Patents by Inventor Hidetoshi Abe

Hidetoshi Abe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210070975
    Abstract: A film is described comprising a (meth)acrylic polymer and a polyvinyl acetal (e.g. butyral) resin. In some embodiments, the film has a glass transition temperature (i.e. Tg) ranging from 30° C. to 60° C. In some embodiments, the film has a gel content of at least 20% or greater. In some embodiments, the film has an elongation at break of at least 175%. The film typically comprises photoinitiator as a result of the method by which the film was made. The film may be a monolithic film or a layer of a multilayer film.
    Type: Application
    Filed: November 19, 2020
    Publication date: March 11, 2021
    Inventors: Jonathan E. Janoski, Anthony F. Schultz, Keith R. Lyon, Ronald S. Steelman, Kevin M. Lewandowski, Corinne E. Lipscomb, Terry R. Hobbs, Arlin L. Weikel, Jayshree Seth, Duane D. Fansler, Hidetoshi Abe
  • Publication number: 20210009863
    Abstract: An adhesive sheet of an embodiment of the present disclosure is an adhesive sheet including: a rigid resin film having a thickness of 80 micrometers to 500 micrometers, and a first pressure sensitive adhesive layer being disposed on or above a surface of the rigid resin film, wherein the first pressure sensitive adhesive layer includes elastic resin microspheres having a volume average particle diameter of 110 micrometers or greater and a tacky binder, and the first pressure sensitive adhesive layer has an uneven surface due to the presence of the microspheres.
    Type: Application
    Filed: April 4, 2018
    Publication date: January 14, 2021
    Inventors: Hidetoshi Abe, Kengo Imamura, Katsuya Ono, Yoshihiko Takeda, Takeo Yamamoto
  • Patent number: 10893188
    Abstract: An imaging apparatus includes an imaging device that photoelectrically converts an optical image obtained through a focus lens. The focus lens is moved to a focus position set by focus detection performed based on image signals from the imaging device with a first aperture value. A first correction amount of the set focus position is acquired according to a difference between the first aperture value and a second aperture value to be used at a time of photographing. Photographing is executed at a determined focus position at the time of photographing, by a user's operation. If the first correction amount is larger than a predetermined amount, a focus position corrected according to the first correction amount is determined as the focus position at the time of photographing, and if not, the set focus position is determined as the focus position at the time of photographing.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: January 12, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Masaki Tokioka, Hiromi Kotoku, Hidetoshi Abe, Takeshi Omata, Kenya Fukabori, Naoki Iwasaki, Hiroaki Kurisu
  • Patent number: 10870750
    Abstract: A film is described comprising a (meth)acrylic polymer and a polyvinyl acetal (e.g. butyral) resin. In some embodiments, the film has a glass transition temperature (i.e. Tg) ranging from 30° C. to 60° C. In some embodiments, the film has a gel content of at least 20% or greater. In some embodiments, the film has an elongation at break of at least 175%. The film typically comprises photoinitiator as a result of the method by which the film was made. The film may be a monolithic film or a layer of a multilayer film.
    Type: Grant
    Filed: November 28, 2018
    Date of Patent: December 22, 2020
    Assignee: 3M Innovative Properties Company
    Inventors: Jonathan E. Janoski, Anthony F. Schultz, Keith R. Lyon, Ronald S. Steelman, Kevin M. Lewandowski, Corinne E. Lipscomb, Terry R. Hobbs, Arlin L. Weikel, Jayshree Seth, Duane D. Fansler, Hidetoshi Abe
  • Publication number: 20200321451
    Abstract: A method for producing a semiconductor power device, includes forming a gate trench from a surface of a semiconductor layer toward an inside thereof. A first insulation film is formed on an inner surface of the gate trench. The method also includes removing a part on a bottom surface of the gate trench in the first insulation film. A second insulation film having a dielectric constant higher than SiO2 is formed in such a way as to cover the bottom surface of the gate trench exposed by removing the first insulation film.
