Patents by Inventor Hieu Van Tran

Hieu Van Tran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9959927
    Abstract: A memory device and method comprising a metal oxide material disposed between and in electrical contact with first and second conductive electrodes, and a voltage source configured to apply a plurality of voltage pulses spaced apart in time across the first and second electrodes. For each one of the voltage pulses, an amplitude of the voltage increases during the voltage pulse.
    Type: Grant
    Filed: January 11, 2017
    Date of Patent: May 1, 2018
    Assignee: Silicon Storage Technology, Inc.
    Inventors: Feng Zhou, Xian Liu, Nhan Do, Hieu Van Tran, Hung Quoc Nguyen, Mark Reiten, Zhixian Chen, Wang Xinpeng, Guo-Qiang Lo
  • Patent number: 9953719
    Abstract: The present invention relates to a flash memory cell with only four terminals and decoder circuitry for operating an array of such flash memory cells. The invention allows for fewer terminals for each flash memory cell compared to the prior art, which results in a simplification of the decoder circuitry and overall die space required per flash memory cells. The invention also provides for the use of high voltages on one or more of the four terminals to allow for read, erase, and programming operations despite the lower number of terminals compared to prior art flash memory cells.
    Type: Grant
    Filed: May 18, 2016
    Date of Patent: April 24, 2018
    Assignee: SILICON STORAGE TECHNOLOGY, INC.
    Inventors: Hieu Van Tran, Anh Ly, Thuan Vu
  • Patent number: 9922715
    Abstract: A non-volatile memory device that a semiconductor substrate of a first conductivity type. An array of non-volatile memory cells is in the semiconductor substrate arranged in a plurality of rows and columns. Each memory cell comprises a first region on a surface of the semiconductor substrate of a second conductivity type, and a second region on the surface of the semiconductor substrate of the second conductivity type. A channel region is between the first region and the second region. A word line overlies a first portion of the channel region and is insulated therefrom, and adjacent to the first region and having little or no overlap with the first region. A floating gate overlies a second portion of the channel region, is adjacent to the first portion, and is insulated therefrom and is adjacent to the second region. A coupling gate overlies the floating gate. A bit line is connected to the first region. A negative charge pump circuit generates a first negative voltage.
    Type: Grant
    Filed: October 3, 2014
    Date of Patent: March 20, 2018
    Assignee: SILICON STORAGE TECHNOLOGY, INC.
    Inventors: Hieu Van Tran, Hung Quoc Nguyen, Nhan Do
  • Patent number: 9911501
    Abstract: The present invention relates to an improved sensing amplifier and related method for use in read operations in flash memory devices. In one embodiment, the sensing amplifier includes a built-in voltage offset. In another embodiment, a voltage offset is induced in the sensing amplifier through the use of capacitors. In another embodiment, the sensing amplifier utilizes sloped timing for the reference signal to increase the margin by which a “0” or “1” are detected from the current drawn by the selected cell compared to the reference cell. In an another embodiment, a sensing amplifier is used without any voltage offset.
    Type: Grant
    Filed: May 24, 2016
    Date of Patent: March 6, 2018
    Assignee: SILICON STORAGE TECHNOLOGY, INC.
    Inventors: Hieu Van Tran, Anh Ly, Thuan Vu
  • Patent number: 9910473
    Abstract: An improved method and apparatus for performing power management in a memory device is disclosed.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: March 6, 2018
    Assignee: Silicon Storage Technology, Inc.
    Inventors: Hung Quoc Nguyen, Hieu Van Tran, Hung Thanh Nguyen
  • Publication number: 20180053553
    Abstract: In one embodiment of the present invention, one row is selected and two columns are selected for a read or programming operation, such that twice as many flash memory cells can be read from or programmed in a single operation compared to the prior art. In another embodiment of the present invention, two rows in different sectors are selected and one column is selected for a read operation, such that twice as many flash memory cells can be read in a single operation compared to the prior art.
    Type: Application
    Filed: August 16, 2016
    Publication date: February 22, 2018
    Inventors: Hieu Van Tran, Anh Ly, Thuan Vu, Vipin Tiwari, Nhan Do
  • Publication number: 20180053560
    Abstract: In one embodiment of the present invention, one row is selected and two columns are selected for a read or programming operation, such that twice as many flash memory cells can be read from or programmed in a single operation compared to the prior art. In another embodiment of the present invention, two rows in different sectors are selected and one column is selected for a read operation, such that twice as many flash memory cells can be read in a single operation compared to the prior art.
