Abstract: An exposure apparatus performs an exposure of a substrate by filling at least a portion of the space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate via the projection optical system and the liquid. The apparatus includes a bubble detector that detects air bubble or bubbles in the liquid between the projection optical system and the substrate. Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.

Abstract: A liquid immersion type exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a liquid film forming system for forming a liquid film in a predetermined region between the projection optical system and the substrate, and a sensor for detecting disappearance of at least a portion of the liquid film in the predetermined region.

Abstract: In subroutine 201 and step 205, a best image-forming plane of a projection optical system and an offset component of a multipoint AF system are detected as calibration information. During measurement of a wafer alignment mark by an alignment system in step 215, the multipoint AF system detects information related to a surface shape of a surface subject to exposure of a wafer (Z map). In step 219, a Z position order profile regarding position order (Z, ?x, ?y) related to autofocus leveling control is made, along with an XY position order profile of a wafer stage during scanning exposure, and in step 221, scanning exposure is performed while performing open control based on the position order.

Abstract: A reticle holder 18 has; a first suction section 63 facing a precision warrantable area AR1 having a predetermined surface precision, of a lower face Ra of a reticle R; a second suction section 64 facing a precision unwarrantable area AR2 outside of the precision warrantable area AR1; a pore 70a connected to a suction apparatus which draws out gas in a space between the lower face Ra of the reticle R and the first suction section 63, and a pore 70b connected to the suction apparatus 72 which draws out gas in the space between the lower face Ra of the reticle R and the second suction section 64. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.

Abstract: A reticle holder has a first suction section facing a precision warrantable area having a predetermined surface precision, of a lower face of a reticle, a second suction section facing a precision unwarrantable area outside of the precision warrantable area, a pore connected to a suction apparatus that draws out gas in a space between the lower face of the reticle and the first suction section, and a pore connected to the suction apparatus and that draws out gas in the space between the lower face of the reticle and the second suction section. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.

Abstract: An exposure apparatus performs an exposure of a substrate by filling at least a portion of the space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate via the projection optical system and the liquid. The apparatus includes a bubble detector that detects air bubble or bubbles in the liquid between the projection optical system and the substrate. Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.

Abstract: A liquid immersion type exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a liquid film forming system for forming a liquid film in a predetermined region between the projection optical system and the substrate, and a sensor for detecting disappearance of at least a portion of the liquid film in the predetermined region.

Abstract: An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) via the projection optical system and the liquid, includes a bubble detector (20) which detects air bubble or bubbles in the liquid between the projection optical system and the substrate (P). Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.

Abstract: A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.

Abstract: A reticle holder 18 has; a first suction section 63 facing a precision warrantable area AR1 having a predetermined surface precision, of a lower face Ra of a reticle R; a second suction section 64 facing a precision unwarrantable area AR2 outside of the precision warrantable area AR1; a pore 70a connected to a suction apparatus which draws out gas in a space between the lower face Ra of the reticle R and the first suction section 63, and a pore 70b connected to the suction apparatus 72 which draws out gas in the space between the lower face Ra of the reticle R and the second suction section 64. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.

Abstract: A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.

Abstract: Improvement is obtained in quality of transmitting by extraction of the accurate transfer data from the Symbol data stream includes Guard Interval and transfer data. The first aspect of the present invention is expansion of the size of the memory means for inputting to be able to store N+n samples (N means the size of symbol data, n is smaller than GI) using means to input the discrete input data sampled at a constant period, and fetch N samples of data from the optimum position. In the second aspect, the size of memory block for inputting stores N samples (N is power of 2, and N means the size of symbol data) as not changing their size. For inputting, at least 2 memory blocks are allocated with the function to independently control the riming to initiate fetching the input data to the each block. Therefore the data at the optimum position can be selected at the operation.

Abstract: An alignment method which performs alignment of a substrate on which a first mark is formed with respect to an exposure position, comprises measuring and storing a positional relationship between the first mark and a second mark formed in an area different from the first mark, and measuring a position of the second mark after the substrate is moved to a vicinity of the exposure position in a state in which relative positions of the first mark and the second mark are maintained to be substantially constant. The alignment of the substrate is performed based on the measurement result and the stored positional relationship.

