Patents by Inventor Hideyuki Nakamura

Hideyuki Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5439775
    Abstract: An image formation process uses two light-sensitive elements comprising first and second adhesive light-sensitive layers which become nonadhesive upon exposure to light, respectively, and first and second toner elements comprising toner layers (a') and (b') of hues (a) and (b), respectively.
    Type: Grant
    Filed: December 14, 1994
    Date of Patent: August 8, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yohnosuke Takahashi, Hideyuki Nakamura, Fumiaki Shinozaki, Shinji Tsuno
  • Patent number: 5352562
    Abstract: Disclosed is an image forming process employing a light-sensitive image forming material. The image forming material comprises a support, a light-heat conversion layer and an image forming layer, superposed in order. The process comprises the steps of imagewise exposing the image forming material to light so as to increase a bonding strength between the light-heat conversion layer and the image forming layer in the exposed area, pressing a receiving sheet on the light-heat conversion layer, and removing the receiving sheet from the image forming material to form a negative image on the receiving sheet in the unexposed area and to leave a positive image on the light-heat conversion layer in the exposed area.
    Type: Grant
    Filed: March 26, 1992
    Date of Patent: October 4, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yonosuke Takahashi, Hideyuki Nakamura, Fumiaki Shinozaki
  • Patent number: 5158857
    Abstract: A light-sensitive transfer sheet is disclosed, which comprises a support having provided thereon a peeling layer comprising an alcohol-soluble polyamide, an alkali-soluble organic polymer and a basic compound, and a color material-incorporated light-sensitive resin layer or a color material layer and a light-sensitive resin layer, in that order.
    Type: Grant
    Filed: October 11, 1990
    Date of Patent: October 27, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Tomohisa Tago, Tomizo Namiki, Hideyuki Nakamura
  • Patent number: 5041897
    Abstract: A semiconductor device has a fuse element formed on an insulating substrate, and a first insulating layer formed on the substrate and covering the fuse element. Further insulation on the first insulating layer nitride has an opening exposing the region of the first insulating layer above said fuse.
    Type: Grant
    Filed: October 17, 1990
    Date of Patent: August 20, 1991
    Assignees: Seikosha Co., Ltd., Nippon Precision Circuits Ltd.
    Inventors: Koji Machida, Hideyuki Nakamura, Hiroshi Tonegi