    Type: Application
    Filed: April 4, 2017
    Publication date: February 22, 2018
    Inventors: Hieu Van Tran, Anh Ly, Thuan Vu, Vipin Tiwari, Nhan Do
  • Publication number: 20180047454
    Abstract: Improved flash memory sensing circuits are disclosed. In one embodiment, a sensing circuit comprises a memory data read block, a memory reference block, a differential amplifier, and a precharge circuit. The precharge circuit compensates for parasitic capacitance between a bit line coupled to a selected memory cell and adjacent bit lines.
    Type: Application
    Filed: October 24, 2017
    Publication date: February 15, 2018
    Inventors: Hieu Van Tran, Anh Ly, Thuan Vu, Hung Quoc Nguyen, Vipin Tiwari
  • Publication number: 20180040482
    Abstract: A method of forming a memory device that includes forming a first insulation layer on a semiconductor substrate, forming a conductive material layer on the first insulation layer, forming an insulation block on the conductive material layer, forming an insulation spacer along a side surface of the insulation block and on the conductive material layer, etching the conductive material layer to form a block of the conductive material disposed directly under the insulation block and the insulation spacer, removing the insulation spacer, forming a second insulation layer having a first portion wrapping around an exposed upper edge of the block of the conductive material and a second portion disposed on a first portion of the first insulation layer over the substrate, and forming a conductive block insulated from the block of the conductive material by the second insulation layer and from the substrate by the first and second insulation layers.
    Type: Application
    Filed: May 15, 2017
    Publication date: February 8, 2018
    Inventors: Chien-Sheng Su, Jeng-Wei Yang, Man-Tang Wu, Chun-Ming Chen, Hieu Van Tran, Nhan Do
  • Patent number: 9887206
    Abstract: A non-volatile memory cell, and method of making, that includes a semiconductor substrate having a fin shaped upper surface with a top surface and two side surfaces. Source and drain regions are formed in the fin shaped upper surface portion with a channel region there between. A conductive floating gate includes a first portion extending along a first portion of the top surface, and second and third portions extending along first portions of the two side surfaces, respectively. A conductive control gate includes a first portion extending along a second portion of the top surface, second and third portions extending along second portions of the two side surfaces respectively, a fourth portion extending up and over at least some of the floating gate first portion, and fifth and sixth portions extending out and over at least some of the floating gate second and third portions respectively.
    Type: Grant
    Filed: March 8, 2017
    Date of Patent: February 6, 2018
    Assignee: Silicon Storage Technology, Inc.
    Inventors: Chien-Sheng Su, Jeng-Wei Yang, Man-Tang Wu, Chun-Ming Chen, Hieu Van Tran, Nhan Do
  • Publication number: 20180033482
    Abstract: A memory device includes a metal oxide material disposed between and in electrical contact with first and second conductive electrodes, and an electrical current source configured to apply one or more electrical current pulses through the metal oxide material. For each of the one or more electrical current pulses, an amplitude of the electrical current increases over time during the electrical current pulse to form a conductive filament in metal oxide material.
    Type: Application
    Filed: May 17, 2017
    Publication date: February 1, 2018
    Inventors: Santosh Hariharan, Hieu Van Tran, Feng Zhou, Xian Liu, Steven Lemke, Nhan Do, Zhixian Chen, Xinpeng Wang
  • Publication number: 20170358360
    Abstract: An improved method and apparatus for programming advanced nanometer flash memory cells is disclosed.
    Type: Application
    Filed: August 25, 2017
    Publication date: December 14, 2017
    Inventors: Hieu Van Tran, Anh Ly, Thuan Vu, Hung Quoc Nguyen
  • Publication number: 20170345509
    Abstract: The present invention relates to an improved sensing amplifier and related method for use in read operations in flash memory devices. In one embodiment, the sensing amplifier includes a built-in voltage offset. In another embodiment, a voltage offset is induced in the sensing amplifier through the use of capacitors. In another embodiment, the sensing amplifier utilizes sloped timing for the reference signal to increase the margin by which a “0” or “1” are detected from the current drawn by the selected cell compared to the reference cell. In an another embodiment, a sensing amplifier is used without any voltage offset.
    Type: Application
    Filed: May 24, 2016
    Publication date: November 30, 2017
    Inventors: Hieu Van Tran, Anh Ly, Thuan Vu
  • Publication number: 20170345840
    Abstract: A method of forming a memory device with memory cells over a planar substrate surface and FinFET logic devices over fin shaped substrate surface portions, including forming a protective layer over previously formed floating gates, erase gates, word line poly and source regions in a memory cell portion of the substrate, then forming fins into the surface of the substrate and forming logic gates along the fins in a logic portion of the substrate, then removing the protective layer and completing formation of word line gates from the word line poly and drain regions in the memory cell portion of the substrate.
