Patents by Inventor Hirokazu Kato

Hirokazu Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130049137
    Abstract: A semiconductor device is improved in reliability. A power MOSFET for switching, and a sense MOSFET for sensing a current flowing in the power MOSFET, which is smaller in area than the power MOSFET, are formed in one semiconductor chip. The semiconductor chip is mounted over a chip mounting portion, and sealed in a resin. To first and second source pads for outputting the current flowing in the power MOSFET, a metal plate is bonded. A third source pad for sensing the source voltage of the power MOSFET is at a position not overlapping the metal plate. A coupled portion between a source wire forming the third pad and another source wire forming the first and second pads is at a position overlapping the metal plate.
    Type: Application
    Filed: August 19, 2012
    Publication date: February 28, 2013
    Inventors: Tomoaki UNO, Yoshitaka ONAYA, Hirokazu KATO, Ryotaro KUDO, Koji SAIKUSA
  • Publication number: 20130009299
    Abstract: A semiconductor device is inhibited from being degraded in reliability. The semiconductor device has a tab including a top surface, a bottom surface, and a plurality of side surfaces. Each of the side surfaces of the tab has a first portion continued to the bottom surface of the tab, a second portion located outwardly of the first portion and continued to the top surface of the tab, and a third portion located outwardly of the second portion and continued to the top surface of the tab to face the same direction as each of the first and second portions. In planar view, the outer edge of the semiconductor chip is located between the third portion and the second portion of the tab, and the outer edge of an adhesive material fixing the semiconductor chip to the tab is located between the semiconductor chip and the second portion.
    Type: Application
    Filed: July 2, 2012
    Publication date: January 10, 2013
    Inventors: Keita TAKADA, Tadatoshi Danno, Hirokazu Kato
  • Publication number: 20130001792
    Abstract: A power MOSFET for switching and a sense MOSFET having an area smaller than that of the power MOSFET and configured to detect an electric current flowing through the power MOSFET are formed within one semiconductor chip CPH and the semiconductor chip CPH is mounted over a chip mounting part via an electrically conductive joining material and sealed with a resin. In a main surface of the semiconductor chip CPH, a sense MOSFET region in which the sense MOSFET is formed is located more internally than a source pad PDHS4 of the sense MOSFET region RG2. Furthermore, in the main surface of the semiconductor chip, the sense MOSFET region RG2 is surrounded by a region in which the power MOSFET is formed.
    Type: Application
    Filed: June 24, 2012
    Publication date: January 3, 2013
    Inventors: Tomoaki UNO, Yoshitaka Onaya, Hirokazu Kato, Ryotaro Kudo, Koji Saikusa, Katsuhiko Funatsu
  • Publication number: 20120313251
    Abstract: Methods and structure are provided for creating and utilizing hard masks to facilitate creation of a grating effect to control an anisotropic etching process for the creation of an opening, and subsequent formation of a interconnect structure (e.g., a via) in a multilayered semiconductor device. A first hard mask can be patterned to control etching in a first dimension, and a second hard mask can be patterned to control etching in a second dimension, wherein the second hard mask is patterned orthogonally opposed to the first hard mask. A resist can be patterned by inverting the pattern of a metal line patterning. Interconnects can be formed with critical dimension(s) and also self-aligned.
    Type: Application
    Filed: June 10, 2011
    Publication date: December 13, 2012
    Applicant: TOSHIBA AMERICA ELECTRONIC COMPONENTS, INC.
    Inventor: Hirokazu Kato
  • Patent number: 8324596
    Abstract: A device and method for fluorescence observation have good operability, high sensitivity, and high acid reliability. The device is used for fluorescence observation using evanescent light. The angle of incidence of the excitation light is adjusted so that the excitation light is totally reflected from the surface of a substrate irrespective of the angle of the substrate surface. The method includes a step of shining the excitation light on the observation substrate while continuously varying the angle of the excitation light with respect to the observation substrate. In addition, the method includes a step of sensing the shone excitation light via optical sensors, and a step of setting the angle of total reflection according to the result of the sensing by the optical sensors. In the present device and method, the direction in which the shone excitation light travels varies with the angle of incidence.
