Patents by Inventor Hirokazu Nishida

Hirokazu Nishida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090061481
    Abstract: Disclosed is a modified hyperthermophilic DNA ligase having improved DNA binding ability and reactivity. The modified hyperthermophilic DNA ligase has an amino acid sequence corresponding to the amino acid sequence of a heat-resistant DNA ligase derived from a thermophilic bacterium, a hyperthermophilic bacterium, a thermophilic archaebacterium, or a hyperthermophilic archaebacterium, except with at least two of charged amino acids in the C-terminal helix region each being substituted by alanine, threonine, or serine residues.
    Type: Application
    Filed: February 8, 2008
    Publication date: March 5, 2009
    Inventors: Hirokazu Nishida, Maiko Tanabe
  • Publication number: 20080210868
    Abstract: Chirality distribution in the molecular structure of protein or the like and magnetic domain structure are analyzed with high resolution less than 10 nm. A transmission electron microscope equipped with a spin-polarized electron source is used for holography observation. The phase of transmission spin-polarized electrons changes due to the existence of chirality structure or magnetization in a sample, which is observed as an interference pattern phase shift in holography measurement.
    Type: Application
    Filed: January 29, 2008
    Publication date: September 4, 2008
    Inventors: Teruo Kohashi, Takashi Ohshima, Takao Matsumoto, Hirokazu Nishida
  • Patent number: 7306508
    Abstract: A multi-wire saw according to the present invention cuts a workpiece while supplying a slurry containing an alkali or mixed acid to a cutting interface between the workpiece and a wire, and includes: a storage tank with a heating mechanism for storing and heating the slurry; a thermal insulating pipe for transporting the slurry sent with a pump from the storage tank with a heating mechanism to a position before a position where the wire is incorporated into the workpiece, while keeping the slurry at a predetermined temperature; a thermostat for keeping a temperature in a vicinity of the workpiece fixed to a stage at the predetermined temperature; and a wire heating mechanism for heating the wire to the predetermined temperature. Consequently, the cutting resistance decreases during cutting machining of a silicon ingot, and the variation in the cutting resistance also decreases, whereby a high-quality wafer can be obtained at a high efficiency and a low cost.
    Type: Grant
    Filed: October 22, 2004
    Date of Patent: December 11, 2007
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Takafumi Kawasaki, Hirozoh Tsuruta, Hirokazu Nishida, Seiichi Mimura, Masayuki Hamayasu, Hisashi Tominaga
  • Publication number: 20070037190
    Abstract: It is intended to obtain DNA ligase improved in binding ability and reactivity with DNA, particularly thermostable DNA ligase improved in binding ability and reactivity with DNA. The present invention provides a DNA ligase mutant improved in binding ability and reactivity with DNA, which is obtained by partially or completely deleting a C-terminal helix portion of DNA ligase. Particularly, the mutant is derived from a thermostable bacterium.
    Type: Application
    Filed: June 23, 2006
    Publication date: February 15, 2007
    Inventors: Hirokazu Nishida, Yoshizumi Ishino, Kosuke Morikawa
  • Publication number: 20060249134
    Abstract: A multi-wire saw according to the present invention cuts a workpiece while supplying a slurry containing an alkali or mixed acid to a cutting interface between the workpiece and a wire, and includes: a storage tank with a heating mechanism for storing and heating the slurry; a thermal insulating pipe for transporting the slurry sent with a pump from the storage tank with a heating mechanism to a position before a position where the wire is incorporated into the workpiece, while keeping the slurry at a predetermined temperature; a thermostat for keeping a temperature in a vicinity of the workpiece fixed to a stage at the predetermined temperature; and a wire heating mechanism for heating the wire to the predetermined temperature. Consequently, the cutting resistance decreases during cutting machining of a silicon ingot, and the variation in the cutting resistance also decreases, whereby a high-quality wafer can be obtained at a high efficiency and a low cost.
    Type: Application
    Filed: October 22, 2004
    Publication date: November 9, 2006
    Inventors: Takafumi Kawasaki, Hirozoh Tsuruta, Hirokazu Nishida, Seiichi Mimura, Masayuki Hamayasu, Hisashi Tominaga
  • Publication number: 20060075687
    Abstract: In a slurry for cutting a silicon ingot according to the present invention, a content of a basic material is at least 3.5% by mass with respect to the total mass of a liquid component of a slurry, organic amine is contained in a mass ratio of 0.5 to 5.0 with respect to water in a liquid component of the slurry, and pH of the slurry is 12 or more. Furthermore, according to a method of cutting a silicon ingot according to the present invention, the above-mentioned slurry for cutting a silicon ingot is used at 65° C. to 95° C. Consequently, the cutting resistance during cutting processing of a silicon ingot is reduced, and a wafer of high quality can be obtained efficiently.
    Type: Application
    Filed: October 12, 2004
    Publication date: April 13, 2006
    Inventors: Hirozoh Tsuruta, Masayuki Hamayasu, Takafumi Kawasaki, Hirokazu Nishida, Hisashi Tominaga