Abstract: A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 ?m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 ?m2 to 50 ?m2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.

Abstract: A deposition mask includes: a first mask having an opening formed therein; and a second mask superposed on the first mask and having a plurality of through-holes formed therein, the through-hole having a planar dimension smaller than a planar dimension of the opening; wherein: the deposition mask has a plurality of joints that join the second mask and the first mask to each other; the plurality of joints are arranged along an outer edge of the second mask; and a notch is formed at a position in the outer edge of the second mask, the position corresponding to a space between the adjacent two joints.

Abstract: The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.

Abstract: A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 ?m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 ?m2 to 50 ?m2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.

Abstract: A metal plate includes a surface including a longitudinal direction of the metal plate and a width direction orthogonal to the longitudinal direction. A surface reflectance by regular reflection of a light is 8% or more and 25% or less. The surface reflectance is measured when the light is incident on the surface at an angle of 45°±0.2°. The light is in at least one plane orthogonal to the surface.

Abstract: A vapor deposition mask device includes a vapor deposition mask having an effective region in which a plurality of first through holes is disposed, and a frame attached to the vapor deposition mask. The vapor deposition mask device includes a plurality of joint portions that joins the vapor deposition mask and the frame to each other. The plurality of joint portions is arranged along the outer edge of the vapor deposition mask. A notch is formed at a position corresponding to between two adjacent joint portions in the outer edge of the vapor deposition mask.

Abstract: A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.

Abstract: In a method for stretching a vapor deposition mask including a metal mask in which a slit is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the slit, a stretching assistance member is overlapped on one surface of the vapor deposition mask, the stretching assistance member is fixed to the vapor deposition mask in at least part of a portion in which the one surface of the vapor deposition mask and the stretching assistance member overlap with each other, and the vapor deposition mask fixed to the stretching assistance member is stretched by pulling the stretching assistance member fixed to the vapor deposition mask.

Abstract: A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.

Abstract: In a method for stretching a vapor deposition mask including a metal mask in which a slit is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the slit, a stretching assistance member is overlapped on one surface of the vapor deposition mask, the stretching assistance member is fixed to the vapor deposition mask in at least part of a portion in which the one surface of the vapor deposition mask and the stretching assistance member overlap with each other, and the vapor deposition mask fixed to the stretching assistance member is stretched by pulling the stretching assistance member fixed to the vapor deposition mask.

Abstract: In a method for stretching a vapor deposition mask including a metal mask in which a slit is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the slit, a stretching assistance member is overlapped on one surface of the vapor deposition mask, the stretching assistance member is fixed to the vapor deposition mask in at least part of a portion in which the one surface of the vapor deposition mask and the stretching assistance member overlap with each other, and the vapor deposition mask fixed to the stretching assistance member is stretched by pulling the stretching assistance member fixed to the vapor deposition mask.

Abstract: A broadband emission material according to the present invention includes: a fluoride glass containing 20 to 45 mol % of AlF3, 25 to 63 mol % of alkaline-earth fluorides in total and 3 to 25 mol % of at least one fluoride of element selected from the group consisting of Y, La, Gd and Lu; and ytterbium ions incorporated in the fluoride glass as divalent rare-earth ions so as to serve as a luminescent center, wherein the fluoride glass includes 1 to 15 mol % of at least one halide of element selected from the group consisting of Al, Ba, Sr, Ca and Mg and element selected from the group consisting of Cl, Br and I; and wherein the alkaline-earth fluorides includes 0 to 15 mol % of MgF2, 7 to 25 mol % of CaF2, 0 to 22 mol % of SrF2 and 0 to 5 mol % of BaF2.

Abstract: In a method for stretching a vapor deposition mask including a metal mask in which a slit is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the slit, a stretching assistance member is overlapped on one surface of the vapor deposition mask, the stretching assistance member is fixed to the vapor deposition mask in at least part of a portion in which the one surface of the vapor deposition mask and the stretching assistance member overlap with each other, and the vapor deposition mask fixed to the stretching assistance member is stretched by pulling the stretching assistance member fixed to the vapor deposition mask.

