Patents by Inventor Hidetoshi Abe

Hidetoshi Abe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210009863
    Abstract: An adhesive sheet of an embodiment of the present disclosure is an adhesive sheet including: a rigid resin film having a thickness of 80 micrometers to 500 micrometers, and a first pressure sensitive adhesive layer being disposed on or above a surface of the rigid resin film, wherein the first pressure sensitive adhesive layer includes elastic resin microspheres having a volume average particle diameter of 110 micrometers or greater and a tacky binder, and the first pressure sensitive adhesive layer has an uneven surface due to the presence of the microspheres.
    Type: Application
    Filed: April 4, 2018
    Publication date: January 14, 2021
    Inventors: Hidetoshi Abe, Kengo Imamura, Katsuya Ono, Yoshihiko Takeda, Takeo Yamamoto
  • Patent number: 10893188
    Abstract: An imaging apparatus includes an imaging device that photoelectrically converts an optical image obtained through a focus lens. The focus lens is moved to a focus position set by focus detection performed based on image signals from the imaging device with a first aperture value. A first correction amount of the set focus position is acquired according to a difference between the first aperture value and a second aperture value to be used at a time of photographing. Photographing is executed at a determined focus position at the time of photographing, by a user's operation. If the first correction amount is larger than a predetermined amount, a focus position corrected according to the first correction amount is determined as the focus position at the time of photographing, and if not, the set focus position is determined as the focus position at the time of photographing.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: January 12, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Masaki Tokioka, Hiromi Kotoku, Hidetoshi Abe, Takeshi Omata, Kenya Fukabori, Naoki Iwasaki, Hiroaki Kurisu
  • Patent number: 10870750
    Abstract: A film is described comprising a (meth)acrylic polymer and a polyvinyl acetal (e.g. butyral) resin. In some embodiments, the film has a glass transition temperature (i.e. Tg) ranging from 30° C. to 60° C. In some embodiments, the film has a gel content of at least 20% or greater. In some embodiments, the film has an elongation at break of at least 175%. The film typically comprises photoinitiator as a result of the method by which the film was made. The film may be a monolithic film or a layer of a multilayer film.
    Type: Grant
    Filed: November 28, 2018
    Date of Patent: December 22, 2020
    Assignee: 3M Innovative Properties Company
    Inventors: Jonathan E. Janoski, Anthony F. Schultz, Keith R. Lyon, Ronald S. Steelman, Kevin M. Lewandowski, Corinne E. Lipscomb, Terry R. Hobbs, Arlin L. Weikel, Jayshree Seth, Duane D. Fansler, Hidetoshi Abe
  • Patent number: 10830729
    Abstract: In a sensor control device which controls a sensor, a first filter unit extracts a first filtered signal obtained by attenuating a frequency component higher than a first cutoff frequency from a digital signal indicating a current-application control value for a pump current, and a second filter unit extracts a second filtered signal obtained by attenuating a frequency component higher than a second cutoff frequency from the first filtered signal. A cutoff frequency setting unit sets at least one of the first cutoff frequency and the second cutoff frequency such that the sensor control device can control at least two types of sensors.
    Type: Grant
    Filed: May 16, 2018
    Date of Patent: November 10, 2020
    Assignee: NGK SPARK PLUG CO., LTD.
    Inventors: Junichiro Mitsuno, Satoru Abe, Chihiro Tomimatsu, Hidetoshi Makino
  • Publication number: 20200321451
    Abstract: A method for producing a semiconductor power device, includes forming a gate trench from a surface of a semiconductor layer toward an inside thereof. A first insulation film is formed on an inner surface of the gate trench. The method also includes removing a part on a bottom surface of the gate trench in the first insulation film. A second insulation film having a dielectric constant higher than SiO2 is formed in such a way as to cover the bottom surface of the gate trench exposed by removing the first insulation film.
    Type: Application
    Filed: June 18, 2020
    Publication date: October 8, 2020
    Inventors: Keiji OKUMURA, Mineo MIURA, Yuki NAKANO, Noriaki KAWAMOTO, Hidetoshi ABE
  • Publication number: 20200279923
    Abstract: According to the present invention, a semiconductor device includes a first conductivity type SiC layer, an electrode that is selectively formed upon the SiC layer, and an insulator that is formed upon the SiC layer and that extends to a timing region that is set at an end part of the SiC layer. The insulator includes an electrode lower insulating film that is arranged below the electrode, and an organic insulating layer that is arranged so as to cover the electrode lower insulating film. The length (A) of the interval wherein the organic insulating layer contacts the SiC layer is 40 ?m or more, and the lateral direction distance (B) along the electrode lower insulating layer between the electrode and SiC layer is 40 ?m or more.
    Type: Application
    Filed: May 19, 2020
    Publication date: September 3, 2020
    Inventors: Katsuhisa NAGAO, Hidetoshi ABE
  • Patent number: 10727318
    Abstract: A method for producing a semiconductor power device, includes forming a gate trench from a surface of a semiconductor layer toward an inside thereof. A first insulation film is formed on an inner surface of the gate trench. The method also includes removing a part on a bottom surface of the gate trench in the first insulation film. A second insulation film having a dielectric constant higher than SiO2 is formed in such a way as to cover the bottom surface of the gate trench exposed by removing the first insulation film.
    Type: Grant
    Filed: September 9, 2016
    Date of Patent: July 28, 2020
    Assignee: ROHM CO., LTD.
    Inventors: Keiji Okumura, Mineo Miura, Yuki Nakano, Noriaki Kawamoto, Hidetoshi Abe
  • Publication number: 20200201126
    Abstract: A liquid crystal display capable of reducing the occurrence of defective display due to variations in the initial alignment direction of a liquid crystal alignment control film in a liquid crystal display of an IPS scheme, realizing the stable liquid crystal alignment, providing excellent mass productivity, and having high image quality with a higher contrast ratio. The liquid crystal display has a liquid crystal layer disposed between a pair of substrates, at least one of the substrates being transparent, and an alignment control film formed between the liquid crystal layer and the substrate. At least one of the alignment control films 109 comprises photoreactive polyimide and/or polyamic acid provided with an alignment control ability by irradiation of substantially linearly polarized light.
    Type: Application
    Filed: March 4, 2020
    Publication date: June 25, 2020
    Inventors: Yasushi TOMIOKA, Hidetoshi ABE, Katsumi KONDO
  • Patent number: 10692978
    Abstract: According to the present invention, a semiconductor device includes a first conductivity type SiC layer, an electrode that is selectively formed upon the SiC layer, and an insulator that is formed upon the SiC layer and that extends to a timing region that is set at an end part of the SiC layer. The insulator includes an electrode lower insulating film that is arranged below the electrode, and an organic insulating layer that is arranged so as to cover the electrode lower insulating film. The length (A) of the interval wherein the organic insulating layer contacts the SiC layer is 40 ?m or more, and the lateral direction distance (B) along the electrode lower insulating layer between the electrode and SiC layer is 40 ?m or more.
    Type: Grant
    Filed: May 15, 2015
    Date of Patent: June 23, 2020
    Assignee: ROHM CO., LTD.
    Inventors: Katsuhisa Nagao, Hidetoshi Abe
  • Patent number: 10669963
    Abstract: An anomaly determination apparatus determines an anomaly of a current control apparatus which supplies a control current to a control target and includes a current anomaly determination section. The current anomaly determination section is configured to compare a normal numerical range within which a state quantity changing with the control current falls in a particular state with a particular state quantity which is the state quantity corresponding to the control current generated by the control current generation section in the particular state, and determine that at least one of the reference resistor, the reference current generation section, and the control current generation section is in an anomalous state in the case where the particular state quantity has deviated from the normal numerical range. By using the current anomaly determination section, the anomaly determination apparatus can determine an anomaly of the current control apparatus.
    Type: Grant
    Filed: April 18, 2018
    Date of Patent: June 2, 2020
    Assignee: NGK Spark Plug Co., LTD.
    Inventors: Junichiro Mitsuno, Satoru Abe, Chihiro Tomimatsu, Hidetoshi Makino
  • Publication number: 20190238756
    Abstract: An imaging apparatus includes an imaging device that photoelectrically converts an optical image obtained through a focus lens. The focus lens is moved to a focus position set by focus detection performed based on image signals from the imaging device with a first aperture value. A first correction amount of the set focus position is acquired according to a difference between the first aperture value and a second aperture value to be used at a time of photographing. Photographing is executed at a determined focus position at the time of photographing, by a user's operation. If the first correction amount is larger than a predetermined amount, a focus position corrected according to the first correction amount is determined as the focus position at the time of photographing, and if not, the set focus position is determined as the focus position at the time of photographing.
    Type: Application
    Filed: January 25, 2019
    Publication date: August 1, 2019
    Inventors: Masaki Tokioka, Hiromi Kotoku, Hidetoshi Abe, Takeshi Omata, Kenya Fukabori, Naoki Iwasaki, Hiroaki Kurisu
  • Patent number: 10358582
    Abstract: The present application is directed to an acrylic polymer. Specifically, a marking film comprising a film layer which comprises a polymer blend of a first (meth)acrylic polymer having a glass transition temperature of 30 degrees C. to 180 degrees C. and a second (meth)acrylic polymer having a glass transition temperature of over ?80 degrees C. less than 30 degrees C. One from the first and second (meth)acrylic polymers comprises a carboxylic group and another comprises an amide group. The marking film additionally comprises an adhesive layer.
    Type: Grant
    Filed: January 12, 2011
    Date of Patent: July 23, 2019
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Hidetoshi Abe, Yorinobu Takamatsu, Ronald S. Steelman, Naoyuki Toriumi, Michael P. Daniels
  • Publication number: 20190210149
    Abstract: The friction stir welding tool member according to the present invention is made of a ceramic member in which a shoulder portion and a probe portion are integrally formed, wherein a root portion of the probe portion and an end portion of the shoulder portion have a curved surface shape; and the friction stir welding tool member has a ratio (R1/D) of 0.02 or more and 0.20 or less when a curvature radius of the end portion of the shoulder portion is defined as R1 (mm) and an outer diameter of the shoulder portion is defined as D (mm). In addition, the ceramic member is preferably made of a silicon nitride sintered body having a Vickers hardness of 1400 HV1 or more. According to the above-described configuration, a friction stir welding tool member having excellent durability can be provided.
    Type: Application
    Filed: August 4, 2017
    Publication date: July 11, 2019
    Applicants: OSAKA UNIVERSITY, TOSHIBA MATERIALS CO., LTD.
    Inventors: Hidetoshi FUJII, Yoshiaki MORISADA, Kai FUNAKI, Isao IKEDA, Yutaka ABE, Masahiro KATO
  • Publication number: 20190202516
    Abstract: A saddle-riding-type vehicle canister arrangement structure is a canister arrangement structure of a saddle riding type vehicle, including: an engine that includes a crankcase; an exhaust pipe that extends downward at a frontward position of the crankcase from a front part of the engine and then passes below the engine; and a canister that recovers an evaporated fuel which is generated at a fuel tank, wherein the canister is arranged between the engine and the exhaust pipe at a frontward position of the crankcase.
    Type: Application
    Filed: December 20, 2018
    Publication date: July 4, 2019
    Inventors: Kanta Yamamoto, Hitoshi Nishino, Kohei Abe, Jumpei Mishiro, Hidetoshi Wakasa
  • Publication number: 20190168337
    Abstract: The friction stir welding tool member according to the present invention is made of a silicon nitride sintered body, wherein the silicon nitride sintered body contains 15% by mass or less of additive components except silicon nitride in such a manner that the additive components include at least one element selected from lanthanoid elements and at least one element selected from Mg, Ti, Hf, and Mo. In addition, it is preferable that the additive components further include at least one element selected from Al, Si, and C. According to the above-described configuration, a friction stir welding tool member having an excellent durability can be provided.
    Type: Application
    Filed: August 4, 2017
    Publication date: June 6, 2019
    Applicants: OSAKA UNIVERSITY, TOSHIBA MATERIALS CO., LTD.
    Inventors: Hidetoshi FUJII, Yoshiaki MORISADA, Kai FUNAKI, Isao IKEDA, Yutaka ABE, Masahiro KATO
  • Publication number: 20190092936
    Abstract: A film is described comprising a (meth)acrylic polymer and a polyvinyl acetal (e.g. butyral) resin. In some embodiments, the film has a glass transition temperature (i.e. Tg) ranging from 30° C. to 60° C. In some embodiments, the film has a gel content of at least 20% or greater. In some embodiments, the film has an elongation at break of at least 175%. The film typically comprises photoinitiator as a result of the method by which the film was made. The film may be a monolithic film or a layer of a multilayer film.
    Type: Application
    Filed: November 28, 2018
    Publication date: March 28, 2019
    Inventors: Jonathan E. Janoski, Anthony F. Schultz, Keith R. Lyon, Ronald S. Steelman, Kevin M. Lewandowski, Corinne E. Lipscomb, Terry R. Hobbs, Arlin L. Weikel, Jayshree Seth, Duane D. Fansler, Hidetoshi Abe
  • Patent number: 10167386
    Abstract: A film is described comprising a (meth)acrylic polymer and a polyvinyl acetal (e.g. butyral) resin. In some embodiments, the film has a glass transition temperature (i.e. Tg) ranging from 30° C. to 60° C. In some embodiments, the film has a gel content of at least 20% or greater. In some embodiments, the film has an elongation at break of at least 175%. The film typically comprises photoinitiator as a result of the method by which the film was made. The film may be a monolithic film or a layer of a multilayer film.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: January 1, 2019
    Assignee: 3M Innovative Properties Company
    Inventors: Jonathan E. Janoski, Anthony F. Schultz, Keith R. Lyon, Ronald S. Steelman, Kevin M. Lewandowski, Corinne E. Lipscomb, Terry R. Hobbs, Arlin L. Weikel, Jayshree Seth, Duane D. Fansler, Hidetoshi Abe
  • Patent number: 10139530
    Abstract: To provide a decorative sheet which has anti-skid properties, is resistant to abrasion, exhibits high abrasion resistance even when bonded to a floor or road surface over which pedestrians or vehicles traverse, does not cause pedestrians or vehicles to skid, and does not suffer from damage or peeling. [Resolution Means] A decorative sheet having a first bead coat layer comprising a resin and particles having a median diameter of from 20 ?m to 60 ?m, a second bead coat layer which is coated on the first bead coat layer and which includes a resin and particles having a median diameter of from 20 ?m to 60 ?m, a design layer and an adhesive layer.
    Type: Grant
    Filed: October 11, 2012
    Date of Patent: November 27, 2018
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Takeo Yamamoto, Hidetoshi Abe
  • Publication number: 20180273812
    Abstract: A laminate comprising a substrate layer; a contact adhesive layer comprising a contact adhesive agent having at least one of chloroprene rubber or acrylic copolymers, as well as microspheres having an average particle size of 0.5 ?m or greater in the contact adhesive layer, wherein the contact adhesive layer contains from 5 parts by mass to 500 parts by mass of the microspheres per 100 parts by mass of the contact adhesive agent, and the contact adhesive layer has a plurality of protruding portions because of the microspheres.
    Type: Application
    Filed: December 2, 2016
    Publication date: September 27, 2018
    Inventors: Hidetoshi Abe, Yuji Kashiwazaki, Mamoru Kanno
  • Publication number: 20180198120
    Abstract: A lithium secondary battery having a positive electrode, a negative electrode, a separator and an electrolyte solution, in which the positive electrode contains a first active material and a second active material each capable of intercalating and deintercalating lithium. The first active material is in the state under which only deintercalation of lithium can be carried out in a battery reaction with the negative electrode immediately after assembly of the lithium secondary battery, and the second active material is in the state under which lithium can be intercalated in the battery reaction with the negative electrode immediately after assembly of the lithium secondary battery. The negative electrode contains metal lithium as an active material. The separator has a structure in which pores are three-dimensionally regularly arranged.
    Type: Application
    Filed: April 28, 2016
    Publication date: July 12, 2018
    Applicants: Tokyo Metropolitan University, 3DOM Inc.
    Inventors: Masaaki KUBOTA, Hidetoshi ABE, Miyu NEMOTO, Kiyoshi KANAMURA, Kazuhiro IMAZAWA