    Type: Grant
    Filed: May 20, 2009
    Date of Patent: December 4, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Nobutaka Kumazaki, Satoshi Takahashi, Hirokazu Kato, Takanobu Haga
  • Publication number: 20120197497
    Abstract: A travel controller which controls the travel of a vehicle includes a road information acquisition unit which acquires road information of a scheduled travel route, a temporary target travel control pattern generation unit which generates a temporary target travel control pattern of the scheduled travel route on the basis of the road information, an engine state transition section estimation unit which estimates an engine state transition section where the state of an engine transits when the vehicle travels using the temporary target travel control pattern, a speed difference calculation unit which calculates a speed difference resulting from variation in engine output in the engine state transition section, a target travel control pattern generation unit which corrects the temporary target travel control pattern on the basis of the speed difference to generate a target travel control pattern, and a travel control unit which performs travel control on the basis of the target travel control pattern.
    Type: Application
    Filed: October 22, 2009
    Publication date: August 2, 2012
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventor: Hirokazu Kato
  • Patent number: 8138059
    Abstract: A semiconductor device manufacturing method includes: forming a core pattern on a foundation film, the core pattern containing a material generating acid by light exposure; selectively exposing part of the core pattern except an longitudinal end portion; supplying a mask material onto the foundation film so as to cover the core pattern, the mask material being crosslinkable upon supply acid from the core pattern; etching back the mask material to expose an upper surface of the core pattern and remove a portion of the mask material formed on the end portion of the core pattern, thereby leaving a mask material side wall portion formed on a side wall of the core pattern; and removing the core pattern and processing the foundation film by using the mask material sidewall portion left on the foundation film as a mask.
    Type: Grant
    Filed: September 22, 2009
    Date of Patent: March 20, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kentaro Matsunaga, Hirokazu Kato, Tomoya Oori
  • Patent number: 8119517
    Abstract: A chemical mechanical polishing method comprises polishing an organic film using a slurry including polymer particles having a surface functional group and a water-soluble polymer.
    Type: Grant
    Filed: June 3, 2009
    Date of Patent: February 21, 2012
    Assignees: JSR Corporation, Kabushiki Kaisha Toshiba
    Inventors: Hirotaka Shida, Yukiteru Matsui, Atsushi Shigeta, Shinichi Hirasawa, Hirokazu Kato, Masako Kinoshita, Takeshi Nishioka, Hiroyuki Yano
  • Publication number: 20120021657
    Abstract: A connector includes a surface mount contact and housing. The surface mount contact has a cylindrical portion, a lance, and a pair of surface mount soldering portions. The cylindrical portion has a cylindrical shape into which a wire core of an electrical wire is inserted. The lance is positioned in an intermediate portion of the cylindrical portion along an axial direction thereof and secures the wire core when the electrical wire is inserted. The pair of surface mount soldering portions project from the cylindrical portion. Each of the pair of surface mount soldering portions extend from an end of the cylindrical portion in a direction orthogonal to the axial direction.
    Type: Application
    Filed: July 20, 2011
    Publication date: January 26, 2012
    Inventors: Taisuke Nagasaki, Hirokazu Kato
  • Publication number: 20110307145
    Abstract: A power generation control apparatus can switch, by controlling a power generation apparatus capable of generating power by power of a power source which makes a vehicle travel, between a first power generation control of mainly performing power generation at the time of deceleration of the vehicle while suppressing power generation at the time of acceleration of the vehicle in the case where normal travel of acceleration/deceleration travel is performed in a state where the power source operates and a second power generation control of mainly performing power generation at the time of acceleration of the vehicle while suppressing power generation at the time of deceleration of the vehicle in the case where acceleration/deceleration travel including coasting in which the vehicle travels in a state where the operation of the power source stops is performed. Consequently, power generation can be performed properly.