    Type: Application
    Filed: June 18, 2020
    Publication date: October 8, 2020
    Inventors: Keiji OKUMURA, Mineo MIURA, Yuki NAKANO, Noriaki KAWAMOTO, Hidetoshi ABE
  • Publication number: 20200279923
    Abstract: According to the present invention, a semiconductor device includes a first conductivity type SiC layer, an electrode that is selectively formed upon the SiC layer, and an insulator that is formed upon the SiC layer and that extends to a timing region that is set at an end part of the SiC layer. The insulator includes an electrode lower insulating film that is arranged below the electrode, and an organic insulating layer that is arranged so as to cover the electrode lower insulating film. The length (A) of the interval wherein the organic insulating layer contacts the SiC layer is 40 ?m or more, and the lateral direction distance (B) along the electrode lower insulating layer between the electrode and SiC layer is 40 ?m or more.
    Type: Application
    Filed: May 19, 2020
    Publication date: September 3, 2020
    Inventors: Katsuhisa NAGAO, Hidetoshi ABE
  • Patent number: 10727318
    Abstract: A method for producing a semiconductor power device, includes forming a gate trench from a surface of a semiconductor layer toward an inside thereof. A first insulation film is formed on an inner surface of the gate trench. The method also includes removing a part on a bottom surface of the gate trench in the first insulation film. A second insulation film having a dielectric constant higher than SiO2 is formed in such a way as to cover the bottom surface of the gate trench exposed by removing the first insulation film.
    Type: Grant
    Filed: September 9, 2016
    Date of Patent: July 28, 2020
    Assignee: ROHM CO., LTD.
    Inventors: Keiji Okumura, Mineo Miura, Yuki Nakano, Noriaki Kawamoto, Hidetoshi Abe
  • Publication number: 20200201126
    Abstract: A liquid crystal display capable of reducing the occurrence of defective display due to variations in the initial alignment direction of a liquid crystal alignment control film in a liquid crystal display of an IPS scheme, realizing the stable liquid crystal alignment, providing excellent mass productivity, and having high image quality with a higher contrast ratio. The liquid crystal display has a liquid crystal layer disposed between a pair of substrates, at least one of the substrates being transparent, and an alignment control film formed between the liquid crystal layer and the substrate. At least one of the alignment control films 109 comprises photoreactive polyimide and/or polyamic acid provided with an alignment control ability by irradiation of substantially linearly polarized light.
    Type: Application
    Filed: March 4, 2020
    Publication date: June 25, 2020
    Inventors: Yasushi TOMIOKA, Hidetoshi ABE, Katsumi KONDO
  • Patent number: 10692978
    Abstract: According to the present invention, a semiconductor device includes a first conductivity type SiC layer, an electrode that is selectively formed upon the SiC layer, and an insulator that is formed upon the SiC layer and that extends to a timing region that is set at an end part of the SiC layer. The insulator includes an electrode lower insulating film that is arranged below the electrode, and an organic insulating layer that is arranged so as to cover the electrode lower insulating film. The length (A) of the interval wherein the organic insulating layer contacts the SiC layer is 40 ?m or more, and the lateral direction distance (B) along the electrode lower insulating layer between the electrode and SiC layer is 40 ?m or more.
    Type: Grant
    Filed: May 15, 2015
    Date of Patent: June 23, 2020
    Assignee: ROHM CO., LTD.
    Inventors: Katsuhisa Nagao, Hidetoshi Abe
  • Publication number: 20190238756
    Abstract: An imaging apparatus includes an imaging device that photoelectrically converts an optical image obtained through a focus lens. The focus lens is moved to a focus position set by focus detection performed based on image signals from the imaging device with a first aperture value. A first correction amount of the set focus position is acquired according to a difference between the first aperture value and a second aperture value to be used at a time of photographing. Photographing is executed at a determined focus position at the time of photographing, by a user's operation. If the first correction amount is larger than a predetermined amount, a focus position corrected according to the first correction amount is determined as the focus position at the time of photographing, and if not, the set focus position is determined as the focus position at the time of photographing.