Abstract: A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.

Abstract: A phosphor-dispersed glass according to one aspect of the present invention includes phosphor particles and a phosphor encapsulant, wherein the phosphor encapsulant is a fluoride glass material containing 1 to 45 mol % of AlF3, 30 to 60 mol % of a sum of a fluoride of Hf and a fluoride of Zr, 20 to 65 mol % of alkaline earth fluorides in total, 2 to 25 mol % in total of at least one fluoride of element selected from the group consisting of Y, La, Gd and Lu and 0 to 20 mol % in total of at least one fluoride of element selected from the group consisting of Na, Li and K. It is feasible in this phosphor-dispersed glass to suppress deactivation of the phosphor particles regardless of the kind of the phosphor.

Abstract: A broadband emission material according to the present invention includes: a fluoride glass containing 20 to 45 mol % of AlF3, 25 to 63 mol % of alkaline-earth fluorides in total and 3 to 25 mol % of at least one fluoride of element selected from the group consisting of Y, La, Gd and Lu; and ytterbium ions incorporated in the fluoride glass as divalent rare-earth ions so as to serve as a luminescent center, wherein the fluoride glass includes 1 to 15 mol % of at least one halide of element selected from the group consisting of Al, Ba, Sr, Ca and Mg and element selected from the group consisting of Cl, Br and I; and wherein the alkaline-earth fluorides includes 0 to 15 mol % of MgF2, 7 to 25 mol % of CaF2, 0 to 22 mol % of SrF2 and 0 to 5 mol % of BaF2.

Abstract: Provided are: an engine-mounted controller capable of being suitably used in a vehicle that carries out an idle-stop operation while the vehicle is moving; and a vehicle. An engine-mounted controller of a vehicle determines whether or not an engine is in a completely stopped state when an idle-stop operation is canceled. If the controller determines that the engine is in a completely stopped state, a first control operation for suppressing the transmission of engine vibrations associated with engine idling is executed on the assumption that the engine is in a completely stopped state, and if the controller determines that the engine is not in a completely stopped state, the first control operation is prohibited when the engine restarts.

Abstract: A control apparatus for controlling a vehicle includes an actuator ECU. The actuator ECU acquires a crankshaft angle (stopped crankshaft angle) at a time that an engine stops operating. The actuator ECU identifies a crankshaft angle depending on an edge of a first TDC pulse of a TDC pulse signal immediately after the engine has been started or restarted. Then, using the identified crankshaft angle as a reference, the actuator ECU corrects the stopped crankshaft angle.

Abstract: Provided are: an engine-mounted controller capable of being suitably used in a vehicle that carries out an idle-stop operation while the vehicle is moving; and a vehicle. An engine-mounted controller of a vehicle determines whether or not an engine is in a completely stopped state when an idle-stop operation is canceled. If the controller determines that the engine is in a completely stopped state, a first control operation for suppressing the transmission of engine vibrations associated with engine idling is executed on the assumption that the engine is in a completely stopped state, and if the controller determines that the engine is not in a completely stopped state, the first control operation is prohibited when the engine restarts.

Abstract: There is provided a method for separating an arsenic mineral from a copper-bearing material containing arsenic, such as a copper ore or a copper concentrate, to obtain a copper concentrate with low arsenic grade. The method for separating an arsenic mineral from a copper-bearing material by flotation includes adding a flotation agent containing a depressant, a frother, and a collector to a slurry composed of a copper-bearing material containing arsenic, and blowing air into the slurry to float a copper concentrate, wherein the depressant is sodium thiosulfate. The sodium thiosulfate is preferably added in an amount of 10 kg or more and 200 kg or less in terms of sodium thiosulfate pentahydrate per ton of copper-bearing material to be subjected to flotation. Further, the oxidation-reduction potential of the slurry to be subjected to flotation, as measured against a silver/silver chloride reference electrode, is preferably ?10 mV or more and 50 mV or less.