Patents by Inventor Hideo Nakako

Hideo Nakako has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120289674
    Abstract: A compound represented by a formula 1 shown below. In the formula 1, each of R1 and R2 independently represents a group selected from the group consisting of a hydrogen atom and substituents composed of C, H and/or X (wherein X represents a hetero atom), and each of Z1 and Z2 independently represents a group selected from the group consisting of aromatic substituents composed of C and H, aromatic substituents composed of C, H and X (wherein X represents a hetero atom), groups containing an aromatic ring and a double-bonded and/or triple-bonded conjugated structure composed of C and H, and groups containing an aromatic ring and a double-bonded and/or triple-bonded conjugated structure composed of C, H and/or X (wherein X represents a hetero atom).
    Type: Application
    Filed: January 28, 2011
    Publication date: November 15, 2012
    Applicants: Kanagawa University, Hitachi Chemical Company, Ltd.
    Inventors: Shigeaki Funyuu, Kenichi Ishitsuka, Hideo Nakako, Sentaro Okamoto
  • Publication number: 20120175147
    Abstract: Disclosed are: a copper metal film which has good adhesion to a substrate, low volume resistivity, and good deep-part metal properties; and a method for producing a copper metal film, wherein the copper metal film can be produced by reducing a substrate to a deep part thereof without damaging the substrate. Specifically disclosed is a copper metal film obtained by treating a copper-based particle deposition layer containing both copper oxides and a metallic transition metal or alloy, or a transition metal complex containing a metal element, with gaseous formic acid and/or formaldehyde heated to 120° C. or higher. The copper oxide is preferably copper (I) oxide and/or copper (II) oxide. The transition metal, alloy or metal complex are preferably a metal selected from the group consisting of Cu, Pd, Pt, Ni, Ag, Au and Rh, an alloy containing the metal, or a complex containing the metal element, respectively.
    Type: Application
    Filed: September 13, 2010
    Publication date: July 12, 2012
    Inventors: Hideo Nakako, Kazunori Yamamoto, Yasushi Kumashiro, Shunya Yokosawa, Katsuyuki Masuda, Yoshinori Ejiri, Maki Inada, Kyoko Kuroda
  • Publication number: 20120170241
    Abstract: Disclosed is a printing ink comprising Cu- and/or CuO-containing metal nanoparticles, which obtains excellent dispersion properties and successive dispersion stability without using additives such as dispersing agents. Specifically disclosed is a printing ink that comprises Cu- and/or CuO-containing metal nanoparticles and has no more than 2,600 ppm of ionic impurities in the total solid content. The printing ink is obtained by dispersing the Cu- and/or CuO-containing metal nanoparticles, which have no more than 2,600 ppm of ionic impurities in the total solid content, in a dispersion medium.
    Type: Application
    Filed: September 13, 2010
    Publication date: July 5, 2012
    Inventors: Hideo Nakako, Kazunori Yamamoto, Yasushi Kumashiro, Shunya Yokosawa, Yoshinori Ejiri, Katsuyuki Masuda, Kyoko Kuroda, Maki Inada
  • Publication number: 20120125659
    Abstract: Provided are a copper conductor film and manufacturing method thereof, and patterned copper conductor wiring, which have superior conductivity and wiring pattern formation, and with which there is no decrease in insulation between circuits, even at narrow wiring widths and narrow inter-wiring spacing.
    Type: Application
    Filed: December 17, 2008
    Publication date: May 24, 2012
    Inventors: Hideo Nakako, Kazunori Yamamoto, Yasushi Kumashiro, Youichi Machii, Shunya Yokozawa, Yoshinori Ejiri, Katsuyuki Masuda
  • Publication number: 20100233011
    Abstract: There are provided are a method wherein a surface treating agent, which is essential for making copper particles antioxidative and dispersing the copper particles in the prior art, is hardly used but copper particles, which cause little electromigration and are small in the price rate of material itself, are used to form a low-resistance copper wiring pattern while the generation of cracks therein is restrained; and a copper oxide particle dispersed slurry used therein. The method is a method for forming a copper wiring pattern including the step of using a dispersion slurry wherein copper based particles having a copper oxide surface are dispersed to form any pattern over a substrate, and the step of reducing the copper oxide surface of the copper based particles in the pattern with atomic form hydrogen to return the oxide to copper, and sintering particles of the copper metal generated by the reduction and bonding the particles to each other.
    Type: Application
    Filed: October 20, 2008
    Publication date: September 16, 2010
    Inventors: Hideo Nakako, Kazunori Yamamoto, Youichi Machii, Yasushi Kumashiro, Shunya Yokozawa, Yoshinori Ejiri, Katsuyuki Masuda
  • Publication number: 20090134386
    Abstract: An organic field-effect transistor has a gate insulating layer comprising a cured epoxy resin. The epoxy resin has a lower concentration of trapping centres compared with a conventional epoxy resin in which trapping centres are provided by hydroxyl (OH) groups. The lower concentration of trapping centres can be achieved by reducing the number of hydroxyl groups throughout the layer and/or by reducing the number of hydroxyl groups in a surface region.
    Type: Application
    Filed: August 21, 2008
    Publication date: May 28, 2009
    Inventors: Hideo Nakako, Kazunori Yamamoto, Yasushi Kumashiro, Masahiko Ando, Takeo Shiba
  • Publication number: 20050065275
    Abstract: The invention relates to a thermosetting resin composition comprising: a binder containing a thermosetting resin having a storage elastic modulus of 1,000 MPa or less at 20° C. and an elongation of 10% or more at 20° C.; and an inorganic filler in an amount of 100 to 2,000 parts by weight with respect to 100 parts by weight of the binder. According to the invention, it provides a thermosetting resin composition and resin film which have a low thermal expansion coefficient and able to possess a low elastic modulus, a high extensibility, and a low thermal expansion coefficient.
    Type: Application
    Filed: September 25, 2002
    Publication date: March 24, 2005
    Applicant: Hitachi Chemical Co., LTD
    Inventors: Atsushi Takahashi, Hideo Baba, Ken Madarame, Hideo Nakako, Nozomu Takano