    Type: Application
    Filed: January 25, 2019
    Publication date: August 1, 2019
    Inventors: Masaki Tokioka, Hiromi Kotoku, Hidetoshi Abe, Takeshi Omata, Kenya Fukabori, Naoki Iwasaki, Hiroaki Kurisu
  • Patent number: 10358582
    Abstract: The present application is directed to an acrylic polymer. Specifically, a marking film comprising a film layer which comprises a polymer blend of a first (meth)acrylic polymer having a glass transition temperature of 30 degrees C. to 180 degrees C. and a second (meth)acrylic polymer having a glass transition temperature of over ?80 degrees C. less than 30 degrees C. One from the first and second (meth)acrylic polymers comprises a carboxylic group and another comprises an amide group. The marking film additionally comprises an adhesive layer.
    Type: Grant
    Filed: January 12, 2011
    Date of Patent: July 23, 2019
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Hidetoshi Abe, Yorinobu Takamatsu, Ronald S. Steelman, Naoyuki Toriumi, Michael P. Daniels
  • Publication number: 20190092936
    Abstract: A film is described comprising a (meth)acrylic polymer and a polyvinyl acetal (e.g. butyral) resin. In some embodiments, the film has a glass transition temperature (i.e. Tg) ranging from 30° C. to 60° C. In some embodiments, the film has a gel content of at least 20% or greater. In some embodiments, the film has an elongation at break of at least 175%. The film typically comprises photoinitiator as a result of the method by which the film was made. The film may be a monolithic film or a layer of a multilayer film.
    Type: Application
    Filed: November 28, 2018
    Publication date: March 28, 2019
    Inventors: Jonathan E. Janoski, Anthony F. Schultz, Keith R. Lyon, Ronald S. Steelman, Kevin M. Lewandowski, Corinne E. Lipscomb, Terry R. Hobbs, Arlin L. Weikel, Jayshree Seth, Duane D. Fansler, Hidetoshi Abe
  • Patent number: 10167386
    Abstract: A film is described comprising a (meth)acrylic polymer and a polyvinyl acetal (e.g. butyral) resin. In some embodiments, the film has a glass transition temperature (i.e. Tg) ranging from 30° C. to 60° C. In some embodiments, the film has a gel content of at least 20% or greater. In some embodiments, the film has an elongation at break of at least 175%. The film typically comprises photoinitiator as a result of the method by which the film was made. The film may be a monolithic film or a layer of a multilayer film.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: January 1, 2019
    Assignee: 3M Innovative Properties Company
    Inventors: Jonathan E. Janoski, Anthony F. Schultz, Keith R. Lyon, Ronald S. Steelman, Kevin M. Lewandowski, Corinne E. Lipscomb, Terry R. Hobbs, Arlin L. Weikel, Jayshree Seth, Duane D. Fansler, Hidetoshi Abe
  • Patent number: 10139530
    Abstract: To provide a decorative sheet which has anti-skid properties, is resistant to abrasion, exhibits high abrasion resistance even when bonded to a floor or road surface over which pedestrians or vehicles traverse, does not cause pedestrians or vehicles to skid, and does not suffer from damage or peeling. [Resolution Means] A decorative sheet having a first bead coat layer comprising a resin and particles having a median diameter of from 20 ?m to 60 ?m, a second bead coat layer which is coated on the first bead coat layer and which includes a resin and particles having a median diameter of from 20 ?m to 60 ?m, a design layer and an adhesive layer.
    Type: Grant
    Filed: October 11, 2012
    Date of Patent: November 27, 2018
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Takeo Yamamoto, Hidetoshi Abe
  • Publication number: 20180273812
    Abstract: A laminate comprising a substrate layer; a contact adhesive layer comprising a contact adhesive agent having at least one of chloroprene rubber or acrylic copolymers, as well as microspheres having an average particle size of 0.5 ?m or greater in the contact adhesive layer, wherein the contact adhesive layer contains from 5 parts by mass to 500 parts by mass of the microspheres per 100 parts by mass of the contact adhesive agent, and the contact adhesive layer has a plurality of protruding portions because of the microspheres.
