Tomimatsu, Hideo Kashima, Muneyuki Fukuda
  • Patent number: 7888639
    Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: February 15, 2011
    Assignee: Hitachi, Ltd.
    Inventors: Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura