Abstract: Provided is a conductive film for antennas, in which a conducting film and a substrate made of a polycarbonate resin material containing a polycarbonate resin are laminated, and the polycarbonate resin contains, as main constituent units, a unit (A) represented by the following formula (1) and/or a unit (B) represented by the following formula (2). The conductive film for antennas has low dielectric characteristics and bendability, can form an antenna with a low transmission loss, and has excellent adhesion to the conducting film. (In the formula (1), R1 and R2 each independently represent an alkyl group having 1 to 6 carbon atoms or a halogen atom, and R3 and R4 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a halogen atom.

Abstract: A mask may include a first portion including at least one first through-hole group, and a second portion including at least one second through-hole group located next to the first through-hole group in a first direction. A method of manufacturing the mask may include: a step of preparing a laminated body that includes an original base material and a resist layer; a first exposure process of exposing the resist layer corresponding to the first portion by using a first exposure mask; a second exposure process of exposing the resist layer corresponding to the second portion by using a second exposure mask; a process of developing the resist layer corresponding to the first portion and the resist layer corresponding to the second portion; and a process of etching the original base material through the resist layer corresponding to the first portion and the resist layer corresponding to the second portion.

Abstract: A deposition mask apparatus includes a frame, a deposition mask, and an alignment mask. The alignment mask has two first alignment mask holes located at positions different from each other in the second direction and overlapping the frame. A first weld joining the frame with the alignment mask is located in an outer side of the alignment mask in the second direction with respect to a corresponding one of the first alignment mask holes. A second weld joining the frame with the alignment mask is located in an inner side of the alignment mask in the second direction with respect to a corresponding one of the first alignment mask holes.

Abstract: A metal plate includes a surface including a longitudinal direction of the metal plate and a width direction orthogonal to the longitudinal direction. A surface reflectance by regular reflection of a light is 8% or more and 25% or less. The surface reflectance is measured when the light is incident on the surface at an angle of 45°±0.2°. The light is in at least one plane orthogonal to the surface.

Abstract: A standard mask apparatus includes at least one standard mask including at least one through-hole. The standard mask apparatus may include standard regions each including the at least one through-hole. The standard regions may be arranged in a first direction and in a second direction that intersects with the first direction. A ratio of a dimension of each standard region in the first direction to a dimension of an interval between two of the standard regions in the first direction may be higher than or equal to 0.1. A ratio of a dimension of each standard region in the second direction to a dimension of an interval between the two standard regions in the second direction may be higher than or equal to 0.1.

Abstract: A method for inspecting a mask may include a first calculation step of calculating the y components y0 to yn of the coordinates of reference points in a y direction, an adjustment step of adjusting a tension so that a simple amplitude converted value ?C calculated based on the y components y0 to yn becomes less than or equal to a first threshold, the tension being applied to the mask, and a second evaluation step of evaluating linearity of the mask with reference to amplitude ?S calculated based on the y components of the coordinates of the reference points of the mask under the tension adjusted in the adjustment step.

Abstract: A deposition mask includes an effective part in which a plurality of openings are provided, and an outer frame part surrounding the effective part. The effective part includes an outer peripheral area that is adjacent to the outer frame part, and a central area which is surrounded by the outer peripheral area and has a thickness larger than a thickness of the outer peripheral area.

Abstract: A mask apparatus may include a frame including first and second sides opposing each other in a first direction across an opening and third and fourth sides opposing each other in a second direction crossing the first direction across the opening. A manufacturing apparatus may include a pressing mechanism that presses the first and second sides toward the opening, a displacement measuring mechanism that measures amounts of deformation of the first and second sides in the first direction, and a fixing unit that fixes a mask to the first and second sides. The pressing mechanism may include five or more pressing units that are arranged at intervals of 500 mm or less in the second direction and that press the first side and five or more pressing units that are arranged at intervals of 500 mm or less in the second direction and that press the second side.

Abstract: A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.

Abstract: A deposition mask includes: a first mask having an opening formed therein; and a second mask superposed on the first mask and having a plurality of through-holes formed therein, the through-hole having a planar dimension smaller than a planar dimension of the opening; wherein: the deposition mask has a plurality of joints that join the second mask and the first mask to each other; the plurality of joints are arranged along an outer edge of the second mask; and a notch is formed at a position in the outer edge of the second mask, the position corresponding to a space between the adjacent two joints.

Abstract: The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.

Abstract: The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.

Abstract: A vapor deposition mask device includes a vapor deposition mask having an effective region in which a plurality of first through holes is disposed, and a frame attached to the vapor deposition mask. The vapor deposition mask device includes a plurality of joint portions that joins the vapor deposition mask and the frame to each other. The plurality of joint portions is arranged along the outer edge of the vapor deposition mask. A notch is formed at a position corresponding to between two adjacent joint portions in the outer edge of the vapor deposition mask.

Abstract: A standard mask apparatus includes at least one standard mask including at least one through-hole. The standard mask apparatus may include standard regions each including the at least one through-hole. The standard regions may be arranged in a first direction and in a second direction that intersects with the first direction. A ratio of a dimension of each standard region in the first direction to a dimension of an interval between two of the standard regions in the first direction may be higher than or equal to 0.1. A ratio of a dimension of each standard region in the second direction to a dimension of an interval between the two standard regions in the second direction may be higher than or equal to 0.1.

Abstract: A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 ?m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 ?m2 to 50 ?m2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.

Abstract: A method of manufacturing a vapor deposition mask device includes: a preparing step of preparing a vapor deposition mask that includes a plurality of through-holes extending from a first surface to a second surface; and a welding step of welding the vapor deposition mask to a front surface of a frame that includes the front surface and a back surface opposite to the front surface.

Abstract: A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.

Abstract: A deposition mask apparatus includes: a deposition mask having a plurality of mask through-holes extending from a first surface which is positioned closer to the substrate, to reach a second surface which is positioned opposite to the first surface; and a frame provided with an opening which is overlapped with a part of the deposition mask, the frame supporting the deposition mask.

Abstract: A deposition mask includes an effective part in which a plurality of openings are provided, and an outer frame part surrounding the effective part. The effective part includes an outer peripheral area that is adjacent to the outer frame part, and a central area which is surrounded by the outer peripheral area and has a thickness larger than a thickness of the outer peripheral area.

Abstract: A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.