Abstract: There is provided a multifunction rolling mill for rolling an H-beam including: a pair of right and left vertical rollers composed of flange thickness reduction rollers; web thickness reduction horizontal rollers; and a pair of upper and lower horizontal rollers arranged on both sides of the web thickness reduction rollers, having flange width reduction rollers freely moved in the vertical direction by retracting mechanisms. In the case of reduction of flange thickness and web thickness rolling, the flange width reduction rollers of the above horizontal rollers are moved upward and downward so that the flange width reduction rollers of the horizontal rollers do not interfere with the vertical rollers.

Abstract: The present invention relates to a detecting apparatus capable of detecting the position of a surface to be examined at higher accuracy and speed. Particularly, the detecting apparatus of the present invention allows a slit image, which is tilted relative to a base pattern on the surface of a substrate, to be applied to the surface of the substrate and its reflection on the surface to be re-imaged and recorded as a two-dimensional image on an image pick-up device. In particular, a row of imaging elements of the image pick-up device aligned in one dimension are arranged with its direction extending at an angle to the lengthwise direction of the two-dimensional image of the slit pattern reflection. Also, the two-dimensional image of the slit pattern reflection is defocused along the lengthwise direction by the action of a specific optics thus to average data of the optical characteristics on the surface of the substrate.

Abstract: The present invention relates to a technology for detecting at higher accuracy the position of a photosensitive substrate coated with photoresist with the use of a simpler arrangement. According to the present invention, the photoresist coating on the surface of the photosensitive substrate on which alignment marks are applied is a specific photoresist which is transparent to exposure light so that the alignment marks on the photosensitive substrate can be read with detection light which has a wavelength equal or approximate to the wavelength of the exposure light and may be lower in the intensity than a desired level of the exposure light required for exposure action. Accordingly, the present invention eliminates a conventional process for preparing legibility of the alignment marks on a photosensitive substrate such as exposing coating of the photoresist on the substrate to light for giving transparency to the detection light or removing a portion of the photoresist which covers the alignment marks.

Abstract: An object of the invention is to perform fast Fourier transform processes of radix 4 and 2 at a high speed. In order to attain this object, the invention divides complex number data in which the number of sampling points is 4n×2 or 4n into 4 groups A to D, and then repeats at n times a butterfly arithmetic operation of: ai={(Ai+Ci)+(Bi+Di)}×Wi1 ci={(Ai+Ci)−(Bi+Di)}×Wi3 bi={(Ai−Ci)−j(Bi−Di)}×Wi2 di={(Ai−Ci)+j(Bi−Di)}×Wi4, using the ith complex number data Ai, Bi, Ci and Di belonging to the groups A to D and twiddle factors Wi1, Wi2, Wi3 and Wi4, and then in case that the number of sampling points is 4n×2, the invention further performs once a butterfly arithmetic operation: ai=Ai+Bi bi=Ai−Bi ci=Ci+Di di=Ci−Di.

Abstract: An alignment apparatus according to the present invention is constructed, for example, which is arranged in an exposure apparatus provided with a projection optical system which projects a predetermined pattern formed on a mask onto a substrate under exposure light, which performs relative positioning between the mask and the substrate, which has light irradiating means for irradiating alignment light in a wavelength region different from that of exposure light onto an alignment mark formed on the substrate through the projection optical system and detecting means for detecting light from the alignment mark through the projection optical system, wherein, for alignment light as irradiation light traveling toward the alignment mark and alignment light as detection light from the alignment mark, there are provided correction optical elements for irradiation light and correction optical elements for detection light to cause axial chromatic aberration and magnification chromatic aberration in the opposite directio

Abstract: In an exposure apparatus and method utilizing a projection system, a surface state relating to an exposure area of the projection system is determined by illuminating the exposure area with light, receiving light from the exposure area, designating positions of a plurality of detection points in the exposure area in accordance with a size of the exposure area, and detecting, based on information of received light corresponding to the plurality of detection points, positions related to the plurality of detection points.

Abstract: In a cata-dioptric optical system having a combination of a reflection system and a refraction system for reduction-projecting an object on a first plane onto a second plane, a polarization beam splitter and a quarter wavelength plate are provided to split the incident light and the reflected light. The light beam directed to the polarization beam splitter is converted to a substantially collimated light beam by a first group of lenses. A second group of lenses are arranged between the polarization beam splitter and a concave reflection mirror to diverge the light beam. The light reflected by the concave reflection mirror is directed back to the polarization beam splitter with a substantially collimated state by the second group of lenses. The light beam from the second group of lenses transmitted through the polarization beam splitter is focused by a third group of lenses having a positive refraction power to form a reduced image.