    Type: Application
    Filed: April 27, 2010
    Publication date: December 15, 2011
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventor: Hirokazu Kato
  • Publication number: 20110284768
    Abstract: The present invention has an object to provide a method for efficiently detecting an image with a smaller number of pixels. The invention relates to fluorescence analysis which uses a substrate having a plurality of regions for being capable of immobilizing biologically-related molecules in positions of lattice points of a lattice structure, and which causes the fluorescence from a certain lattice point to be wavelength-dispersed in a direction other than the direction toward the adjacent closest lattice point. According to an embodiment, for example, the number of pixels of a two-dimensional sensor required for fluorescence analysis of the regions with the biologically-related molecules immobilized can be set to several hundred times to fifty times smaller than that in the conventional case without degrading the measurement accuracy. This can achieve the improvement of throughput, reduction in price, and/or improvement of the operability of an analyzing device.
    Type: Application
    Filed: November 30, 2009
    Publication date: November 24, 2011
    Inventors: Satoshi Takahashi, Tsuyoshi Sonehara, Tomoyuki Sakai, Takanobu Haga, Hirokazu Kato, Nobutaka Kumazaki, Takuya Matsui
  • Patent number: 8058318
    Abstract: There is provided an acidic zirconia sol having compatibility of particle properties and binding properties, and a production method of the same. The acidic zirconia sol includes zirconia particles (a) having a particle diameter ranging from 20 to 300 nm in a content of 90 to 50% by mass, based on the mass of all zirconia particles, and zirconia particles (b) having a particle diameter of less than 20 nm in a content of 10 to 50% by mass, based on the mass of all zirconia particles.
    Type: Grant
    Filed: January 14, 2010
    Date of Patent: November 15, 2011
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Yutaka Ohmori, Hirokazu Kato, Kenji Yamaguchi
  • Publication number: 20110274767
    Abstract: There is provided a method for efficiently producing an anatase-type titanium oxide sol in an extremely advantageous dispersion state. The method comprises mixing a titanium alkoxide, an organic acid, and a quaternary ammonium hydroxide with water in a molar ratio of the organic acid of 0.4 to 4.0 relative to 1 mol of a titanium atom of the titanium alkoxide and in a molar ratio of the quaternary ammonium hydroxide of 0.8 to 1.9 relative to 1 mol of the organic acid to prepare an aqueous mixed solution having a concentration in terms of TiO2 of 0.5 to 10% by mass; heating the aqueous mixed solution to 50 to 100° C. to remove an alcohol; and subjecting the resulting titanium-containing aqueous solution to a hydrothermal treatment at 110 to 170° C.
    Type: Application
    Filed: October 27, 2009
    Publication date: November 10, 2011
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hirokazu Kato, Natsumi Tsuihiji
  • Patent number: 7987079
    Abstract: A facility for determining the 3-dimensional location and orientation of a subject surface in a distinguished perspective image of the subject surface is described. The subject surface has innate visual features, a subset of which are selected. The facility uses the location of the selected visual features in a perspective image of the subject surface that precedes the distinguished perspective image in time to identify search zones in the distinguished perspective image. The facility searches the identified search zones for the selected visual features to determine the 2-dimensional locations at which the selected visual features occur. Based on the determined 2-dimensional locations, the facility determines the 3-dimensional location and orientation of the subject surface in the distinguished perspective image.
    Type: Grant
    Filed: March 11, 2008
    Date of Patent: July 26, 2011
    Assignee: Artoolworks, Inc.
    Inventors: Mark N. Billinghurst, Hirokazu Kato
  • Publication number: 20110121204
    Abstract: A technique and device for fluorescence observation with good operability, high sensitivity, acid high reliability. The device is used for fluorescence observation using evanescent light. The angle of incidence of the excitation light is adjusted so that the excitation light is always totally reflected from the surface of a substrate irrespective of the angle of the surface of the substrate. The method includes a step of shining the excitation light on the observation substrate while continuously varying the angle of the excitation light with respect to the observation substrate, a step of sensing the shone excitation light by means of optical sensors, and a step of setting the angle of total reflection according to the result of the sensing by the optical sensors. The direction in which the shone excitation light travels varies with the angle of incidence. That is, the excitation light travels as the transmitted light, the reflected light, or the surface propagating light.
