Patents by Inventor Hideo Shimizu

Hideo Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5663602
    Abstract: The inner wall of a hub has a step surface between an upper bearing mounting surface and a magnet mounting surface. A spacer of ring-like shape is directly mounted to the step surface of the hub for determining the upper position of a rotor magnet. The inside diameter of the spacer is smaller than the inner wall at the bearing mounting surface of the hub so that a space is created between the bearing mounting surface, the spacer, and the bearing for holding a portion of adhesive. When a portion of the adhesive applied for bonding the bearing to the bearing mounting surface of the hub remains uncured, it will be retained in the space and prevented from entering the interior of the motor.
    Type: Grant
    Filed: March 13, 1995
    Date of Patent: September 2, 1997
    Assignee: Nidec Corporation
    Inventors: Hideo Shimizu, Jun Inoue
  • Patent number: 5604940
    Abstract: A movable bathtub unit having a bathtub covered with a jacket receptacle is integrally assembled with bubble-jet producing equipment for emitting a jet of air bubbles or hot water into the bathtub so as to facilitate its transportation and installation. The bathtub further includes equipment for injecting various bath liquids or an aromatic or for illuminating the inside of the bathtub so as to render bathing more enjoyable.
    Type: Grant
    Filed: March 22, 1995
    Date of Patent: February 25, 1997
    Assignee: Cappeline Buono
    Inventor: Hideo Shimizu
  • Patent number: 5602950
    Abstract: A light beam from an optical fiber held by a waveguide support is guided to an illuminated region of a light-receiving section. A light beam from one light-deflecting device inside this region is reflected by a reflecting surface and passed as a light beam through a second light-deflecting device in another illuminated region to arrive at a second optical fiber. A light beam from the second optical fiber takes the reverse route to the foregoing route. In this way, various light-deflecting devices in one illuminated region are optically coupled to light-deflecting devices in other illuminated regions with substantially equal optical coupling strength. Further for equalizing light-beam intensities and minimizing optical dispersion loss, lenses may be included with the light-deflecting devices.
    Type: Grant
    Filed: January 29, 1996
    Date of Patent: February 11, 1997
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Tetsuya Saitoh, Hideo Shimizu, Takeshi Kobayashi
  • Patent number: 5593799
    Abstract: An exposure mask having phase shifting films of a predetermined thickness composed of a material transparent to the wavelength of exposure light and formed on a substrate transparent to such wavelength for causing a desired phase shift, wherein the phase shifting films are so patterned as to principally have arrangement of repeated patterns. Relative to the rule width L of the repeated patterns projected onto a work member to be exposed, a pattern having a rule width of 2 L/m is formed, in which m (.ltoreq.1) is a size reduction magnification in the use of a reduced-size projection exposer. The exposure mask is adapted for use in producing a diffraction grating as well. The mask is easily manufacturable without the necessity of any intricate process such as a positioned exposure, hence minimizing the number of required steps in manufacture while achieving a further fine work with an enhanced resolution higher than the known value.
    Type: Grant
    Filed: October 26, 1990
    Date of Patent: January 14, 1997
    Assignee: Sony Corporation
    Inventors: Toshiro Tsumori, Hideo Shimizu
  • Patent number: 5568580
    Abstract: A light beam from an optical fiber held by waveguide support is guided to an illuminated region of a light-receiving section. A light beam from one light-deflecting device inside this region is reflected by a reflecting surface and passed as a light beam through a second light-deflecting device in another illuminated region to arrive at a second optical fiber. A light beam from the second optical fiber takes the reverse route to the foregoing route. In this way, various light-deflecting devices in one illuminated region are optically coupled to light-deflecting devices in other illuminated regions with substantially equal optical coupling intensity.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: October 22, 1996
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Tetsuya Saitoh, Hideo Shimizu
  • Patent number: 5537969
    Abstract: A cylinder block is produced by subjecting an outer surface of a cylinder sleeve section Sc of cast iron to a shot blast treatment, forming a first intermediate layer 31 of aluminum-based material containing Si, Cu and the like on the cylinder section Sc, and inserting the cylinder sleeve section Sc in a cast-in manner within a cylinder barrel 1.sub.U of aluminum alloy. The electrical-potential difference between the cylinder sleeve section Sc and the cylinder barrel 1.sub.U and the first intermediate layer 31 is decreased by the first intermediate layer 31 to enhance the durability against an electrolytic corrosion and to enhance the deposition by a mutual diffusing action therebetween. In a modification, a second intermediate layer 32 of a Ni-Al based material is formed under the first intermediate layer 31 at a portion of the cylinder sleeve section Sc inserted in a cast-in manner within the cylinder barrel 1.sub.U, whereby the adhesion can be further enhanced.