    Type: Application
    Filed: December 2, 2016
    Publication date: September 27, 2018
    Inventors: Hidetoshi Abe, Yuji Kashiwazaki, Mamoru Kanno
  • Publication number: 20180198120
    Abstract: A lithium secondary battery having a positive electrode, a negative electrode, a separator and an electrolyte solution, in which the positive electrode contains a first active material and a second active material each capable of intercalating and deintercalating lithium. The first active material is in the state under which only deintercalation of lithium can be carried out in a battery reaction with the negative electrode immediately after assembly of the lithium secondary battery, and the second active material is in the state under which lithium can be intercalated in the battery reaction with the negative electrode immediately after assembly of the lithium secondary battery. The negative electrode contains metal lithium as an active material. The separator has a structure in which pores are three-dimensionally regularly arranged.
    Type: Application
    Filed: April 28, 2016
    Publication date: July 12, 2018
    Applicants: Tokyo Metropolitan University, 3DOM Inc.
    Inventors: Masaaki KUBOTA, Hidetoshi ABE, Miyu NEMOTO, Kiyoshi KANAMURA, Kazuhiro IMAZAWA
  • Patent number: 9862172
    Abstract: The present disclosure relates to a method for manufacturing the laminated film that is BSPC (Back Side Printable Clear) and has excellent interlayer adhesion. The method involves a first UV curing step and a second UV curing step and the laminated film includes a transparent film layer, a UV curable ink layer, and an adhesive layer. The first UV curing step includes disposing the UV curable ink layer on the transparent film layer and partially curing the UV curable ink layer by performing a first UV irradiation. The second UV curing step includes disposing the adhesive layer on a surface of the UV curable ink layer opposite the transparent film layer, and further curing the UV curable ink layer by performing a second UV irradiation.
    Type: Grant
    Filed: May 30, 2013
    Date of Patent: January 9, 2018
    Assignee: 3M Innovative Properties Company
    Inventors: Shinji Ikeda, Hidetoshi Abe, Yoshinori Araki, Koji Saito, Shinya Ohtomo, Michael R. Kesti
  • Publication number: 20170110545
    Abstract: According to the present invention, a semiconductor device includes a first conductivity type SiC layer, an electrode that is selectively formed upon the SiC layer, and an insulator that is formed upon the SiC layer and that extends to a timing region that is set at an end part of the SiC layer. The insulator includes an electrode lower insulating film that is arranged below the electrode, and an organic insulating layer that is arranged so as to cover the electrode lower insulating film. The length (A) of the interval wherein the organic insulating layer contacts the SiC layer is 40 ?m or more, and the lateral direction distance (B) along the electrode lower insulating layer between the electrode and SiC layer is 40 ?m or more.
    Type: Application
    Filed: May 15, 2015
    Publication date: April 20, 2017
    Inventors: Katsuhisa NAGAO, Hidetoshi ABE
  • Publication number: 20170092743
    Abstract: A method for producing a semiconductor power device, includes forming a gate trench from a surface of a semiconductor layer toward an inside thereof. A first insulation film is formed on an inner surface of the gate trench. The method also includes removing a part on a bottom surface of the gate trench in the first insulation film. A second insulation film having a dielectric constant higher than SiO2 is formed in such a way as to cover the bottom surface of the gate trench exposed by removing the first insulation film.
    Type: Application
    Filed: September 9, 2016
    Publication date: March 30, 2017
    Applicant: ROHM CO., LTD.
    Inventors: Keiji OKUMURA, Mineo MIURA, Yuki NAKANO, Noriaki KAWAMOTO, Hidetoshi ABE
  • Publication number: 20160377925
    Abstract: A liquid crystal display is provided which is capable of reducing the occurrence of defective display due to variations in the initial alignment direction of a liquid crystal alignment control film in a liquid crystal display of an IPS scheme, realizing the stable liquid crystal alignment, providing excellent mass productivity, and having high image quality with a higher contrast ratio. The liquid crystal display has a liquid crystal layer disposed between a pair of substrates, at least one of the substrates being transparent, and an alignment control film formed between the liquid crystal layer and the substrate. At least one of the alignment control films 109 comprises photoreactive polyimide and/or polyamic acid provided with an alignment control ability by irradiation of substantially linearly polarized light.
    Type: Application
    Filed: June 27, 2016
    Publication date: December 29, 2016
    Inventors: Yasushi TOMIOKA, Hidetoshi ABE, Katsumi KONDO