    Type: Application
    Filed: May 20, 2009
    Publication date: May 26, 2011
    Inventors: Nobutaka Kumazaki, Satoshi Takahashi, Hirokazu Kato, Takanovu Haga
  • Publication number: 20110105358
    Abstract: An object of the present invention relates to selectively control an extension reaction within a desired area in a substrate. In the present invention, an oligo probe arranged with a caged compound at the terminal thereof is immobilized to a reaction field area in the substrate. After pouring a reaction solution into a flow cell including the reaction field area, the reaction field area alone is irradiated with light to associate the photodegradation-active protecting group at the terminal of the oligo probe that has been immobilized in the reaction field area and thus to selectively control initiation of a polymerase extension reaction. In the flow cell, a plural number of the reaction field areas are arranged at constant interval on the substrate. The flow cell immobilized to a moving stage is moved by a distance equal to the interval between the adjacent reaction field areas and then light irradiation is carried out to measure the extension reaction continuously.
    Type: Application
    Filed: June 8, 2009
    Publication date: May 5, 2011
    Inventors: Hirokazu Kato, Satoshi Takahashi, Nobutaka Kumazaki, Takanobu Haga
  • Publication number: 20110070680
    Abstract: A pattern forming method includes forming a spin on dielectric film on a substrate, washing the spin on dielectric film by using a washing liquid, drying a surface of the spin on dielectric film after the washing, forming a photosensitive film on the dried coating type insulation film, emitting energy rays to a predetermined position of the photosensitive film in order to form a latent image on the photosensitive film, developing the photosensitive film in order to form a photosensitive film pattern which corresponds to the latent image, and processing the spin on dielectric film with the photosensitive film pattern serving as a mask.
    Type: Application
    Filed: October 27, 2010
    Publication date: March 24, 2011
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Tomoyuki Takeishi, Hirokazu Kato, Shinichi Ito
  • Patent number: 7892343
    Abstract: A manufacturing method for a slurry for the production of a precision casting mold that includes a zirconia sol and a refractory powder, and a manufacturing method for a precision casting mold that uses the slurry is provided. The present invention relates to a manufacturing method for a slurry for the production of a precision casting mold for a metal that includes a step in which an alkaline zirconia sol (A1) and a refractory powder (D) are mixed, the alkaline zirconia sol (A1) being obtained by a manufacturing method that includes a step (i), in which a zirconium salt (B1) is heated at 60 to 110° C. in an aqueous medium that includes a carbonate of quaternary ammonium, and a step (ii), in which a hydrothermal treatment is carried out at 100 to 250° C.
    Type: Grant
    Filed: June 21, 2006
    Date of Patent: February 22, 2011
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kiyomi Ema, Yutaka Ohmori, Hirokazu Kato, Kenji Yamaguchi
  • Patent number: 7851363
    Abstract: A pattern forming method includes forming a spin on dielectric film on a substrate, washing the spin on dielectric film by using a washing liquid, drying a surface of the spin on dielectric film after the washing, forming a photosensitive film on the dried coating type insulation film, emitting energy rays to a predetermined position of the photosensitive film in order to form a latent image on the photosensitive film, developing the photosensitive film in order to form a photosensitive film pattern which corresponds to the latent image, and processing the spin on dielectric film with the photosensitive film pattern serving as a mask.
    Type: Grant
    Filed: January 14, 2005
    Date of Patent: December 14, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Tomoyuki Takeishi, Hirokazu Kato, Shinichi Ito
  • Patent number: 7779777
    Abstract: A substrate-processing apparatus includes a sample table which mounts thereon a to-be-processed substrate, a first line which supplies a chemical solution, a second line which supplies a cleaning liquid, a three-way valve connected to the first and second lines and configured to select one of the first and second lines, a filter provided across the first line upstream of the three-way valve, and configured to eliminate a foreign material from the chemical solution, and a nozzle provided downstream of the three-way valve and configured to discharge the chemical solution or the cleaning liquid when the first or second line is selected via the three-way valve. The three-way valve selects the first line when the substrate is coated with the chemical solution, and selects the second line in other cases.
    Type: Grant
    Filed: May 15, 2009
    Date of Patent: August 24, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Eishi Shiobara, Hirokazu Kato, Seiro Miyoshi, Shinichi Ito