    Type: Grant
    Filed: April 18, 1995
    Date of Patent: July 23, 1996
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Tsunehisa Hata, Hideo Shimizu, Kenji Matsumoto
  • Patent number: 5432044
    Abstract: A method of forming a pattern using a phase shift mask which comprises applying at least first and second exposures. At least one exposure is conducted by using a phase shifting mask and at least the other exposure is conducted for compensating the amount of light at a phase shifting boundary of the phase shifting mask, the pattern having an inter-pattern distance on a substrate of less than 2.4.times..lambda./NA.The method of the present invention is applicable also to the formation of a pattern to which the existing phase shifting technique can not be applied, as well as to a pattern in which sub-patterns as the phase shifting portions can not be provided, whereby a pattern at a high resolution power can be obtained irrespective of the pattern shape.
    Type: Grant
    Filed: October 8, 1993
    Date of Patent: July 11, 1995
    Assignee: Sony Corporation
    Inventor: Hideo Shimizu
  • Patent number: 5397663
    Abstract: An exposure mask and an exposure method are provided, which can suppress adverse effects of interference edge patterns (sub-shifters) located around a central pattern.The exposure mask has central patterns and edge patterns arranged around each central pattern. The mutual interference of edge patterns is reduced by providing an angle or a phase difference between vicinity edge patterns, or providing a single edge pattern to reduce the light transmission.
    Type: Grant
    Filed: August 31, 1993
    Date of Patent: March 14, 1995
    Assignee: Sony Corporation
    Inventors: Fumikatsu Uesawa, Michio Negishi, Hideo Shimizu
  • Patent number: 5318623
    Abstract: A process for producing a metal phthalocyanine pigment which comprises the steps of: reacting phthalic anhydride or a derivative thereof with urea or a derivative thereof with heating in the presence of a catalyst either in the presence or absence of an organic solvent; adding to the reaction mixture of the preceding step a metal or its compound capable of constituting the core of the metal phthalocyanine either alone or together with urea or a derivative thereof, without isolating the reaction product from the reaction mixture of the preceding step; and allowing the reaction mixture to react while simultaneously applying a mechanical grinding force in the presence or absence of a grinding agent.
    Type: Grant
    Filed: April 30, 1993
    Date of Patent: June 7, 1994
    Assignee: Toyo Ink Manufacturing Co., Ltd.
    Inventors: Shinichi Azuma, Takashi Kano, Takanori Miyake, Hideo Shimizu
  • Patent number: 5271197
    Abstract: The present invention provides an earthquake resistant multi-story building which is characterized by having an energy concentration story. The energy concentration story has an elasto-plastic force-displacement relationship regarding horizontal force and displacement. The force-displacement relationship is characterized in that: (a) stiffness in elastic range (F.sub.y /d.sub.y) is generally equal to an optimal stiffness of the same story according to an elastic design concept; (b) the yield strength F.sub.y is generally less than 80% of an optimum yield strength; (c) stiffness in plastic range is positive and generally less than about a half of the stiffness in the elastic range; and (d) ultimate displacement is generally at least twice as large as the yield displacement.
    Type: Grant
    Filed: August 13, 1992
    Date of Patent: December 21, 1993
    Assignees: Shimizu Construction Co., Ltd., Sumitomo Metal Industries, Ltd.
