Patents by Inventor Hieu Lam

Hieu Lam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system of determining chamber seasoning condition by optical emission
    Patent number: 6825920
    Abstract: A plasma processing system that comprises a process chamber, a plasma source, a light detection device and a controller. The controller is useful for determining a seasoning state of the plasma processing system. The present invention further provides a method of determining the seasoning state of a plasma processing system comprising the steps of forming a first plasma in the process chamber utilizing the plasma source; measuring a first signal related to light emitted from the first plasma using the light detection device and storing the first signal using the controller; forming a second plasma in the process chamber utilizing the plasma source; measuring a second signal related to light emitted from the second plasma using the light detection device and storing the second signal using the controller; and correlating a change between the first signal and the second signal with a seasoning state of the plasma processing system.
    Type: Grant
    Filed: May 29, 2003
    Date of Patent: November 30, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Hieu A. Lam, Hongyu Yue, John Shriner
  • Method and system of determining chamber seasoning condition by optical emission
    Publication number: 20040008336
    Abstract: A plasma processing system that comprises a process chamber, a plasma source, a light detection device and a controller. The controller is useful for determining a seasoning state of the plasma processing system. The present invention further provides a method of determining the seasoning state of a plasma processing system comprising the steps of forming a first plasma in the process chamber utilizing the plasma source; measuring a first signal related to light emitted from the first plasma using the light detection device and storing the first signal using the controller; forming a second plasma in the process chamber utilizing the plasma source; measuring a second signal related to light emitted from the second plasma using the light detection device and storing the second signal using the controller; and correlating a change between the first signal and the second signal with a seasoning state of the plasma processing system.
    Type: Application
    Filed: May 29, 2003
    Publication date: January 15, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hieu A. Lam, Hongyu Yue, John Shriner