    Type: Application
    Filed: April 17, 2017
    Publication date: November 30, 2017
    Inventors: Chien-Sheng Su, Jeng-Wei Yang, Man-Tang Wu, Chun-Ming Chen, Hieu Van Tran, Nhan Do
  • Publication number: 20170337466
    Abstract: An artificial neural network device that utilizes one or more non-volatile memory arrays as the synapses. The synapses are configured to receive inputs and to generate therefrom outputs. Neurons are configured to receive the outputs. The synapses include a plurality of memory cells, wherein each of the memory cells includes spaced apart source and drain regions formed in a semiconductor substrate with a channel region extending there between, a floating gate disposed over and insulated from a first portion of the channel region and a non-floating gate disposed over and insulated from a second portion of the channel region. Each of the plurality of memory cells is configured to store a weight value corresponding to a number of electrons on the floating gate. The plurality of memory cells are configured to multiply the inputs by the stored weight values to generate the outputs.
    Type: Application
    Filed: May 12, 2017
    Publication date: November 23, 2017
    Inventors: Farnood Merrikh Bayat, Xinjie Guo, Dmitri Strukov, Nhan Do, Hieu Van Tran, Vipin Tiwari, Mark Reiten
  • Publication number: 20170337978
    Abstract: The present invention relates to a flash memory cell with only four terminals and decoder circuitry for operating an array of such flash memory cells. The invention allows for fewer terminals for each flash memory cell compared to the prior art, which results in a simplification of the decoder circuitry and overall die space required per flash memory cells. The invention also provides for the use of high voltages on one or more of the four terminals to allow for read, erase, and programming operations despite the lower number of terminals compared to prior art flash memory cells.
    Type: Application
    Filed: May 18, 2016
    Publication date: November 23, 2017
    Inventors: Hieu Van Tran, Anh Ly, Thuan Vu
  • Publication number: 20170337971
    Abstract: A memory device and method of erasing same that includes a substrate of semiconductor material and a plurality of memory cells formed on the substrate and arranged in an array of rows and columns. Each of the memory cells includes spaced apart source and drain regions in the substrate, with a channel region in the substrate extending there between, a floating gate disposed over and insulated from a first portion of the channel region which is adjacent the source region, a select gate disposed over and insulated from a second portion of the channel region which is adjacent the drain region, and a program-erase gate disposed over and insulated from the source region. The program-erase gate lines alone or in combination with the select gate lines, or the source lines, are arranged in the column direction so that each memory cell can be individually programmed, read and erased.
    Type: Application
    Filed: May 11, 2017
    Publication date: November 23, 2017
    Inventors: Hieu Van Tran, Vipin Tiwari, Nhan Do
  • Publication number: 20170337980
    Abstract: A memory device that provides individual memory cell read, write and erase. In an array of memory cells arranged in rows and columns, each column of memory cells includes a column bit line, a first column control gate line for even row cells and a second column control gate line for odd row cells. Each row of memory cells includes a row source line. In another embodiment, each column of memory cells includes a column bit line and a column source line. Each row of memory cells includes a row control gate line. In yet another embodiment, each column of memory cells includes a column bit line and a column erase gate line. Each row of memory cells includes a row source line, a row control gate line, and a row select gate line.
    Type: Application
    Filed: December 9, 2016
    Publication date: November 23, 2017
    Inventors: Xinjie Guo, Farnood Merrikh Bayat, Dmitri Strukov, Nhan Do, Hieu Van Tran, Vipin Tiwari
  • Publication number: 20170323682
    Abstract: A three-dimensional flash memory system is disclosed. The system comprises a memory array comprising a plurality of stacked dies, where each die comprises memory cells. The system further comprises a plurality of pins, where the function of at least some of the pins can be configured using a mechanism that selects a function for those pins from a plurality of possible functions.
    Type: Application
    Filed: July 26, 2017
    Publication date: November 9, 2017
    Inventors: Hieu Van Tran, Hung Quoc Nguyen, Mark Reiten
  • Publication number: 20170316823
    Abstract: A memory device and method comprising a metal oxide material disposed between and in electrical contact with first and second conductive electrodes, and a voltage source configured to apply a plurality of voltage pulses spaced apart in time across the first and second electrodes. For each one of the voltage pulses, an amplitude of the voltage increases during the voltage pulse.
    Type: Application
    Filed: January 11, 2017
    Publication date: November 2, 2017
    Inventors: Feng Zhou, XIAN LIU, NHAN DO, HIEU VAN TRAN, HUNG QUOC NGUYEN, MARK REITEN, ZHIXIAN CHEN, WANG XINPENG, GUO-QIANG LO