    Inventors: Toshio Uno, Yoshitaka Yabe, Kiyoshi Ikura, Shinji Mase, Toshihiko Hirama, Hideo Shimizu, Masahiro Kato, Fumio Ohtake, Takehiko Terada, Tomomi Kanemitsu
  • Patent number: 5260152
    Abstract: A method for manufacture of such a phase shifting mask comprises the steps of forming a light shielding layer on a substrate; forming a photoresist on the light shielding layer; patterning the photoresist to form a resist pattern; providing an opening in the light shielding layer by the use of the resist pattern as a mask, thereby forming a light shielding pattern; etching the substrate anisotropically to form a phase shifting segment; side etching the light shielding pattern to form a light shielding region; and removing the resist pattern.
    Type: Grant
    Filed: April 27, 1992
    Date of Patent: November 9, 1993
    Assignee: Sony Corporation
    Inventors: Hideo Shimizu, Hiroichi Hawahira
  • Patent number: 5067117
    Abstract: An output stabilizing apparatus for an optical head having a semiconductor laser, a beam splitter, an optical projection system, a monitor photodiode and an automatic laser power control circuit. A main laser beam emitted from the semiconductor laser is split into two beams by the beam splitter. The monitor photodiode is disposed to receive one of the beams and generates a monitor signal. In response to the monitor signal, the automatic laser power control circuit controls the semiconductor laser intensity.
    Type: Grant
    Filed: October 25, 1989
    Date of Patent: November 19, 1991
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Hideo Shimizu, Yasuhiro Takahashi
  • Patent number: 4955550
    Abstract: A quantitative feeding apparatus usable for pulverized and/or granular material, a multi-colored automatic feeding apparatus in which the material to be handled is fed in the form of a master batch while the quantitative feeding apparatus is used therefor and a runner recycling apparatus are provided. At every time when the kind of color is to be changed to another one, it is necessary that the quantitative feeding apparatus using the master batch therefor is heretofore disassembled for the purpose of cleaning with the result that a number of manhours are consumed for cleaning operation. In view of the foregoing problem, a plurality of cleaning nozzles directed toward the upper feeding port of the quantitative feeding apparatus, the feeder and the bottom discharging part are arranged for the purpose of cleaning whereby automatic cleaning can be achieved satisfactorily.
    Type: Grant
    Filed: November 3, 1988
    Date of Patent: September 11, 1990
    Assignees: Toyota Jidosha Kabushiki Kaisha, Toyo Ink Mfg. Co., Ltd.
    Inventors: Hideo Satake, Hideo Shimizu, Hozumi Tanaka
  • Patent number: 4943380
    Abstract: An antistatic resin composition with transparency contains 90-99.9 wt % of a synthetic resin selected from polycarbonate or polymethyl methacrylate and 0.1-10 wt % of a heat-resistant antistat containing phosphonium sulfonate shown by the general formula (I) below: ##STR1## where A is alkyl group with 1-36 carbon atoms, alkenyl group with 4-24 carbon atoms, phenyl group, phenyl group substituted by alkyl group with 1-18 carbon atoms, naphthyl group or naphthyl group substituted by alkyl group with 1-18 carbon atoms, R.sup.1, R.sup.2 and R.sup.3 are identical, each being an aliphatic hydrocarbon group with 1-8 carbon atoms or aromatic hydrocarbon group, and R.sup.4 is a hydrocarbon group with 1-18 carbon atoms.
    Type: Grant
    Filed: February 27, 1989
    Date of Patent: July 24, 1990
    Assignee: Takemoto Yushi Kabushiki Kaisha
    Inventors: Masato Sugiura, Hideo Shimizu, Shigeru Imamura, Fumitoshi Sugiura
  • Patent number: 4810733
    Abstract: A color concentrate which comprises (a) one or more of polypropylene resins and propylene copolymers having a melt flow rate in the range of 0.1-100, (b) one or more of organic and inorganic pigments; and (c) one or more pigment dispersants selected from the group consisting of polyethylene wax, polypropylene wax and derivatives thereof, zinc stearate, magnesium stearate, aluminium stearate, calcium stearate and ethylene bisamide, the contents of (a), (b) and (c) being, respectively, 11-30 wt %, 10-80 wt % and 10-50 wt % based on the total of (a), (b) and (c); and molded or extruded articles of thermoplastic resins other than (a) colored with the color concentrate.
    Type: Grant
    Filed: October 19, 1987
    Date of Patent: March 7, 1989
    Assignee: Toyo Ink Mfg Co., Ltd
    Inventors: Noburu Sakuma, Hideo Shimizu
  • Patent number: 4740869
    Abstract: An electrolytic capacitor comprising a capacitor element and an electrolyte impregnated to the element, wherein the electrolyte contains a flurorocarboxylic acid or its salt as a solute dissolved in an organic solvent.
    Type: Grant
    Filed: November 14, 1986
    Date of Patent: April 26, 1988
    Assignees: Asahi Glass Company Ltd., Elna Company Ltd.
    Inventors: Takeshi Morimoto, Toshiya Matsubara, Yoshiki Hamatani, Naoto Iwano, Hideo Shimizu, Shigeo Komatsu, Hidemi Yamada
  • Patent number: 4734821
    Abstract: An electrolytic capacitor comprising a capacitor element and an electrolyte impregnated to the element, wherein the electrolyte comprises an organic polar solvent and a solute dissolved in the solvent, said solute being selected from the group consisting of a quaternary ammonium salt of an aromatic carboxylic acid, a quaternary ammonium salt of cycloalkene carboxylic acid and a quaternary ammonium salt of an unsaturated aliphatic carboxylic acid.
    Type: Grant
    Filed: May 13, 1987
    Date of Patent: March 29, 1988
    Assignees: Asahi Glass Company Ltd., Elna Company Ltd.
    Inventors: Takeshi Morimoto, Yoshiki Hamatani, Toshiya Matsubara, Naoto Iwano, Hideo Shimizu
  • Patent number: 4689724
    Abstract: An electrolytic capacitor comprising a capacitor element and an electrolyte impregnated to the element, wherein the electrolyte contains a fluorocarboxylic acid or its salt as a solute dissolved in an organic solvent.
    Type: Grant
    Filed: November 14, 1986
    Date of Patent: August 25, 1987
    Assignees: Asahi Glass Company Ltd., Elna Company Ltd.
    Inventors: Takeshi Morimoto, Toshiya Matsubara, Yoshiki Hamatani, Naoto Iwano, Hideo Shimizu, Shigeo Komatsu, Hidemi Yamada
  • Patent number: 4686138
    Abstract: There is disclosed a direct image printing plate for offset printing which comprises a water resistant support and an image receiving layer provided thereon which comprises an inorganic pigment and a mixed binder comprising a water-soluble high polymer compound and a synthetic high polymer latex. There is also disclosed a direct image printing plate for offset printing which comprises a water resistant support and an image receiving layer provided thereon which comprises a mixed pigment comprising a synthetic silica fine powder of 20.mu. or less in particle diameter and a colloidal silica of 50 m.mu. or less in particle diameter and a binder which is preferably polyvinyl alcohol.
    Type: Grant
    Filed: June 11, 1986
    Date of Patent: August 11, 1987
    Assignee: Mitsubishi Paper Mills, Ltd.
    Inventors: Koji Toyama, Hideo Shimizu
  • Patent number: 4527208
    Abstract: In a magnetic recording and/or reproducing apparatus having a rotary head drum and a mounting for a tape cassette apart from the drum; a tape loading device is provided with a support ring which is rotatable around the drum and inclined in respect to the plane containing the longitudinal median of the tape in the mounted cassette, a plurality of rotary tape guides spaced apart along the support ring and extending perpendicularly to the latter for withdrawing tape from the cassette and wrapping a portion thereof about the drum in response to turning of the support ring, and a draw-out guide which is movable toward and away from one side of the support ring in synchronism with the turning of the latter, the draw-out guide, when moved away from the support ring, being inclined relative to the plane containing the longitudinal median of the tape in the cassette such that a return run of the tape extending from the draw-out guide back to the cassette leads smoothly to the latter.
    Type: Grant
    Filed: April 8, 1982
    Date of Patent: July 2, 1985
    Assignee: Sony Corporation
    Inventors: Shin Okita, Hideo Shimizu, Noriyuki Yamazaki, Fumio Sekiguchi, Toshihiko Chimura, Osamu Shinagawa